| 8 Plasma Electronics |
| Invited Lectures |
| March 19 13:00`14:00 |
| 19p-ZG - 1`2 |
| |
1 |
Plasma Control for Various Kinds of Plasma Application |
Tohoku Univ. (Professor Emeritus)@Sato Noriyoshi |
| |
2 |
Understandings and Control in Plasma-Fabrication Process of Silicon Thin Films |
Osaka Univ. 1@*Matsuda Akihisa 1, Sobajima Yasushi 1, Okamoto Hiroaki 1 |
| 8.1 Production and Control of Plasma |
| March 18 9:30`18:15 |
| 18a-ZB - 1`11 |
| 1 | Active Profile Control of Plasma Parameters and Beams By Using Multi-Frequencies Microwaves on a Large Bore ECR Ion Source with Permanent Magnets | Osaka Univ. 1@*Sakamoto Naoki 1, Kato Yushi 1, Sato Fuminobu 1, Iida Toshiyuki 1 |
| 2 | Plasma Production and Ion Beam Extraction from a Large Bore ECRIS with Permanent Magnets by Using Pulse Mode Microwaves | Osaka Univ. 1@*Hirai Yoshiaki 1,Sakamoto Naoki 1,Kato Yushi 1,Sato Fuminobu 1,Iida Toshiyuki 1 |
| 3 | Development of Induction Heating Pure Vapor Source of High Temperature Melting Point Materials on Electron Cyclotron Resonance Ion Source | Osaka Univ. 1,NIRS 2,Toyo Univ. 3@*Kutsumi Osamu 1,Kato Yushi 1,Kitagawa Atsushi 2,Muramatsu Masahiko 2,Uchida Takashi 3,Yoshida Yoshikazu 3,Sato Huminobu 1,Iida Toshiyuki 1 |
| 4 | Control of Carbons-loss fullerene ion in ECR ion source | Toyo Univ., 1, Tateyama Machine Co. Ltd., 2, NIRS 3@*Minezaki Hidekazu 1, Uchida Takashi 1,Tanaka Kiyokatsu 2, Muramatsu Masayuki 3, Asaji Toyohisa 2, Yoshida Yoshikazu 1 |
| 5 | Production of multi-charged iron ions with electron cyclotron resonance ion source | Tateyama Machine 1, Toyo Univ. 2, NIRS 3, ATOMKI 4, Osaka Univ. 5@*Toyohisa Asaji 1, Takashi Uchida 2, Hidekazu Minezaki 2, Tsubasa Takayama 2, Kiyokatsu Tanaka 1, Hidefumi Uchiyama 1, Masayuki Muramatsu 3, Sandor Biri 4, Atsushi Kitagawa 3, Yushi Kato 5, Yoshikazu Yoshida 2 |
| 6 | Production of endohedral Fe-fullerene by ion implantation | Toyo Univ. 1, Tateyama Machine Co., Ltd. 2, NIRS 3, ATOMKI 4, Osaka Univ. 5@*Uchida Takashi 1, Minezaki Hidekazu 1, Takayama Tsubasa 1, Tanaka Kiyokatsu 2, Muramatsu Masayuki 3, Asaji Toyohisa 2, Kitagawa Atsushi 3, Biri Sandor 4, Kato Yushi 5, Yoshida Yoshikazu 1 |
| | | Break 11:00`11:15 | |
| 7 | Improvement of beam intensity at compact ECR ion source for heavy-ion therapy with gas mixing technique | NIRS@*Muramatsu Masayuki 1, Kitagawa Atsushi 1, Drentje Arne 1 |
| 8 | Large-Scaled Long Line Plasma Production by Microwave with Narrowed Rectangular Waveguide(III) | Tokai Univ.1,2@*Yasuhito Kimura1, Tetuya Masuda2, Kazuki Yabuki2, Rintarou Shibata2, Haruo Shindo1,2 |
| 9 | Hollow Effects on Microwave Plasma Production at High Pressure | Chubu Univ. 1,Nagoya Industrial Research Inst. 2@*Shu Ohta 1,Iji Liang 1,Kimitaka Kato 2,Keiji Nakamura 1,Hideo Sugai 1 |
| 10 | Production of high-density capacitively coupled plasma by ring-shaped hollow electrode | Saga Univ.1@*Ohtsu Yasunori 1, Urasaki Hiroshi 1, Misawa Tatsuya 1, Fujita Hiroharu 1 |
| 11 | Effect of RF Voltage Non-Uniformity on Capacitive Discharge | Tokyo Electron Ltd. 1@*Ohshita Tatsuro 1, Matsukuma Masaaki 1, Kang Song-Yun 1, Sawada Ikuo 1 |
| | | Lunch 12:30`13:30 | |
| 18p-ZB - 1`18 |
| | 1 | Numrical analyses on electric fields radiated from slot antennas | Kobe Univ. 1@*Tsuji Akihiro 1, Yasaka Yasuyoshi 1, Takeno Hiromasa 1 |
| 2 | Numerical Analysis on Microwave Propagation Characteristics in Plasma Device with Microstrip Line in Low Pressure | Univ. of Tokyo@Dongmin Kim 1, Hiroyuki Ohsaki 1 |
| 3 | Numerical Analysis of a Micro Inductively Coupled Plasma Source Using PIC/MCC | Kyoto Univ. 1@*Takao Yoshinori 1, Eriguchi Koji 1, Ono Kouichi 1 |
| 4 | Simulation of dielectric barrier discharge in atmospheric pressure oxygen | N.D.A.1,N.D.A.2@Takahashi Gou 1,Akashi Haruaki 2 |
| ’ | 5 | Development of Gas Plasma Gun for Processing under Medium Vacuum | Toyohashi Univ. Technol. 1, Itoh Optical Industrial Co., Ltd. 2, Onward Ceramic Coating Co., Ltd. 3, Hitachi Tool Eng., Ltd. 4@*Yanagita Taichiro 1, Tanoue Hideto 1, Kamiya Masao 1,2, Suda Yoshiyuki 1, Takikawa Hirofumi 1, Taki Makoto 3, Hasegawa Yushi 3, Ishikawa Takeshi 4 |
| ’ | 6 | Discharge Transition from Dielectric Barrier Discharges to Micro-hollow Discharges at Atmospheric Pressure | Shizuoka Univ. 1@* Watanabe Jun 1, Ogino Akihisa 1, Nagatsu Masaaki 1 |
| 7 | Propagation speeds of optical emission waves in atmospheric-pressure plasma jets | Osaka Univ. 1@Ito Tsuyohito 1, Raddenzati Aur?lien 1, Shams Artabaze 1, Hamaguchi Satoshi 1 |
| 8 | Production and Diagnostics of Atmospheric Pressure Microplasma Jet Excited by Microwave | Nagoya Univ@Tomohiro Shirasaki 1, Keishi Tsuda 1, Mitsutoshi Aramaki 1, Akihiro Kono 1 |
| 9 | Method of generating high energetic electron plasma and application of NOx resolution | Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka Univ. 1@*Takashi Yoshida 1,Takayoshi Yumii 1,Noriaki Kimura 1 |
