| 1 Radiation·Plasma Electronics |
| 1.1 Radiation·Accelerator·Nuclear Reactor |
| March 29 9:00`18:15 |
| 29a-B-@/ I |
| | 1 | Neutron spectral effect in transferring the thermal neutron fluence rate standard | AIST1, Nagoya Univ.2, KUR3, JAEA4@*Tetsuro Matsumoto1, Hideki Harano1, Tetsuya Shimoyama1, Yasushi Sato1, Akira Uritani2, Jun-ichi Hori3, Hideaki Matsue4, Mariko Segawa4, Katsuhisa Kudo |
| | 2 | Heavy ion tracks in polycarbonate (bisphenole A) (3) |
Kobe Univ. 1, NIRS 2@*Watanabe Souichirou 1,Matsuo
Takahiro 1,Mori Yutaka 1,Yamauchii Tomoya 1,Oda Keiji 1,Yasuda Nakahiro
2 |
| | 3 | Development of a space dosimeter using the Micro Pixel Chamber III | Waseda Univ.1,Kyoto Univ2,KEK 3,JAXA.4, NIRS 5@Yasunobu Fujita 1,Tsutomu Nagayoshi 1,Tadayoshi Doke 1,4,Jun Kikuchi 1, Kazuhiro Terasawa 1,4, Koji Ishida 1, Kentaro Miuchi 2,Kiwamu Saito 3,Shin-ichi Sasaki 3,Hiroko Tawara 3,Tatsuto Komiyama 4, Haruhisa Matsumoto 4, Yukio Utihori 5, Hisashi Kitamura 5 |
| | 4 | Optical absorption and thermoluminescence of X-ray irradiated semiconductor-doped glass | Ube National College of Technology 1,Graduate School of Science and Engineering,Yamaguchi Univ. 2 @*Kaneda Teruhisa 1,Ushigusa Keita 2,Miyoshi Tadaki 2 |
| | 5 | Effect of Ultrasonic Oscillation on Luminescence in X-Ray Irradiated KCl:Eu2+(II) | Grad. School, Kanazawa Univ.@*Nakamura Shoichi, Ohgaku Tomiyasu |
| | 6 | Thermoluminescence properties of CaF2, CaF2:Dy | Osaka Sangyo Univ.@*Fukuda Yasunori 1, Okuda yuta 1, Katou Satosi 1, Shin Meitetu 1. |
| | 7 | Glow Curve of Thermoluminescence Phosphor CaSO4:Dy Nanocrystalline on Slow Rates Region of Heating | Rikkyo Univ. 1, Komazawa Univ. 2@*Kiyomitsu Shinsho1, Kazumasa Harada2, Yusuke Yamamoto 2, Akio Urushiyama 1 |
| | 8 | A simple method for measurement of radio-photoluminescence from glass dosimeter |
Osaka Univ. 1,Chiyoda Technol Corp. 2@Atsuya Kishi
1, Wataru Kada 1, Youhei Ihara 1, Fuminobu Sato 1, Yushi Kato 1,Toshiyuki
Iida 1,Takayoshi Yamamoto 2 |
| | 9 | Scintillation properties of organic-inorganic perovskite compounds at different temperatures | Tohoku Univ. 1,NIRS 2,Univ. of Tokyo 3@*Takahashi Naoki 1,Watanabe Shotaro 1,Koshimizu Masanori 1,Shibuya Kengo 2,Muroya Yusa 3,Asai Keisuke 1 |
| | 10 | Development of a fast Scintillator using Semiconductor Quantum Dot dispersed in the CsCl:Pb Single Crystal | School of Engineering,Tohoku Univ. 1,National Inst. of Radiological Sciences 2,School of Engineering,Univ. of Tokyo 3@*Watanabe Shotaro 1,Takahashi Naoki 1,Koshimizu Masanori 1,Shibuya Kengo 2,Muroya Yusa 3,Asai Keisuke 1 |
| | 11 | Scintilator using ZnO-family phosphor for neutron detection |
Res. Lab. of Integrated Technological Systems,
Kanazawa Inst. of Tech. 1, Japan Atomic Energy Res. Inst. 2@Nishimura Akina
