7 Beam Technologies
7.1 X-ray Technologies
Sept. 3 9:00〜16:30
3a-F-　/ II
1 Development and preliminary performance test of a soft x-ray ellipsometer JAEA 1, Shimadzu Emit Co. Ltd. 2　*Imazono Takashi 1, Suzuki Yoji 1, Sano Kazuo 2, Koike Masato 1
2 In-situ measurement of nuclear transmutation using Pd multi-layer Univ. of Hyogo 1, Mitsubishi Heavy Industries 2, JASRI/SPring-8 3, RIKEN Harima Inst. 4　*Akinori Kishida 1, Yasuhiro Iwamura 2, Takehiko Itoh 2, Yasuko Terada 3, Tetsuya Ishikawa 4
3 Characterization of Ultrathin SiC layer formed by Carbonization Using grazing incidence X-ray diffraction Kyushu Inst. of Tech. 1　*Tanehira Takafumi 1, Matsuishi Tomoya 1, Ejima Mitsuaki 1, Nakano Takahiro 1, Nakao Motoi 1
4 3D structure analysis of thin films by X-ray reflectivity technique Nat’l Inst. for Materials Science1,JASRI/SPring-82　*Kenji Sakurai1,Mari Mizusawa1,Yasuhiko Imai2
5 Development of non-scanning X-ray spectrometer using accurately shaped cylindrical Ge crystal
 Tohoku Univ. 1　Hayashi Kouichi 1, Nakajima Kazuo 1, Fujiwara Kozo 1
6 Simultaneous multiwavelength dispersive X-ray reflectometer utilizing laterally graded multilayers　– first trial - Photon Factory 1, Tokyo Gakugei Univ 2, Tohoku Univ. 3, KEK 4　 Tadashi Matsushita 1, Etsuo Arakawa 2, Tadashi Hatano 3, Tetsuo Harada 3, Yasuo Higashi 4, Keiichi Hirano 1
Break 10:30〜10:45
7 Evaluation of X-ray Gratings for X-ray Phase Imaging with Large Field of View Graduate School of Frontier Sciences, The Univ. Tokyo 1, LASTI, Univ. Hyogo 2　*Takeda Yoshihiro 1,Wan Keshu 1,Yashiro Wataru 1,Tsujii Hiroshi 2,Noda Daiji 2,Hattori Tadashi 2,Momose Atsushi 1
8 Development of High resolution Fourier Transform Holography X-ray Microscope. (2) Semicircular disc FZP condenser lens Kyoto Inst. of Technology 1　Nagano Takaaki 1, *Kurata Hiromi 1, Endoh Hisamitsu 1
9 Measurements of charge-clouds produced at inside of the Hard X-ray CCDs Yokohama National Univ. 1, RIKEN 2, NIRS 3, ISAS/JAXA 4, KEK 5 　*Kenji Miyamoto 1, Junko S. Hiraga 2, Shogo Nakamura 1, Yuichi Ozaki 1, Masato Kikuchi 1, Koji Abe 2, Yoshihiro Uchida 1, Shintaro Kamada 1, Takuya Kamei 1, Shingo Kurata 1, Yukio Uchihori 3, Hisashi Kitamura 3, Takeshi Takashima 4, Hiroko Tawara 5
10 Refraction Contrast Magnification Radiography With Photon Counting Mode Using Microfocus X-ray Generator and X-ray CCD of Astronomy Satellite Osaka Univ 1　*Fumihara Atsushi 1, Uchida Hiroyuki 1, Tsunemi Hiroshi 1
11 Development of transmission X-ray multilayer mirror microscope “TXM3” using LPP light source IMRAM Tohoku Univ. 1　Ejima Takeo, Nakamura Yoshimasa, Toyoda Mitsunori, Harada Tetsuo, Hatano Tadashi, Yanagihara Mihiro
Lunch 12:00〜13:00
3p-F-　/ II
1 Development of an atomic model of the plasma light sources in the EUV to soft x-ray wavelength region. Japan Atomic Energy Agency 1, ILE Osaka Univ. 2, ILT 3, Okayama Univ. 4, Kitasato Univ 5　Sasaki Akira 1, Nishihara Katsunobu 2, Sunahara Atsushi 3, Nishikawa Takeshi 4, Koike Fumihiro 5, Hiroyuki Furukawa 3
2 Two-Dimensional Simulations of Extreme Ultra Violet Emission from Laser-produced Tin Plasmas irradiated by two-wavelength double pulses. Inst. for Laser Technology 1, Tohoku Univ. 2, Inst. of Laser Engineering Osaka Univ. 3, JAEA Kansai 4　Sunahara Atsushi 1, Ohnishi Naofumi 2, Nishihara Katusnobu 3, Sasaki Akira 4
3 Ablation dynamics of Sn droplet target by double-pulse irradiation Grad. Sch. of ISEE Kyushu Univ. 1, Sch. of Medicine Kyushu Univ. 2　Nakamura Daisuke 1, Akiyama Tomoya 1, Takahashi Akihiko 2, Okada Tatsuo 1
4 Development of a Collective Thomson Scattering System for Laser Produced Plasmas for EUV Light Sources Kyushu Univ. 1　*Tomita Kentaro 1, Kagawa Taisuke 1, Hyakuta Yasuhisa 1, Uchino Kiichiro 1
5 Characteristics of EUV emission from CO2 laser produced punched-out tin plasmas ILE Osaka Univ. 1,ILT 2　Shinsuke Maeda 1,Yoshinori Shimada 2,Shinri Kurahashi 1,Shinsuke Fujioka 1,Atsushi Sunahara 2,Hiroyuki Furukawa 2,Yasuko Kimura 1,Keiji Nagai 1,Takayoshi Norimatsu 1,Hiroaki Nishimura 1,Katsunobu Nishihara 1,Noriaki Miyanaga 1,Yasukazu Izawa 1,Kunioki Mima 1
6 High power laser produced plasma EUV light source for lithography EUVA/Komatsu 1, EUVA/Gigaphoton 2, Gigaphoton 3 　*H. Komori 1, Y. Ueno 1, K. Nowak 1, T. Yabu 1, T. Yanagida 1, T. Suganuma 1, T. Asayama 1, H. Someya 1, H. Hoshino 1, M. Nakano 1, M. Moriya 1, T. Nishisaka 1, T. Abe 1, A. Sumitani 1, H. Nagano 2, Y. Sasaki 2, S. Nagai 2, Y. Watanabe 2, G. Soumagne 2, T. Ishihara 2, O. Wakabayashi 2, A. Endo2, K. Kakizaki 2, H. Mizoguchi 3