| | | Break 15:45`16:00 | |
| 10 | Surface modification of polycarbonate plate by atmospheric pressure plasma | Nagoya Inst Tec. 1,Chubu Univ. 2@*Mikitoshi Kasuya 1,Shinji Yasui 1,Teppei Nakada 1,Mikio Noda 2 |
| ’ | 11 |
Surface modification processes on organic material employing nonequilibrium atmospheric pressure remote plasma(III) | Nagoya Univ.1, SEKISUI CHEMICAL CO., Ltd 2@*Hirotoshi Inui 1,Takuya Yara 2,Tsuyoshi Uehara 2, Keigo Takeda 1,Makoto Sekine 1,Masaru Hori |
| 12 | Localized Etching of Polyimide film by an Atmospheric-Pressure Microplasma using a 100-Κm-Σ Metal Pipe Electrode | Tsuruoka Natl College of Tech.@Yoshiki Hiroyuki |
| 13 | Generation-Process of the Atmospheric Plasma
Produced in Microwave Heating of Powder Material | Chubu Univ. 1, NIFS 2@*Matsubara Akihiro 1, Nakayama Kazuya 1, Okajima Shigeki 1, Sato Motoyasu 2
|
| ’ | 14 | Influence of heat on plasma-liquid interaction of electolyte cathode discharge | Tokyo Metro. Univ. 1, Tokyo Tech. 2@*Naoki Shirai 1, Kosuke Ichinose 1, Yusuke Hashizume 1, Naoki Iwamoto 1, Satoshi Uchida 1, Fumiyoshi Tochikubo 1, Syozo Ishii 2 |
| 15 | Primary Factor of Stabilization on Solution Plasma Formation | Graduate School of Engineering, Nagoya Univ. 1, EcoTopia Science Inst., Nagoya Univ. 2, CREST/JST 3@*Hieda Junko 1, Fujikawa Norihiro 1, Saito Nagahiro 2,3, Takai Osamu 1,3 |
| 16 | Carbon Nanotube Synthesis from Liquid Xylene by Liquid Phase Arc Discharge: An Effect of Arc Plasma Characteristics
| Tokyo Univ. of Science 1@*Takio Kizu 1, Shinya Aikawa 1, Eiichi Nishikawa 1 |
| 17 | Generation mechanisms of the ions and radicals in the liquid processed by plasmas | Eng., Osaka Univ. 1, Sci., Osaka Univ. 2, TRI Osaka 3, Eng. Tohoku Univ. 4, Eng. Kansai Univ. 5@* Kitano Katsuhisa 1, Yonemori Seiya 1, Tani Atsushi 2, Ikawa Satoshi 3, Ohnishi Naofumi 4, Arakawa Ryuichi 5, Hamaguchi Satoshi 1
|
| 18 | Numerical analysis of diffusion of ions and radicals in liquid processed by plasma | Eng., Tohoku Univ. 1, Eng., Osaka Univ. 2, Sci., Osaka Univ. 3, TRI Osaka 4@*Naofumi Ohnishi 1, Katsuhisa Kitano 2, Atsushi Tani 3, Satoshi Ikawa 4 |
| 8.2 Plasma Diagnostics |
| March 17 9:30`18:00 |
| 17a-ZC - 1`11 |
| 1 | Effect of Gas on Electrode Temperature and Emission of Emitter Material in A Low-Pressure Fluorescent Lamp | Kyushu Univ. 1, Lighting Company, Panasonic corp. 2@*Yamagata Yukihiko 1, Naito Sho 1, Tomita Kentaro 1, Uchino Kiichiro 1, Kai Makoto 2, Manabe Yoshio 2 |
| 2 | Measurement of Atomic Density of Ti a3F4 State in a Facing Target Sputtering System with a SHG of Ti:Al2O3 Laser. | Tokyo Polytechnic Univ. 1@*Yoji Yasuda 1, Yusuke Ono 1, Nobuo Nishimiya 1, Masao Suzuki 1 |
| 3 | Multilayer Graphene Growth by Photoemission-Assisted Plasma CVD (8) : Discharge Characteristics and Emission Spectroscopy of Ar Plasma
| Tohoku Univ. 1, CREST-JST 2, Fujitsu Ltd. 3@*Kaga Toshiteru 1, Ohtomo Yudai 1, Ogawa Shuichi 1,2, Sato Motonobu 2,3, Nihei Mizuhisa 2,3, Takakuwa Yuji 1,2 |
| 4 | Multilayer Graphene Growth by Photoemission-Assisted Plasma CVD (9): Discharge characteristics and Emission spectroscopy in H2 plasma | Tohoku Univ. 1. CREST-JST 2. Fujitsu 3@*Yudai Ohtomo 1. Toshiteru Kaga 1. Shuichi Ogawa 1,2. Motonobu Sato 2,3. Mizuhisa Nihei 2,3. Yuji Takakuwa 1,2 |
| ’ | 5 | Saturation characteristics of the Balmer-Ώ line of atomic hydrogen in diode laser absorption spectroscopy | Nagoya Univ. 1,NIFS 2@*Asakawa Renge 1,Goto Motoshi 2,Sasaki Koichi 1 |
| | | Break 10:45`11:00 | |
| ’ | 6 | Investigation of External Electric Field Intensity in Atmospheric-pressure Pulsed Plasma using Polarized Hydrogen Atom Spectrum Measurement
| Nagoya Univ. 1,Nagoya Univ. 2@*Kamata Azumi 1,Haipeng Yang 1,Ishijima Tatsuo 2,Toyoda Hirotaka 1,2 |
| 7 | Diagnostics of the initial state in atmospheric-pressure pulsed micro hollow-cathode discharge plasma | National Defense Academy@Nakano Toshiki 1, Wake Shinya 1, Kitajima Takeshi 1 |
| 8 | Spectroscopic Diagnostics of Electron Density Distribution inside Parallel-Plate Dielectric Barrier Discharge | Kyoto Uni. 1, Ehime Univ. 2@*Urabe Keiichiro 1, Choi Joon-Young 1, Sakai Osamu 1, Kunihide Tachibana 2 |
| 9 | Electron Density and Temperature Measurements of Pulsed Filament Discharges using Laser Thomson Scattering Diagnostics
| Kyushu Univ. 1@Nima Bolouki 1, Hiroki Shirozono 1, Kentaro Tomita 1, Kiichiro Uchino 1@ |
| 10 | Gas-Phase Diagnostics of SiH4/H2 Microwave Excited Plasma | Nagoya Univ. 1,2@*Toshiyuki Kuroda 1, Tatsuo Ishijima 2, Hirotaka Toyoda 1,2 |
| 11 | Laser Scattered Measurement of Plasma for Thin Film Solar Cell Processing | Kyushu Univ. 1@Wei-Ting Chen 1, Ryota Komatsu 1, Yuki Kimura 1, Kentaro Tomita 1,
Kiichiro Uchino 1, Yoshinobu Kawai 1
|
| | | Lunch 12:30`13:30 | |
| 17p-ZC - 1`17 |
