| 7 Beam Technologies |
| 7.1 X-ray Technologies |
| March 27 |
| 27a-B- / II |
| |
|
Short Presentation (5min.) 9:00〜10:45
27a-B-1〜21 Poster Session 15:30〜17:30 |
| | 1 | R&D of MEMS X-ray Mirrors (2) | ISAS/JAXA 1, TMU 2, AIST 3 *Yuichiro Ezoe 1, Masaki Koshiishi 1, Makoto Mita 1, Kazuhisa Mitsuda 1, Akio Hoshino 2, Yoshitaka Ishisaki 2, Takayuki Takano 3, Ryutaro Maeda 3 |
| | 2 | Fabrication of a Gray Mask for X-ray Lithography by MEMS Technology | AIST 1 *Mekaru Harutaka 1, Takano Takayuki 1, Awazu Koichi 1, Takahashi Masaharu 1, Maeda Ryutaro 1 |
| | 3 | Preliminary experiments on fabrication of Ruthenium hollow fibers for EUV transmission | Tohoku Univ. *Yoshida Takanori, Matsuura Yuji |
| | 4 | Reflection passband broadening by aperiodic designs of EUV/soft X-ray multilayer mirrors | IMRAM Tohoku Univ. 1 *Tsuru Toshihide 1, Yamamoto Masaki 1 |
| | 5 | Wavelength matching of an EUV Schwarzschild objective | Tohoku Univ. 1 *Tetsuo Harada 1, Tadashi Hatano 1, Masaki Yamamoto 1 |
| △ | 6 | Development of optical component for EUV phase-shift microscope | Univ. of Hyogo 1, HOYA Corporation 2, CREST-JST 3 *Mizuta Yoshio 1,3, Osugi Masafumi 1,3, Sakaya Noriyuki 2,3, Hamamoto Kazuhiro 2,3, Kinoshita hiroo 1,3 |
| | 7 | Development of the ion milling system for sub-nm figure error correction of a soft-X-ray multilayer mirror | IMRAM Tohoku Univ. 1 TOSAKA Aki 1, SAKAI Yu 1, TSURU Toshihide 1, YAMAMOTO Masaki 1 |
| | 8 | Development of full field transmission EUV microscope “TEUVM” using LPP light source |
IMRAM Tohoku Univ. *T. Ejima 1, H. Murata 1, M.
Toyoda 1, T. Harada 1, M. Furudate 1, A. Arai 1, T. Tsuru 1, T. Hatano 1,
M. Yanagihara 1, M. Yamamoto 1 |
| △ | 9 | Application of a Wolter Mirror Soft X-ray Microscope to Three-Dimensional Imaging | Univ. Tsukuba 1 *Hoshino Masato 1, Aoki Sadao 1 |
| | 10 | Application of a laser plasma light source for photo-stimulated desorption and photochemistry of water clusters | Gakushuin Univ. 1 Arakawa Ichiro 1, Tachibana Takayuki 1, *Morita Mai 1,Miura Takashi 1 |
| | 11 | Heat stability evaluations of multilayer mirrors for use in the 1-8 keV region | JAEA 1, Shimadzu Emit 2 Ishino Masahiko 1, *Koike Masato 1, Sano Kazuo 2 |
| | 12 | Development of multilayer laminar-type spherical gratings for use with soft x-ray flat-field spectrographs (I) | Quantum Beam Science and Technology Directorate JAEA Koike Masato 1,Ishino Masahiko 1, Ishino,Imazono Takashi 1 |
| | 13 | Element Analysis by Projection X-ray Microscope | Meiji Univ. 1 *Tsuruta Susumu 1,Yoshimura Hideyuki 1 |
| | 14 | Improvement of XPS using collimated X-ray beam | Central Research Lab., Hitachi Ltd. *Kikawa Takeshi, Ishizaka Akitoshi |
| | 15 | A new type of wavelength dispersive X-ray reflectometer utilizing a curved crystal polychromator | KEK-PF 1, NIMS 2 *Matsushita Tadashi 1, Inada Yasuhiro 1, Niwa Yasuhiro 1, Ishii Masashi 2, Sakurai Kenji 2, Nomura Masaharu 1 |
| | 16 | Determination of Complex Wavefunction using Coherent X-ray Microscopy | RIKEN1,JASRI2 *Yoshiki Kohmura1,Tatsuyuki Sakurai1,Takuji Ohigashi2,Tetsuya Ishikawa1 |
| | 17 | Spherical-wave X-ray Talbot Interferometer and Phase Imaging with Microfocus X-ray Generator | Graduate School of Frontier Sciences, The Univ. Tokyo 1,Graduate School of Pure and Applied Sciences, Univ. Tsukuba 2,Faculty of Engineering, The Univ. Tokyo 3, LASTI, Univ. Hyogo 4 *Atsushi Momose 1, Masafumi Moritake 1, Keshu Wan 1, Wataru Yashiro 1, Yoshihiro Takeda 2, Marie Uno 3, Makoto Tanaka 4, Daiji Noda 4, Tadashi Hattori 4 |
| | 18 | Phase Contrast X-ray Imaging Microscopy with X-ray Talbot Interferometer |
Graduate School of Pure and Applied Sciences, Univ.
of Tsukuba 1,The School of Engineering, The Univ. of Tokyo 2, SPring-8 3,
LASTI, Univ. of Hyogo 4, Graduate School of Frontier Sciences, The Univ.
of Tokyo 5 *Takeda Yoshihiro 1,Sawano Masakazu 2,Yoshio Suzuki 3,Takeuchi
Akihisa 3,Hattori Tadashi 4, Momose Atsushi 5 |
| | 19 | Feasibility study of 3D elemental analysis by x-ray fluorescence laminography with a scanning x-ray microscope | Univ. Tsukuba 1, JASRI/SPring-8 2 *Watanabe Norio 1, Hoshino Masato 1, U Reiken 1, Aoki Sadao 1, Takeuchi Akihisa 2, Suzuki Yoshio 2 |
| | 20 | Structural Information Obtained from Positions of First Minimum and First Peak in X-ray Scattering Curve(I) | Nagoya Inst. Tech. 1 *Ota Takehira 1,Nakai Satoshi 1,Kawaguchi Takeshi 1 |
| | 21 | Structural Information Obtained fromPositions of First Minimum and First Peak in X-ray Scattering Curve(II) | Nagoya Inst. Tech. 1 *Ota Takehira 1,Nakai Satoshi 1,Kawaguchi Takeshi 1 |
| 7.1 X-ray Technologies |
| March 28 |
| 28p-A- / II |
| |
|
Short Presentation (5min.) 13:00〜14:35
28p-A-1〜19 Poster Session 15:30〜17:30 |
| | 1 | The Characteristic of EUV and Ion emission from Laser Plasma Lithium Target |
Univ. of Hyogo, LASTI 1, Grad. School of Eng. 2 *Nagano
Akihisa 1,Okino Hideyasu 1,Kataoka Kazuyuki 1,Masuda Kazuya 1,Amano Sho
1,Miyamoto Shuji 1,Sekioka Tsuguhisa 2,Takayasu Mochizuki 1 |
| | 2 | Measurement of Particles Emitted from Laser Plasma EUV Source IV |
Univ. of Hyogo, Grad. School of Eng. 1, Univ. of
Hyogo, LASTI 2, Univ. of Hyogo, Faculty of Eng. 3 *Sekioka Tsuguhisa 1,
Amano Sho 2, Miyamoto Shuji 2, Nobuyuki Ohtani 1, Takashi Kondo 3, Atsushi
Morimoto 3, Nagano Akihisa 2, Okino Hideyasu 2, Kataoka Kazuyuki 2, Masuda
Kazuya 2, Mochizuki Takayasu 2 |
| | 3 | Debris from laser-produced plasma in solid Xe and Li targets | University of Hyogo, LASTI 1, Grad.School of Eng. 2 K.Kataoka, K.Masuda, A.Nagano, H.Okino, S.Amano, T.Sekioka, S.Miyamoto and T.Mochizuki |
| | 4 | Study on LPP EUV Light Sources using YAG Laser and Xenon Targets | Inst. Laser Technol. * Furukawa Hiroyuki |
| | 5 | Effect of accuracy of the transition wavelengths to the emissivity and opacity of Sn plasmas | JAEA 1, ILE Osaka Univ 2, ILT 3, Okayama Univ 4, Kitazato Univ 5, Nara Women's Univ 6, Tokyo Metropolitan Univ 7 Sasaki Akira 1, Nishihara Katsunobu 2, Sunahara Atsushi 3, Nishikawa Takeshi 4, Koike Fumihiro 5, Kagawa Takashi 6, Tanuma Hajime 7 |
| △ | 6 | Improvement of EUV conversion efficiency with CO2 laser and double pulses | Osaka Univ. 1,ILE 2,ILT 3 *Ueda Hirofumi 1 2,Nishihara Katsunobu 2,Sunahara Atsushi 3 |
| △ | 7 | Expansion of laser produced plasma in magnetic field | ILE Osaka Univ. 1 *Masanori Nunami 1, Akira Takata 1, Katsunobu Nishihara 1 |
| | 8 | Two-dimensional Radiation Hydrodynamic Simulation on Extreme Ultra-Violet Emission from Laser-produced Tin Droplet target |
Inst. for Laser Technology 1, Inst. of Laser Engineering,
Osaka Univ. 2, Advanced Photon Research center JAEA 3 *A. Sunahara 1, K.