1, Kuroda Masashi 1, Iida Kaoru 1, Mizoi Ayaka 1, Takei Yoshinori 1, Nanto
Hidehito 1, Katagiri Masaki 2 |
| | 12 | Development of DAQ system for BGO stack detector | Nagoya Univ. 1, Clear Pulse 2@*Kawarabayashi Jun 1, Mihoya Shinji 1, Watanabe Kenichi 1, Iguchi Tetsuo 1, Kubo Shin 2 |
| | | Lunch 12:00`13:00 | |
| 29p-B-@/ I |
| ’ | 1 | Evaluation of a Spatial Resolution in 10 MeV/u Class Focusing Heavy Ion Microbeam System | JAEA Takasaki 1, Gunma Univ. 2@*Oikawa Masakazu 1,2, Satoh Takahiro 1, Kashiwagi Hirotsugu 1, Miyawaki Nobumasa 1, Kurashima Satoshi 1, Okumura Susumu 1, Yokota Watalu 1, Kamiya Tomihiro 1,2 |
| | 2 | Beam Decelerating System for a Compact Monochromatic Hard X-ray Source | Ishikawajima-Harima Heavy Industries Co., Ltd. 1, University of Tokyo 2, Akita National College of Technology 3@*Ishida Daisuke 1, Nose Hiroyuki 1, Kaneko Namio 1, Sakai Yasuo 1, Sakae Hisaharu 1, Sakamoto Fumito 2, Dobashi Katsuhiro 2, Uesaka Mitsuru 2, Yamamoto Masashi 3 |
| | 3 | Miniaturization of Isotopomer Analysis System Based on Rapidly Swept Cavity Ringdown Spectroscopy | Nagoya Univ. 1@*Yu Takiguchi 1, Hideki Tomita 1, Kenichi Watanabe 1, Jun Kawarabayashi 1, Tetsuo Iguchi 1 |
| | 4 | Study on Mass Fractionation Effect in Resonance Ionization Mass Spectrometry Based on Isotope Selection with Doppler Shift of Laser Ablated Atoms | Nagoya Univ. 1@*Yuki Higuchi 1, Kenichi Watanabe 1, Jun Kawarabayashi 1, Tetsuo Iguchi 1 |
| | 5 | Measurement of cluster ion transmission through tandem accelerator | JAEA Takasaki 1, JAEA ASRC 2@Saitoh Yuichi 1, Chiba Atsuya 1, Adachi Masahiro 1, Kazumasa Narumi 2 |
| | 6 | Evaluation of Charge-Changing Cross Sections of Fast Carbon Cluster Ions Through Carbon Foil | Japan Atomic Energy Agency 1, Okayama Univ. of Sci. 2@Adachi Masahiro 1, Saitoh Yuichi 1, Chiba Atsuya 1, Narumi Kazumasa 1, Kaneko Toshiaki 2 |
| ’ | 7 | Development of High-repetition rate Ti:Sapphire Narrow-band Laser for Trace Analysis of Long-lived Radioisotopes by Resonance Ionization Mass Spectroscopy | Nagoya Univ. 1, Johannes Gutenberg Univ. 2, Univ. of Jyväskylä 3@*Tomita Hideki 1, Christoph Mattolat@2, Thomas Kessler 3, Fabio Schwellnus 2, Klaus Wendt 2, Watanabe Kenichi 1, Iguchi Tetsuo 1 |
| | 8 | Single cell irradiation experiment with X-ray micro beam by use of micro cell chip | Graduate school of Engineering, Osaka Univ. 1,Radioisotope Center, Osaka Univ. 2@*Takahiro Kuchimaru 1,Takayuki Kiyohara 1,Tomohisa Fujita 1, Fuminobu Sato 1,Kikuo Shimizu 2,Yushi Kato 1,Toshiyuki Iida 1 |
| | 9 | Fragmentation reactions of therapeutic carbon beams | JST 1,KEK 2,Aichi Univ. Edu. 3,Gunma Univ. 4,JAXA 5,Kobe Univ.6,Nagoya Univ. 7,Naruto Univ. Edu. 8,NIRS 9,SLAC 10,Toho Univ. 11@*Toshiyuki Toshito 1,2,K. Kodama 3,K. Yusa 4,M. Ozaki 5,K. Amako 2,S. Kameoka 2,K. Murakami 2,T. Sasaki 2,S. Aoki 6,T. Fukuda 7,H. Kubota 7,N. Naganawa 7,M. Natsume 7,K. Niwa 7,S. Takahashi 7,J. Yoshida 7,H. Yoshida 8,N. Kanematsu 9,M. Komori 9,M. Asai 10,T. Koi 10,C. Fukushima 11,S. Ogawa 11,H. Shibuya 11 |