7 The characteristic of EUV light and ion emissions from micro Li target Univ. of Hyogo LASTI 1　*Nagano Akihisa 1, Amano Sho 1, Mochizuki Takayasu 1
8 Focusing characteristics of soft X-rays from laser produced plasmas in a rotating drum Xe cryogenic target Univ. of Hyogo LASTI 1, Grad. School of Eng. 2　*Masuda Kazuya 1, Takanashi Yasuyuki 2, Amano Sho 1, Miyamoto Shuji 1, Mochizuki Takayasu 1
Break 15:00〜15:15
9 Atomic layer epitaxy of TiO2/ZnO multilayers for soft x-rays Osaka City Univ. 1,OMTRI 2　*Yusuke Masuda 1,Yuji Tanaka 1,Hiroshi Kumagai 1, Tsutomu Shinagawa 2,Ataru Kobayashi 1
10 Reflection phase control of dielectric multilayer mirrors by its surface milling IMRAM, Tohoku Univ. 1　*Sakai Yu 1, Tsuru Toshihide 1, Yamamoto Masaki 1
11 Normal incidence focusing optics for EUV free-electron laser operating at photon energy of 20eV IMRAM, Tohoku Univ. 1, Kyoto University 2, NMIJ/AIST 3, MPI Heidelberg 4, Frankfurt Univ. 5, RIKEN 6, JASRI 7　*M. Toyoda 1, T. Harada 1, M. Yamamoto 1, M. Yanagihara 1, H. Fukuzawa 1,6, X. J. Liu 1,6, G. Prumper 1,6, M. Okunishi 1, K. Shimada 1, K. Ueda 1,6, H. Iwayama 2,6, K. Nagaya 2,6, M. Yao 2,6, K. Motomura 3,6, N. Saito 3,6, A. Rudenko 4,6, J. Ullrich 4, L. Foucar 5, A. Czasch 5, R. Dorner 5, K. Ishikawa 6, M. Nagasono 6, A. Higashiya 6, M. Yabashi 6, R. Tanaka 6, T. Ishikawa 6, H. Ohashi 6,7, H. Kimura 6,7
12 Fabrication of carbon window multilayers using highly stabilized ion beam sputtering deposition IMRAM, Tohoku Univ. 1　*Tetsuo Harada 1, Tadashi Hatano 1, Masaki Yamamoto 1
13 Development of 0.1 % Order Precision Wavelength Matching Technology for Carbon Window Multilayer Microscope IMRAM, Tohoku Univ. 1　*Tetsuo Harada 1, Takayoshi Jinno 1, Mitsunori Toyoda 1, Tadashi Hatano 1, Masaki Yamamoto 1
  14〜16　16:30〜17:15（7.8 Beam Application and New Technology）
7.2 Electron Microscopy and Diagnostics
Sept. 2 13:00〜17:45
2p-F-　/ II
1 Construction of Analysis beamline in NewSUABRU for Industry Univ. of Hyogo 1,KEK-PF 2,NIMS 3,Ritsumeikan Univ. SR center 4,Synchrotron Analysis LLC 5 　*Kazuhiro Kanda 1,Kenta Amemiya 2,Sei Fukushima 3,Toshiaki Ohta 4,Takafumi Tsurui 5,Masayoshi Shimidzu 5,Muneyuki Motoyama 1,Shinji Matsui 1
2 Ultrafast time-resolved electron diffraction using laser plasma electron sources ICR, Kyoto Univ.　Shigeki Tokita 1, Shunsuke Inoue 1, Shinichiro Masuno 1, Masaki Hashida 1, Shuji Sakabe 1
3 Quality Factor Evaluation of Nano-structure using Electron Beam Univ. of Tokyo 1　*Ashiba Hiroki 1, Warisawa Shin'ichi 1, Ishihara Sunao 1
4 Electron Beam Irradiation Effects of Dielectrics II: Substrate Current Induced by Surface Charging Hitachi, Ltd., Central Research Lab. 1, Hitachi High-Technologies Corp. 2　*Koyama Hikaru 1, Yano Tasuku 1, Kazumi Hideyuki 2, Kimura Yoshinobu 1
△ 5 In-situ visualization of local electric field at the probe apex using scanning electron optical system PRESTO JST 1, Univ. of Tsukuba Inst. of Applied Physics 2　*Yuta Ikeda 1,2, Ikumi Suzuki 1,2, Jun-ich Fujita1,2
△ 6 Development of CCD Camera System for Diffraction Microscope Central Research Lab., Hitachi Ltd. 1, Hokkaido Univ. 2　*Takashi Dobashi 1, Osamu Kamimura 1, Kouta Kawahara 2, Takashi Abe 2, Kazutoshi Gohara 2
7 Contrast mechanism of SEM images for multi-wall carbon nanotubes/polymer composites UBE Scientific Analysis Laboratory, Inc.　*Tohru Kawamoto 1,Yoshiyuki Sumiyama 1,Hamazo Nakagawa 1,Atsuhiro Kunishige 1
8 Real-space measurement of distribution of iron particles on nickel oxide film using EF-TEM method. Nagoya Univ. 1, JFCC Nano Structure Lab. 2, EcoTopia Science Inst.,Nagoya Univ. 3　*Kondo Yushi 1, Yoshida Kenta 1,2, Tanaka Nobuo 1,3
9 Analysis algorithms to measure three dimensional morphology of microcrystallite Nagoya Univ. 1,JFCC Nano Structure Lab. 2,Ecotopia Science Inst, Nagoya univ. 3　Sueda Shogo 1,Yoshida Kenta 1 2,Tanaka Nobuo 1 3
Break 15:15〜15:30
10 TEM observation of the Pt-CeO2 interface UBIQEN-AIST 1,Tokyo Metropolitan Univ. 2, Osaka.Univ. 3,　*Tomoki Akita 1,Shingo Tanaka 1, Koji Tanaka 1, Masanori Kohyama 1, Masatake Haruta 2, Seiji Takeda 3
11 High-resolution in situ environmental TEM observation of Au/TiO2 catalysts in CO/Air Osaka Univ. 1, AIST 2　*Yasufumi Kuwauchi 1, Tetsuya Uchiyama 1, Hideto Yoshida 1, Tomoki Akita 2, Hideo Kohno 1, Seiji Takeda 1