Nishihara 2, A. Sasaki 3, H. Ueda 2, T. Aota 2, M. Yamaura 1, S. Fujioka
2, Y. Shimada 1, H. Nishimura 2, N. Miyanaga 2, Y. Izawa 2, and K. Mima
2 |
| | 9 | Developments of droplet target for EUV light source (IV) | Univ. of Hyogo 1, ILE Osaka Univ. 2 *Fujiwara Etsuo 1, Sugishita Hiroki 1, Kon Ryou 1, Tatsumi Shinichi 1, Azuma Kingo 1, Nishimura Hiroaki 2, Yatsuzuka Mitsuyasu 1 |
| | 10 | Study of Sn droplet target EUV source | ILE Osaka univ. 1, Univ. Hyogo 2 *Tatsuya Aota 1, Yuki Nakai 1, Shinsuke Fujioka 1, Etsuo Fujiwara 2, Yuki Sugishita 2, Tsuyoshi Ando 1, Masashi Simomura 1, Hiroaki Nishimura 1, Katsunobu Nishihara 1, Noriaki Miyanaga 1, Yasukazu Izaw 1, Kunioki Mima 1 |
| | 11 | High power laser produced plasma EUV light source for lithography | Hiratsuka R&D Center EUVA H. Komori, T. Yabu, T. Asayama, Y. Ueno, T. Suganuma, H. Hoshino, H. Someya, M. Nakano, M. Moriya, T. Ariga, T. Abe, G. Soumagne, A. Endo, A. Sumitani, H. Mizoguchi |
| | 12 | Debris Evaluation of CO2 Laser Produced Tin Plasma for EUV Light Source | Hiratsuka R&D Center EUVA 1 *Ueno Yoshifumi 1, George Soumagne 1, Akira Endo 1, Akira Sumitani 1 |
| | 13 | Extreme Ultraviolet Light and Debris Generated from CO2 Laser Produced Tin Plasmas | Inst. Laser Eng., Osaka Univ. 1, Hiratsuka R&D Center, EUVA 2, Inst. Laser Tech. 3 Fujioka Shinsuke 1, Shimomura Masashi 1, Ueno Yoshifumi 2, Soumagne Georg 2, Komori Hiroshi 2, Shimitani Akira 2, Sunahara Atsushi 3, Yasuda Yuzuri 1, Nagai Keiji 1, Norimatsu Takayoshi 1, Nishimura Hiroaki 1, Nishihara Katsunobu 1, Miyanaga Noriaki 1, Izawa Yasukazu 1, Mima Kunioki 1, |
| △ | 14 | LIF image of neutral debris generated from minimum mass targets |
ILE Osaka Univ. 1 *Shimomura Masashi 1,Fujioka
Shinsuke 1,Ando Tsuyoshi 1,Sakaguchi Hirokazu 1, Yasuda Yuduri 1,Nishimura
Hiroaki 1,Nagai Keiji 1,Norimatsu Takayoshi 1,Nishihara Katsunobu 1,Miyanaga
Noriaki 1,Izawa Yasukazu 1,Mima Kunioki 1 |
| △ | 15 | Out-of-band radiation from laser-produced tin plasma of EUV light source |
ILE Osaka Univ. 1, Graduate School of Engineering
Hiroshima Univ. 2,ILT 3 *Sakaguchi Hirokazu 1, Fujioka Shinsuke 1, Namba
Shinichi 2, Nishimura Hiroaki 1, Norimatsu Takayoshi 1, Sunahara Atsushi
3, Nishihara Katsunobu 1, Miyanaga Noriaki 1, Izawa Yasukazu 1, Mima Kunioki
1 |
| | 16 | Development of EUV light source with punch-out target |
Kinki Univ. 1,ILE Osaka Univ. 2,ILT 3 *Maeda Shinsuke
1,Biro Tomoya 2,Ando Tsuyoshi 2,Shimada Yoshinori 3,Yamaura Michiteru 3,Hashimoto
Kazuhisa 2,Fujioka Shinsuke 2, Furukawa Hiroyuki 3,Sunahara Atsushi 3,Yasuda
Yuzuri 2,Nagai Keiji 2, Norimatu Takayoshi 2,Nishimura Hiroaki 2,Nishihara
Katsunobu 2, Miyanaga Noriaki 2,Izawa Yasukazu 2,Mima Kunioki 2,Nakahara
Mikio 1, Kawashima Nobuki 1 |
| | 17 | EUV emission from a laser-produced plasma by use of a colloidal microjet target containing tin dioxide nanoparticles | Univ. of Miyazaki 1, Utsunomiya Univ. 2 Yusuke Senba 1, Sumihiro Suetake 1, Yusuke Sato 1, Takeshi Higashiguchi 2, and Shoichi Kubodera 1 |
| | 18 | The Triggering Effect on Discharge of Laser-Produced Plasma with Tin Target | Dept. Health Sci. Kyushu Univ. 1、ISEE Kyushu Univ. 2 *Takahashi Akihiko 1,Hashimoto Yuuki 2,Tamaru Kouji 2, Nakamura Daisuke 2,Okada Tatsuo 2 |
| | 19 | Studies of the removal of a tin thin film by hydrogen / argon plasma | Univ. of Hyogo 1 *Nakashima Noriyuki 1, Azuma Kingo 1, Hujiwara Etsuo 1, Yatsuzuka Mitsuyasu 1 |
| 7.2 Electron Microscopy and Diagnostics |
| March 30 9:00〜14:45 |
| 30a-SH- / II |
| | 1 | Magnification Calibration for Scanning Transmission Electron Microscope Based on Phase-Only Correlation Method. | Central Research Laboratory, Hitachi, Ltd. 1、Graduate School of Information Sciences, Tohoku Univ. 2 *Tsuneta Ruriko1, Koguchi Masanari1, Nagashima Sei2, Aoki Takafumi2 |
| | 2 | Crystal structure study of “core-shell” structure in BaTiO3 using TEM-CBED method | Taiyo Yuden Co., Ltd. 1 Keisuke Kobayashi 1,Hirokazu Chazono 1 |
| △ | 3 | Amplitude contrast of a single gadolinium atom | Graduate School of Eng. Osaka Univ. *T. Tsuji, H. Chikada, M. Taya, Y. Takai |
| | 4 | Development of computer-assisted minimal dose system for transmission electron microscopy | Osaka Univ 1 Misa Hayashida 1, Yoshihide Kimura 1, Yoshizo Takai 1 |
| △ | 5 | Restoration of Phase and Amplitude Component Using Active Hollow Cone Illumination in Transmission Electron Microscopy | Graduate School of Eng. Osaka Univ. 1,Osaka Electro-Communication Univ. 2 *Yoshimori Hiromasa 1,Taya Masaki 1,Ikuta Takashi 2,Takai Yoshizo 1 |
| | 6 | Development of Annular Aperture for Electron Optics by Focused Ion-beam Technique | Osaka Electro-Communication Univ., Osaka Univ., Nagoya Univ., Osaka Industrial Promotion Organization, Osaka Sangyo Univ. *Matsutani Takaomi 1,Ikuta Takashi 1,Taya Masaki 2,Takai Yoshizou 2,Kawasaki Tadahiro 3,Ichihashi Mikio 3,Shimizu Ippei 4,Fujiwara Makoto 5,Tanaka Takeo 5, |
| | | Break 10:30〜10:45 | |
| △ | 7 | Development of environmental-cell TEM system for atomic level in-situ observation of nano particle catalysts (III) | Nagoya Univ. 1, and Ecotopia Sci. Inst. Nagoya Univ. 2 Kouta Ueda 1, Kawasaki Tadahiro 1, Hideyuki Tanaka 1, and Mikio Ichihashi 2 |
| | 8 | Development of environmental-cell TEM system for atomic level in-situ observation of nano particle catalysts (IV) | Nagoya Univ. 1, Ecotopia Sci. Inst. Nagoya Univ. 2 *Tadahiro Kawasaki 1, Kouta Ueda 1, Hideyuki Tanaka 1, Mikio Ichihashi 2 |
| | 9 | Development of confocal scanning transmission electron microscope –I. Development of scanning sample stage- | NIMS 1, Saitama Inst.Tech. 2 Takeguchi Masaki 1, Shimojo Masayuki 2, Takahashi Atsushi 2, Mitsuishi Kazutaka 1, Furuya Kazuo 1 |
