| 7 Beam Technologies |
| 7.1 X-ray Technologies |
| March 18 9:00`12:15 |
| 18a-W - 1`12 |
| 1 | Nano-focused X-ray microscope equipped with liquid lithium electron source | School of Eng.,Mie Univ. 1CFaculty of Eng.,Mie Univ. 2CCUTE 3CHamamatsu Photonics 4@*Shibahara Kazuki 1CMaeda Tatsuya 2CHata Koichi 1,3CYabushita Ryosuke 4COkada Tomoyuki 4 |
| 2 | Improvement Method of Compact X-rays Source using Multiple Uniaxially Polarized LiNbO3 Single Crystals | Doshisha Univ. 1, JSPS 2, Kyoto Univ. 3@Shinji Fukao 1,2, *Kazuyuki Itou 1, Yang Guan 1, Yoshikazu Nakanishi 1, Yuuki Sato 1, Yoshiaki Ito 3, Shinzo Yoshikado 1 |
| 3 | Improvement Method of X-rays Source using Uniaxially Polarized LiNbO3 Single Crystal in High Vacuum Range | Doshisha Univ. 1, JSPS 2, Kyoto Univ. 3@*Shinji Fukao 1,2, Kazuyuki Itou 1, Yang Guan 1, Yoshikazu Nakanishi 1, Yuuki Sato 1, Yoshiaki Ito 3, Shinzo Yoshikado 1 |
| 4 | Characteristics of a discharge-excited XUV source using alkali metal | Utsunomiya Univ. 1, Utsunomiya Univ. CORE 2@Hiromitsu Terauchi 1, *Takeshi Higashiguchi 1,2, Noboru Yugami 1,2, Toyohiko Yatagai 2 |
| ’ | 5 | Density Optimization of minimum-mass tin drop targets for properties of Extreme Ultraviolet radiation | ILE Osaka Univ. 1, ILT 2@*Matsuoa Yuji 1, Fujioka Shinsuke 1, Nishimura Hiroaki 1, Sunahara Atsushi 2, Nishihara katsunobu 1 |
| 6 | Measurements of Electron Density, Electron Temperature and Ionic Charge of Laser-produced EUV Light Source Plasmas using Collective Thomson Scattering | Kyushu Univ. 1@*Kentaro Tomita, Yasuhisa Hyakuta, Kota Ohara, Kazuki Nakayama, Kiichiro Uchino
|
| | | Break 10:30`10:45 | |
| 7 | Observation of Phase Objects by using an X-ray Microscope with a Foucault Knife-edge | Univ. of Tsukuba, Inst. of Applied Physics@Watanabe Norio 1, Sasaya Tomotaka 1, Imai Yusuke 1, Iwata Toshiharu 1, Zama Keisuke 1, Aoki Sadao 1 |
| £ | 8 | X-ray Phase Laminography Using Talbot Interferometry | Graduate School of Frontier Sciences, Univ. of Tokyo 1, Faculty of Engineering, Univ. of Tokyo 2@Sebastien Harasse 1, Nozomi Hirayama 2, Wataru Yashiro 1, Atsushi Momose 1 |
| £ | 9 | Four-Dimensional X-ray Phase Tomography Using Talbot Interferometry | Graduate School of Frontier Sciences, The University of Tokyo 1@*Sebastien Harasse@1, Katsuyuki Kawabata@1, Hiroaki Kuwabara@1, Wataru Yashiro@1, Atsushi Momose@1 |
| 10 | Observation of Biological Samples with Transmission Soft X-ray Microscope | IMRAM, Tohoku Univ. 1, SCINT, Univ. of Tokyo 2@*Ishida Fumihiko 1, Ejima Takeo 1, Yanagihara Mihiro 1, Mizutani Haruo 2 |
| 11 | Evaluation of Maximum Length by Autocorrelation Function
Calculated from X-Ray Scattering Curve
| Nagoya Inst. Technology 1@*Shoji Yamamoto 1, Sunao Minamide 1, Takeshi Kawaguchi 1 |
| 12 | Curve Fitting of X-ray Scattering Curve by Polydisperse System of Spheres (Test of Porodfs Hypothesis) | Nagoya Inst. Tech. 1@*Sunao Minamide 1, Shoji Yamamoto 1, Takeshi Kawaguchi 1 |
| 7.1 X-ray Technologies |
| March 19 9:00`11:45 |
| 19a-W - 1`10 |
| 1 | Measurement of ion milling thickness of figured soft X-ray multilayer mirrors | IMRAM, Tohoku Univ. 1@*Koji Arai 1, Toshihide Tsuru 1, Masaki Yamamoto 1 |
| 2 | Fabrication of a soft X-ray multilayer mirror with contact double slit for interferometry on reflection phase manipulation by surface milling | IMRAM, Tohoku Univ. 1@*Toshihide Tsuru 1, Yu Sakai 1, Tadashi Hatano 1, Masaki Yamamoto 1 |
| 3 | SR soft X-ray interferometry on multilayer phase manipulation | IMRAM, Tohoku Univ.@1@*Hatano Tadashi 1,Ogasawara Shodo 1,Umetsu Hiroo 1,Sakai Yu 1,Tsuru Toshihide 1,Yamamoto Masaki 1 |
| 4 | Fringe observation by Youngfs interferometer
in a versatile soft X-ray experimental apparatus
| IMRAM, Tohoku Univ. 1@*Shodo Ogasawara 1, Hiroo Umetsu 1, Tadashi Hatano 1, Toshihide Tsuru 1 ,
Masaki Yamamoto 1
|
| 5 | Development of Ultra-light and High-resolution MEMS X-ray Optics (2) | Tokyo Metropolitan University 1, ISAS/JAXA 2, Ritsumeikan University 3, University of Florida 4, Tohoku University 5, AIST 6@*Utako Takagi 1, Yuichiro Ezoe 1, Ikuyuki Mitsuishi 2, Kensuke Ishizu 1, Teppei Moriyama 1, Kazuhisa Mitsuda 2, Takaya Ohashi 1, Fumiki Kato 3, Susumu Sugiyama 3, Raul Riveros 4, Taylor Boggs 4, Hitomi Yamaguchi 4, Yoshiaki Kanamori 5, Kohei Morishita 5, Kazuo Nakajima 5, Ryutaro Maeda 6 |