| 1 | Spectroscopic analysis in reaction field of solution plasma | Graduate School of Eng., Nagoya Univ. 1,EcoTopia Science Inst., Nagoya Univ. 2,CREST/JST 3@Hidekazu Tanaka 1,Junko Hieda 1,Bratescu Maria 1,Nagahiro Saito 2,3,Osamu Takai 1,3 |
| 2 | OES-Measurement on the spatial distribution of the Ar(1s5) population density in a 2f-CCP | Keio Univ. 1@Toshiaki Makabe 1,Tomihito Ohba 1,Kazuki Takahashi 1 |
| 3 | 2 dimensional optical emission spectroscopy of a temporal E-H
transition in an inductively coupled plasma in Ar | Keio Univ.@Morishita Satoshi, Hayashi Yuichiro, Mitsui Yo, *Makabe Toshiaki |
| ’ | 4 | Electron density measurements of Ar+H2+C7H8 plasmas | Graduate School of Information Sci., and Electrical Eng., Kyushu Univ., 1, Joining and Welding Research Inst., Osaka Univ., 2, Department of Electrical Eng., and Computer Sci., School of Eng., Nagoya Univ., 3, JST,CREST 4@*Takuya Nomura 1, Yuki Korenaga 1, Hidefumi Matsuzaki 1, Kazunori Koga 1,4, Masaharu Shiratani 1,4, Yuichi Setsuhara 2,4, Makoto Sekine 3,4, and Masaru Hori 3,4 |
| ’ | 5 |
Low-k Film Etching Using C4F8/N2/Ar Gas Chemistry in Dual Frequency CCP with DC bias (II)
| Nagoya Univ. 1, JST-CREST 2, Tokyo Electron AT Ltd. 3@T.Yamaguchi 1, T.Kimura 1, K.Takeda 1,2, C.Koshimizu 3, M.Sekine 1,2, M.Hori 1,2 |
| ’ | 6 | Cross Sections Measurement for Electron-Impact TiCl2 Production from TiCl4 | Nagoya Univ. 1,2,Tokyo Electron 3@*Saito Kohei 1,Sekine Makoto 1,2,Hori Masaru 1,2,Toyoda Hirotaka 1,2,Kang Songyun 3,Sawada Ikuo 3 |
| 7 | Li+ Attachment Mass Analysis of Neutral Species in the Downstream Region of CH4 Plasmas | Kyushu Univ.@*Furuya Kenji 1, Ide Akihiro 1, Harata Akira 1 |
| ’ | 8 | Oxidation process of an amorphous carbon film due to oxygen | Graduate school of Science and Technology Nagasaki Univ. 1, Faculty of Engineering Nagasaki Univ. 2, Toyo Advanced Technologies Co., LTD.3@¦T. Kawakami 1, H. Kawazoe 1, T. Inayoshi 1, K. Hara2,
M. Shinohara1, Y. Matsuda2, H. Fujiyama1, Y. Nitta3, and T. Nakatani3
|
| ’ | 9 | Influence of perturbation of discharge power on ion density | Kyushu Univ.@*Hiroshi Miyata 1,Shinya Iwashita 1,Yasuyuki Yamada 1,Kazunori Koga 1,Masaharu Shiratani 1 |
| | | Break 15:45`16:00 | |
| 10 | Electron Energy Distribution Mleasurement in RF Plasmas by a New Emissive Probe Method(II) | Tokai Univ.1,2, Nihonkousyuuha Co.LTD 3@Nakazaki Yoshiaki 1,Fujimoto Yuma 2,Kimura Yasuhito 1,Kusaba Kota 3,shindo haruo 12 |
| 11 | Investigation on Multi-Resonant Frequency Shift Probes | Chubu Univ. 1@Qi Zhang 1, Keiji Nakamura 1, Hideo Sugai 1 |
| 12 | Plasma Diagnosis Using a Quartz Sensor without a Filter | AIST 1@Plasma Diagnosis Using a Quartz Sensor without a Filter |
| 13 | Plasma Diagnostics of H2-N2 Glow Discharge Plasma? | Tokyo Denki Univ. 1@*Nakada Hideki 1,Shimizu Fumitaka 1, Suda Kenichi 1, Tatsuya Wagai 1, Mitsuya Motohashi 1, Homma Kazuaki 1 |
| 14 | In-situ sampling of dust particles in LHD using a polyhedral holder | Kyushu Univ. 1, NIFS 2@*H. Miyata 1,S. Iwashita 1,Y. Yamada 1,K. Koga 1,M. Shiratani 1,N. Ashikawa 2,S. Masuzaki 2,K. Nishimura 2,A. Sagara 2,LHD experimental group 2 |
| 15 | Measurement of plasma heat flux on high temperature Tangsten samples | Osaka Pref. Univ. 1,Kyushu Univ. 2@*Matsuura Hiroto 1,Higashizono Yuta 2,Sakamoto Mizuki 2 |
| 16 | Heat influx to the substrate during ICP assisted sputtering | School of Sci. & Technol. Nagasaki Univ. 1, Fac. of Eng. Nagasaki Univ. 2@Ryoji Kan 1, Hiroaki Kitagawa 1, Masanori Shinohara 1, *Yoshinobu Matsuda 2 |
| 17 | Behaviors of Metal Atoms during ICP-assisted Sputtering of Al-doped ZnO thin Films | School of Sci. & Technol. Nagasaki Univ. 1, Fac. of Eng. Nagasaki Univ. 2@Tadashi Iwata 1, Kazuki Komine 1, Ryota Sindo 1, Masanori Shinohara 1, *Yoshinobu Matsuda 2 |
| 8.3 Plasma Deposition and Surface Treatment |
| March 19 9:30`18:30 |
| 19a-ZB - 1`11 |
| 1 | Polymer Surface Modification by Plasma Irradiation and Deposition of Self Assembled Monolayer | Dept. Eng., Nagoya Univ. 1, EcoTopia Sci. Inst., Nagoya Univ. 2@*Tatsuru Shirafuji 1, Masanori Kawaguchi 1, Nagahiro Saito 2, Osamu Takai 1 |
| £ | 2 | Enhancement of ITO Layer Adhesion to PET Film Treated by High-Density Plasma | Chubu Univ. 1, Nagoya Industrial Research Inst. 2, Toyobo Co. 3@*Iji Liang 1, Hisafumi Ogawa 1, Kimitaka Kato 2, Kiyoshi Iseki 3, Hideo Sugai 1 |
| 3 | Effect of plasma treatment time on adhesion force between chloride-isobutene-isoprene rubber and stainless-steel
| Nagoya Univ. 1, Argonne National Lab. 2, Nagoya Univ. 3, Nipro Corp. 4@*Kousaka Hiroyuki 1, Kim Jyong-Hyoung 2, Tomida Makoto 3, Umehara Noritsugu 1, Shimada Mamoru 4, Hasegawa Mitsuru 4 |
| ’ | 4 | Rapid Enhancement of Polyimide Film Adhesion by High Density Microwave Plasma | Nagoya Univ. 1,2, Toyobo Co. 3, Chubu Univ. 4@*Usami Kenji 1, Ishijima Tatsuo 2, Toyoda Hirotaka 1,2 Iseki Kiyoshi 3, Sugai Hideo 4 |