| | 10 | Bethe method based confocal scanning transmission electron microscope image calculation | NIMS 1, Saitama Inst. Tech. 2 *Kazutaka Mitsuishi 1, Masaki Takeguchi 1,Masayuki Shimojo 1,2, Atsushi Takahashi 2, Kazuo Furuya 1 |
| | 11 | Development of the aberration-free phase image reconstruction system in STEM using parallel detector array II | Grad.Schl.of Eng. Osaka Univ. 1, Osaka Electro-commu. Univ. 2, APCO Ltd. 3, Osaka Sangyo Univ. 4 *Taya Masaki 1, Matsutani Takaomi 2, Ikuta Takashi 2, Saito Hidekazu 3, Ogai Keiko 3, Harada Yoshihito 3, Tanaka Takeo 4, Takai Yoshizo 1 |
| | | Lunch 12:00〜13:00 | |
| 30p-SH- / II |
| △ | 1 | Self-standing ultra-thin SiN membrane film formation on Si(100) wafer | Graduate school of information Science and Technology Hokkaido Univ. 1 *Sasakawa Yoshiaki 1,Murakami Akira 1,Hamada Koichi 1,Arita Masashi 1, Takahashi Yasuo 1 |
| | 2 | Development of High Brightness Spin Polarized Electron Gun with High Polarization | Osaka Electro-Commun. Univ. 1, EOS Tsuno 2, Nagoya Univ. 3 *Yasue Tsuneo 1, Tsuno Katsushige 1 2, Nakanishi Tsutomu 3, Koshikawa Takanori 1 |
| | 3 | Electrical Characterization of GaN/Si by High-Voltage STEM-EBIC | Nagoya Univ.Dept. Electronics 1. Nagoya Univ.Ecotopia 2 Aoyama Kentaro 1. Tanaka Shigeyasu 2. Ichihashi Mikio 2. Honda Yoshio 1. Sawaki Nobuhiko 1 |
| | 4 | Simulation of charging-up of insulating materials under electron beam irradiation | Osaka Institute of Technology, Nanomaterials Microdevices Research Center 1 *Maekawa Takeshi 1, Kotera Masatoshi 1 |
| | 5 | Manufacturing of ultra sharp Tungsten probe with the use of MWNT and its characteristics | CREST JST 1, Univ. of Tsukuba 2, NEC 3, Univ. of Hyogo 4 Ikeda Yuta 1,2, Nakazawa Shotaro 1,2, Higashi Kodai 1,2, Ishida Masahiko 1,3 Shinji Matsui 1,4, Fujita Jun-ichi 1,2 |
| | 6 | Internal state analysis of sputtered atoms | Kogakuin Univ 1,Nippon Steel Corp 2,Tokyo Inst Tech 3 *Koizumi Masaomi 1,Kawasaki jyunji 1,Sakamoto tetsuo 1,Hayashi Shunichi 2,Ishiuchi Shunichi 3,Hujii Masaaki 3 |
| | 7 | Sub-micron resolution mapping with EUV excited photoelectron system EUPS4 for analyzing 4 inch wafer surfaces | AIST-ASRC Kasai Takeshi, Iwazumi Hiromi, Tomie Toshihisa |
| 7.3 Lithography |
| March 29 10:00〜18:00 |
| 29a-SH- / II |
| | 1 | Imaging measurement and countermeasure of debris from laser-produced tin plasma for sources of EUV light |
Graduate School of I.S.E.E, Kyushu Univ. 1,Graduate
School of Medicine, Kyushu Univ. 2 Koji Tamaru 1,Yuki Hashimoto 1,Daisuke
Nakamura 1,Akihiko Takahashi2,Tatsuo Okada 1 |
| | 2 | Evaluation and Selection of EUVL-Grade TiO2-SiO2 Ultra-Low-Expansion Glasses Using the Line-Focus-Beam Ultrasonic Material Characterization System | Grad. Sch. Eng., Tohoku Univ. 1, Faculty of Eng., Tohoku Univ. 2 Ohashi Yuji 1, Arakawa Mototaka 1, Kushibiki Jun-ichi 1, Suzuki Kouji 1, Sannohe Sho 2 |
| | 3 | EUV mirrors prepared using a magnetron sputtering device with a superconducting bulk magnet | JST Plaza Tokai 1,Nagoya Univ. 2,IMRA Material R&D Co.,Ltd. 3,Niigata Univ. 4,Nikon Corp. 5,Toyota Riken 6 *Yamaguchi Takashi 1,Ikuta Hiroshi 2,Yanagi Yousuke 3,Itoh Yoshitaka 3,Oka Tetsuo 4,Tomofuji Tetsuya 5,Mizutani Uichiro 6 |
| | 4 | Long term resistance characteristics for inhibition of contamination by introducing ethanol for multilayer mirrors of EUVL projection optics | LASTI, Univ. of Hyogo 1, Canon Inc. 2, EUVA 3 *Kakutani Yukinobu 1, Koida Keigo 1, Niibe Masahito 1, Gomei Yoshio 2, Takase Hiromitsu 3, Terashima Shigeru 3, Matsunari Shuichi 3, Aoki Takashi 3, Murakami Katsuhiko 3, Fukuda Yasuaki 3 |
| | 5 | Oxygen-contamination Cleaning for EUVL by Atomic Hydrogen Generated by Hot Wire (IV) | ASET EUV Process Tech. Res. Lab. 1, Kyusyu Inst. of Tech. (KIT) 2, *Motai Kumi 1, Oizumi Hiroaki 1,2, Nishiyama Iwao 1, Miyazaki Yasuo 2, Izumi Akira 2, |
| | 6 | Estimation of Contamination Using In-situ Ellipsometer | Univ.of Hyogo1,Samsung Electronics2 Kishimoto Junki1,Lee Dong-Gun2,Kinoshita Hiroo1 |
| | | Break 11:30〜11:45 | |
| | 7 | Observation of programmed phase defects using an EUV microscope | Hyougo Univ 1,Asahi Glass Inst 2 *Yoshizumi Takahiro 1,Sugiyama Takashi 2,Watanabe Takeo 1,Kinoshita Hiroo 1 |
| | 8 | EUV exposure experiments using programmed multilayer defect mask | ASET EUV Process Lab. 1, HOYA 2 Tezuka Yoshihiro 1, Cullins Jerry 1, Tanaka Yuusuke 1, Hashimoto Takeo 1, Nishiyama Iwao 1, Shoki Tsutomu 2 |
| | 9 | A study for improving the performance of PHS based EUV resist |
ASET 1, JSR 2 *Kikuchi Yukiko 1, Kumise Taka-aki
1, Nishiyama Iwao 1, Shimizu Daisuke 2,Kai Toshiyuki 2, Shimokawa Tsutomu
2 |
| | 10 | Design of Negative-Tone Molecular Resist for EUV and EB Lithography | Hitachi CRL. 1, TOK 2, ASET 3 *Kojima Kyoko 1, Shiono Daiju 2, Hada Hideo 2, Onodera Junichi 2, Oizumi Hiroaki 3, Nishiyama Iwao 3 |
| | 11 | Estimation of the diffusion lengths of both acid and quencher in a chemically-amplified resist on the basis of EUV exposure results | ASET EUV Process Technology Research Lab. 1 *Tanaka Yuusuke 1, Kikuchi Yukiko 1, Goo DooHoon 1, Oizumi Hiroaki 1, Nishiyama Iwao 1 |
| | | Lunch 13:00〜14:00 | |
| 29p-SH- / II |
| | 1 | Measurement of EUV Resist outgassing (I) -Outgassing evaluation apparatus- | ASET EUV 1, KIT 2 *Oizumi Hiroaki 1,2, Nishiyama Iwao 1 |
| | 2 | Measurement of EUV Resist outgassing (II) Data Analysis and International Round-Robin | ASET *I. Nishiyama, H. Oizumi |
| | 3 | Development of an EUV Resist Outgas Evaluation System | MIRAI-Selete, Inc. SANTILLAN JULIUSJOSEPH 1, ITANI TOSHIRO 1 |
| | 4 | Outgassing Reduction of EUV Resists Using Topcoating | Selete 1, Univ. of Hyogo 2 Kobayashi Shinji 1, Watanabe Takeo 2, Fukushima Yasuyuki 2, Kinoshita Hiroo 2, Toriumi Minoru 1, Itani Toshiro 1 |
| | 5 | Single Component Positive-tone Chemically Amplified Resist utilizing Dehalogenation |
ISIR Osaka Univ. 1, Tokyo Ohka Kogyo Co., Ltd.
