The 83rd JSAP Autumn Meeting 2022 Highlighted Presentations
- 1. Success in further improving the quality of 100‐mm‐diameter β‐type gallium oxide epi‐wafers
This is expected to contribute significantly to the energy conservation of power semiconductors for electric vehicles, etc.
Chia‐Hung Lin, Kentaro Ema, Satoshi Masuya, Quang Tu Thieu, Ryoichi Sakaguchi, Kohei Sasaki, Akito Kuramata
Novel Crystal Technology, Inc.
- 2. World's first commercial quantum computer and the Nobel Prize in 2021 both have their origins in spin glass research
Hidetoshi Nishimori
Specially Appointed Professor, Tokyo Institute of Technology
- 3. Contributing to the Realization of Carbon Neutrality via the Utilization of Exhaust Heat
Highly Efficient Thermoelectric Module Achieves World‐class Power Generation Density
Fuyuki Ando (1), Hiromasa Tamaki (1), Yoko Matsumura (2), Tomoyuki Urata (2), Takeshi Kawabe (1), Ryosuke Yamamura (1), Yuriko Kaneko (1), Ryoji Funabashi (2), Tsutomu Kanno (1)
Panasonic Holdings (1), AIST (2)
- 4. Unpredictable amorphous oxide semiconductors are creating a new display market
Hideo Hosono
honorary and Institute Professor, MDX Materials Research Center for Elements Strategy, Tokyo Institute of Technology
- 5. First Material Capable of Visualizing Static Electricity in Approximately 2,600 Years
Tadashi Terasaki, Kazuya Kikunaga
Sensing System Research Center, National Institute of Advanced Industrial Science and Technology (AIST)
- 6. Contributing to the development of brain science and drug discovery by developing an ultra‐compact CMOS imaging device that can simultaneously measure cerebral blood flow and neural activity
Makoto Haruta (1), Mark Christian Guinto (1), Yasumi Ota (1), Asumiko Kawahara (1), Kosei Takehara (1), Yoyo Tashiro (1),(2), Kiyotaka Sasakawa (1), Jun Ota (1)
Nara Advanced Institute of Science and Technology (1), Kyushu University (2)
- 7. A New Step Toward Improving Performance of n‐Type Organic Semiconductors
Development of molecules that suppress low‐frequency intramolecular vibration modes is the key
Hiroyuki Ishii (1), Hiroyuki Yoshida (2),(3), Nobuhiko Kobayashi (1)
Faculty of Pure and Applied Sciences, University of Tsukuba (1), Graduate School of Engineering, Chiba University (2), MCRC, Chiba University (3)
- 8. Innovative Atomic‐Level Surface‐Planarization Technology was Developed for the Semiconductor Industry and is Expected to be used to Mass‐Produce Micro‐LEDs
Reo Yamato (1), Shuhei Ichikawa (1),(2), Atsushi Takeo (1), Jun Tatebayashi (1), Yasufumi Fujiwara (1)
Graduate school of Engineering, Osaka University (1), Research Center for Ultra‐High Voltage Electron Microscopy, Osaka University (2)
- 9. Neural network creates a digital twin that can control reality
Yuto Takehara, Yasunori Okano
Graduate School of Engineering Science, Osaka University
- 10. Developing Inexpensive, High‐Resolution Infrared Analysis Technology with Graphene, a Miraculous Material, Opens New Possibilities for Applications in Chemistry, Physics, and Bio‐Science
Kenta Nakagawa (1),(2), Yui Shimura (1), Yusuke Fukazawa (1), Ryosuke Nishizaki (1), Shinchiro Matano (1), Shuma Oya (1), Hideyuki Maki (1),(3)
Faculty of Science and Technology, Keio University (1), Kagami Memorial Research Institute for Materials Science and Technology (2), Center for Spintronics Research Network, Keio University (3)
- 11. Ultrafine‐fiber ceramic thermistor capable of measuring the temperature of a single cell at high speed, realized via photocrystallization
Tomohiko Nakajima, Tetsuo Tsuchiya
National Institute of Advanced Industrial Science and Technology (AIST)
- 12. Innovative neutron imaging technology developed amid the ultimate physical search for the elucidation of dark matter
Saya Akamatsu(1), Takuya Shiraishi(1), Tatsuhiro Naka(1), Takashi Asada(3), Ryuta Kobayashi(2), Ken’ichi Kuge (4)
Toho University(1), Nagoya University(2), The University of Naples Federico II (3), Chiba Univ. RI Research Center
- 13. An accidental discovery that led to the development of solar cells whose performance is improved by irradiation
Kento Hirai (1), Keisuke Yamane (1), Akihiro Wakahara (1), Takeshi Oshima (2), Tetsuya Nakamura (3), Tsutomu Imaizumi (3)
Toyohashi University of Technology (1), National Institutes for Quantum Science and Technology (2), Japan Aerospace Exploration Agency (3)
- 14. Etching Technology to Support Future Atomic‐Scale Semiconductor Manufacturing
High‐throughput SiN ALE: a step toward realization
Akiko Hirata (1), Masanaga Fukasawa (1), Katsuhisa Kugimiya (1), Yoshiya Hagimoto (1), Hayato Iwamoto (1), J. U. Tercero (2), Kazuhiro Karahashi (2), Satoshi Hamaguchi (2)
Sony Semiconductor Solutions Corporation (1), Graduate School of Engineering, Osaka University (2)
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