12 High-resolution Environmental Transmission Electron Microscopy Observation of Au/CeO2 catalysts in CO/Air Osaka Univ 1, AIST 2　*Tetsuya Uchiyama 1, Hideto Yoshida 1, Tomoki Akita 2, Hideo Kohno 1 Seiji Takeda 1
13 Selective Detection of Aromatic Compounds from Organic Mixtures by means of FIB-REMPI Kogakuin Univ　*Kawasaki Junji, Ooishi Kenji, Sakamoto Tetsuo
△ 14 Real-space observation of the extraction/insertion behaviors of Li ions by STEM-EELS spectrum-imaging AIST　Jun Kikkawa 1, Tomoki Akita 1, Mitsuharu Tabuchi 1, Masahiro Shikano 1, Kuniaki Tatsumi 1, Masanori Kohyama 1
15 Carrier distribution of compound semiconductor using electron holography The Furukawa Electric Co.,ltd 1, JFCC 2　Sasaki Hirokazu 1,2, Ootomo Sinya 1, Matsuda Takeyoshi 1, Yamamoto Kazuo 2, Hirayama Tsukasa 2
16 Quantitative analysis of Hf in HfO2 film on Si for a reference material NMIJ/AIST　Kojima Isao,Hirata kouichi,Nonose Naoko,Takatsuka Toshiko,OochiTadayuki,Ichihara Chikara,Takahara Hikari,Matue Hideaki,Morita Mizuho,Asano Toshiyuki
△ 17 UV cleaning method in vacuum for surface analysis Toyota Central R&D Labs., INC.　Takahashi Naoko 1,Kimoto Yasuji 1,Shimaoka Keiichi 1, Tohyama Mamoru 1,Ohmori Toshihide 1, Dohmae Kazuhiko 1
18 Two-dimensional positron lifetime imaging by a positron probe micro analyzer AIST 1,Univ. of Tsukuba 2,Chiba Univ. 3　*Narumi Takamitsu 1,2,Oshima Nagayasu 1,Suzuki Ryoichi 1,Ohdaira Toshiyuki 1,Kinomura Atsushi 1,Uedono Akira 2,Fujinami Masanori 3
7.3 Lithography
Sept. 2 9:30〜16:30
2a-CB-　/ II
1 Arbitrary Pattern Delineation onto Inside Surface of Pipes and Reduction of Pattern Edge Roughness Graduate School of Eng. Tokyo Denki Univ 1.　*Saitou Kenta 1, Horiuchi Toshiyuki 1
2 Application of Matrix Projection Exposure Using a Liquid Crystal Display Panel to Fabrication of Micro Resist Molds For Electroplating Graduate School of Eng., Tokyo Denki Univ.　*Fukasawa Hirotoshi 1,Horiuchi Toshiyuki 1
3 Fabrication of Nickel Micro-coils Using Laser Scan Lithography and Electroplating Graduate School of Tokyo Denki Univ. 1,Tokyo Denki Univ. 2,LuzCom Inc. 3,　*Hidetoshi Ishii 1,Masahiro Katayama 1,Tetuya Ogawa 2,Yasuhide Shinozaki 2,Kasao Kojima 3,Toshiyuki Horiuchi 1.2
4 Fabrication of an Optical Fiber Matrix with a Square Cross Section for Printing Code Marks Tokyo Denki University　*Ishikawa Koichi 1,Yasushi Higashida 2,Shintaro Matsui 2,Junnya Iwasaki 1,Toshiyuki Horiuchi 1,2
5 Fabrication and evaluation of 3D-DEP devices utilized by proton beam writing Shibaura Inst. of Tech. 1, Takasaki Advanced Radiation Research Inst., JAEA. 2, Tokyo Metropolitan Univ. 3 　*Furuta Yusuke 1, Nishikawa Hiroyuki 1, Satoh Takahiro 2, Ishii Yasuyuki 2, Kamiya Tomihiro 2, Nakao Ryota 3, Uchida Satoshi 3
Break 10:45〜11:00
6 3D alignment with 10-nm order accuracy in 3D nanofabrication using EB lithography NTT Basic Research Labs.　Yamazaki Kenji, Yamaguchi Hiroshi
7 Study of high accurate measurement for image displacement of projection optics Nikon Corp.　Otaki Katsura
8 Focus and Dose control performance of the EUV small-field exposure tool(SFET) Semiconductor Leading Edge Technologies,Inc.　*Seiichiro Shirai 1,Kazuo Tawarayama 1,Shunko Magoshi 1,Yuusuke Tanaka 1,Hideto Mori 1,Hiroyuki Tanaka 1,
9 Defect signal analysis for an actinic EUVL mask blank inspection MIRAI-Selete 1, AIST 2　*Takeshi Yamane 1, Teruo Iwasaki 1, Toshihiko Tanaka 1, Tsuneo Terasawa 1, Osamu Suga 1, Toshihisa Tomie 2
△ 10 Observation of programmed phase defects using the EUV microscope University of Hyogo 1, Asahi Glass Co 2　Yoshito Kamaji 1,Kei Takase 1, Toshiyuki Uno 2, Takeo Watanabe 1, Hiroo Kinoshita 1
Lunch 12:15〜13:30
2p-CB-　/ II
1 Chemical Bondings of EUV Deposited and Electron Beam Deposited Carboneous Contamination Selete 1　*Anazawa Toshihisa 1,Nishiyama Yasushi 1,Oizumi Hiroaki 1,Nishiyama Iwao 1,Suga Osamu 1
△ 2 Contamination control of projection optics mirror for EUV lithography by introducing hydrocarbon gas species. LASTI, Univ. of Hyogo 1, Nikon Corporation 2, Canon Inc. 3　Koida Keigo 1, Niibe Masahito 1, Kakutani Yukinobu 2, Matsunari Shuichi 2, Aoki Takashi 2, Kawata Shintaro2, Takase Hiromitu 3, Terashima Shigeru 3, Nakayama Takahiro 3, Fukuda Yasuaki 3
3 XPS depth profiling study of Mo/Si bilayer films formed by magnetron sputtering Niigata Univ. 1, JST Plaza Tokai 2, IMRA Material R&D 3, Nagoya Univ. 4　*Kikuchi Hokuto 1, Sekizaki Daisuke 1, Shimizu Hidehiko 1, Yamaguchi Takashi 2, Yanagi Yousuke 3, Itoh Yoshitaka 3, Ikuta Hiroshi 4, Oka Tetsuo 1