| | 10 | Gamma-ray emission profile on accelerator based neutron source | Osaka Univ. 1, Kobe Univ. 2@Miyamaru Hiroyuki 1, Ootera Yasutaka 1, Murata Isao 1, Kitamura Akira 2 |
| | 11 | Applied study of laser Compton scattering gamma rays 2 | LASTI 1,ILT 2@Horikawa Ken 1,Aratani Tomohiro 1,*Miyamoto Syuji 1,Amano Sho 1,Mochizuki Takayasu 1,Li Dazhi 2,Imasaki Kazuo 2 |
| | | Break 15:45`16:00 | |
| | 12 | Estimation of W-value for scintillation light from gas xenon for alpha particles | Waseda Univ. 1@*Takahashi Tomoaki 1, Kikuchi Jun 1, Doke Tadayoshi 1, Suzuki Satoshi 1, Ebizuka Yasushi 1, Kusano Hiroki 1, Nemoto Shinpei 1 |
| | 13 | A measurement of emission spectrum of liquid xenon - 2 | Yokohama Nat'l Univ. 1, KEK 2, ICRR 3@*NAKAMURA Shogo 1, OZAKI Yuichi 1, SAITO Kiwamu 2, SASAKI Shinichi 2, SATO Tomoatsu 1, TAWARA Hiroko 2, NAGASE Tatsuhiro 1, NAKAHATA Masayuki 3, HAGIWARA Hiroki 1, HARUYAMA Tomiyoshi 2 |
| | 14 | Electron avalanche multiplication and propagation characteristic of a GM counter | Hiroshima Pref. College of Health Sci. 1@*Iwatani Kazuo 1, Yamada Akiko 1, Tanoue shouko 1, Sakai Takafumi 1 |
| | 15 | Positive charge type field emission CdTe radiation detector by using secondary electron emission | Research Institute of Electronics Shizuoka Univ 1@*Sakata Takuya 1, Ikeda Yoshiaki 1, Hanawa Yuichiro 1, Shiozawa Kazufumi 1, Neo Yoichiro 1, Aoki Toru 1, Mimura Hidenori 1 |
| ’ | 16 | Formation of Schottky contact on H2 plasma treated CdTe(111)Cd surfaces (III) | Univ. of the Ryukyus 1, Acrorad 2@Owan Ikumi 1, *Yamanoha Satoru 1, Toyama Hiroyuki 1, Yamazato Masaaki 1, Higa Akira 1, Ohno Ryoichi 2, Toguchi Minoru 1 |
| | 17 | Temperature Dependence of Thallium Bromide Radiation Detectors | Tohoku Inst. Technology@*Onodera Toshiyuki 1, Hitomi Keitaro 1, Shoji Tadayoshi 1 |
| | 18 | 3-D position sensitive TlBr radiation detectors | Tohoku Inst. Technology@*Keitaro Hitomi 1, Toshiyuki Onodera 1, Tadayoshi Shoji 1 |
| | 19 | Study of Large Area CdTe X-ray and Α-ray Imaging Detectors Grown by MOVPE (I) | Nagoya Inst. of Tech.@*Tanaka Ryuichi 1,Noda Kotaro 1,Omura Motohiro 1,Minoura Shinpei 1,Agata Yasunori 1,Niraula Madan 1,Yasuda Kazuhito 1 |
| | 20 | study ofLarge Area CdTe X-ray and Α-ray Imaging Detectors Grown by MOVPE | Nagoya Inst. of Tech. 1@*Ohashi Hiroyuki 1,Shinu ikki 1,Nakamura Koji 1,Yokota Masahiro 1,Agata Yasunori 1,Niraula Madan 1,Yasuda Kazuhito 1 |
| 1.1 Radiation·Accelerator·Nuclear Reactor |
| March 30 13:00`15:00 |
| 30p-B-@/ I |
| ’ | 1 | Material Identification in X-ray CT image by energy discriminate imager |