| | | Break 10:15`10:30 | |
| ’ | 6 | Development of hard X-ray imaging optics with four aspherical mirrors | Osaka Univ. 1@*Kidani Naotaka 1, Matsuyama Satoshi 1, Fujii Masaki 1, Wakioka Toshiyuki 1 , Mimura Hidekazu 1, Yamauchi Kazuto 1 |
| 7 | Systematic studies of Si and Ge wafers prepared by plastic deformation | IMR Tohoku Univ. 1@*Kazuo Nakajima1, Kohei Morishit1, Kozo Fujiwara1, Ichiro Yomenaga1 |
| 8 | Point-focusing Johansson Monochromating Crystals Prepared by
Hot Plastic Deformation | Kyoto Univ. 1, Tohoku Univ. 2@Okuda Hiroshi 1, Nakajima Kazuo 2, Morishita Kohei 2, Fujiwara Kozo 2, Yonenaga Ichiro 2, Ochiai Shojiro 1 |
| 9 | Development of crystal analyzer for one-shot spectrometry using a plastically deformed single crystal wafer | IMR Tohoku Univ. 1@*Morishita Kohei 1, Hayashi Kouichi 1, Nakajima Kazuo 1 |
| ’ | 10 | Development of Simultaneous Measurement of CTR Scattering Using a Multi-Wavelength Dispersive Mode | ISSP Univ. of Tokyo 1, Dept. of Phys., Tokyo Gakugei Univ. 2, KEK-PF 3, JASRI/SPring-8 4@Shirasawa Tetsuroh 1, Arakawa Etsuo 2, Hirano Keiichi 3, Takahashi Toshio 1, Matsushita Tadashi 3, Toyokawa Hidenori 4, Tajiri Hiroo 4, Yagi Naoto 4, Kimura Shigeru 4 |
| 7.2 Electron Microscopy and Diagnostics |
| March 19 |
| 19a-S - 1`6 |
| |
Short Presentation (5 min.) 11:00`11:30
19a-S - 1`6@Poster Session 13:00`15:00 |
| 1 | A Molecular Dynamics Study of Electron Irradiation Damages in Carbon Nanomaterials (II)
| Osaka Pref. Univ. 1@*Yasuda Masaaki 1, Wakuda Shinya 1, Mimura Ryosuke 1, Kawata Hiroaki 1, Hirai Yoshihiko 1 |
| 2 | Structure resolution and phase mapping based on precession diffraction | Yves Maniette ,Nanomegas ,1
Naoto Tsuchiya,AD Science,2@*Yves Maniette 1,Naoto Tsuchiya 2 |
| 3 | Development of environmental-cell TEM system for in-situ observation
of nano particulate catalysts (?)
| Nagoya Univ. 1, JST-PRESTO 2, Kinki Univ. 3, Nagoya Univ. EcoTopia Science Inst.4,@*Tadahiro Kawasaki1,2, Takuya Miura1, Hidenori Tsutsui3, Takaomi Matsutani3, Takayoshi Tanji4 |
| 4 | TEM observation of Au/ZrO2 catalysts | AIST 1@*Akita Tomoki 1, Tanaka Shingo 1, Tanaka Koji 1, Kohyama Masanori 1 |
| 5 | A role of Li2MnO3 nanoparticles in the tunnel-to-spinel structural transformation of lithium-manganese-oxide nanowires | Osaka Univ. 1, AIST UBIQEN 2, AIST ETRI 3@*Jun Kikkawa 1, Tomoki Akita 2, Eiji Hosono 3, Haoshen Zhou 3, Masanori Kohyama 2 |
| 6 | Analysis of atmospheric particle matters at roadside using image analysis | Graduate School of kogakuin Univ. 1@*Hitoshi Wada 1, Kenji Ohishi 1, Tetsuo Sakamoto 1 |
| 7.3 Lithography |
| March 17 9:30`17:30 |
| 17a-W - 1`11 |
| 1 | Development of the extreme ultraviolet interference lithography equipment | Hyogo Univ.1@*Kimura Teruhiko 1,Sakagami Naoki 1,Fukushima Yasuyuki 1,Harada Tetsuo 1,Watanabe Takeo 1,Kinoshita Hiroo 1 |
| 2 | The design of a transmission grating for EUVIL | University of Hyogo 1@*Fukushima Yasuyuki 1, Sakagami Naoki 1, Kimura Teruhiko 1, Iguchi Takafumi 1,
Yamaguchi Yuuya 1, Tada Masaki 1, Harada Tetsuo 1, Watanabe Takeo 1,
Kinoshita Hiroo 1 |
| 3 | Development of transmission grating for EUVL interference exposure | Univ. of Hyogo 1@*Iguchi Takafumi 1,Fukushima Yasuyuki 1,Sakagami Naoki 1,Kamaji Yoshito 1,Kimura Teruhiko 1,Yamaguchi Yuya 1,Tada Masaki 1,Harada Tetsuo 1,Watanabe Takeo 1,Kinoshita Hiroo 1 |
| 4 | XANES of Carbon Contamination Formed on EUVL Optic Mirror | College of Life Sciences Ritsumeikan Univ. 1, Ritsumeikan Univ. SR Center 2, Selete 3@Sanada Tomoe 1, Kojima Kazuo 1, Ikeda Hiroyuki 2 , Watanabe Iwao 2 , Ohta Toshiaki 2, Nishiyama Iwao 3, Anazawa Toshihisa 3, Takagi Noriaki 3, Suga Osamu 3
|
| 5 | Carbon Contamination Growth on Patterned EUVL Mask
(1) Observation of Asymmetric Coverage by CD-SEM and 3DAFM | Selete 1,Hitachi High-Technologies 2@*Anazawa Toshihisa 1,Nishiyama Yasushi 1,Tanaka Yusuke 1,Tanaka Toshihiko 1,Suga Osamu 1,Nishiyama Iwao 1,Kadowaki Yasuhiro 2,Sato Hidetoshi 2 |
| 6 | Carbon Contamination Growth on Patterned EUVL Mask
(?) Modeling of Asymmetric Coverage | Mirai-Selete@*Iwao Nishiyama, Toshihisa Anazawa, Yukiyasu Arisawa |
| | | Break 11:00`11:15 | |
| 7 | Non-linearity of carbon deposition by EUV irradiation in the simultaneous presence of hydrocarbon gas and water vapor