4 Screening of new rein materials for EUV resists Selete 1　Hiroaki Oizumi 1, Takaaki Kumise 1, Itani Toshiro 1
△ 5 Resolution of Molecular Resist Derived from Truxene for EUV Exposure Toshiba Corporation 1　Hattori Shigeki 1, Saito Satoshi 1, Asakawa Koji 1
6 EUV resist outgassing: quantification and qualification evaluations Selete Inc.　Shinji Kobayashi 1, Julius Joseph Santillan 1, Toshiro Itani 1
Break 15:00〜15:15
7 XPS depth profiling of non-topcoat resist film by C60+ ion etching Toray Research Center, Inc. 1, Renesas Technology Corp. 2, Mitsubishi Electric Corp. 3, Asahi Glass Co., Ltd. 4　*Yoshikawa Kazuhiro 1, Man Naoki 1, Matsunobe Takeshi 1, Hagiwara Takuya 2, Ishibashi Takeo 2, Hanawa Tetsuro 2, Terai Mamoru 3, Shirota Naoko 4, Yokokoji Osamu 4
8 Chemically Amplified Molecular Resist Based on Fullerene Derivative ISIR　Osaka Univ.1, Tokyo Ohka Kogyo Co., Ltd. 2　*Hiroki Yamamoto 1,Takahiro Kozawa 1,Seiichi Tagawa 1,Tomoyuki Ando 2,
Katsumi Ohmori 2,Mitsuru Sato 2,Junichi Onodera 2
9 The effects of acid generator concentration in EB resist films ISIR, Osaka Univ. 1　*Natsuda Kenichiro 1, Kozawa Takahiro 1, Okamoto Kazumasa 1, Tagawa Seiichi 1
10 Dynamics of radical cation of base polymer for chemically amplified resist ISIR, Osaka Univ. 1, JST-CREST 2　*Kazumasa Okamoto 1,2, Masafumi Tanaka 1, Takahiro Kozawa 1,2, Seiichi Tagawa 1,2
11 Rapid directed self-assembly of in-plane half-cylindrical domains of diblock copolymer NTT Basic Research Labs. 1, Univ. of Tokyo 2　*Yamaguchi Toru 1, Ozaki Yasuno 2, Hayashi Junzo 1, Yamazaki Kenji 1, Warisawa Shin'ichi 2, Ishihara Sunao 2, Yamaguchi Hiroshi 1
7.4 Nanoimprint
Sept. 2 9:00〜17:00
2a-M-　/ II
1 Impact of de-molding force on temperature in nanoimprint lithography Osaka Pref Univ. 1, Warsaw Univ Technol. 2,　Tanabe Toshiaki 1, Darek Jarzabek 2, Matsue Masato 1, Kawata Hiroaki 1, Zygmunt Rymuza 2, Hirai Yoshihiko 1
2 Evaluation of Release Effect for Antisticking Layer with and without Annealing by Scanning Probe Microscopy Univ. of Hyogo 1, SII NanoTechnology 2, JSPS 3　*Okada Makoto 1, Iwasa Masayuki 2, Nakamatsu Ken-ichiro 1, 3, Kanda Kazuhiro 1, Haruyama Yuichi 1 and Matsui Shinji 1
△ 3 Nanoimprinting onto a Release Agent Coated Hydrogen Silsesquioxane Univ. of Hyogo 1, JSPS 2　*Okada Makoto 1, Nakamatsu Ken-ichiro 1,2, Kanda Kazuhiro 1, Haruyama Yuichi 1, and Matsui Matsui 1
4 Nanoimprinting on a CHF3 Plasma Irradiated Resin Univ of Hyogo 1, JSPS 2　*Okada Makoto 1, Nakamatsu Ken-ichiro 1,2, Kanda Kazuhiro 1, Haruyama Yuichi 1, Matsui Shinji 1
5 Fabrication and Characterization of Fluorinated Diamond-Like Carbon Nanoimprint Mold Hyogo Univ. 1, JSPS 2　*Kang Yuji 1, Okada Makoto 1, Nakamatsu Kenichirou 1 2, Kanda kazuhiro 1, Haruyama Yuichi 1, Matsui Shinji 1
Break 10:15〜10:30
6 Study of release property on photo-curing nanoimprint using F-DLC as release layer TUS 1,TOYO GOSEI 2,Nippon ITF 3　*Yatsushiro Teruhiko 1,Sakai Nobuji 2,Ohsaki Takeshi 2,Tanaka Yoshikazu 3,Nakahigashi Takahiro 3,Taniguchi Jun 1
7 Impact of imprint condition on release force in UV-nanoimprint Natl. Inst. of AIST　*Hiroshima Hiroshi 1
8 Electroplating using High-aspect-ratio Microstructures Fabricated by Proton Beam Writing SIT 1,JAEA Takasaki 2　*Seki Yoshihiro 1,Furuta Yusuke 1,Nishikawa Hiroyuki 1,Satoh Takahiro 2,Ishii Yasuyuki 2,Kamiya Tomihiro 2
9 Nanoimprinting using Large Area Mold fabricated by Electron Beam Stamper Univ. of Hyogo 1, HOLON 2 　*Okada Makoto 1, Kishiro Takashi 2, Yanagihara Kaori 2, Ataka Masashi 2, Anazawa Norimichi 2, and Matsui Shinji 1
△ 10 Development of Large Area Quarts Mold for Nanoimprint Lithography Using Scanner Canon inc.　*Isano Taisuke, Kaneda Yasushi, Asano Kosuke, Hoshi Tai
Lunch 11:45〜13:00
2p-M-　/ II
1 Study on time evolution of the resist deformation in Thermal NIL (Material and Process Design) Osaka Pref. Univ.　1　Shibata Mayuko 1, Tanabe Toshiaki 1, Kawata Hiroaki 1, and Hirai Yoshihiko 1
2 Forming Process Time in Glass Nanoimprint Osaka. Pref. Univ. 1, AIST 2, Nihon Yamamura Glass Co. Ltd. 3　*Kimoto Yoshihisa 1, Tanabe Toshiaki 1, Shibata Mayuko 1, Kasa Haruya 2, Nakamura Junichi 3, Hidaka Tatsuo 3, Yasuda Masaaki 1, Kawata Hiroaki 1, Nishii Junji 2, Hirai Yoshihiko 1
3 Dynamic analysis of resist flow into mold cavity in UV NIL Osaka Pref Univ. 1.
AIST 2.　Morihara Daisuke 1.
Hiroshima Hiroshi 2.
Kawata Hiroaki 1.
Hirai Yoshihiko 1.