2 Yamamoto Hiroki 1, Kozawa Takahiro 1, Tagawa Seiichi 1,Yukawa Hiroto 2,
Ohmori Katsumi 2, Sato Mitsuru 2, Komano Hiroji 2 |
| △ | 6 | Dynamics of Chemical Species in Chemically Amplified Resists for Post-optical Lithography | Osaka Univ. 1, Intel 2 *Saeki Akinori 1, Kozawa Takahiro 1, Tagawa Seiichi 1, Cao Heidi B 2 |
| | 7 | Effect of Temperature for Photoresist Critical Dimension during Puddle Development |
Shibaura Institute of Technology 1, Corporate Manufacturing
Engineering Center TOSHIBA Corp. 2, Semiconductor Company TOSHIBA Corp.
3 *Hideo Eto 1,2, Yasuhiro Ito 3, Tetsuya Homma 1 |
| | | Break 15:45〜16:00 | |
| | 8 | Study of high power and high repetition rate ArF excimer laser for lithography light source | Ushio Inc. 1, Komatsu Ltd. 2, Gigaphoton Inc. 3 *Kouji Kakizaki 1, Takanobu Ishihara 2, Tsukasa Hori 2, Youichi Sasaki 1, Hitoshi Nagano 1, Yasufumi Kawasuji 2, Hiroshi Umeda 2, Hakaru Mizoguchi 3 |
| | 9 | Focus & Dose Measurement Control using advanced CD-SEM | Canon 1,Hitachi High-Tech.2 ○H. Ina 1, K. Sentoku 1, K Watanabe 2, S. Yoneda 2 |
| △ | 10 | Optimization Method of Measurement Conditions on CD-SEM Using Taguchi Method | Central Research Lab., Hitachi, Ltd. 1,Hitachi High-Technologies corporation 2 *Hitomi keiichiro 1,Nakayama Yoshinori 1,Yamanashi Hiromasa 1,Sohda Yasunari 1, Kawada Hiroki 2 |
| | 11 | Analysis of a temperature rise of resist by electron beam irradiation (3) | Osaka Institute of Technology, Nanomaterials Microdevices Research Center 1 *Tanaka Hiroyuki 1,Kotera Masatoshi 1 |
| | 12 | Alignment control of vertical cylinder domains of diblock copolymer | NTT Basic Research Labs. 1,Univ. of Tokyo 2,NTT-AT 3 *Edamoto Masato 1,2,Yamaguchi Toru 1,Inokuma Kazuhito 3,Hayashi Junzo 1,Warisawa Shin'ichi 2,Yamaguchi Hiroshi 1,Ishihara Sunao 2 |
| | 13 | Pattern transferablity of aligned lamellar-domains of diblock copolymers | NTT Basic Research Labs. 1, NTT-AT 2 *Yamaguchi Toru 1, Inokuma Kazuhito 2, Hayashi Junzo 1, Yamaguchi Hiroshi 1 |
| | 14 | Fabrication of 3-D Structures on Silicon by Proton Beam Writing | Shibaura Inst. of Tech. 1, Takasaki Advanced Radiation Research Inst., JAEA 2 *Furuta Yusuke 1, Uchiya Naoyuki 1, Nishikawa Hiroyuki 1, Haga Junji 2, Oikawa Masakazu 2, Satoh Takahiro 2, Ishii Yasuyuki 2, Kamiya Tomihiro 2 |
| | 15 | Fabrication of the nanopattern on glass using thermal lithography method with organic resists | Pulstec Ind.1 ,Tokyo Ohka Kogyo Co.,Ltd. 2 *Takashi Morisaki 1, Hirofumi Ikeya 1, Sanae Furuya 2, Tsuyoshi Matsuyama 1, Masahiko Ujiie 1, Hideo Hada 2 |
| 7.4 Nanoimprint |
| March 27 10:00〜17:30 |
| 27a-SL- / II |
| | 1 | Strength Analysis of Si Mold for Nanoimprint Lithography with Molecular Dynamics (IV) | Osaka Pref. Univ. 1 *Horimoto shuuhei 1, Tada Kazuhiro 1, Yasuda Masaaki 1, Kimoto Yoshihisa 1, Kawata Hiroaki 1, Hirai Yoshihiko 1 |
| | 2 | Nano imprint by a mold of 10-nm-diameter dot arrays using electron beam writing and RIE | Gunma Univ 1 *Shirai Masumi 1, Sano Hirotaka 1, Sone Hayato 1, Hosaka Sumio 1 |
| | 3 | Reproduction of Anti-reflection Structure by Nano Casting Method using Fluorine Polymer |
Osaka Pref. Univ. Sogo Kenji 1, Nakajima Masaki
1, Kawata Hiroaki 1, Hirai Yoshihiko 1 |
| | 4 | Relation between Sidewall Roughness of Mold and Demolding Charasteristics in Imprint Lithography | Osaka Prefecture Univ. 1 Junya Ishihara 1,Masayo Kayama 1,Hiroaki Kawata 1,Masaaki Yasuda 1,Hirai Yoshihiko 1 |
| | 5 | Repair of UV-Nanoimprint mold using Focused-Ion-Beam etching and deposition | Hyougo Univ. 1,CREST JST 2,JSPS 3 *Okada Makoto 1,2,Igaki Jun-ya 1,2,Nakamatsu Ken-ichiro 1,2,3,Kometani Reo 1,2,3,kanda Kazuhiro 1,2,Haruyama Yuichi 1,2,Matsui Shinji 1,2 |
| | 6 | Evaluation of fluorinated diamond-like carbon coating as an anti-sticking layer onto a nanoimprint mold | Univ of Hyogo 1 *Yamada Noriko 1, Nakamatsu Ken-ichirou 1, Kanda Kazuhiro 1, Haruyama Yuichi 1, Matsui Shinji 1 |
| | | Break 11:30〜11:45 | |
| | 7 | Deformation analysis of rotational lens structure in thermal imprint. | Osaka Pref. Univ. 1, Univ. Wuppertal 2, Hirai Yoshihiko 1, Masayoshi Nishihata 1, Hella Scheer 2 |
| | 8 | Effect of Assistance of Ultrasonic Vibration in Thermal Nanoimprint Lithography | AIST 1 *Mekaru Harutaka 1, Noguchi Toshihiko 1, Goto Hiroshi 1, Takahashi Masaharu 1 |
| | 9 | Simulation study of thermal nanoimprint for time evolution, cooling and de-molding processes |
Mizuho Info. Res. Inst. 1, Osaka Pref. Univ. 2 *Yuki
ONISHI 1, Takuya IWASAKI 1, Yasuroh IRIYE 1, Masayoshi NISHIHATA 2, Yoshihiko
HIRAI 2 |
| | 10 | Experimental study of thermal nanoimprint for time evolution of the resist deformation |
Osaka Pref. Univ. 2, Mizuho Info. Res. Inst. 1 Tanabe
Toshiaki 1, Nishihata Masayoshi 1, Onishi Yuki 2, Kawata Hiroaki 1, Hirai
Yoshihiko 1 |
| △ | 11 | Micro-nano fabrication by thermal-UV hybrid nanoimprint | Graduate School of Eng., Osaka Pref. Univ. 1 *Okuda Keisuke 1,Kawata Hiroaki 1,Seki Minoru 1,Hirai Yoshihiko 1 |
| | | Lunch 13:00〜14:00 | |
| 27p-SL- / II |
| | 1 | Investigation on High Throughput Sheet Nanoimprint Technology | Materials Research Laboratory, Hitachi Ltd. 1 *Hasegawa Mitsuru 1, Ogino Masahiko 1, Oohashi Ken-ya 1, Miyauchi Akihiro 1 |
| | 2 | Fabrication of Ordered Polymer Nanopatterns by Nanoimprinting Using Highly Ordered Anodic Porous Alumina | KAST, Tokyo Metropolitan Univ. *Yanagishita Takashi 1, Kumagai Naoko 2, Nishio Kazuyuki 1,2, Masuda Hideki 1,2 |