| ’ | 5 | Analyses of nano-crystalline carbon particles in gas phase of carbon sputtering plasmas | Department of Electronics Kyoto Institute of Technology@*Tomo Ide 1,Koji Nishio 1,Kazuo Takahashi 1 |
| ’ | 6 | Deposition of a metal/DLC nanocomposite film by magnetron sputtering | Nagoya Univ. 1,3,Tun Hussein Onn Malaysia Univ. 2,@Tsutsumi Takahiko 1,Takada Noriharu 1,Nafarizal Bin Nayan 2,Sasaki Kouiti 3 |
| | | Break 11:00`11:15 | |
| ’ | 7 | Microcrystalline Silicon Thin Film Deposition by High Density SiH4/H2 Microwave PCVD under Surface Temperature-Controlled Condition | Nagoya Univ. 1,2@Junji Sakai 1,Masahira Ikeda 1,Yuki Ito 1,Tatsuo Ishijima 2,Hirotaka Toyoda 1,2 |
| ’ | 8 | Mechanism of fabricating microcrystalline silicon in plasma CVD method | Nagoya Univ. 1, JRT-CREST 2@*Kawashima Sho 1,Abe Yusuke 1, Takeda Keigo 1, Ishikawa Kenji 1, Kondou Hiroki 1, Sekine Makoto 1,2, Hori Masaru 1,2 |
| | 9 | High-rate Etching of Silicon by Narrow-gap Microwave Hydrogen Plasma and Analysis of the Etched Surface
| SHARP Corp. 1, Osaka Univ. 2@*Funaki Takeshi 1, Nakahama Yasuji 1, Kadono Masaru 1, Yasutake Kiyoshi 2, Ohmi Hiromasa 2 |
| 10 | SiH4 production from solid Si by narrow-gap microwave hydrogen plasma | SHARP Corp. 1, Osaka Univ. 2@*Nakahama Yasuji 1, Funaki Takeshi 1, Kadono Masaru 1, Yasutake Kiyoshi 2, Ohmi Hiromasa 2 |
| 11 | Preparation of the purified Si film by remote hydrogen plasma enhanced chemical transport | Osaka Univ. 1,SHARP 2@*Ohmi Hiromasa 1,Yasutake Kiyoshi 1,Nakahama Yasuji 2,Funaki Takeshi 2,Kadono Masaru 2 |
| | | Lunch 12:30`14:00 | |
| 19p-ZB - 1`17 |
| 1 | Analysis of Plasma-Polymer Interactions Using Combinatorial Plasma-Process Analyzer (III) | Osaka Univ. 1, Kyushu Univ. 2, Nagoya Univ. 3, JST, CREST 4@*Yuichi Setsuhara 1,4, Ken Cho 1,4, Kosuke Takenaka 1,4, Masaharu Shiratani 2,4, Makoto Sekine 3,4, Masaru Hori 3,4 |
| ’ | 2 | Nano-Surface Analysis of Plasma-Polymer Interactions for Development of Low-Temperature and Low-Damage Plasma Processes | Osaka Univ. 1, Kyusyu Univ. 2, Nagoya Univ. 3, JST, CREST 4@*Ken Cho 1,4, Kosuke Takenaka 1,4, Yuichi Setsuhara 1,4, Masaharu Shiratani 2,4, Makoto Sekine 3,4, Masaru Hori 3,4 |
| 3 | Formation of Inorganic / Organic Hybrid Structures via Low-Temperature and Low-Damage Plasma Processes | Osaka Univ. 1, Kyusyu Univ. 2, Nagoya Univ. 3, JST, CREST 4@*Kosuke Takenaka 1,4, Ken Cho 1,4, Yuichi Setsuhara 1,4, Masaharu Shiratani 2,4, Makoto Sekine 3,4, Masaru Hori 3,4 |
| 4 | Deposition of Indium-Zinc-Oxide transparent conductive film using RF magnetron sputtering
| Wakayama Univ. 1, Meijo Univ. 2, Nagoya Univ.3@*Ohta Takayuki 1, Takota Naoki 1, Inoue Mari 1, Ito Masafumi 2, Takeda Keigo 3, Hori Masaru 3 |
| 5 | Control of film microstructure by impulse magnetron sputtering deposition using target bias voltage during off-pulse period
| Seikei Univ. 1@*Nakano Takeo 1, Hara Ryosuke 1, Hirukawa Norihiko 1, Baba Shigeru 1 |
| ’ | 6 | Periodic Peak Structure in O- Energy Distribution in Sputter Process of Oxide Target | Nagoya Univ. 1,Nagoya Univ. 2,ULVAC 3,NEC 4@*Goto Kazuya 1,Ishijima Tatsuo 2,Morita Tadashi 3,Ono Kazunaga 3,Ohshima Kazunori 4, Kinoshita Keizo 4,Toyoda Hirotaka 1,2 |
| 7 | Oxygen Negative Ion Beam Induced Damage in Oxide Magnetron Sputter Process | NEC 1, ULVAC 2, Nagoya Univ. 3,4@*Keizo Kinoshita 1, Kazunaga Ono 2, Kazuya Goto 3, Norikazu Ohshima 1, Tadashi Morita 2, Tatsuo Ishijima 4, Hirotaka Toyoda 3,4 |
| 8 | Preprocessing experiments of insulation substrate by irradiating the atmospheric pressure plasma-ions oriented for maskless sputtering deposition | Ibaraki Univ.@*Naoyuki Sato 1, Hiroyuki Kikukawa 1, and Takashi Ikehata 1 |
| | | Break 16:00`16:15 | |
| ’ | 9 | Oil Film Removal from Metal Surface by Atmospheric-Pressure Twin Flat-Plasma-Jets | Toyohashi Univ. Technol. 1, Daiken Chemical Co., Ltd. 2@*Tsujii Keinichi 1, Minamoto Junichi 1, Shikamata Daisuke 1, Suda Yoshiyuki 1, Takikawa Hirofumi 1, Shiki Hajime 2 |
| ’ | 10 | Nitriding Treatment of Stainless Steel by Atomospheric-Pressure Meso-Plasma Jet | Toyohashi Univ. Technol. 1,Daiken Chemical Co., Ltd.,2@*Minamoto Junichi 1,Tsujii Kenichi 1,Shikamata Daisuke 1,Suda Yoshiyuki 1,Takikawa Hirofumi 1,Shiki Hajime 2 |
| ’ | 11 | Preparation of Transparent Conductive ZnO Crystal Films by Atmospheric Pressure Plasma-Assisted Flux Method | Shinshu Univ. 1, Tokyo Univ. 2@*Oishi Masahiro 1, Teshima Katsuya 1, Lee SunHyung 1, Tajima Satomi 2, Tsuchiya Shoichi 2, Ichiki Takanori 2, Oishi Shuji 1 |
| ’ | 12 | Development of patterning techniques for extracellular matrix films by atmospheric-pressure plasmas | Osaka Univ. CAMT 1,IMS 2@*Ando Ayumi 1,Asano Toshifumi 2,Tero Ryugo 2,Kitano Katsuhisa 1,Urisu Tsuneo 2,Hamaguchi Satoshi 1 |
| 13 | Development of Atmospheric Plasma Jet with Slit Nozzle | Toyota Technological Inst.@*Oshima Nobuaki 1, Takada Ryuji 1, Hara Tamio 1 |