4 Theoretical study of ultimate resolution in nanoimprint lithography Osaka Pref. Univ. 1　*Tada Kazuhiro 1, Kimoto Yoshihisa 1, Yasuda Masaaki 1, Kawata Hiroaki 1, Hirai Yoshihiko 1
5 Deformation Control of Template for Nanoimprint Hitachi Research Lab., Hitachi, Ltd. 1, Hitachi High-Technologies Corp. 2　*Sasaki Miho 1, Ando Takashi 1, Ogino Masahiko 1, Mori Kyoichi 2, Shizawa Noritake 2, Miyauchi Akihiro 1
6 Development of nanometer accurate surface replication method for fabricating reflective optics Osaka Univ. 1, JST-PRESTO 2　*Ishikura Hiroyuki 1, Mimura Hidekazu 1,2 Sano Yasuhisa 1, Yamauti Kazuto 1
Break 14:30〜14:45
7 Patterning of magnetic layer by room-temperature nanoimprint for fabricating patterned media Univ. of Hyogo 1, JSPS 2　Nakamatsu Kenichiro 1,2, Matsui Shinji 1
8 Ultrasonic nanoimprint in engineering plastics Nat. Inst. of AIST 1　*Mekaru Harutaka 1, Takahashi Masaharu 1
9 Patterning of polyimide and SWCNT composite by a low-temperature imprinting technique Shinshu Univ. 1　*Tamura Shunsuke 1, Ito Eiji 1, Miyairi Keiichi 1
10 Fabrication of the porous Alumina ceramics by nanoimprint method Nagaoka Univ. of Tech.1, Osaka Pref. Univ.　Tadachika Nakayama1, Hong Dae Kim1, Masahiro Terauchi1,
Kazutaka Imaki1, Jun Yoshimura1, Takeshi Yoshimura2, Tsuneo Suzuki1, Hisayuki Suematsu1, Koichi Niihara1
11 Fabrication of Anodic Porous Alumina with Fine Pitch Using Negative Resist Tokyo Metropolitan Univ. 1, KAST 2　*Yamada Naoto 1, Maegawa Hiroaki 1, Nishio Kazuyuki 1,2, Masuda Hideki 1,2
12 Fabrication of Antireflection Structures of Inorganic Materials by Nanoimprinting Using Anodic Porous Alumina Tokyo Metropolitan Univ. 1, KAST 2　*Endo Takahide 1, Yanagishita Takashi 1,2, Nishio Kazuyuki 1,2, Masuda Hideki 1,2
13 Fabrication of ordered nanoporous carbon by nanoimprinting using highly ordered porous alumina Tokyo Metropolitan Univ. 1, KAST 2　*Morishita Shoto 1, Endo Takahide 1 , Yanagishita Takashi 1,2, Nishio Kazuyuki 1,2, Masuda Hideki 1,2
14 Fabrication of cantilevers by two step transfer process without lithography Osaka Pref. Univ.　*Kawata Hiroaki 1, Ryugou Kenichi 1, Yasuda Masaaki 1, Hirai Yoshihiko 1
15 Grating substrate fabricated by nanoimprint lithography for surface plasmon-field enhanced fluorescence microscopy RICE AIST 1,PRI AIST 2　* Akashi Naoko 1,Tawa Keiko 1,Tatsu Yoshiro 1,Kintaka Kenji 2,Nishii Junji 2
7.5 Beam Excitation Surface Reaction
Sept. 3
3a-D-　/ II
 
Short Presentation (5min.) 10:45〜12:00
3a-D-1〜15　Poster Session 15:30〜17:30
1 Crystallinity Control of Aluminum Nitride Thin Films by Using ECR Plasma Sputtering Hirosaki Univ.　*Hiroshi Toyota1, Hidenori Yasui1, Toshiro Ono1
2 Analysis of beam-deposited Pt layer by Raman spectroscopy CQST Osaka Univ. 1　*Kisa Toshiya 1,Murakami Katsuhisa 1,Abo Satoshi 1,Wakaya Fujio 1,Takai Mikio 1
3 Transport properties of Pt nano pillar fabricated by electron-beam induced deposition Osaka Univ. 1　*Takamoto Kunio 1 , Nakayama Takahito 1 , Murakami Katsuhisa 1 , Abo Satoshi 1 , Wakaya Fujio 1 , Takai Mikio 1
4 Evaluation of electron biprism with fine filament fabricated by free-space-wiring technology of FIB-CVD Univ. of Hyogo 1, JSPS 2, JFCC 3　Nakamatsu Kenichiro 1,2, Yamamoto Kazuo 3, Hirayama Tsukasa 3, Matsui Shinji 1
5 Variation on Local Structure of DLC Thin Films Formed with FIB-CVD Method by Annealing LASTI, Univ. Hyogo 1, School Eng., Univ. Tokyo 2 　*Kazuhiro Kanda 1,Makoto Okada 1,Noriko Yamada 1,Jun-ya Igaki 1,Reo Kometani 2,Shinji Matsui 1
6 Graphite thin film formation induced by eduction phenomenon of Ga implanted by focused-ion-beam The University of Tokyo 1, NEC 2　*Kometani Reo 1, Ichihashi Toshinari2, Warisawa Shinichi1, Ishihara Sunao1
7 Depth profile of hydrogen in the diamond-like carbon film exposed to atomic oxygen beam Kobe Univ. 1, JAXA 2, JAEA 3　*Tagawa Masahit 1, Yokota Kumiko 1, Kitamura Akira 1, Matsumoto Koji 2, Yoshigoe Akitaka 3, Teraoka Yuden 3
8 A synergetic effect of atomic oxygen and EUV on the erosion of fluorinated polymer Kobe Univ., TRI Osaka　*Kumiko Yokota 1, Kazuhiro Kishida 1, Masahito Tagawa 1, Akio Okamoto 2
9 Ion desorption from single-walled carbon nanotubes induced by core-electron excitations - Photo-electron photo-ion coincidence measurements - II Univ. of Tokyo 1, Grad. Univ. for Adv. St. 2, Yokohama National Univ. 3, Chiba Univ. 4, KEK-PFC 5　*Yutaka Mera 1, Satoshi Arima 1, Takayuki Fujiwara 1, Kiichirou Ishizaki 1, Takuhiro Kakiuchi 2, Shogo Hashimoto 3, Koji Okudaira 4, Kazuhiko Mase 5, Koji Maeda 1