Shizuoka Univ. 1, Hamamatsu Photonics 2 @Takuya
Nakashima 1, Yasuyuki Takahashi 1, Hisashi Morii 1, Akifumi Koike 1, Hidenori
Mimura 1, Toru Aoki 1, Yasuhiro Tomita 2 |
| | 2 | Effect of Different Scatterer on Spectral Measurement of Radiographic X-ray Unit with Compton-Scattered Method | Grad. Sch. Med. Osaka Univ. 1, Osaka Univ. 2, Hiroshima Inst. Univ. 3@*Matsumoto Masao 1, Nagata jun 2, Nakajima Toshiaki 2, Maeda Koji 3 |
| | 3 | A Volunteer PET Study on Annihilation Photon Acollinearity | NIRS Molecular Imaging 1, NIRS Radiation Emergency 2@*Shibuya Kengo 1, Yoshida Eiji 1, Nishikido Fumihiko 1, Suzuki Toshikazu 2, Inadama Naoko 1, Yamaya Taiga 1, Murayama Hideo 1 |
| | 4 | Inter-crystal scatter identification in a depth-sensitive PET detector | National Institute of Radiological Sciences 1, Shimadzu Corporation 2, Tokyo Metropolitan Institute of Gerontology 3@Eiji Yoshida 1, Keishi Kitamura 2,1, Uichi Kimura 3, Fumihiko Nishikido 1, Kengo Shibuya 1, Taiga Yamaya 1, Hideo Murayama 1 |
| | 5 | Spatial Resolution of four-layer DOI small animal PET scanner with one-pair evaluation system | NIRS 1, Chiba Univ. 2, Waseda Univ. 3@Nishikido Fumihiko 1, Yoshida Eiji 1, Inadama Naoko 1, KShibuya engo 1, Yamaya Taiga 1, Lam Chih Fung 1, Takahashi Kei 2 1, Ohmura Atsushi 3 1, Murayama Hideo 1 |
| | 6 | DOI-PET detector with Capability of Optical Imaging |
Chiba Univ. 1, NIRS 2, Shimadzu Co. 3, Waseda Univ.
4@Kei Takahashi 1,2, Hideo Murayama 2, Naoko Inadama 2, Taiga Yamaya 2,
Eiji Yoshida 2, Fumihiko Nishikido 2, Kengo Shibuya 2, Ichiro Oda 3, Atsushi
Ohmura 4, Hideyuki Kawai 1 |
| | 7 | Comparison some optical cements bonding scintillators for PET scanner | Waseda Univ. 1, NIRS 2, Chiba Univ. 3@Atsushi Ohmura 1,2, Hideo Murayama 2, Naoko Inadama 2, Taiga Yamaya 2, Eiji Yoshida 2, Fumihiko Nishikido 2, Kengo Shibuya 2, Kei Takahashi2,3, Jun Kikuchi 1 |
| | 8 | Optimization of Crystal Arrangement for 8-Layer DOI PET Detector | NIRS 1, Chiba University 2, Waseda University 3@*Naoko Inadama 1, Hideo Murayama 1, Taiga Yamaya 1, Eiji Yoshida 1, Kengo Shibuya 1, Fumihiko Nishikido 1, Kei Takahashi 2,1, Atsushi Ohmura 3,1 |
| 1.2 Plasma Sources and Production Technologies |
| March 29 9:00`17:00 |
| 29a-G-@/ I |
| | 1 | Basic Property of Atmospheric Pressure Line Jet Plasma by Dielectric Barrier Discharge | Nagano National College of Tech. 1@*Kobayashi Tomoyuki 1, Ezumi Naomichi 1 |
| ’ | 2 | Discharging Characteristics of Atmospheric Pressure Micro-plasma Jet@Excited by DBD | Faculty of Engineering, Ehime Univ. 1@*Hisaki Matsuba 1, Masanori Kawata 1, Hideki Motomura 1, Masahumi Jinno 1 |
| ’ | 3 | Jet shape and electrode dependence of low-temperature plasma jet at atmospheric pressure | Kyoto Univ.@*Urabe Keiichiro 1, Ito Yosuke 2, Kubo Makoto 2, Sakai Osamu 2, Tachibana Kunihide 2 |