| LASTI Univ. Hyogo 1, Canon 2, Nikon 3@*Niibe Masahito 1, Keigo Koida 3, Takahiro Nakayama 2, Shigeru Terashima 2, Akira Miyake 2, Hiroyoshi Kubo 2, Yukinobu Kakutani 3, Shuichi Matsunari 3, Takashi Aoki 3, Shintaro Kawata 3 |
| 8 | Novel Ozone-based Cleaning Technique for EUV Masks | Selete 1,MEIDENSHA 2@*Anazawa Toshihisa 1,Takagi Noriaki 1,Suga Osamu 1,Nishiyama Iwao 1,Miura Toshinori 2,Kekura Mitsuru 2 |
| 9 | Improvement of defect detection with an actinic EUVL mask blank inspection | MIRAI-Selete 1@*Takeshi Yamane 1, Toshihiko Tanaka 1, Tsuneo Terasawa 1, Osamu Suga 1 |
| 10 | Study on critical dimension of printable phase defects Using an extreme ultraviolet microscope | Univ. of Hyogo, Asahi Glass Co.@*Kamaji Yoshito 1,Takase Kei 1,Uno Toshiyuki 2,Harada Tetuo 1,Watanabe Takeo 1,Kinoshita Hiroo 1 |
| 11 | Evaluation and Control of Zero-CTE Temperature of TiO2-SiO2 Ultra-Low-Expansion Glass by the LFB/PW Ultrasonic Material Characterization System | Graduate School of Engineering, Tohoku Univ. 1, AIST 2@Jun-ichi Kushibiki 1, *Mototaka Arakawa 1, Yuji Ohashi 1, Sho Yoshida 1, Takanori Kondo 1, Yuko Maruyama 1, Naofumi Yamada 2
|
| | | Lunch 12:30`13:30 | |
| 17p-W - 1`15 |
| 1 | Improvement of EB exposure stability using HSQ negative resist | Univ.of Hyogo 1AJST-CREST 2AJSPS 3@*S. Omoto1, 2, M. Okada1, 2, 3, Y. Kang1, 2, Y.Nakai1, 2, K.Kanda1, 2, Y. Haruyama1, 2, and S. Matsui1, 2 |
| 2 | Comparison of EB Exposure characteristics between HSQ and Calix Arene of high resolution negative resist | University of Hyogo 1, JST-CREST 2, JSPS 3, TOKUYAMA 4@*Omoto Shinya 1,2, Okada Makoto 1,2,3, Kang Yuji 1,2, Kanda Kazuhiro 1,2, Haruyama Yuichi 1,2, Tono Seiji 4, Matsui Shinji 1,2 |
| 3 | Study on Depth Profile of Acid Generator Distribution in Poly(4-hydroxystyrene) Thin Films by Using X-ray Photoemission Spectroscopy (XPS) | ISIR@Osaka Univ. 1, JST-CREST2@*Hiroki Yamamoto 1,2, Takahiro Kozawa 1,2, and Seiichi Tagawa 1,2 |
| £ | 4 | An investigation of fluorinated polymer-based EUV resist | Selete 1, Daikin Industries 2@*Julius Joseph Santillan 1, Tsuneo Yamashita 2, Masamichi Morita 2, Yoshito Tanaka 2,
and Toshiro Itani 1 |
| 5 | Improvement of pattern collapse for EUV resist | Selete 1@*Gousuke Shiraishi 1, Kentaro@Matsunaga 1, Toshiro Itani 1 |
| 6 | A study of flare correction for half pitch 2x nm in EUV lithography | Selete 1@Taiga Uno 1, Yukiyasu Arisawa 1, Hajime Aoyama 1, Toshihiko Tanaka 1 |
| 7 | Resolution limit using full field EUV exposure tool | Semiconductor Leading Edge Technologies, Inc. (Selete) 1@*Tawarayama Kazuo 1, Aoyama Hajime 1, Matsunaga Kentaro 1, Magoshi Shunko 1, Arisawa Yukiyasu 1, Uno Taiga 1
|
| 8 | Xe flow optimization for the Small Field Exposure Tool (SFET) in Selete | Semiconductor Leading Edge Technologies, Inc. 1@*Shirai Seiichiro 1,Magoshi Shunkou 1,Seki Miyoshi 1,Tanaka Hiroyuki 1 |
| | | Break 15:30`15:45 | |
| ’ | 9 | Chemical Reaction of Atomic Hydrogen with Photoresist | Kanazawa Inst. Technol. 1, Tokyo Ohka 2@*Masashi Yamamoto 1, Takeshi Maruoka 1, Akihiko Kono 1, Hideo Horibe 1, Satoshi Ohya 2 |
| 10 | Haze generation by H2S in ArF lithography environment | Toshiba Corp. Device Process Development Center 1,Toshiba Corp. Corporate Reseach & Development Center 2,Nikon Corp. 3@*Eri Uemura 1,Makiko Tamaoki 1,Hatano Masayuki 1,Aiga Fumihiko 2,Matsuoka Keiji 3,Horita Yoshinari 3,Hirabayashi Hidefumi 3 |
| 11 | Liquid immersion angled exposure for batch patterning 3D sample with vertical walls | Toyota Technol. Inst.@*Minoru Sasaki 1, Takafumi Honoso 1, Shinya Kumagai 1 |
| 12 | Research on Projection Exposure Lithography Using a Gradient-Index Lens Array | Tokyo Denki Univ.@*Hiroshi Kobayashi, Toshiyuki Horiuchi |
| 13 | Ni electroforming using a PMMA mother by proton beam writing | SIT 1, JAEA Takasaki 2@*Tanabe Yusuke 1, Nishikawa Hiroyuki 1, Watanabe Toru 1, Seki Yoshihiro 1, Satoh Takahiro 2, Ishii Yasuyuki 2, Kamiya Tomihiro 2 |
| 14 | Replication of micro-channels on PDMS using SU-8 mold fabricated
by proton beam writing
| SIT 1,JAEA Takasaki 2,TMU 3@*Shiine Yasuharu 1, Nishikawa Hiroyuki 1, Mori Toshiki 1, Satoh Takahiro 2, Ishii Yasuyuki 2, Kamiya Tomihiro 2, Nakao Ryouta 3, Uchida Satoshi 3
|