| 14 | Reduction of cuprous oxide and cupric oxide by atmospheric-pressure inductively coupled microplasma jet | U. of Tokyo-School of Engineering 1, Panasonic Factory Solutions Co., Ltd. 2, U. of Tokyo-CNBI 3, JST-CREST 4@Satomi Tajima 1, Shouichi Tsuchiya 1, Masashi Matsumori 2, Shigeki Nakatsuka 2, Takanori Ichiki 1, 3, 4 |
| 15 | Improvement of Adhesive Strength of Fluoroplastic Films Using Atmospheric Meso-Plasma | Daiken Chemical Co., Ltd. 1, Toyohashi Univ. Technol. 2@*Shiki Hajime 1,Yamanaka Shigenobu 1,Okawa Takashi 1,Tsujii Kenichi 2,Minamoto Junichi 2,Shikamata Daisuke 2,Suda Yoshiyuki 2,Takikawa Hirofumi 2 |
| 16 | Formation of High Crystallinity Silicon Films by High Speed Scanning of Melting Region Formed by Atomospheric Pressure DC Arc Discharge Micro-Thermal-Plasma-Jet and Its Application to Thin Film Transistors. | Hiroshima Univ. 1@*Shohei Hayashi 1, Seiichiro Higashi 1, Yasuo Hiroshige 1, Hideki Murakami 1, Seiichi Miyazaki 1 |
| 17 | Factor of crystallinity of a-Si utilizing rf thermal plasma torch | Saitama Univ. 1@*Ota Naoki 1, Lei Senki 1, Oba Daisuke 1, Sato Syunsuke 1, Shirai Hajime 1 |
| 8.3 Plasma Deposition and Surface Treatment |
| March 20 9:00`12:15 |
| 20a-ZB - 1`12 |
| 1 | Silicon trench oxidation characteristic in microwave oxygen plasma | Tokai University 1,2@*J. Koike1, T. Ishii2 Y. Nakazaki1 , Y. Kimura1 and H. Shindo1,2 |
| 2 | Noncontact Measurement of Quartz Surface Temperature during Remote Hydrogen Plasma Exposure
| Grad. School of Advanced Sciences of Matter, Hiroshima Univ. 1, Univ. of the Ryukyus 2@*Tsustsui Hiroki 1, Okada Tatsuya 2, Higashi Seiichiro 1, Hiroshige Yasuo 1, Matsumoto Kazuya 1, Miyazaki Seiichi 1, Noguchi Takashi 2 |
| £ | 3 | Large area dielectric barrier discharges generated in supercritical xenon and their application to sp3 hybridized nanocarbon materials synthesis | Univ. Tokyo 1@*Stauss Sven 1, Miyazoe Hiroyuki 1, Kikuchi Hirokazu 1, Shizuno Tomoki 1, Saito Koya 1, Terashima Kazuo 1 |
| ’ | 4 | Low-temperature crystallization of TiNi thin film by ion irradiation technology | Kanazawa Institute of Technology, Research Laboratory for Integrated Technology Systems@*Yujiro Hoshino,Yuya Kurachi,Noriaki Ikenaga,Yoichi Kishi,Zenjiro Yajima,Noriyuki Sakudo |
| 5 | Effect of Hydrogen gas Dilution on SiNx Films Deposition by Low Temperature Plasma Enhanced Chemical Vapor Deposition | Toshiba Corp. 1, Kyusyu Univ. 2@*Ikagawa Masakuni 1, Sano Junji 1, Sakita Hirofumi 2 |
| 6 | Thin-film silicon microstructure and PECVD process dependence | AIST PV center@*Nunomura Shota 1, Kondo Michio 1 |
| | | Break 10:30`10:45 | |
| 7 | Surface-Wave-Plasma CVD system with reciprocated substrate ambulation mechanism | Shimadzu corp.@*Ueno Satoko 1, Suzuki Masayasu 1, Konishi Yoshiyuki 1, Azuma Kazufumi 1, Ishida Shinichiro 1 |
| 8 | Development of Microwave Atmospheric Pressure Plasma CVD Device Using Microstrip | AIST 1, Univ. of Tokyo 2, Open Univ. of Japan 3@*Jaeho Kim 1, Dongmin Kim 2, Ohsaki Hiroyuki 2, Makoto Katsurai 3 |
| 9 | Deposition of P doped a-Si:H in using SiH4+PH3 multi-hollow discharge plasma CVD | Kyushu Univ. 1@*Kenta Nakahara 1, Hiroshi Sato 1, Yuuki Kawashima 1, Kazunori Koga 1, Masaharu Shiratani 1
|
| 10 | Reaction of SiHCl3 with hydrogen radical produced using pulse-modulated thermal plasma for SOG-Si production | Hosei Univ. 1, Nihon Univ. 2, NIMS 3@*Akizuki Tomohiro 1,Sumiya Masatomo 3,Ishigaki Takamasa 1,Hashimoto Takuya 2,Koinuma Hideomi 3 |
| 11 | HfTiSiON film growth by N2 plasma exposure to Hf-Ti liquid nano particles on native SiO2 film
| National Defense Academy 1@*Kitajima Takeshi 1, Kage Ryousuke 1, Nakano Toshiki 1 |
| 12 | Study on temperature variation and erosion processes of diverter plates in nuclear fusion devices | Graduate School of Engineering,Hachinohe Inst. of Technology 1@*Tabata Takuya 1, Nejoh YasuNori 2 |
| 8.4 Plasma Etching |
| March 18 9:30`18:00 |
| 18a-ZD - 1`11 |
| 1 | TSV Etching Process in NLD | Inst.of Semiconductor and Electronics Tech.@*Murayama Takahide 1,Morikawa Yasuhiro 1,Yoshii Manabu 1,Suu Koukou 1 |
| 2 | TSV etching process using by VHF-CCP. | ULVAC, Inc. Institute of Semiconductor and Electronics Technologies.@*Yasuhiro Morikawa 1, Manabu Yoshii 1, Koukou Suu 1 |
| 3 | Silicon etching by Outward/Inward Plasmas and their novel characteristics | NRI-AIST 1, SUNYOU 2@*Tetsuo Shimizu 1, Tohru Wataya 1, Yasuhisa Naitoh 1, Hiroshi Tokumoto P,
Yuya Shirayama 2, Shun-ichiro Shimbori 2,Tatsuo Kawakami 2, Shuntaro Yokosuka 2, Kenta Kashimura 2 |
| 4 | Etch characteristics of HfO2 in CO- and H2- added CF4 plasmas | Kyoto Inst. of Technology@Miyama Ryo 1,Takahashi Kazuo 1 |
| 5 | Etching reaction of Pt, Co and Pt-Co films by reactive ion beam irradiation | Osaka Univ.@*Karahashi Kazuhiro 1, Tomoko Ito 2, Satoshi Hamaguchi |
| | | Break 10:45`11:00 | |