| | 4 | Developments of Long-Plume Atmospheric Plasma Jet | Toyota Tech. Inst. 1@*Kubota Yuusuke 1, Takemura Yuichiro 1, Hara Tamio 1 |
| | 5 | Interaction of liquid and the atmospheric pressure plasma jet | Toyota Tech. Inst. 1@*Takemura Yuichiro, Kubota Yuusuke, Hara Tamio |
| ’ | 6 | Development of 4-in-1 PEN-Jet and Evaluation of Treatment Performance | Toyohashi Univ. Technol. 1, Sintobrator Ltd. 2, Sumitomo Osaka Cement Co., Ltd. 3, Daiken Chemical Co., Ltd. 4, Gifu Nat. Coll. Technol. 5@*Hajime Shiki 1, Junpei Motoki 1, Yukikazu Ito 1, Hirofumi Takikawa 1, Eiji Usuki 2, Takeshi Ootsuka 3, Takashi Okawa 4, Shigenobu Yamanaka 4, Tateki Sakakibara 5 |
| | | Break 10:30`10:45 | |
| | 7 | Dynamical characteristics of low-frequency nonequilibrium atmospheric micro plasma jets | CAMT Osaka Univ. 1@*Katsuhisa Kitano 1, Satoshi Hamaguchi 2 |
| ’ | 8 | Development of numerical model for the plasma needle by FEM and understanding of the plasma-tissue interaction | Univ. of Tokyo 1,UC Berkeley 2@*Sakiyama Yukinori 1,David Graves 2 |
| ’ | 9 | Characteristics of RF Discharge Plasmas with Gas-Liquid Phases Interface Sustained by Ionic Liquid Electrode | Tohoku Univ. 1@*Baba Kazuhiko 1, Kaneko Toshiro 1, Hatakeyama Rikizo 1 |
| | 10 | Observation of discharge on the metal rod covered with porous Teflon tube in ethanol | IIC Kyoto Univ 1, GSE Kyoto Univ 2@*Tatsuru Shirafuji 1, Masaru Kimura 2, Osamu Sakai 2, Kunihide Tachibana 2 |
| ’ | 11 | Characteristics of chemical reactions of dissolved chemical substances induced by glow plasmas generated upon or inside the liquid | Osaka Univ. Center for Atomic and Molecular Technologies 1 @*Aoki Hironori 1, Kitano Katsuhisa 1, Hamaguchi Satoshi 1 |
| | | Lunch 12:00`13:00 | |
| 29p-G-@/ I |
| ’ | 1 | Microwave discharge in the atmospheric argon gas flow | Grad. School of Eng. Shizuoka Univ. 1@Matsuda Itsuki 1,Ohishi Youhei 1,Kando Masashi 1 |
| | 2 | Generation of microgap plasma excited by 10-GHz microwave | Nagoya Univ. 1@*Kobayashi Masayoshi 1,Aramaki Mitsutoshi 1,Kono Akihiro 1 |
| | 3 | Numerical Analysis and Optical Diagnostics of Microwave-Excited Plasma Source for Microthrusters | Kyoto Univ. 1@*Takahashi Takeshi 1, Takao Yoshinori 1, Eriguchi Koji 1, Ono Kouichi 1 |
| £ | 4 | Study on New optical devices using Microplasma arrays in silicon | Kyoto Univ. 1@*Lee Dae-Sung 1,Tachibana Kunihide 1 |
| | 5 | Production of 10GHz micro ECR plasma aiming at ultra short wavelength light source | Nagoya Univ. 1@*Kuroki Toshihiro 1, Aramaki Mitsutoshi 1, Kono Akihiro 1 |
| | 6 | Simulation of High-Frequency Driven Capacitively Coupled Microplasma with Gas Dynamics | Tokyo Metropolitan Univ. 1@*Otsuka Shin 1,Tochikubo Fumiyoshi 1,Uchida Satoshi 1,Watanebe Tsuneo 1 |