| | 3 | Reversal nanoimprint lithography towards 3D glass structures | RIKEN 1, Tokyo Inst. of Tech. 2 Okinaka Motoki 1, Tanaka Kenichiro 1, Tsukagoshi Kazuhito 1, and Aoyagi Yoshinobu 2,1 |
| | 4 | Nano transfer printing of Au thin films on the processed surfaces | Osaka Univ. 1, Univ. of Hyogo 2 *Toshio Kawahara 1, Tomoji Kawai 1, Kenichiro Nakamatsu 2, Shinji Matsui 2 |
| | 5 | Room-Tempearture Nanoimprinting Using Organic Spin-on-Glass | Univ. of Hyogo 1, JSPS 2, Tokyo Ohka Kogyo 3 Nakamatsu Ken-ichiro 1,2, Ishikawa Kiyoshi 3, Taneichi Noriaki 3, Matsui Shinji 1 |
| △ | 6 | Room-Tempearture Nanoimprinting Using Ladder Hydrogen Silsesquioxane (HSQ) | Univ. of Hyogo 1, JSPS 2, Tokyo Ohka Kogyo 3 Nakamatsu Ken-ichiro 1,2, Ishikawa Kiyoshi 3, Taneichi Noriaki 3, Matsui Shinji 1 |
| | | Break 15:30〜15:45 | |
| | 7 | UV curable compounds for nanoimprint lithography | Daicel Chemical Industries 1,Univ. of Hyogo 2 *Miyake Hiroto 1,Nakamatsu Ken-ichiro 2,Matsui Shinji 2 |
| | 8 | UV curable compounds for nanoimprint lithography with radical and cation curing systems | Daicel Chemical Industries 1,Univ. of Hyogo 2 *Miyake Hiroto 1,Nakamatsu Ken-ichiro 2,Matsui Shinji 2 |
| △ | 9 | Analysis on Degradation Mechanism of Release Layer in Nanoimprint Process | Hitachi Ltd. Yasuhiko Tada 1,Hiroshi Yoshida 1, Akihiro Miyauchi 1 |
| | 10 | Evaluation of an anti-sticking layer on UV-NIL templates by scanning probe microscopy |
Dai Nippon Printing Co., Ltd. 1,Tokyo Inst. of
Tech. 2 *Yoshida Kouji 1, Shimomura Takeya 1, Shimada Shu 1, Kurihara Masaaki
1, Mohri Hiroshi 1, Hayashi Naoya 1, Akiyama Miki 2, Kobayashi Takehiro
2, Fujihira Masamichi 2 |
| | 11 | Control of bubble defects in UV-nanoimprint at ambient atmospheric pressure using condensable gas | National Institute of Advanced Industrial Science and Technology *Hiroshima Hiroshi 1 |
| △ | 12 | Evaluation of Residual Layer by Nanoimprint Using Liquid Phase Hydrogen Silsesquioxane | University of Hyogo 1, JSPS 2 Minari Chiaki 1, Nakamatsu Ken-ichiro 1,2, Kometani Reo 1,2, Kanda Kazuhiro 1, Haruyama Yu-ichi 1, Matsui Shinji 1 |
| | 13 | Cancer inspection using fine structures fabricated by nanoimprint lithography | JST Innovation Plaza Osaka 1, Graduate School of Eng., Osaka Pref. Univ. 2, Graduate School of Life and Environmental Sci., Osaka Pref. Univ. 3 Niimi Naoyuki 1, Okuda Keisuke 2, Tsukamoto Yasuhiro 3, Kawata Hiroaki 2, Yao Toshio 2, Seki Minoru 2, Hirai Yoshihiko 2 |
| 7.5 Beam Excitation Surface Reaction |
| March 29 14:00〜18:30 |
| 29p-SA- / II |
| | 1 | Development of Ultra Small Shock Tube for High Energy Molecular Beam Source | Tokyo Univ. 1 *Nagata Shuhei 1,Miyoshi Nobuya 1,Shiozaki Seiji 1,Kinefuchi Ikuya 1,Sakiyama Yukinori 1, Takagi Shu 1, Matsumoto Yoichiro 1 |
| △ | 2 | Reaction analysis of supersonic CH4 molecules on defect-induced Pt(111) | Univ. of Tsukuba 1 *Ryuta Okada 1,Tsuyoshi Hori 1,Taiki Harimoto 1, Yuta Yokoyama 1,Masahiro Sasaki 1 |
| | 3 | Direct fluorination and metallization of polyimide using hyperthermal fluorine beam (1) | Kobe Univ. 1, Konan Univ.2 Yokota Kumiko 1, Maeda Ken-ichi 1, Tagawa Masahito 1, Akamatsu Kensuke 2, Nawafune Hidemi 2 |
| | 4 | Effects of translational energy on surface direct oxidation reaction of silicon with hyperthermal atomic oxygen | Kobe Univ. 1, JAEA 2 Tagawa Masahito 1, Sogo Chie 1, Yokota Kumiko 1, Yoshigoe Akitaka 2, Teraoka Yuden 2 |
| | 5 | Real-time SR-XPS observation on the initial rapid oxidation of Si(110)-16×2 | Tohoku Univ. 1,Japan Atomic Energy Agency 2 *Yamamoto Yoshihisa 1,Togashi Hideaki 1,Konno Atsushi 1,Kato Atsushi 1,Suemitsu Maki 1,Teraoka Yuden 2,Yoshigoe Akitaka 2 |
| | 6 | Photo-induced desorption with hard X-ray due to the surface excitation at CBr4 on Ge surface | Yokohama Nat’l Univ. 1, Riken/SPring-8 2 Photo-induced desorption with hard X-ray due to the surface excitation at CBr4 on Ge surface |
| | 7 | Formation of a-Si:H films fabricating by combining electron-beam-induced deposition and low-temperature H tunneling reaction. | Univ. of Yamanashi 1, Miyatsu Co.,Ltd. 2 Tetsuya Sato 1, Kazuaki Kobayashi 1, Yuuich Imamura 1, Kiyokazu Nakagawa 1, Shyouji Sato 2 |
| | 8 | HR-RBS analysis of silicon altered layers formed by sputtering with the metal-cluster-complex ions of Ir4(CO)7+ | AIST 1,Toshiba 2 *Fujiwara Yukio 1, Kondou Kouji 1, Watanabe Kouji 1, Nonaka Hidehiko 1, Saito Naoki 1, Fujimoto Toshiyuki 1, Kurokawa Akira 1, Ichimura Shingo 1, Tomita Mitsuhiro 2 |
| | 9 | Formation of carbon materials by atomic layer deposition technique with atmospheric plasma system (II) | RIKEN 1, Hosei Univ. 2 *Tsuji Naoki 2, Saito Syota 2, Yamamoto Yashuhiro 2, Mise Takaya 1, Watanabe Kowashi 1, Meguro Takashi 1 |
| | | Break 16:15〜16:30 | |
| | 10 | Local structure analysis on the FIB-CVD DLC thin film using Ga K-edge XAFS | Univ. of Hyogo 1,CREST JST 2,JSPS 3 *Saikubo Akihiko 1,2,Igaki Jun-ya 1,2,Kometani Reo 1,2,3,Kanda Kazuhiro 1,2,Matsui Shinji 1,2 |
| | 11 | Elastic double structure realized in FIB-CVD amorphous carbon pillar | CREST JST1, Univ. of Tsukuba2, NEC3, SII-NT4, Univ. of Hyogo5, *J. Fujita12, S. Okada12, R. Ueki12, M. Ishida13, T. Kaito4, S. Matsui15 |
| | 12 | Evaluation of the bio nano-sensing probe fabricated by FIB-CVD | University of Hyogo 1, JSPS 2, CREST JST 3, SII NanoTechnology Inc. 4 Kometani Reo 1,2,3, Koike Hiroyuki 1,3, Kanda Kazuhiro 1,3, Haruyama Yuichi 1,3, Kaito Takashi4, Matsui Shinji 1,3 |