| 6 | Analysis of Si Substrate Damage by H-Containing Plasma | Sony corp. 1,Kyoto Univ. 2@*Masanaga Fukasawa 1,Asahiko Matsuda 2,Yoshinori Nakakubo 2,Yoshinori Takao 2,Koji Eriguchi 2,Kouichi Ono 2,Masaki Minami 1,Fumikatsu Uesawa 1,Tetsuya Tatsumi 1 |
| 7 | Correlation between Plasma-Induced Physical Damage and MOS-Device Performance Degradation | Kyoto Univ.@Koji Eriguchi 1, Yoshinori Nakakubo 1, Asahiko Matsuda 1, Yoshinori Takao 1, Kouichi Ono 1 |
| 8 | Evaluation of mechanism of H2/N2 plasma damage on porous SiOCH low-k film (II) | Nagoya Univ. 1, JST-CREST 2, Toshiba Corp. 3@Hiroshi Yamamoto 1, Keigo Takeda 1,2, Kenji Ishikawa 1, Hiroki Kondo 1, Makoto Sekine 1,2, Masaru Hori 1,2, Takeshi Kaminatsui 3, Hisataka Hayashi 3, Itsuko Sakai 3, Tokuhisa Ohiwa 3 |
| 9 | A Simulation of the Effect of Resist Mask on Feature Profile Evolution in SiO2 Etching | Keio Univ. 1@*Yagisawa Takashi 1, Makabe TOshiaki 1 |
| 10 | Dissociation Channel of c-C4F8 in Reactive Plasma | Nagoya Uni. 1, ULVAC Inc. 2@Toshio Hayashi 1, Kenji Ishikawa 1, Makoto Sekine 1, Masaru Hori 1, Akihiro Kono 1, Koukou Suu 2 |
| 11 | Dissociation Channel of C2F4 in Reactive Plasma | Nagoya Uni. 1, ULVAC Inc. 2@Toshio Hayashi 1, Kenji Ishikawa 1, Makoto Sekine 1, Masaru Hori 1, Akihiro Kono 1, Koukou Suu 2 |
| | | Lunch 12:30`13:15 | |
| 18p-ZD - 1`18 |
| 1 | Resist Removal Using High Purity Ozone Gas at Room Temperature | Meidensha Corp. 1,Kanazawa Inst. of Technology 2@*Toshinori Miura 1,Mitsuru Kekura 1,Hideo Horibe 2 |
| ’ | 2 | Mechanism of ashing photoresist using O2 plasma and CO2 plasma | Nagoya Univ. 1,JST-CREST@2@Abe Yusuke 1,Takeda Keigo 1,Ishikawa Kenji 1,Kondo Hiroki 1,Sekine Makoto 1,2,Hori Masaru 1,2 |
| ’ | 3 | Surface analysis of photoresist surface modified by SF6/O2 plasma | Nagoya Univ. 1, JST-CREST 2@Takeuchi Takuya 1,Amasaki Shinpei 1,Takeda Keigo 1,Ishikawa Kenji 1,Kondo Hiroki 1,Sekine Makoto 1,2,Hori Masaru 1,2 |
| ’ | 4 | Mechanism for Generation of LER and Degradation of Etching Selectivity of ArF Photoresist during Plasma Etching Processes ? | Tohoku Univ. 1, Mitsubishi Rayon 2@*Koji Koyama 1, Butsurin Jinnai 1, Shinichi Maeda 2, Keisuke Kato 2, Atsushi Yasuda 2,@Hikaru Momose 2, Seiji Samukawa 1 |
| ’ | 5 | Plasma etching of SiC surface using NFsub3/sub | Doshisha Univ. 1,Toyo Tanso Co., Ltd. 2@Yuki Kotaka 1,Tomoki Nonoyama 1,Takatsugu Kanatani 1,Hirohisa Yamada 1,Tetsuro Tojo 2, Minoru Inaba 1,Akimasa Tasaka 1 |
| ’ | 6 | Dry Etching Assisted by Femtosecond Laser Irradiation in Fused Silica (2) = Selective Etching of Nano Periodic Structure=
| BEANS Project 3D BEANS Center 1, Fujikura Ltd. 2, Univ. of Tokyo3, Tohoku Univ. 4@*Osamu Nukaga 1, Satoshi Yamamoto 2, Tomohiro Kubota 1,3 , Masakazu Sugiyama 1,3, Seiji Samukawa1,4
|
| ’ | 7 | Study of Plasma-induced Damage to Low-k Film through the Hard-Mask | Tohoku Univ. 1@*Hirokatsu Okumura 1, Butsurin Jinnai 1, Noriaki Matsunaga 1, Seiji Samukawa 1 |
| ’ | 8 | On-wafer Monitoring for VUV Radiation in a Capacitively-Coupled Plasma Etch Reactor | Tohoku Univ. 1, Lam Research 2@*Butsurin Jinnai 1, Eric A Hudson 2, Seiji Samukawa 1 |
| | | Break 15:15`15:30 | |
| ’ | 9 |
SiO2 Films Etching Process Based on Gas Design and Clarifying Mechanisms of Etching Process iIIj | Nagoya Univ. 1, ZEON Corp. 2, JST-CREST 3@*Miyawaki Yudai 1, Takeda Keigo 1, Ito Azumi 2, Nakamura Masahiro 2, Ishikawa Kenji 1, Sekine Makoto 1,3, Hori Masaru 1,3
|
| ’ | 10 |
Study for damage in porous SiOCH film with air exposure after plasma processing(II) | Nagoya Univ 1, JST-CREST 2@*Toshiya Suzuki 1, Hiroshi Yamamoto 1, Keigo Takeda 1,2, Hiroki Kondo 1,2, Kenji Ishikawa 1,2, Makoto Sekine 1,2, Masaru Hori 1,2
|
| ’ | 11 | Etching reaction by CHxFy+ ion irradiation | Osaka Univ. 1,Sony Corp. 2@*Tomoko Ito 1,Kazuhiro Krahashi 1,Masanaga Fukasawa 2,Tetsuya Tatsumi 2,Satoshi Hamaguchi 1 |
| ’ | 12 | Atomic-scale Cellular Model and Profile Simulation of Si Etching in Chlorine-based Plasmas: Analysis of Mechanisms for Microscopic Uniformity | Kyoto Univ. 1@*Tsuda Hirotaka 1, Mori Masahito 1, Takao Yoshinori 1, Eriguchi Koji 1, Ono Kouichi 1 |
| 13 | Classical Molecular Dynamics Simulation of Plasma-Surface Interactions during
Si Etching in Chlorine- and Bromine-based Plasmas with and without Neutral Reactants
| Kyoto Univ.@*Ken Taniguchi, Tatsuya Nagaoka, Hirotaka Tsuda, Yoshinori Takao,
Koji Eriguchi, Kouichi Ono
|
| 14 | In Situ Fourier Transform Infrared Absorption Spectroscopy of Reaction Products during Si Etching in Inductively Coupled Cl2 Plasmas
| Kyoto Univ. 1@*Miyata Hiroki 1, Tsuda Hirotaka 1, Takao Yoshinori 1, Eriguchi Koji 1, Ono Kouichi 1 |
| 15 | Silicon Etching using Fluorine Neutral Beam | BEANS 1, Univ. of Tokyo 2, Tohoku Univ. 3@Kubota Tomohiro 1,2, Nukaga Osamu 1, Ueki Shinji 1, Sugiyama Masakazu 1,2, Ohtake Hiroto 3, Samukawa Seiji 1,3 |