| 15 | Thermal stabilization of GaAs native oxide by resistless low-energy EB direct writing and successive GaAs faceting control by selective thermal sublimation etching | Kwansei Gakuin Univ. 1@*Hirokawa Yuki 1, Goto Taiki 1, Ishiwatari Asuka 1, Ushio Shoji 1, Mastuda Kazuhiro 1, Kaneko Tadaaki 1 |
| 7.4 Nanoimprint |
| March 19 14:00`17:30 |
| 19p-ZH - 1`13 |
| 1 | Simple photo-nanoimprint using vacuum packing ? | Gunma Univ. 1@*Ando Tetsuya 1,Takagi Kazuya 1,Noguchi Katsuya 1,Itoh Kazuo 1 |
| 2 | Pattern transfer to TiO2 layer by direct thermal nanoimprint | Osaka Pref. Univ. 1,Rohm Co.,Ltd. 2,OKI Semiconductor Co.,Ltd. 3@Hoto Norihito 1,Watanabe Minoru 2,3,Kawata Hiroaki 1,Hirai Yoshihiko 1 |
| 3 | Fabrication of Novel High Aspect Ratio Pillars using Fine Flexible mold by UV-NIL | Kinki University. 1,Osaka Prefecture University. 2@*Nishino Tomoki 1,Sakamoto Junji 2,Kawata Hiroaki 2,Mizutani Katsumi 1,Hirai Yoshihiko 2 |
| 4 | Replication of three-dimensional nanostructure fabricated by FIB-CVD using nanoimprint lithography with PDMS mold | University of Hyogo 1, CREST-JST 2, JSPS 3@Kang Yuji 1,2, Nakai Yasuki 1,2, Okada Makoto 1,2,3, Kanda Kazuhiro 1,2, Haruyama Yuichi 1,2, Matsui Shinji 1,2 |
| 5 | Metal Lift-off Process using Solution Soluble Resist by UV-NIL | Osaka Pref. Univ. 1,Daicel Chemical 2@Fujii Noriyoshi 1,Suzuki Ryosuke 1,Miyake Hiroto 2,Yukawa Takayuki 2,Sakamoto Junji 1,Kawata Hiroaki 1,*Hirai Yoshihiko 1
|
| 6 | Metal pattern transfer by use of CYTOP template | Osaka Pref. Univ. 1,JST CREST. 2@*Kengo Hara 1,Satoshi Kubo 1,Hiroaki Kawata 1,2,Masaaki Yasuda 1,2,Yoshihiko Hirai 1,2 |
| 7 | Metal pattern transfer on cured SU8 pattern at relatively low temperature | Osaka Pref. Univ. 1,JST CREST 2@*Kubo Satoshi 1,Hara Kengo 1,Kawata Hiroaki 1,2,Yasuda Masaaki 1,2,Hirai Yoshihiko 1,2 |
| | | Break 15:45`16:00 | |
| 8 | Control of Anode Etching Sites of Si by Nanoimprinting | Tokyo Metropilitan Univ.1, KAST2@Yanagishita Takashi1,2, Nariyama Teppei1, Nishio Kazuyuki1,2, Masuda Hideki1,2 |
| 9 | Preparation of Monodisperse Particles by Nanoimprinting Using Anodic Porous Alumina | Tokyo Metropolitan Univ.1, KAST2@*Yanagishita Takashi1,2, Nishio Kazuyuki1,2, Masuda Hideki1,2 |
| 10 | Heat-assisted injection molding of high-aspect-ratio nanostructures | The Univ. of Tokyo 1@Keisuke Nagato 1, Shuntaro Hattori 1, Takehiro Mitsuda 1, Tetsuya Hamaguchi 1, Masayuki Nakao 1 |
| ’ | 11 | Fabrication of multilayered nanostructures by iterative roller imprint | The Univ. of Tokyo 1@Keisuke Nagato 1, Shuntaro Sugimoto 1, Tetsuya Hamaguchi 1, Masayuki Nakao 1 |
| 12 | Roller Imprinting on Teflon-PFA Inlet Tube | BEANS project 1, AIST 2, Namiki Precision Jewel 3@*Harutaka Mekaru 1,2, Masaharu Takahashi 1,2, Eri Fukushima 3 |
| 13 | Thermal Imprinting on Surface of Rectangular Quartz Fiber | BEANS project 1, AIST 2@*Harutaka Mekaru 1,2, Chieko Okuyama 2, Akihisa Okuyama 1,2, Masaharu Takahashi 1,2 |
| 7.4 Nanoimprint |
| March 20 9:00`12:30 |
| 20a-ZH - 1`13 |
| 1 | Basic analysis on Si anodic oxidation aiming at electrode nanoimprint lithography | HIrosaki Univ.@*Takashi Sato 1, Makoto Fukuda 1, Takashi Mineta 1 |
| ’ | 2 | Improvement of replica mold releasability due to gpost cureh. | Waseda Univ.1, Asahi Glass CO.,LTD.2@*Lingyi Li1, Yasuhide Kawaguchi2, Kentaro Tsunozaki2,
Jun Mizuno1, Shuichi Shoji1 |
| ’ | 3 | Inside hydrophilization of thin poly(styrene) films during removal of a residual layer | IMRAM, Tohoku Univ. 1@*Kubo Shoichi 1, Sato Yuko 1, Nakagawa Masaru 1 |
| 4 | Adhesion of a UV-cured resin to fluorinated adsorbed monolayers studied by highly sensitive UV-visible spectroscopy | IMRAM, Tohoku Univ. 1, JST-CREST 2@*Korenaga Sosuke 1, Kohno Akihiro 1, Kubo Shoichi 1, Nakagawa Masaru 1,2 |
| ’ | 5 | Detection of resin adhesion on a mold surface by fluorescent resists for UV-NIL | IMRAM, Tohoku Univ. 1, JST-CREST 2, Toyo Gosei 3, LASTI, Univ. of Hyogo 4@*Kobayashi Kei 1,2, Kubo Shoichi 1, Sakai Nobuji 3, Matsui Shinji 2,4, Nakagawa Masaru 1,2 |
| 6 | Study of DTM Pattern Profile Measurement Method using Effective Medium Approximation | Hitachi Ltd. 1, Hitachi High-Technologies Corp. 2
@*Takenori Hirose 1, Hideaki Sasazawa 1, Shigeru Serikawa 2, Kiyotaka Horie 2 |
| | | Break 10:30`10:45 | |
| | 7 | Viscosity characteristics of spin-coated UV nanoimprint resin in pentafluoropropane | AIST 1, Tokyo Univ. of Science 2, JST-CREST 3@*Hidemasa Atobe 1,2,3, Hiroshi Hiroshima 1,3, Qing Wang 1,3 |