| ’ | 7 | Additional Effect of Dielectric Barrier Discharge for Pre-ionization on Multi-hole Type Micro-hollow Cathode Discharge | Shizuoka Univ.@*Watanabe Jun, Ogino Akihisa, Nagatsu Masaaki |
| | | Break 14:45`15:00 | |
| | 8 | Fabrication and Discharge Properties of Microprojection Array Cathode by Transfer Mold Method | Grad. School of Sci. & Technol., Shizuoka Univ. 1, Res. Inst. Electronics, Shizuoka Univ. 2@*Genta Sato 1, Masayuki Nakamoto 1,2 |
| | 9 | Atmospheric-Pressure Plasma Source Using Flexible Electrodes of Fabric Structure | Kyoto Univ. 1,2@*Sakai Osamu 1, Shirafuji Tatsuru 2, Tachibana Kunihide 1 |
| ’ | 10 | Surface modification using coaxial micro dielectric barrier discharges at atmospheric pressure | Kyoyo Univ. 1@*Ito Yosuke 1,Sakai Osamu 1,Tachibana Kunihide 1 |
| | 11 | Atmospheric Pulsed Barrier Discharge in Gas-Liquid Two Phase Flow for Advanced Oxidation | Tokyo Inst. Technology@Hiroshi Katayama 1, *Koichi Yasuoka 1, Shozo Ishii 1 |
| ’ | 12 | Measurement of UV during Atmospheric-pressure Plasma Irradiations using On-wafer-monitoring Sensor (2) | Tohoku Univ. 1, Sekisui Chemical 2@*Ueno Akira 1, Yara Takuya 2, Ishikawa Yasushi 1, Samukawa Seiji 1 |
| | 13 | Analysis of Atmospheric Pressure Glow Discharge Plasma -II- |
Fujielectric Dev. Tech.Co., Fujielectric Adv. Tech.Co.
@Narita Masataka 1, Suzawa Takaaki 1, Fujikake Shinji 2, Ichikawa Yukimi
2 |
| | 14 | Evaluation of Electron Energy Distribution in a He Atmospheric-pressure, Non-equilibrium Discharge Plasma | National Defense Academy 1,2@*Toshiki Nakano 1, Haruaki Akashi 2, Hiroyuki Imaizumi 1, Takeshi Kitajima 1 |
| ’ | 15 | Characterization of Electrode Grooves on Single Crystalline Silicon Solar Cells | Sojo Univ., 1,Miyazaki Univ., 2,M.SETEK Co., Ltd 3@*Hamada Toshiyuki 1,Matsukuma Kunihiro 1,Sakoda Tatsuya 2,Honda Chikahisa 2,Herai Hiroki 3,Matsui Kazuo 3,Nagasawa Kazuo 3 |
| 1.2 Plasma Sources and Production Technologies |
| March 30 9:00`15:00 |
| 30a-G-@/ I |
| | 1 | Development of free-standing-wave typed VHF plasma sources for large-area material processing : Phase 1 | Advanced Plasma Technologies 1,Nagasaki Inst. of Applied Science 2,Yamaguchi Univ. 3@*Murata Masayoshi 1,Okuno Tamio 2,Fukumasa Osamu 3 |
| | 2 | Development of large-area plasma-processing equipment employing long-wavelength microwave in Evanescent region | ADTEC Plasma 1, Tokyo Univ. 2, Kobe Univ. 3@*Ramasamy Raju 1 3, Shanmugavelayutham Grusammy 1, Chijimi Shimoe 1, Hiroshi Kajiyama 2, Tsutae Shinoda 2, Yasuyoshi Yaska 3, Ryohei Itatani 1, Takayuki Fukasawa 1 2 |
| ’ | 3 | Production of 1 Meter-Square High-Density Plasma Excited by 915 MHz Surface Wave | Nagoya Univ. 1,Plasma Nano 2@*Takanishi Yudai 1,Endo Hirotaka 1,Okayasu Takafumi 1,Ishijima Tatsuo 2,Toyoda Hirotaka 2,Sugai Hideo 1,2 |