10 Solid Phase Epitaxy Growth of Phosphorus Ion-implanted Amorphous Silicon Inst. of Appl. Phys., Univ. of Tsukuba. 1, HOYA CANDEO OPTRONICS Corp. 2　*Inoue Takehiko 1, Mizuta Taiji 2, Ohshima Hiroshi 2, Murakami Kouichi 1
11 Animation of multiphonon recombination process with configuration coordinate diagram Wakayama Univ. 1　*Negoro Masayuki 1,Shinozuka Yuzo 1
12 Development of a GaAs-Photocathode of irradiation from substrate side using FIB processing RIKEN Inst. 1,Hosei Univ. 2　*Sekiya Satoshi 2,Nishitani Tomohiro 1,Nishida Kei 2,Yamamoto Yasuhiro 2,Meguro Takashi 1
13 Secondary Ion Measurements of Polymer Materials with Large Cluster Ions Kyoto Univ. 1, JST-CREST 2　*Satoshi Ninomiya 1, Kazuya Ichiki 1, Hideaki Yamada 1, Yoshihiko Nakata 1, Toshio Seki 1,2, Takaaki Aoki 1,2, Jiro Matsuo 1,2
14 O1s Photoemission Spectroscopy with Synchrotron Radiation for Oxidation of Ni(111) Surface at Room Temperature
induced by Supersonic O2 Molecular Beam
 Japan Atomic Energy Agency 1, Hiroshima Univ. 2　*Yasunori KAWAKAMI 1,2, Yuden TERAOKA 1, Akitaka YOSHIGOE 1, James HARRIES 1
15 State selection of a triplet O2 molecular beam by an inhomogeneous field and the polarization reversal NIMS 1　Kurahashi Mitsunori 1, Yamauchi Yasushi 1
7.6 Ion Beam Technology
Sept. 2 9:00〜15:30
2a-D-　/ II
1 Ion beam focusing method by using ruby capillary AIST 1　Watanabe Koji 1, Kondou Koji 1, Fujiwara Yukio 1, Nonaka Hidehiko 1, Saito Naoaki 1, Ichimura Shingo 1
2 Development of Electron Cyclotron Resonance Ion Source for Synthesis of Endohedral Metallofullerenes (II) Tateyama Machine Co., Ltd. 1, Toyo Univ. 2, NIRS. 3, ATOMKI. 4, Osaka Univ. 5　*Tanaka Kiyokatsu 1,2, Uchida Takashi 2, Minezaki Hidekazu 2, Muramatsu Masayuki 2,3, Biri Sandor 4, Asaji Toyohisa 1, Shima kazushi 1, Hanajiri Tatsuro 2, Kitagawa Atushi 3, Kato Yushi 5, Yoshida Yoshikazu 2
3 Controlled Synthesis of Fullerene Plasma in an ECR ion source Toyo Univ. 1, Tateyama Machine Co., Ltd. 2, NIRS 3, ATOMKI 4, Osaka Univ. 5　*Uchida Takashi 1, Tanaka Kiyokatsu 1,2, Minezaki Hidekazu 1, Muramatsu Masayuki 1,3, Biri Sandor 4, Asaji Toyohisa 2, Shima kazushi 2, Hanajiri Tatsuro 1, Kitagawa Atsushi 3, Kato Yushi 5, Yoshida Yoshikazu 2
4 Incident angle dependence of average charge of C2+ fragment ions emerging from a thin carbon foil TARRI, JAEA 1, ASRC, JAEA 2　*Chiba Atsuya 1, Saitoh Yuich 1, Narumi Kazumasa 2, Yamada Keisuke 1, Takahashi Yasuyuki 2
5 Dependence of the micromachining of siloxane films by ion beam writing SIT 1, JAEA 2,　*Tsuchiya Ryutaro 1, Furuta Yusuke 1, Nishikawa Hiroyuki 1, Ohisihi Tomoji 1
Satoh Takahiro 2, Ishii Yasuyuki 2, Kamiya Tomihiro 2,
Break 10:15〜10:30
6 Formation of organic-inorganic hybrid nano -structures by high energy ion beam irradiation. IMRAM Tohoku Univ. 1, Osaka Univ. 2, JAEA 3　*Satoshi Tsukuda 1, Shu Seki 2, Masaki Sugimoto 3, Shun-ichiro Tanaka 1
7 Morphological control of ion-induced Ge nanoprotrusions Nagoya Inst.Technol. 1,Nagoya Univ. 2　*Miyawaki Ako 1,Sugita Yoshitaka 1,Hayashi Yasuhiko 1,Tanemura Masaki 1,Tokunaga Tomoharu 2
8 Room-temperature fabrication of Zn nanofibers by ion irradiation method Nagoya Inst. Technol. 1　*Kutsuna Masaki 1, Yamaguchi Kouhei 1, Hayashi Yasuhiko 1, Tanemura Masaki 1
△ 9 Electro Luminescence on Ge-Ion-Implanted SiO2 Films Kyoto Univ. 1,Sharp Corp. 2　*Hattori Masashi 1,Tsuji1 Hiroshi 1,Arai Nobutoshi 1,2,Kojima Kenji1,Adachi Kouitirou 2,Kotaki Hiroshi 2,Gotoh Yasuhito 1,Ishikawa Jyunzou 1
10 Pretreatment by CHF3 Plasma processing for cell adhesion patterning on SiO2 Dept. Elec. Sci. Eng 1,VBL 2 ,Kyoto Univ.　*Hiroyuki Kojima 1,Hiroshi Tsuji 1,Piyanuch Sommani 2,Hiroko Sato 1,Yasuhito Gotoh 1,Jyunzou Isikawa 1
11 Ion beam modification of polymers for the therapy of aneurysms Riken 1, Tokyo Women's Medical Univ. 2　*Suzuki Yoshiaki 1, Ujiie Rena 1, Toida Hiroshi 1, Ujiie Hiroshi 2, Hori Tomokatsu 2
Lunch 12:00〜13:00
2p-D-　/ II
1 Development of a liquid-type cluster ion source – gas pressure dependence of electrospray onset voltage - AIST 1　*Fujiwara Yukio 1, Watanabe Kouji 1, Nonaka Hidehiko 1, Saito Naoki 1, Fujimoto Toshiyuki 1, Kurokawa Akira 1, Ichimura Shingo 1
2 Development of large mass markers for TOF-SIMS spectrum using Ir4(CO)12 metal cluster complex film AIST 1　*Nonaka Hidehiko 1, Nakanaga Taisuke 1, Fujiwara Yukio, Saito Naoaki 1, Fujimoto Toshiyuki 1
3 Irradiation Effect of Water Cluster Ion Beam on Surface of Polymer Substrates Photonics Electron. Sci. Eng. Ctr., Kyoto Univ.　*Hiromichi Ryuto, Keiji Tada, Gikan H. Takaoka