| | 13 | Mechanical Property Evaluation of Nanospring Using Scanning Electron Microscopy with Micromanipulator | Univ. of Hyogo 1, CREST JST 2, JSPS 3, SII NanoTechnology 4 Nakamatsu Ken-ichiro 1,2,3, Kanda Kazuhiro 1, Haruyama Yuichi 1, Kaito Takashi 4, Matsui Shinji 1,2 |
| | 14 | Thermal-excited Mechanical Vibration of Carbon Nano-Pillar Fabricated by FIB-CVD | NTT Basic Research Labs. 1,Univ. of Tokyo 2 *Tamaru Kojiro 1,2,Nonaka Keiichiro 1,2,Nagase Masao 1,Yamaguchi Hiroshi 1,Warisawa Shin'ichi 2,Sunao Ishihara 2 |
| ▲ | 15 | Metallic Atomic Wires and Nanowires on Si : Phase Transitions and beyond | Yonsei Univ. 1 *Yeom Han Woong 1 |
| 7.6 Ion Beam Technology |
| March 28 9:00〜18:30 |
| 28a-ZV- / II |
| | 1 | Development of electron-spin-polarized 4He+ ion source (III) | NIMS 1,JST-PRESTO 2 *Suzuki Taku 1,2,Yamauchi Yasushi 1 |
| | 2 | Development of extremely low energy ion beam apparatus for space charge compensation experiments | JST 1, Kyoto Univ. 2 *Takeuchi Mitsuaki 1, Gotoh Yasuhito 2, Tuji Hiroshi 2, Ishikawa Junzo 2 |
| | 3 | Characteristics and Mechanism of Thermal Ion Emission from Negative Ion Source Using Solid Ionic Conductors |
Tohoku Univ. IMRAM 1. Takaaki Sakai1, Yukio Fujiwara1,
Kazuhisa Sato1, Keiji Yashiro1, Tatsuya Kawada1, Junichiro Mizusaki1 |
| | 4 | Enhanced annealing of implantation-induced damage in Si under neutron irradiation | AIST 1, Kyoto Univ. 2, Wakasa Wan Energy Research Center 3 A. Kinomura 1, A. Chayahara 1, Y. Mokuno 1, N. Tsubouchi 1, Y. Horino 1, T. Yoshiie 2, Y. Hayashi 2, Q. Xu 2, Y. Ito 3, R. Ishigami 3, K. Yasuda 3 |
| | 5 | Computer simulation of IBIEC based on vacancy-migration model | Hosei Univ. 1 *Kawai Yosuke 1, Masuda Hirotaka 1, Yamamoto Yasuhiro 1 |
| | | Break 10:15〜10:30 | |
| | 6 | Surface modification and cell adhesion of PTFE using ion beam irradiation | The Univ. of Tokyo 1, RIKEN 2, Saitama Univ. 3 *Kitamura Akane 1, Kobayashi Tomohiro 2, Meguro Takashi 2, Morita Masafumi 3, Suzuki Akihiro 1, Terai Takayuki 1 |
| | 7 | Surface modification of polymers by plasma based ion implantation | Saitama Univ. 1,Riken 2 Kawai Yuki 1,Hasegawa Yasuhiro 1,Kobayashi Tomohiro 2,Meguro Takashi 2 |
| △ | 8 | Control of mesenchymal stem cell (MSC) attachment on spin coated polystyrene implanted carbon negative ion in | Kyoto Univ. 1 *Tetsuya Yamada 1, Hiroshi tsuji 1, Piyanuch Sommani 1, Mitsutaka Hattori 1, Yasuhito Gotoh 1, Junzo ishikawa 1 |
| ▲△ | 9 | Patterned Adhesion of Neuron Cells on Poly-D-lysine Modified by C--Implantation | Kyoto Univ. 1 *Sommani Piyanuch 1,Tsuji Hiroshi 1,Hattori Mitsutaka 1,Yamada Tetsuya 1, Kojima Hiroyuki 1,Sato Hiroko 1,Gotoh Yasuhito 1,Ishikawa Junzo 1 |
| | 10 | Surface Modification of Silicone Rubber by Cluster Ion Beam Irradiation | Ion Beam Eng. Exp. Lab., Kyoto Univ. 1 Araki Rei 1, Kawashita Masakazu 1, Takaoka gikan 1 |
| | 11 | Optical properties of Al$_{2}$O$_{3}$ films prepared by O$_{2}$ cluster ion beam assisted deposition | Kyoto Univ. 1 Nose Tomomichi 1, Nakamine Tatsuhiko 1, Kawashita Masakazu 1, Takaoka Gikan 1 |
| | | Lunch 12:00〜13:00 | |
| 28p-ZV- / II |
| | 1 | Measurement of energy loss by collision of gas cluster ion and residual gas | Graduate School of Engineering University of Hyogo 1,LASTI University of Hyogo 2 *Maeshima Yuki 1,Toyoda Noriaki 2,Mochiji Kozo 1,Mitamura Toru 1,Isao Yamada 2 |
| | 2 | Surface excitation by irradiation with large gas cluster ion beam | Kyoto Univ. 1, Kyoto Univ. Quantum Science and Engineering Center 2 *Ichiki Kazuya 1, Ninomiya Satoshi 2, Seki Toshio 2, Aoki Takaaki 2, Matsuo Jiro 2 |
| | 3 | Surface Processing with High-Energy Reactive Gas Cluster Ion Beams | Kyoto Univ. 1 *Seki Toshio 1, Matsuo Jiro 1 |
| | 4 | MD simulations of glancing-angle gas cluster ion impact | Dept. of Electronic Eng. & Sci. Kyoto Univ., 1, QSEC Kyoto Univ. 2 Takaaki Aoki 1, Jiro Matsuo 2 |
| | 5 | Size Distribution of Methanol Cluster Ions by TOF Method | Ion Beam Eng. Exp. Lab., Kyoto Univ. 1 Okada Takeshi 1,*Sugiyama Kazumichi 1,Ishii Yuya 1,Kawashita Masakazu 1,Takaoka Gikan 1 |
| | 6 | Incident Angle Dependence of Sputtering by Water Cluster Ion Beam Irradiation | Ion Beam Eng. Exp. Lab. Kyoto Univ. 1 Okada Takeshi 1,*Tada Keiji 1,Kawashita Masakazu 1,Takaoka Gikan 1 |
| | 7 | Development of MeV He ion beam irradiation method for cell in liquid using a tapered glass capillary with a thin end-window | Atomic Physics Lab., RIKEN 1, Cellular Dynamics Lab., RIKEN 2, Beam Application Team, RIKEN 3, Electronic and Photonic Eng., Kochi Univ. of Tech. 4, Inst. of Physics, Univ. of Tokyo 5 *Iwai Yoshio 1, Ikeda Tokihiro 1, Kojima Takao M. 1, Kanai Yasuyuki 1, Maeshima Kazuhiro 2, Imamoto Naoko 2, Kobayashi Tomohiro 3, Nebiki Takuya 4, Narusawa Tadashi 4, Yamazaki Yasunori 1,5 |
| | 8 | Development of 3D hydrogen analysis method by means of glass capillary focused ion beam | Kochi Univ. of Technol. 1, IIS Univ. of Tokyo 2, Tohoku Univ. 3, Mitsubishi Heavy Industries 4, Univ. of Tokyo 5 *Nebiki Takuya 1, Narusawa Tadashi1, Sekiba Daiichiro2, Markus Wilde2, Ogura Syohei2, Yamashita Hiroshi2, Matsumoto Masuaki2, Fukutani Katsuyuki2, Okano Tatsuo2, Yonemura Hiroki3, Kasagi Jirota3, Iwamura Yasuhiro4, Itoh Takehiko4, Kuribayashi Shizuma4, Matsuzaki Hiroyuki5 |
| | 9 | Formation of narrow wires deposited by Au+ FIB-CVD method |
Grad. School of Eng. Sci. Osaka Univ. 1, CQST.