| 8 | Evaluation of UV curing characteristics of UV-NIL resists | Osaka Pref. Univ. 1,Lithotech Japan 2,Toyo Gosei 3, JST-CREST 4,@*Suzuki Ryosuke 1,Fujii Noriyoshi 1,4,Sekiguchi Atsushi 2,Sakai Nobuji 3,Tanaka Risa 3,
Kawata Hiroaki 1,4,Hirai Yoshihiko 1,4 |
| 9 | Evaluation of UV curable resin surface by scanning probe microscopy with UV irradiation system | Graduate School of Science, Univ. of Hyogo 1, SII NanoTechnology 2,
Daicel Chemical Industries, LTD 3, Toyo Gosei Co. 4, JST-CREST 5, JSPS 6@*Makoto Okada 1, 5, 6, Masayuki Iwasa 2, Hiroto Miyake 3, Nobuji Sakai 4,
Yuichi Haruyama 1, 5, Kazuhiro Kanda 1, 5, Shinji Matsui 1, 5 |
| 10 | Evaluation heat durability of fluorinated antisticking layers | Univ of Hyogo 1,JST-CREST 2, JSPS 3@*Yasuki Nakai 1,2, Shinya Omoto 1,2, Yuji Kang 1,2, Makoto Okada 1,2,3, Kazuhiro Kanda 1,2, Yuichi Haruyama 1,2, Shinji Matsui 1,2, |
| 11 | Visualization of plasticization on thermal nanoimprinting by a polymer containing a fluorescent dye | IMRAM, Tohoku Univ.@*Sato Yuko 1, Kubo Shoichi 1, Nakagawa Masaru 1 |
| 12 | Molecular Dynamics Simulation on Polymer filling in Nanoimprint Lithography (II) | Osaka Pref. Univ.1, JST-CREST.2@*Akihiro Taga 1,2, Mayuko Shibata 1,2, Masaaki Yasuda 1,2, Hiroaki Kawata 1,2, Yoshihiko Hirai 1,2 |
| 13 | Process Simulator for UV-NIL | Osaka Pref. Univ. 1, JST-CREST 2@Mayuko Shibata 1,2, Yoshinori Nagaoka 1,2, Masato Matsue 1,2, Akira Horiba 1, Hiroaki Kawata 1,2, Masaaki Yasuda 1,2, and *Yoshihiko Hirai 1,2 |
| 7.5 Beam Excitation Surface Reaction |
| March 19 13:30`16:45 |
| 19p-W - 1`12 |
| 1 | Effect of Surface Metal Oxide on the Desorption of Hydrogenation from Hydrogenated Diamond-like Carbon Films | Kobe Univ. 1, JAEA 2@Tagawa Masahito 1, Yokota Kumiko 1, Furuyama Yuichi 1, Tode Mayumi 2, Yoshigoe Akitaka 2, Teraoak Yuden 2 |
| 2 | Effect of VUV Exposures to the Hydrogenated Diamond-like Carbon Films | Kobe Univ. 1,Univ. Hyogo 2,JAEA 3@*Kumiko Yokota 1,Masahito Tagawa 1,Yuichi Furuyama 1,Kazuhiro Kanda 2,Mayumi Tode 3,Akitaka Yoshigoe 3,Yuden Teraoka 3 |
| 3 | Annealing effect of W incorporated DLC fabricated by Ga focused ion beam CVD | Nagaoka Univ. of Tech. 1, Univ. of Hyogo LASTI 2, Nagaoka Univ. of Tech. Extreme Energy-Density Research Institute 3@*Wada Akira 1, Niibe Masahito 2, Suzuki Tsuneo 3, Saitoh Hidetoshi 1, Ito Haruhiko 1, Kanda Kazuhiro 2 |
| 4 | Deposition Method of Non-Core-Shell Nanostructure on FIB-CVD | Univ. Tokyo 1,@*Kometani Reo 1, Warisawa Shin'ichi 1, Ishihara Sunao 1 |
| 5 | Functionalization of the 3-D DLC Nanostructure Fabricated by FIB-CVD | Univ. Tokyo 1,@*Kometani Reo 1, Yusa Kouki 1, Warisawa Shin'ichi 1, Ishihara Sunao 1 |
| 6 | The annealing effect of Fe-doped nanospring fabricated by focused-ion-beam chemical vapor deposition | Univ of Hyogo 1, Nano Electronics Research Laboratorie, NEC Corporation 2, JSPS 3@Nakai Yasuki 1, Kang Yuji 1, Okada MAkoto 1,2, Hruyama Yuichi 1, Kanda Kazuhiro 1, Ichiashi Tetsuya 3, Matsui Shinji 1 |
| 7 | Characteristic Evaluation of nanostructure fabricated by focused ion beam chemical vapor deposition using Tetraethoxysiloxane | Hyogo Univ. 1, JSPS 2@*YamaShita Daisuke 1, Okada Makoto 1,2, Kang Yuji 1, Nakai Yasuki 1 Kanda Kazuhiro 1, Haruyama Yuichi 1, Matsui Shinji 1 |
| 8 | Surface Excitation with ClF3 Cluster Beam | Kyoto Univ. 1, Iwatani Corp. 2@*Seki Toshio 1, Yoshino Yu 2, Ninomiya Satoshi 1, Senoo Takehiko 2, Koike Kunihiko 2, Aoki Takaaki 1, Matsuo Jiro 1 |
| | | Break 15:30`15:45 | |
| 9 | Theory of Electron Propagation in Nanotube | Wakayama Univ.1@*Higashi Takashi 1,Shinozuka Yuzo 1 |
| 10 | Theory of Transient Vibration of Adsorbed Atom induced by Recoil Effect of Photoelectron | Wakayama Univ. 1@*Mori Yoshihiko 1, Shinozuka Yuzo 1 |
| ’ | 11 | Development of a spin polarized hydrogen beam source and measurement systems | Inst. Industrial Sci., Univ. of Tokyo 1@*Takeyasu Kotaro 1, Ogura Shohei 1, Fukutani Katsuyuki 1 |
| 12 | Transmission characteristic of slow highly charged ion beams through glass capillaries to produce micro beams
| RIKEN 1, Tokyo Univ. of Science 2, Univ. of Tokyo 3@*Ikeda Tokihiro 1, Kojima Takao M. 1, Kanai Yasuyuki 1, Miyamoto So 2, Iwai Yoshio 1, Kobayashi Tomohiro 1, Yamazaki Yasunori 1,3
|
| |
13`18@16:45`18:15i7.8 Beam Application and New Technologyj