△ 4 Size separation and analysis of ethanol cluster ion Photonics Electron. Sci. Eng. Ctr., Kyoto Univ.　*Y. Kubo, K. Sugiyama, R. Ozaki, H. Ryuto and G.H. Takaoka
△ 5 Retarding voltage dependence of radiation damage for Si substrates by ethanol cluster ion beams Photonics Electron. Sci. Eng. Ctr., Kyoto Univ.　*Ryosuke Ozaki 1, Kazumichi Sugiyama 1, Hiromichi Ryuto 1, Gikan H. Takaoka 1
6 Etching property of Al2O3 films prepared by O2 cluster ion beam assisted deposition Photonics Electron. Sci. Eng. Ctr., Kyoto Univ.　*Yakushiji Takashi, Ryuto Hiromichi, Takaoka Gikan
7 Size-selected high density large gas cluster ion beam irradiation Kyoto Univ. 1, JST-CREST 2
　*Ichiki Kazuya 1, Ninomiya Satoshi 1, Seki Toshio 1,2, Aoki Takaaki 1,2, Matsuo Jiro 1,2
8 Secondarily ion mass spectrometory from poly styrene by size selected gas cluster ion beam University of Hyogo　*Gen Mukai ,Kousuke Moritani ,Michihiro Hashinokuchi ,Kouzou Mochiji
9 Reactive sputtering by gas cluster ion beams with SF6 and Ar mixed gas Univ. of Hyogo　*Takafumi Mashita 1, Noriaki Toyoda 1,Isao Yamada 1
10 Surface structure dependence on smoothing effect with gas cluster ion beam irradiation Incubation Center, Graduate School of Engineering, University of Hyogo 1,Deapartment of Engineering Synthesis, University of Tokyo 2,Faculty of Engineering Science, Kansai University 3　*Hirota Tomokazu 1,Toyoda Akinori 1,Yamada Isao 1,Nagahuzi Keisuke 2,Hamaguti Tetsuya 2,Tani Hiroshi 3
7.7 Micro-Field Emitter
Sept. 2 9:00〜17:00
2a-N-　/ II
△ 1 A Computational Study on the Surface Structure of Protecting Layer for Plasma Display and its Secondary Electron Emission Property Dept. Appl. Chem., Tohoku Univ. 1, Adv. Sci. Mater.,Hiroshima Univ. 2, NICHe, Tohoku Univ. 3　*Kazumi Serizawa 1, Hiroaki Onuma 1, Hiromi Kikuchi 1 , Masaki Kitagaki 2, Ai Suzuki 3, Riadh Sahnoun 1, Michihisa Koyama 1, Hideyuki Tsuboi 1, Nozomu Hatakeyama 1, Akira Endou 1, Hiromitsu Takaba 1, Carlos A. Del Carpio 1, Momoji Kubo 1, Hiroshi Kajiyama 2, Akira Miyamoto 1,3
2 Observation of fringelike-electron-emission pattern from Pt nanocrystalline emitter fabricated by electron-beam-induced deposition CQST Osaka Univ. 1, OPRNN Osaka Univ. 2　*Murakami Katsuhisa 1,Nishihara Shinji 1, Matsubara Naoki 1, Ichikawa Satoshi 2, Wakaya Fujio 1, Takai Mikio 1
3 Observations of atomistic properties of carbon thin film surfaces by using STM Tsukuba Univ.　Shinya Nagashima 1, Satoshi Ogata 1, Masahiro Sasaki 1
4 Work function measurements of Pr-oxide/W(100) surface by using of the retarding potential Muroran Inst. of Technology 1　*Jungo Yoshihara 1,Takashi Kawakubo 1,Hideaki Nakane 1
5 Work function of transition metal nitride thin films evaluated in vacuum Kyoto Univ. 1　*Endo Keisuke 1, Kanzawa Taro 1, Miyata Yuko 1, Gotoh Yasuhito 1, Tsuji Hiroshi 1, Ishikawa Junzo 1
6 Changes in FEM image and field emission characteristics on SK chart Kyoto Univ.　*Michito kawasaki 1.Yasuhito Gotoh 1. Hiroshi Tsuji 1. Junzo Ishikawa 1.
Break 10:30〜10:45
7 Measurement of energy distribution of electrons emitted from carbonized n-Si-FEAs Kyoto Univ. 1, JST 2, AIST 3, Nissin Ion Equipment 4　*Sakai Yoshiki 1, Gotou Yasuhito 1, Takeuchi Mitsuaki 2, Nagao Masayoshi 3, Sakai Shigeki 4, Kimoto Tsunenobu 1, Tsuji Hiroshi 1, Ishikawa Junzou 1
△ 8 Application of silicon field emitter arrays for space charge compensation of low energy ion beam JST Innovation Plaza Kyoto 1, Kyoto Univ. 2, Nissin Ion Equipment 3　Takeuchi Mitsuaki 1, Gotoh Yasuhito 2, Ishikawa Junzo 2, Tuji Hiroshi 2, Sakai Sigeki 3
△ 9 Verwey transition for spin-polarized electrons field-emitted from single crystal magnetite whisker Graduate School of Eng., Mie Univ. 1, RIE Shizuoka Univ. 2　Nagai Shigekazu 1,Fujiwara Yuji 1,Hata Koichi 1,Okada Morihiro 2, Mimura Hidenori 2
10 Design and fabrication of strain compensated superlattice with no dislocations for high quality spin polarized electron source. Nagoya Univ.　Tanioku Masatoshi 1, X.G. Jin 1, Maeda Yuya 1, Konomi Taro 2, Nakagawa Yasuhide 2, Fuchi Singo 1, Yamamoto Masahiro 2, Ujihara Toru 1, Nakanishi Tutomu 2, Takeda Yoshikazu 1
11 Development and evaluation of High Brightness Polarized Electron Source for SPLEEM that can observe video rate Nagoya Univ. Science 1,Hitachi Central Research Lab 2,Nagoya Univ. Engineering 3,Osaka Prefecture Univ. 4　*Nakagawa Yasuhide 1,Mano Atsushi 1, Yamamoto Masahiro 1,Okumi Syouji 1,Konomi Tarou 1,Saitou Hikaru 1,Nakanishi Tsutomu 1, Kouhashi Teruo 2,Oshima Taku 2,X.G. Jin 3,Maeda Yuuya 3,Ujihara Toru 3,Takeda Yoshikazu 3,Suzuki Masahiko 4,Tsuno Katsushige 4,Yasue Tsuneo 4,Koshikawa Takanori 4