| £ | 4 | Development of Large-volume Plasma Sterilizer with Face-Type Planar Microwave Launchers | Shizuoka Univ. 1, Hamamatsu Univ. Sch. of Med. 2, Nissin Inc. 3, GMA Co. 4@*Mrityunjai K. Singh 1, Ninomiya Keigo 1, Xu Lei 1, Ogino Akihisa 1, Koide Yukio 2, Nanko Shohei 3, Kurawaki Ichiro 4, Nagatsu Masaaki 1 |
| ’ | 5 | Investigation on Effect of Multi-Hole Structured Dielectric Plate on Microwave Plasma | Nagoya Univ. 1, Risoe National Lab. 2, Shibaura Mechatronics Corp. 3@*Nakao Sachiko 1, Stamate Eugen 2, Ganachev Ivan Petrov 1,3, Sugai Hideo 1 |
| £ | 6 | The influence of a gap in the dielectric on the microwave coupling in surfacewave discharge chamber | Graduate School of Electronic Sci. and Technol. Shizuoka Univ. 1, Innovative Joint Research Center, Shizuoka Univ.2@Jan Husarik 1, Milan Širý 2, Masashi Kando 1 |
| | | Break 10:30`10:45 | |
| ’ | 7 | Fast radical process (II) -Behaviors of the fast Ar and N radical- | Nagoya University1, Plasma Nanotechnology Research Center2, Katagiri Engineering CO., LTD3, NU-Eco Engineering CO., LTD4@*Yasuhiro Hara1, Seigo Takashima1, Kouji Yamakawa3, Shouji Den3, Hiroyuki Kano4, Hirotaka Toyoda2, Hideo Sugai1, Masaru Hori1 |
| | 8 | Uniform treatment of inner surface of tubular shape using azimuthally symmetric surface wave-excited plasma source | Nagoya Univ.@*Hiroyuki Kousaka 1, Sho Kishine 1, Noritsugu Umehara 1 |
| £ | 9 | Double probe characteristic in high energy electron beam | Innovative Joint Research Center, Shizuoka Univ.1, Grad. School of Electronic Sci. and Technol., Shizuoka Univ.2 @Milan Širý 1, Jan Husarik 2, Masashi Kando 2 |
| £ | 10 | A new microwave-induced plasma source and its application for poly-Si film deposition using SiCl4 gas | RCPV AIST 1, The Furukawa Electric Co.Ltd 2, TIT 3@*Jia Haijun 1, Kuraseko Hiroshi 2,3, Kondo Michio 1,3 |
| | 11 | Application of Iron evaporator by induction heating for ECR multicharged ion source | Osaka Univ. 1, Tateyama Machine co.,Ltd 2@*Kubo Takashi 1, Asaji Toyohisa 1,2, Sato Fuminobu 1, Kato Yushi 1, Iida Toshiyuki 1 |
| | | Lunch 12:00`13:00 | |
| 30p-G-@/ I |
| ’ | 1 | Numerical analysis of capacitively-coupled plasma with two-dimensional PIC/MC method | Kyoto Univ. 1@*Taro Suzumura 1, Koji Eriguchi 1, Kouichi Ono 1 |
| | 2 | Frequency Dependence of Inductively Coupled Plasma with Single-Loop Antenna | Tokai Univ.1,ULVAC Inc.2@*Kitamura Yuichi 1,Sugiyama Yuichi 1,Kusaba Kouta 1,Jinnbo Yousuke 2,Tsuboi Hideo 2,Asari Shin 2,Kikuchi Masafumi 2,Shindo Haruo 1 |
| | 3 | Discharge Structures of Inductively Coupled Plasmas Driven by Internal Antenna |
Osaka Univ. 1, EMD Corp. 2@*Takenaka Kosuke 1,
Sera Takashi 1, Setsuhara Yuichi 1, Ebe Akinori 2 |
| | 4 | Ion Energy Distributions in Inductively-Coupled Plasmas Driven by Multiple Internal Antenna Units |