| |
| 7.6 Ion Beam Technology |
| March 19 14:00`17:00 |
| 19p-ZA - 1`11 |
| 1 | Development of High Brightness Gas Field Ion Source | Graduate School of Eng.,Mie Univ. 1,CUTE 2,SIINT 3,AIST 4@*Sugiyama Yasuhiko 123,Yusuke Kobayashi 1,Yuki Morikawa 1,Kazuo Kajiwara 12,Shigeo Okayama 4,Koichi Hata 12 |
| £ | 2 | Fabricating nano tip as field gas ion emitter by field-assisted reaction with oxygen | Mie Univ.1, CUTE 2, SIINT 3, AIST 4@*H. Liu 1,2, Y. Kobayashi 1,2, Y. Morikawa 1,2,Y. Sugiyama 1,2,3, K. Kajiwara 1,2, K. Hata 1,2, S. Okayama 4
|
| 3 | Development of polyatomic ion source with organic liquid | Photonics and Electronics Science and Engineering Center, Kyoto Univ.@Mitsuaki Takeuchi 1, Hiromichi Ryuto 1, Gikan H Takaoka 1 |
| 4 | Ion-beam focusing using six-stage self-aligned quadrupole correction-lens | AIST 1, SIINT 2, Mie Univ. 3@*Okayama Shigeo 1, Sugiyama Yasuhiko 2, Kanemaru Seigo 1, Hata Koichi 3 |
| 5 | Development of a compact system for three-dimensional medium-energy ion scattering spectroscopy | RIKEN.1,Osaka Univ.2@Toda Shinnosuke 1,2,Kobayashi Takane 1,Roch A. Andrzejewski 1,Ueno Shuhei 1,2,Kuwahara Yuji 1,2 |
| 6 | Multiple Scattering Correction of Medium Energy Ion Scattering Spectrum | Kobelco Research Inst. Inc. 1,Kyoto Univ. 2@*Sasakawa Kaoru 1,2,Nakajima Kaoru 2,Suzuki Motofumi 2,Kimura Kenji 2 |
| | | Break 15:30`15:45 | |
| 7 | Control of Protrusion Formation and its Distribution Controlling on Polymer Surface using Ion Beam | Univ. of Tokyo 1, RIKEN 2@*Kitamura Akane 1and2, Kobayashi Tomohiro 2, Sasaki Kazuya 1, Suzuki Akihiro 1, Terai Takayuki 2 |
| 8 | Fabrication and Field Emission Properties of ion-induced Ge nanostructures | Nagoya. Inst. Tech. 1, Nagoya Univ. 2@*Miyawaki Ako 1, Zamri Yusop 1, Hayashi Akari 1, Hayashi Yasuhiko 1, Tanemura Masaki 1, Tokunaga Tomoharu 2 |
| 9 | Reduction of background noise in detector system of high-resolution RBS | Kyoto Univ. 1@*Hashimoto Hiroki 1, Kaoru Nakajima 1, Suzuki Motofumi 1, Kimura Kenji 1 |
| 10 | Developing Low Vacuum SIMS with Fast Heavy Ion Beams | Kyoto Univ. 1, JST-CREST 2, JEOL Ltd. 3@*Yoshinobu Wakamatsu, Hideaki Yamada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jun Tamura, Jiro Matsuo |
| 11 | Depth resolution for the TOF-ERDA measurement using a He beam | Wakasa Wan Energy Research Center 1, Toyota Central R&D Labs. 2@*Keisuke Yasuda 1, Chuluunbaatar Batchuluun 1, Ryoya Ishigami 1, Shogo Hibi 2 |
| 7.6 Ion Beam Technology |
| March 20 9:00`14:45 |
| 20a-ZA - 1`11 |
| 1 | Development of high-intensity Ar cluster ion beam equipment | Kyoto Univ. 1, JST-CREST 2@*T. Yamanobe 1, Y. Yamamoto 1, K. Ichiki 1, S. Ninomiya 1, T. Seki 1,2, T. Aoki 1,2, J. Matsuo 1,2 |
| 2 | Size-selected high density large gas cluster ion beam irradiation V | Kyoto Univ. 1, JST-CREST 2
@*Ichiki Kazuya 1, Ninomiya Satoshi 1,2, Seki Toshio 1,2, Aoki Takaaki 1,2, Matsuo Jiro 1,2
|
| 3 | Evaluation of Escape Depth of Secondary Ions produced by Ar cluster Ion Bombardment | Kyoto Univ. 1, JST-CREST 2@*Ninomiya Satoshi 1,2, Ichiki Kazuya 1, Yamada Hideaki 1, Seki Toshio 1,2, Aoki Takaaki 1,2, Matsuo Jiro 1,2 |
| 4 | Si Sputtering by Water Cluster Ion Beams | Photonics and Electronics Science and Engineering Center, Kyoto Univ.@*Ichihashi Gaku 1, Ryuto Hiromichi 1, Takeuchi Mitsuaki 1, Takaoka Gikan 1 |
| 5 | Low damage process with size-selected N2 cluster ion beams | Incubation Center, Graduate School of Engineering, Univ. of Hyogo 1@*Mashita Takafumi 1, Toyoda Noriaki 1, Isao Yamada 1 |
| 6 | AFM observation of marks made by irradiation of polyatomic molecule cluster ions | Photonics and Electronics Sci. and Eng. Center, Kyoto Univ.@*Kubo Yudai 1, Itozaki shunsuke 1, Ryuto Hiromichi 1, Takeuchi Mitsuaki 1, Takaoka Gikan 1 |
| | | Break 10:30`10:45 | |
| 7 | Si substrate patterning by ethanol cluster ion beam irradiation | Kyoto Univ. 1@*Mukai Hiroshi 1, Ryuto Hiromichi 1,Takeuchi Mitsuaki 1, Takaoka Gikan 1 |
| 8 | Surface Irradiation Effect on High Molecule Substrate by Ethanol Cluster Ion Beams | Photnics and Electronics Sci. and Eng. Center, Kyoto Univ.@Itozaki Shunsuke 1, Kubo Yudai 1, Ryuto hiromiti 1, Takeuti Mituaki 1, Takaoka Gikan 1 |
| 9 | In-situ XPS analysis of organic material irradiated with GCIB | Grad. school of Eng., Univ of Hyogo 1@*Noriaki Toyoda 1, Motohiro Nakagiri 1, Isao Yamada 1 |