Lunch 12:00〜13:00
2p-N-　/ II
1 Operation of nanosilicon ballistic electron emitter in aqueous solutions Graduate School of Eng., Tokyo Univ. of Agri. & Technol. 1　*OHTA Toshiyuki 1, OGWA Shuichiro 1, GELLOZ Bernard 1, KOSHIDA Nobuyoshi 1
2 Electron emission from nanocrystalline silicon based MOS cathode arrays Hachinohe Inst. Technol. 1, RIE Shizuoka Univ. 2, CQST Osaka Univ. 3　*Shimawaki Hidetaka1, Kida Yo1, Neo Yoichiro2, Mimura Hidenori2, Murakami Katsuhisa3, Wakaya Fujio3, Takai Mikio3
△ 3 Development of Active-matrix HEED and its application to image sensing (4) Pioneer Corp. 1,NHK Sci. & Tech. Res. Lab. 2,Tokyo Univ. of A&T 3　Yohei Matsuba 1,Takanobu Sato 1,Ryota Tanaka 1,Tomonari Nakada 1,Kazuto Sakemura 1,Nobuyasu Negishi 1,Yoshiyuki Okuda 1 ,Atsushi Watanabe 1,Takamasa Yoshikawa 1,Kiyohide Ogasawara 1,Masakazu Nanba 2,Kenkichi Tanioka 2,Norifumi Egami 2,Nobuyoshi Koshida 3
4 In-Situ, Real Time Observation of Operating Condition of Multi Emitters in Pulse Mode Meijo Univ. 1, Pioneer Co. 2　*Nakagawa Yukihiko 1, Sakai Kentaro 1, Tsubaki Daisuke 1, Murata Hidekazu 1, Shimoyama Hiroshi 1, Sakemura Kazuto 2, Negishi Nobuyasu 2, Watanabe Atsushi 2
5 Simulation and fabrication of FEAs with a built-in electrostatic lens for focused electron beam RIE Shizuoka Univ. 1, AIST 2　*Masafumi Takeda 1, Shun Horie 1, Masayoshi Nagao 2, Tomoya Yoshida 2, Seigo Kanemaru 2, Yoichiro Neo 1, Toru Aoki 1, Hidenori Mimura 1
6 Thickness dependence of ion induced bending phenomenon for field emitter fabrication AIST 1　*Yoshida Tomoya 1, Nagao Masayoshi 1, Kanemaru Seigo 1
7 Ultra-high luminance FED AIST 1, Futaba 2　*Nagao Masayoshi 1, Yoshida Tomoya 1, Kanemaru Seigo 1, Nakamura Kazuhito 2, Marushima Yoshihisa 2, Taniguchi Masateru 2, Itoh Shigeo 2
Break 14:45〜15:00
8 Field emission characteristics of Cu2O conical protrusion grown by Ar ion irradiation IMRAM Tohoku Univ. 1, Graduate School Eng. Tohoku Univ.(now NGK) 2　Shun-ichiro Tanaka1, Hiroyuki Tanaka2
9 Field emission characteristics of carbon nanofiber bundle selectively grown by PECVD Graduate School Eng. Tohoku Univ. 1, IMRAM Tohoku Univ. 2　Norihiro Shimoi 1, Shun-ichiro Tanaka 2
▲ 10 Morphological and compositional control of ion-induced carbon nanofibers and their field emission properties Nagoya Inst. Tech　M.Zamri M.Yusop, Wang Zhipeng, Y. Hayashi, M.Tanemura
11 Effects of Surface Treatment for CNT Electron Sources on Lifetime Osaka Univ. 1　*Takikawa Tomoaki 1, Kinoshita Akira 1, Oki Hiroshi 1, Murakami Katsuhisa 1, Abo Satoshi 1, Wakaya Fujio 1, Takai Mikio 1
12 FEM study of graphene sheet and organic molecules constructed with π conjugated bonds RIE Shizuoka Univ. 1, Staley Co., ltd 2, Tsukuba Univ. 3, Shizuoka Univ. 4　Neo Yoichiro1, T. Matsumoto2, M. Sasaki3, T. Makoto4, T. Aoki1, H. Mimura1
13 Field Emission Characteristics of BCN and BCN/CNT in low vacuum Osaka Univ.　Kawai Satoshi
14 Field emission properties of phosphorus-doped diamond tip array Diamond RC, AIST　Yamada Takatoshi 1, Nebel Christoph 1, Shikata Shin-ichi 1
15 Field enhancement factor of ZnO:Al whisker cold emitter fabricated on carbon substrate Nagaoka Univ. Tech.　*Tanizawa Keisuke 1,Ohshio Shigeo 1,Akasaka Hiroki 1,Saitoh Hidetoshi 1
7.8 Beam Application and New Technology
Sept. 3 16:30〜17:15
3p-F-　/ II
  1〜13　13:00〜16:30（7.1 X-ray Technologies）
14 Crystallization　process under electro deposotion using buthyl-methylimidazolium tetrafluoroborate and AgBF4 PRESTO JST1, Univ. of Tsukuba Institute of Applied Physics　Suzuki Ikumi1,2, Ikeda Yuta1,2, Fujita Junーichi1,2
15 Ion irradiation with RIKEN micro beam system for cell irradiation using a glass capillary with an end-window Atomic Physics Lab., RIKEN 1, Cellular Dynamics Lab., RIKEN 2, Beam Application Team, RIKEN 3, Kochi Univ. of Tech. 4, Institute of Physics, Univ. of Tokyo 5　*Iwai Yoshio 1, Maeshima Kazuhiro 2, Ikeda Tokihiro 1, Kojima Takao M. 1, Wada Michiharu 1, Kanai Yasuyuki 1, Kobayashi Tomohiro 3, Ogiwara Kiyoshi 3, Hamagaki Manabu 3, Narusawa Tadashi 4, Imamoto Naoko 2, Yamazaki Yasunori 1,5
16 Laser ignition of reaction control thruster using GO2/GH2 Graduate school for the Creation of New Photonics Industries 1, JAXA 2, COSMOTEC 3　Fujita Kazuhisa 1, Moriya Shinichi 2, Masuoka Tadashi 2, Takahashi Hideaki 3