Osaka Univ. 2CREST JST 3, Univ. of Hyogo 4 Okada Ryo 1, Yanagisawa Junichi
1,2,3 Matsui Shinji 3,4 |
| | 10 | Low-temperature fabrication of Al nanorods by ion irradiation | Nagoya Inst.Technol.1 *Nao Suzuki 1, Kouhei Yamaguchi 1, Masaki Tanemura 1 |
| | | Break 15:30〜15:45 | |
| | 11 | Observation of the cross section of LiNbO3 implanted with Ag and Cu ion and annealed | Univ. of Yamanashi 1, Tokyo Metropolitan Industrial Technology Research Inst. 2 *Mitsui Naoto 1, Ijima Kaoru 1, Taniguchi Shohei 2, Saito Yukinori 1 |
| | 12 | Ion implantation into Diamondo | Univ. of Yamanashi 1, Tokyo Metropolitan Industrial Technology Research Inst. 2 *Mitsui Naoto 1, Ijima Kaoru 1, Taniguchi Shohei 2, Saito Yukinori 1 |
| | 13 | Optical properties of YSZ implanted with Ag ions | YITJC 1, Univ. of Yamanashi 2 *Fujita Takashi 1, Mitsui Naoto 2, Motiduki Kazuya 2, Ijima Kaoru 2, Saito Yukinori 2 |
| | 14 | Suppression of Pinhole Defects in DLC Film by Plasma-based Ion Implantation | Univ. of Hyogo 1 *Nishino Wataru 1,Fujiwara Etsuo 1, and Yatsuzuka Mitsuyasu 1 |
| | 15 | Fabrication of Cu2O nanoparticles in SiO2 by ion implantation and two-step annealing | Nat. Inst. for Mater. Sci. *Amekura Hiroshi 1, Umeda Naoki 1, Takeda Yoshihiko 1, Kishimoto Naoki 1 |
| ▲△ | 16 | Zinc oxide nanoparticale formation by ion implantation and thermal oxidation at 450oC | NIMS-QBC 1 *Boldyryeva Hanna 1, Amekura Hiroshi 1, Kono Kenichiro 1, Kishimoto Naoki 1, |
| △ | 17 | Spatial Control of Metal Nano-particles by Masked Ion Implantation with Anodic Porous Alumina | Univ. of Tsukuba 1. NIMS QBC 2 *Nakamura Masahide 1, Umeda Naoki 2, Nagaura Tomota 1, Inoue Satoru 2, Kishimoto Naoki 2 |
| | 18 | Ion Dose Dependence of Cathode Luminescence from Ge-Ion-Implanted SiO2 Films | Kyoto Univ. 1,Sharp 2 *Kojima Kenji 1,Tsuji Hiroshi 1,Arai Nobutosi 1,2, Minotani Takashi 1,Nakatsuka Hiroyuki 1,Adachi Kouichiro 2,Kotaki Hiroshi 2,Ishibashi Toyotugu 1,Gotou Yasuhito 1,Ishikawa Junzou 1 |
| | 19 | Formation of Nano-Particles in SrTiO3 by Ion Implantation and the Magnetic Properties | Kochi Univ. of Tech. 1, Kurume Inst. of Tech. 2, AIST 3, Musashi Inst. of Tech. 4 *Takayuki Moriwaki 1, Masafumi Taniwaki 1, Nobuyuki Hayashi 2, Isao Sakamoto 3, Tamotu Toriyama 4 |
| | 20 | Precipitation Control of Cu Nanoparticles in a-SiO2 by Simultaneous Ion and Laser Irradiation 2 | Univ. of Tsukuba 1, NIMS 2 *Kenji Saito 1,2, Yoshihiko Takeda 2, Naoki Kishimoto 2 |
| | 21 | Nanovoid Formation in Silica Glass Induced by Thermal Annealing after Zn+ Ion Implantation | Nanomaterials Lab.,NIMS 1 Naoki Umeda 1, Hiroshi Amekura 1, Naoki Kishimoto 1 |
| 7.7 Micro-Field Emitter |
| March 29 10:00〜17:30 |
| 29a-ZV- / II |
| | 1 | Fabrication of Carbon Nanotube Cold Cathode Using Inkjet Method | Kyushu Inst. Tech. 1,2) Kyushu Univ. 3,4) *Shigematsu Satoshi 1, Baba akiyoshi 2, Nakashima Naotoshi 3, Asano Tanemasa 4 |
| | 2 | Fabrication and (NH4)2Sx surface treatment of GaAs field emitter | RIE Shizuoka Univ. *Xin Liu, Yoshifumi Takigawa, Gui Han, Masaru Shimomura, Yoichiro Neo, Hidenori Mimura |
| △ | 3 | Fabrication of Ceramic Field Emitter Arrays Using Transfer Mold Method | Res. Inst. Electronics, Shizuoka Univ. 1, Grad. School of Sci. & Technol., Shizuoka Univ. 2 *Yasumasa Otsuka 1, Genta Sato 2, Koji Shiratori 1,Masayuki Nakamoto 1,2 |
| | 4 | Structure Optimization of Transfer-Mold Field Emitter Array by Numerical Analysis | Grad. School of Sci. & Technol., Shizuoka Univ. 1, Res. Inst. Electronics, Shizuoka Univ. 2 *Genta Sato 1, Masayuki Nakamoto 1,2 |
| | 5 | Measurement of electron emission from porous Si film on glass substrate(III) | Oshima National College of Maritime Technol. *Katsuya HIGA |
| | | Break 11:15〜11:30 | |
| | 6 | Temperature Dependence of Field Emission from Hafnium Nitride Field Emitter Array | Kyoto Univ. 1 *Miyata Yuko 1, Setojima Noriyuki 1, Kanzawa Taro 1, Gotoh Yasuhito 1, Tsuji Hiroshi 1, Ishikawa Junzo 1 |
| | 7 | Composition Analysis of Hafnium Nitride Thin Films Annealed in the Air | Kyoto Univ. *Kanzawa Taro1, Setojima Noriyuki1, Gotoh Yasuhito1, Tsuji Hiroshi1, Ishikawa Junzo1 |
| | 8 | Observation of Tungsten (100) surface with Yttrium oxide by using XPS and LEED | Muroran Inst. 1 *Kawakubo Takashi 1,Shimoyama Yusuke 1,Ugai Takashi 1,Nakane Hideaki 1,Adachi Hiroshi 1, |
| | 9 | Growth and emission characteristics of iron-oxide whiskers. | RIE Shizuoka Univ.1, Nippon Steel Corp.2 *K. Suzuki 1, M. Murai 1,M. Okada 1,2,Y. Neo 1, H. Mimura 1 |
| | 10 | Electron emission mechanism of ferroelectric electron emitter | NGK Insulators,Ltd. *Ohwada Iwao 1, Sugiyama Tomohiko 1, Nanataki Tsutomu 1 |
| | 11 | Response characteristics of ferroelectric electron emitter | NGK Insulators,Ltd. Ohwada Iwao 1, *Sugiyama Tomohiko 1, Nanataki Tsutomu 1 |
| | | Lunch 13:00〜14:00 | |
| 29p-ZV- / II |
| | 1 | Emission characteristics from C-coated Si FEA and microscopic properties of the C thin film surface | Univ. of Tsukuba 1, AIST 2 Adachi Kotaro 1, *Ogata Satoshi 1, Nagashima Shinya 1, Saida Morihiko 1, Nagao Masayoshi 2, Sasaki Masahiro 1 |