| 10 | Damage evaluation of polymer materials surface irradiated with Ar cluster ion beams | Kyoto Univ. 1, JST-CREST 2@Yasuyuki Yamamoto1, Kazuya Ichiki1, Satoshi Ninomiya1,2, Toshio Seki1,2, Takaaki Aoki1,2, Jiro Matsuo1,2 |
| 11 | Measurements of insulin by argon cluster secondary ion mass spectrometry | University of Hyogo@*Shohei Oshima 1,Kousuke Moritani 1,Ippei Kashihara 1,Norio Inui 1,Kozo Mochiji 1 |
| | | Lunch 12:00`13:00 | |
| 20p-ZA - 1`7 |
| £ | 1 | Adhesion Patterning of Mesenchymal Stem Cells on
Silicone Rubber by Irradiation of Water Cluster Ions | Photonics and Electronics Sci. and Eng. Center, Kyoto Univ. 1, Dept. Elec. Sci. Eng., Kyoto Univ. 2@Piyanuch Sommani 1, Gaku Ichihashi 1, Hiromichi Ryuto 1, Hiroshi Tsuji 2, Yasuhito Gotoh 2, Gikan H. Takaoka 1 @ |
| 2 | Embedded structure formation in nano pattern with gas cluster ion beam | Incubation Center, Graduate School of Engineering, Univ. of Hyogo@*Hirota Tomokazu 1,Toyoda Noriaki 1,Yamada Isao 1 |
| 3 | Surface modification by single charged ions and highly charged ions | Dep. Phys. KobeUniv. 1,Dep. Chem. KobeUniv. 2,NICT 3@Ken Asakura 1,Makoto Sakurai 1,Masahide tona 2,Toshihumi Terui 3,Shengjin Liu 1,Naoyuki Ida 1,Nobuhisa Moriwaki 1,Kayo Yoshida 1,Shinro Masuko 2
|
| ’ | 4 | Factors influencing the nanopore size formed by etching of latent tracks | Waseda Univ. 1, AIST 2, Univ. of Tsukuba 3@*Ken-ichi Nomura 1, Yoshimichi Ohki 1, Makoto Fujimaki 2, Xiaomin Wang 1,2, Koichi Awazu 2, Tetsuro Komatsubara 3 |
| ’ | 5 | Electroluminescence Spectra from Thermally Grown Silicon Dioxide Thin Layer Implanted with Ge Negative Ions at Multiple Energies | Kyoto Univ. 1,Chubu Univ. 2@Shohei Kinoshita 1,Hiroshi Tsuji 1,Nobutoshi Arai 1,Masashi Hattori 1,Yasuhito Gotoh 1,Junzo Ishikawa 2 |
| 6 | Laser Irradiation Effect of Fe and Au Ion Implanted Al2O3 | Hosei Univ. 1, Kurume Institute of Technology 2, The University of Tokyo@3, Shimane Univ. 4, Tokyo City Univ. 5@*Isao Sakamoto 1, Nobuyuki Hayashi 2, Junichi Takata 1, Tomoya Ishida 1, Kiyomi Nomura 3, Shigeo Honda 4, Hiroyuki Tashiro 2, Tamotsu Toriyama 5 |
| 7 | Vacuum fluorescence displays using ZnO nanoparticles fabricated by ion implantation and thermal oxidation | NIMS Q-Beam Center 1, Futaba Corporation 2@*Amekura Hiroshi 1, Sato Yoshitaka 2, Kishimoto Naoki 1 |
| 7.7 Micro-Field Emitter |
| March 17 9:30`16:00 |
| 17a-ZA - 1`11 |
| 1 | Field Emission from Two-Dimensional Electron System in Hetero-Junctions of InAlAs/InGaAs Multiple Quantum Wells | Inst. Industrial Sci., Univ. of Tokyo 1, KIT 2@*Yoshiaki Itakura 1, Masuaki Matsumoto 1, Katsuyuki Fukutani 1, Tatsuo Okano 1, Kazuhiko Hirakawa 1, Kenji Nose 1, Yoshitaka Mitsuda 1, Masahiro Taniguchi 2, Osamu Nishikawa 2 |
| 2 | Electron transport property of electron-beam-deposited Pt emitter@and coherence of@field-emission electron | Osaka Univ@CQSTEC.1@Takamoto Kunio 1,*Teraoka Tsuyoshi 1,Murakami Katsuhisa 1,Abo Satoshi 1,Wakaya Fujio 1,Takai Mikio 1 |
| 3 | Observation of electron emission sites of beam induced deposited Pt field emitters with field ion microscopy | Osaka Univ. 1@*Murakami Katsuhisa 1,Matsuo Tomohito 1,Wakaya Fujio 1,Takai Mikio 1 |
| 4 | Fabrication of titanium-oxide nanostructure and field-emission property | Osaka Univ. 1,2, Ishihara Sangyo Ltd. 3@Tatsumi Tomohiko 1, Miki Masanori 1, Fukuyama Chieko 1, Murakami Katsuhisa 2, Abo Satoshi 1,2, Wakaya Fujio 1,2, Takai Mikio 1,2, Takimoto Tadahiko 3, Takaoka yoichi 3 |
| 5 | Electron emission from LiNbO3 crystal excited by Nd:YAG laser | CQST, Osaka Univ. 1,AdTech Sensing Research 2@*T. Kisa 1,K. Murakami 1,S. Abo 1,F. Wakaya 1,T. Ishida 2,M. Takai 1 |
| 6 | Measurement of electron emission from cross sectional surface of porous Si by applied AC voltage | Okinawa@Nct.1@*Katsuya Higa 1, Hiroki Gima 1 |
| | | Break 11:00`11:15 | |
| ’ | 7 | Field emission characteristics of Si emitter coated with BCN film | Osaka Univ.1@Yamauchi Hirofumi 1,Kawai Satoshi 1,Kimura Chiharu 1,Aoki Hidemitsu 1,Sugino Takashi 1 |
| 8 | Highly Uniform, High Aspect Ratio, Low Operation Voltage, Precisely Position Controlled Transfer Mold Carbon Nanotube Field Emitter Arrays | Res. Inst. of Electronics, Shizuoka Univ. 1@*Nakamoto Masayuki 1, Moon Jonghyun 1, Shiratori Koji 1 |