| 16 | Analysis of Neutral Beam (3) - Measurement of Angular Distribution | BEANS 1, Univ. of Tokyo 2, Tohoku Univ. 3@Kubota Tomohiro 1,2, Nukaga Osamu 1, Ueki Shinji 1, Sugiyama Masakazu 1,2, Samukawa Seiji 1,3 |
| 17 | Analysis of Neutral Beam Generation Mechanism by First-Principle Electronic Structure Calculation III | Mizuho Information & Research Institute Inc. 1, BEANS project 3D BEANS center 2, Univ. of Tokyo 3, Tohoku Univ. 4@*Naoki Watanabe 1, Shingo Otsuka 1, Takuya Iwasaki 1, Kohei Ono 1, Yasuro Iriye 2, Osamu Nukaga 2, Shinji Ueki 2, Tomohiro Kubota 2, Masakazu Sugiyama 2 3, Seiji Samukawa 2 4 |
| 18 | Well-established compact combinatorial plasma etching process for organic low-k films in inductively coupled H2/N2 plasma | Nagoya Univ. 1, Osaka Univ. 2, Kyushu Univ. 3, JST-CREST 4@Hori Masaru 1,4, Chang S. Moon 1, Takeda Keigo 1, Sekine Makoto 1,4, Setsuhara Yuichi 2,4, Shiratani Masaharu 3,4, Ishikawa Kenji 1, Kondo Hiroki 1 |
| 8.5 Plasma Nanotechnology |
| March 19 |
| 19a-R - 1`16 |
| |
Short Presentation (5 min.) 10:10`11:30
19a-R-1`16@Poster Session 15:30`17:30 |
| £ | 1 | Surface treatment of arginine vasotocin powder by air plasma sources at atmospheric pressure | Shizuoka Univ@Tianling NiP, Akihisa OginoP, Iuliana MotrescuP and Masaaki NagatsuP
|
| £ | 2 | ZnO Nano-phosphors Fabricated by Pulsed Nd:YAG Laser Ablation | Shizuoka Univ. 1@Ma QiangP, Takafumi MatsudaP, Akihisa OginoP, and Masaaki NagatsuP |
| ’ | 3 | Synthesis of Si nanoparticles using plasma CVD and their application for the third generation photovoltaics | Dept. of electronics, Kyushu Univ. 1, AIST 2@Yuki Kawashima 1, Kenta Nakahara 1, Hiroshi Sato 1, Kazunori Koga 1, Masaharu Shiratani 1, and Michio Kondo 2 |
| 4 | Visible-light-emitting Si nanocrystal generated by the laser ablation in supercritical fluides | Graduate School of Science, Hiroshima Univ. 1,N-BARD, Hiroshima Univ. 2@*Tamamitsu Hironori 1,Saitow Ken-ichi 1,2 |
| 5 | Growth of Fine Particles and Focusing of Ion Flow in Pulsed DC Plasma | Shimane Univ. 1, Osaka Univ. 2@Akihiro Moritani 1, Kuninori Kitahara 1, Hitoshi Kubo 2 |
| ’ | 6 | Formation of Gold Nanoparticles Intercalated Carbon Nanotubes in a Plasma-Ionic Liquid Interface
| Tohoku Univ 1@*Hrada Takashi 1, Kanoko Toshiro 1, Hatakeyama Rikizo 1 |
| 7 | Synthesis of single-walled carbon nanotubes by microwave plasma CVD | Toyo Univ. 1@*Arai Hiroaki 1,Uchida Takashi 1,Yoshida Yoshikazu 1 |
| 8 | Growth mechanism of carbon nanotubes in atmospheric-pressure PECVD(4) | Tokyo Institute of Technology 1@*Shinpei Yoshida 1,Takuya Karatsu 1,Ken Okazaki 1,Tomohiro Nozaki 1 |
| 9 | Mie scattering measurement of growing process of nanotube-clusters under convection-free arc discharge | Shizuoka Univ. 1, AIST 2, Kyushu Uni. 3@*Tetsu Mieno 1, Shu Usuba 2, Kazunori Koga 3, Masaharu Shiratani 3 |
| 10 | Reducing Polarized Potential of NADH Sensor with Carbon Nanotube 2 | Shibaura Inst. Tech 1@*Tatsuya Hoshino 1, Hitoshi Muguruma 1 |
| 11 | Properties of the metal oxide films with carbon nanotube | KCCT 1, RIKEN KEIKI 2, Ryukoku Univ. 3@*Kasuya Atsushi 1, Nakajima Yoshiyuki 2, Yamamoto Shinichi 3 |
| 12 | Field Emission Property of Carbon Nano-particle-coated Vertically Aligned Carbon Nanotubes
| Shizuoka Univ. 1,Shizuoka Univ. 2@Field Emission Property of Carbon Nano-particle-coated Vertically Aligned Carbon Nanotubes
|
| £ | 13 | Surface Modification of Graphene Layer-Encapsulated Magnetic Nanoparticles by RF Amonia Plasma Processing | Shizuoka Univ. 1@*Teguh E. Saraswati 1, Kenji Kawawaki 1, Takafumi Matsuda 1, Akihisa Ogino 1,
and Masaaki Nagatsu 1
|
| 14 | Vibrational Sum-Frequency-Generation (SFG) Spectroscopic study: plasma-surface interactions | Nagoya Univ. 1@*Kenji Ishikawa 1, K. Takeda 1, H. Kondo 1, M. Sekine 1, M. Hori 1 |
| 15 | Electrochromic characteristics of ITO transparent conductive films | School of Eng., Nagoya Univ. 1, Grad. School of Eng., Nagoya Univ. 2, EcoTopia Sci. Inst., Nagoya Univ. 3@*Hasegawa Kazuya 1, Tsuda Hayato 2, Ishikawa Hiroyuki 2, Inoue Yasushi 3, takai osamu 2 |
| 16 | Protein Patterning Technique with Partial Plasma Treatment 2 | Shibaura Inst. Tech. 1@Hayato Takahashi 1, Akira Irie 1, Takahiro Ii 1, Hitoshi Mugruuma 1 |
| 8.6 General Plasma topics, New Application and Interdisciplinary Area |
| March 19 |
| 19a-ZG - 1`24 |
| |
Short Presentation (5 min.) 9:30`11:45
19a-ZG - 1`24@Poster Session 15:30`17:30 |
| 1 | Preparation of the ITO thin film using a laser ablation process | Sasebo National College of Technology@*Hiroharu Kawasaki 1, Tamiko Ohshima 1, Yoshihito Yagyu 1, Yoshiaki Suda 1 |
| 2 | Surface morphology of diamond using back sputtering | Kanagawa Inst. of Tech.@*Misu Takayuki, Ono Shimon, Higa Tsukasa, Goto Miki, Koh Keishin, Arai Toshihiko |
| ’ | 3 | Computational Chemistry Prediction of Secondary Electron Emission Coefficient for Practical Material Design of PDP Electrode Protecting Layer