| | 2 | Evaluation of cabonized Si field emitter arrays by Seppen-Katamuki chart | Kyoto Univ. 1, JST 2, AIST 3, Nissin Ion Equipment 4 *Oowada Atsushi 1, Sakai Yoshiki 1, Takeuchi Mitsuaki 2, Gotoh Yasuhito 1, Nagao Masayoshi 3, Tsuji Hiroshi 1, Ishikawa Jyunzou 1, Sakai Shigeki 4, Kimoto Tsunenobu 1 |
| | 3 | High current operation of carbonized Si field emitter array | kyoudai/inkou 1,JST 2,Sansouken 3,Nissinionkiki 4 *Sakai Yoshiki 1,Oowada Atusshi 1,Takeuchi Mituaki 2,Gotou Yasuhito 1,Nagao Masayoshi 3,Tuji Hiroshi 1,Ishikawa junzou 1,Sakai Shigeki 4,Kimoto Tunenobu 1 |
| △ | 4 | ELECTRON EMISSION MECHANISM OF DOPED CVD DIAMOND CHARACTERISED BY COMBINED XPS/UPS/FES SYSTEM | Japan Advanced Inst. of Science and Technology 1, Univ. of Cambridge 2, International Christian Univ. 3, AIST 4, JEOL 5, Tohoku Univ. 6 *Hisato Yamaguchi 1, Ichitaro Saito 2, Yuki Kudo 3, Tomoaki Masuzawa 3, Takatoshi Yamada 4, Masato Kudo 5, Yuji Takakuwa 6, and Ken Okano 3,1 |
| | 5 | Atomic Level Analysis of Graphite Nano Fibers by Scanning Atom Probe | Kanazawa Inst. Technol. 1, NHK 2 *Nishikawa Osamu 1, Taniguchi Masahiro 1, Ushirozawa Mizumoto 2 |
| | 6 | Fabrication of Au-coverd Single-atom field electron source | Waseda Univ. 1, Academia Sinica 2 *Nomura Kenichi 1, Rokuta Eiji 1, Itagaki Takahiro 1, Hong-Shi Kuo 2, Tien.T Tsong 2, Oshima Chuhei 1 |
| | 7 | Shot noise measurements in field emission under XHV vacuum conditions below 10Hz | LMST Waseda Univ. 1. JST 2. *Itagaki Takahiro 1. Cho Boklae 1,2. Ishikawa Tsuyoshi 1. Rokuta Eiji 1. Oshima Chuhei 1. |
| | | Break 15:45〜16:00 | |
| | 8 | Development of high-brightness spin-polarized electron field emitter II - Spin polarization of field-emitted electrons from ferromagnetic half-metal Co2MnSi - | Graduate School of Eng., Mie Univ., Shigekazu Nagai 1, Yuji Fujiwara 1, Manabu Hirayama 1, Koichi Hata 1 |
| | 9 | NEA-AlGaAs photocathode high brightness electron source | JAEA 1,Nagoya Univ. VBL 2,Nagoya Univ. 3 *Tomohiro Nishitani 1,Ryoichi Hajima 1,Masao Tabuchi 2,Yoshikazu Takeda 3,Yosuke Noritake 3,Haruhiko Hayashitani 3 |
| △ | 10 | Development of a high brightness and high spin-polarization electron source |
Nagoya Univ., Science1, Hitachi CRL2, Nagoya Univ.,
Engineering3, Osaka Electro-Communication Univ.4, Osaka Prefecture Univ.5,
Daido Institute Of Technology6, Daido Steel Co., Ltd.7 N.Yamamoto1, A.Mano1,
K.Tamagaki1, S.Okumi1, M.Yamamoto1, M.Kuwahara1,R.Sakai1, T.Morino1,A.Utsu1,T.Nakanishi1,
T.Ohshima2, J.Xiuguang3, T.Ujihara3,Y.Takeda3, T.Yasue4, T.Koshikawa4, H.Horinaka5,
T.Saka6, T.Kato7 |
| | 11 | Band structure of strain compensated GaAs/GaAsP superlattice and its properties for spin-polarized electron source | Nagoya Univ. *Kato Takanori 1,Sakai Ryosuke 2,Tanioku Masatoshi 1,Nakagawa Yasuhide 2,Maeda yoshiki 1,Kin Syukou 1,Fuchi Singo 1,Yamamoto Masahiro 2,Ujihara Toru 1,Nakanishi Tsutomu 2,Takeda Yoshikazu, |
| △ | 12 | Operation of nanocrystalline silicon ballistic electron emitter in water and hydrogen generation | Graduate School of Eng. Tokyo Univ. of Agri. & Technol. 1, Quantum14 Co. 2 *Ohta Toshiyuki 1, Gelloz Bernard 1, Koshida Nobuyoshi 1,2 |
| △ | 13 | An electron-beam-pumped light emission of gases using field emitter | RIE Shizuoka Univ. *Kazufumi Shiozawa1, Sugiyama Tadahiro1, Katsumi Matsubara1, Susumu Yamashita1, Yoichiro Neo1, Ikedo Tomoyuki, Hidenori Mimura1 |
| 7.8 Beam Application and New Technology |
| March 29 10:00〜12:00 |
| 29a-SA- / II |
| | 1 | Formation of transmission lines by laser processing and their transmission characteristics | Chiba Inst. of Tech. Inoue Shinya, Sugiura Osamu |
| | 2 | New Techniques of High Voltage Generation for the Particle Beam Equipments | AIST MRISUS *Saitoh kazuo 1, Nakao Setsuo 1, Masuda Haruho 1, Ikeyama Masami 1 |
| △ | 3 | Conducting properties of MgO in nano-regions by means of TEM/STM | Hokkaido Univ IST 1 Okubo Youhei 1, Hamada Kouichi 2, Arita Masashi 1, Takahashi Yasuo 1 |
| | 4 | Reseach on a Size Effect in Thick Resist Lithography | Tokyo Denki Univ. 1 *Watanabe Hiroyuki 1, Horiuchi Toshiyuki 1 |
| | 5 | Ultra Fine Line-and-space Pattern Fabrication Utilizing Light Interference at Crosssectional End of a Resist Film | Tokyou Denki Univ.1 *Fukui Yuichi 1,Horiuchi Toshiyuki 1 |
| | 6 | Absolute sensitivity calibration of imaging plate for GeV electrons | Graduate school of Engineering Osaka Univ. 1,Japan Synchrotron Radiation Inst. (JASRI/Spring-8) 2, Fuji Film 3, Univ. of Hyogo 4 *Nobuhiko Nakanii 1,Kiminori Kondo 1, Kazuki Tsuji 1, Sinsuke Suzuki 2, Takao Asaka 2, Kenichi Yanagida 2, Hirofumi Hanaki 2, Takashi Kobayashi 3, Kazuhiro Makino 3, Takahisa Yamane 3, Shuji Miyamoto 4, Ken Horikawa 4, Tomohiro Aratani 4, Toshinori Yabuuchi 1, Kazuo A Tanaka 1 |
| | 7 | Field emission electron gun using carbon-nanofiber emitter | Nagoya Inst. Tech. 1 *Sakai Yusuke 1,Haga Akihiro 1,Sugita Shinji 1,Matsumoto Yasutaka 1,Kita Shigetomo 1,Tanaka Shun-itirou 1,Okuyama Fumio 1 |
| | 8 | Development of fine-focus x-ray source using carbon-nanofiber field emitter | Nagoya Inst. Tech. 1,Toshiba Corp. 2,Tokyo Univ. 3,Topcon Corp. 4 Shinji Sugita 1,Watanabe Yoshiyuki 1,Nagatu Shintarou 1,Oga Yoshitaka 1,Sugimoto Wataru 1,Sakai Yusuke 1,*Kita Shigetomo 1,Okuyama Fumio 1,Yamaguchi Akiko 2,Miyoshi Motosuke 3,Ohara Takashi 4 |