| £ | 9 | Stable Emission Characteristics of Environment-Hard Transfer Mold TiN Field Emitter Arrays | Res. Inst. of Electronics, Shizuoka Univ.@*Moon Jonghyun 1, Nakamoto Masayuki 1, Shiratori Koji 1 |
| £ | 10 | Transfer Mold TiN Field Emitter Arrays in Harsh Environment | Res. Inst. of Electronics, Shizuoka Univ. 1@*Moon Jonghyun 1, Nakamoto Masayuki 1, Shiratori Koji 1 |
| ’ | 11 | Field Emission Characteristics of Transfer Mold Ni-FEAs with or without New Emitter Fabrication and Evaluation System in case of changing Emitter Temperature | Res.Inst.of Electronics, Shizuoka Univ. 1@*Eto Kazuhisa 1, Moon Jonghyun 1, Shiratori Koji 1, Nakamoto Masayuki 1 |
| | | Lunch 12:30`13:45 | |
| 17p-ZA - 1`9 |
| | 1 | Fabrication of vertical thin film (VTF) field emitter using double-layered film | AIST 1@*Yoshida Tomoya 1,Nagao Masayoshi 1,Shimizu Takashi 1,Kanemaru Seigo 1 |
| 2 | Development of a column-less electron microscopes using Field Emitter built-in electrostatic-lens | Shizuoka Univ. RIE 1, AIST Japan 2, Meijo Univ. 3@*Akifumi Koike 1, Tomoya Tagami 1, Yasuo, Takagi 1, Takahiro Fujino 1,
Msayoshi Nagao 2, Tomoya Yoshida 2, Kentaro Sakai 3, Hidekazu Murata 3,
Toru Aoki 1, Yoichiro Neo 1, Hidenori Mimura 1 |
| 3 | Fabrication of field emitters with a built-in multi-stacked lens-electrode | AIST 1, Shizuoka Univ. RIE 2@*Nagao Masayoshi 1, Tagami Tomoya 2, Takagi Yasuo 2, Koda Nobuko 1, Yoshida Tomoya 1, Shimizu Takashi 1, Koike Akifumi 2, Neo Yoichiro 2, Mimura Hidenori 2 |
| 4 | Development of high brightness and high emittance electron gun-- Optimization of electrode shape of control gun --
| Meijo Univ. 1@Daisuke Tsubaki 1, Naoya Furuhashi 1, Hidekazu Murata 1,Eiji Rokuta 1, Hiroshi Shimoyama 1
|
| 5 | Designing and Evaluation of high resolution energy analyze system
for filed-emitted charged particles
| School of Eng.Mie Univ. 1, Faculty of Eng.Mie Univ. 2, CUTE 3@*Sakakibara Hiroo 1, Tasaka Satoshi 2, Nagai Shigekazu 3, Hata Koich 3 |
| 6 | Development of Spin-FEM equipped with 90 sector type spin rotator | Mie Univ. 1, CUTE 2, RIE Shizuoka Univ. 3@*Shigekazu Nagai 1,2, Hiroshi Gotoh 1, Koichi Hata 1, 2, Morihiro Okada 3, Hidenori Mimura 3 |
| £ | 7 | Electron confinement in gradient magnetic fields for ion beam neutralization | Kyoto Univ. 1,Nissin Ion Equip. 2,Chubu Univ. 3@Nicolaescu Dan 1,Sakai Shigeki 2,Gotoh Yasuhito 1,Ishikawa Junzo 3 |
| 8 | Improvement of Hafnium Nitride Field Emitter Array for Vacuum Transister | Kyoto Univ. 1@*Ikeda Keita 1, Ohue Wataru 1, Endo Keisuke 1, Gotoh Yasuhito 1, Tsuji Hiroshi 1 |
| 9 | Field Emission Devices with Carbon Nanotube and Aluminum Composites | NAIST 1,Horizon 2,Nisshin Kogyo 3@*Tsuruno Yusuke 1,Nakanishi Yusuke 1,Yanagi Hisao 1,Takizawa Katsuo 2,Horikawa Yuiti 2,Magario Akira 3,Yokoyama Kazuo 3,Noguchi Toru 3 |
| 7.8 Beam Application and New Technology |
| March 19 16:45`18:15 |
| 19p-W - 13`18 |
| |
|
1`12@13:30`16:45iBeam Excitation Surface Reactionj |
|
| 13 | Electric Conductivity at Polymers Interface Glued by EB-irradiation | School of Engineering. 1, Graduate School of Engineering. 2, Doctoral Graduate School of Science and Technology. 3
@*Shota Iizuka 1, Hiroaki Takei 2, Keisuke Iwata 3, Akira Tonegawa 3, Yoshitake Nishi 1,2,3 |
| 14 | Influence of Electron Beam Irradiation on Impact Values of
Sandwich Structural Composite Materials | School of Engineering Tokai Univ. 1, Graduate School of Engineering Tokai Univ. 2, Doctoral Graduate School of Science and Technology Tokai Univ. 3@*Shinichirou Nanba 1, Tatsuya Yamamoto 2, Hiroaki Takei 2, Yoshihide Ebihara 2, Keisuke Iwata 3, Akira Tonegawa 3, Yoshitake Nishi 1,2,3
|
| 15 | Interception of Ion Impingement on the Cathode in an Electron Gun | ULVAC Inc. 1@*Watanabe Masaya 1, Kusumoto Yoshiro 1 |
| 16 | Generation of a charged-droplet beam using vacuum electrospray of a pure ionic liquid | AIST@*Fujiwara Yukio 1, Saito Naoki 1, Nonaka Hidehiko 1, Taisuke Nakanaga 1, Ichimura Shingo 1 |
| 17 | Development of Measurement System of Transient Current on Semiconductor Devices by Single Ion Strike | JAEA 1@Onoda Shinobu 1, Makino Takahiro 1, Ohshima Takeshi 1 |
| 18 | Development of flat X-ray source using cold cathode | Nagaoka Univ. Tech. 1@Tanizawa keisuke 1, Sekiya Tetsuo 1, Ohshio Shigeo 1, Akasaka Hiroki 1, Saitoh Hidetoshi 1 |