| Grad. Sch. Eng., Tohoku Univ. 1, Grad. Sch. Adv. Sci. Mater.CHiroshima Univ. 2, NICHe, Tohoku Univ. 3@*Kazumi Serizawa 1, Hiroaki Onuma 1, Hiromi Kikuchi 1,2, Kazuma Suesada2, Masaki Kitagaki 2, Itaru Yamashita 1, Ai Suzuki 3, Hideyuki Tsuboi 1, Nozomu Hatakeyama 1, Akira Endou 1, Hiromitsu Takaba 1, Momoji Kubo 1, Hiroshi Kajiyama 2, Akira Miyamoto 1,3 |
| 4 | Dependence on heating temperature in air atmosphere of discharge voltage of SrCaO electrode material | Science and Technology Research Laboratories, NHK (Japan Broadcasting Corporation) 1@*Kato Daisuke 1, Motoyama Yasushi 1, Seki Masahiko 1 |
| 5 | Improvement of discharge delay time of CaO electrode | Science and Technology Res. Lab., NHK@*Yasushi Motoyama, Daisuke Kato, Masahiko Seki, Keiji Ishii |
| 6 | Development of The Hg-free UV radiation Fluorescent Lamp | USHIO Inc.@Tagawa Yukiharu 1,Matsumoto Shigeyoshi 1,Funakoshi Mitsuo 1,Asayama Junya 1,Yamada Kousuke 1 |
| 7 | Decomposition of Perfluorinated Compounds Using Plasmas Generated Within Bubbles in Water and Collection of Fluoride Ions | Tokyo Tech@Kosugi Akihiro 1, *Takeuchi Nozomi 1, Yasuoka Koichi 1 |
| 8 | Oxidation of cystein using oxygen/water vapor RF plasma | Saga Univ. 1, Sasebo National Coll. of Tech. 2, Kyushu Univ. 3@*Hayashi Nobuya 1, Nakahigashi Akari 1, Yagyu Yoshihito 2, Koga Kazunori 3, Shiratani Masaharu 3 |
| 9 | Characteristics of CF4 Decomposition by Atomospheric Pressure Nonthermal Plasma in Noble Gas/CF4 Mixtures | Tokyo Metropolitan Univ. 1@Arai Shota 1, Idehara Makoto 1, Shirai Naoki 1, Uchida Satoshi 1, *Tochikubo Fumiyoshi 1 |
| ’ | 10 | By-products of Phenol in the Pulsed-discharge Plasma at atmospheric pressure | Muroran I. T. 1@*Itabashi Hideyuki 1,Satoh Kohki 1,Itoh Hidenori 1 |
| 11 | Study of Decomposition of Amino Acids Using Microwave Plasma | Shizuoka Univ.@Hara Takuya 1,Ogino Akihisa 2,Nagatsu Masaaki 2 |
| 12 | Treatment of Heat-stable Allergic Substances by Low-pressure Plasma | Sasebo N.C.T. 1, Saga Univ. 2@Yagyu Yoshihito 1, Hikita Akira 1, Tsujikawa Tomomi 1, Hayashi Nobuya 2, Kawasaki Hiroharu 1, Ohshima Tamiko 1, Suda Yoshiaki 1
|
| | | Break 10:30`10:45 | |
| 13 | Tissue Regeneration Treatment Using Micro-Spot Atmospheric Pressure Plasma Source 1 | Dep. of Biomed. Eng. 1, Dep. of Electrical and Electronic Eng. 2, Nano Carbon Bio Dev. Res. Center 3, Tokyo City Univ.@*Takamichi Hirata 1,3, Chihiro Tsutsui 3, Yuichiro Sakatani 1, Akira Mori 1,3, Atsushi Horii 2, Toshiaki Yamamoto 2,3, Akira Taguchi 1,3 |
| 14 | Tissue Regeneration Treatment Using Micro-Spot Atmospheric Pressure Plasma Source 2 | Dep. of Biomed. Eng. 1, Dep. of Electrical and Electronic Eng. 2, Nano Carbon Bio Dev. Res. Center 3, Tokyo City Univ.@*Takamichi Hirata 1,3, Chihiro Tsutsui 3, Yukiko Yokoi 1, Akira Mori 1,3, Atsushi Horii 2, Toshiaki Yamamoto 2,3, Akira Taguchi 1,3 |
| £ | 15 | Mass spectroscopic and Optical Emission Spectroscopic Study of Plasma-Bio-molecules Interaction under Different Gas Circumstances | SHIZUOKA UNIVERSITY, GRADUATE SCHOOL OF SCIENCE AND TECHNOLOGY@Iuliana Motrescu, Akira Tsukasaki, Akihisa Ogino, Masaaki Nagatsu |
| 16 | Chemical Characterization and Laser Measurement for TTIP Solution | Chubu Univ.@* Parajulee Shankar 1, Hayakawa Masahiro 1, Ikezawa Shunjiro 1 |
| 17 | Decomposition of CO2 by Large Flow Atmospheric Microwave Plasma (LAMP) | Chubu Univ. 1@*Ikezawa Shunjiro 1, Hayakawa Masahiro 1, Parajulee Shankar 1 |
| 18 | Reduction Process of CO2 Solute Using Hydrogen Plasmas in an Electrolyte II | Kyoto Univ. 1@Morita Tadasuke 1, *Sakai Osamu 1, Sano Noriaki 1 |
| ’ | 19 | Multilayer Graphene Growth by Photoemission-Assisted Plasma CVD (7) : Comparison of Plasma Generation Mechanism between SiO2/Si and Si substrate
| Tohoku Univ. 1, CREST-JST 2, Fujitsu Ltd. 3@*Kaga Toshiteru 1, Ohtomo Yudai 1, Ogawa Shuichi 1,2, Sato Motonobu 2,3, Nihei Mizuhisa 2,3, Takakuwa Yuji 1,2 |
| 20 | Amorphous Carbon Film Coating inside Fine Narrow Tube, by Using Solution Plasma | Graduate school of Sci. and Technol. Nagasaki Univ. 1, Faculty of Engineer. Nagasaki Univ. 2,@Shuai Zhang 1, Kenji Kotani 2, Kazuhiko Akaki 2, *Masanori Shinohara 1, Yoshinobu Matsuda 2, and H. Fujiyama 1 |
| 21 | Generation and Characterization of the Plume with High Electron Density Assisted by Surface Wave Plasma | Univ. of Tokyo@*Banno Tatsuya 1 |
| 22 | Variable waveguide of an electromagnetic wave in a microplasma array | Kyoto Univ.@Jun Maeda, Teruki Naito, *Osamu Sakai |
| 23 | Production of Atmospheric Capacitive Discharge Plasma Jet with Ring Shaped Electrodes and Its Application | Saga Univ. 1@*Yasunori Ohtsu 1, Yoshihiko Ura 1, Shigenori Tanaka 1, Tatsuya Misawa 1 |
| ’ | 24 | Electron Heating in Premixed Gas Burner Flame by Microwave Irradiation | Nagoya Univ. 1,Nagoya Univ. 2
@*K.Shinohara 1,N.Takada 1,K.Sasaki 2 |