Osaka Univ. 1, EMD Corp. 2@*Takenaka Kosuke 1,
Setsuhara Yuichi 1, Ebe Akinori 2, Nishisaka Kazuaki 2 |
| | 5 | Surface charging of insulator and its control in the plasma-based ion process | Ibaraki Univ.1, Doshisha Univ.2@*Takashi Ikehata1, Yuya Nonaka1, Ryoki Nakao1, Naoyuki Sato1, Ken Yukimura2 |
| ’ | 6 | Control of the potention and the incident ion-energy on an insulating workpiece using the dual-plasma ion process | Ibaraki Univ. 1@*Yuya Nonaka 1,Yuichiro Takeshima 1,Hiroki Sato 1,Takashi Ikehata 1,Naoyuki Sato 1 |
| | 7 | Control of surface conditions of chamber with double plasma method | Chubu Univ. 1@*Matsunami Hiroaki 1,Nakamura Keiji 1 |
| | 8 | Negative Ion Plasma Production by Employing High Permittivity Ceramic Discharge Tube(II) | Tokai Univ. 12,KYOCERA Co. 3,NIHONKOSHUHA Co. 4@*Masafumi Suzuki 1,Toru Mitomi 1,Kouta Kusaba 24,Seichi Tanaka 3,Kibatsu Sinohara 4,Haruo Shindo 12 |
| 1.3 Diagnostics of Reactive Plasmas |
| March 30 9:00`14:45 |
| 30a-C-@/ I |
| | 1 | O metastable atoms in rare-gas diluted O2 plasmas and their application to the oxide growth | National Defense Academy 1@*Kitajima Takeshi 1, Ono Makoto 1, Toshiki Nakano 1 |
| | 2 | Comparison of Atomic Hydrogen Densities in between H2/Ar-ICP and CH4/Ar-ICP Using Actinometry | Fac. of Eng. 1, School of Sci. & Technol. 2, Nagasaki Univ.,@*Yoshinobu Matsuda 1, Takashi Shibasaki 1, Masanori Shinohara 1, Hiroshi Fujiyama 2 |
| | 3 | Fulcher-band spectroscopy in high-density recombining hydrogen plasmas with ultralow electron temperatures | Suzuka N.C.T. 1, Nagoya Univ. 2@*Shibagaki Kanji 1, Hirasawa Takuya 1, Sasaki Koichi 2 |
| | 4 | Density distributions of Ti+ in magnetron sputtering plasmas with various discharge gases | Nagoya Univ. 1, Chubu Univ. 2, Canon ANELVA Corp. 3@*N. Nafarizal 1, N. Takada 1, K. Nakamura 2, Y. Sago 3, K. Sasaki 1 |
| ’ | 5 | Large Area Cleaning Process and Gas Phase Diagnostics by Using Nonequilibrium Atmospheric Pressure-Pulsed Plasma(II) | Nagoya University 1, Wakayama University 2, SEKISUI CHEMICAL CO.,Ltd. 3@*Masahiro Iwasaki 1, Masafumi Ito 2, Takuya Yara 3, Tsuyoshi Uehara 3 and Masaru Hori 1 |
| | 6 | Evaluation of EEDF of Microwave Discharge Plasmas by Spectroscopic Characteristics | Tokyo Tech. Int. Grad. Sch. Sci. Eng. 1, Tokyo Tech. Res. Lab. Nucl. Reactors 2@Mizuochi Jun 1, Matsuura Haruaki 2, *Akatsuka Hiroshi 1,2 |
| | | Break 10:30`10:45 | |
| | 7 | Development of Measurement Technique of Absolute Carbon Atom Densities in Reactive Plasma Processes Using Vacuum Ultraviolet Absorption Spectroscopy | Nagoya Univ. 1@*Sasaki Hajime 1,Takashima Seigo 1,Hori Masaru 1 |
| ’ | 8 | Analysis of sputtering process using compact multi micro hollow light source | Wakayama Univ. 1, Nagoya Univ. 2, NU-System 3, NU-EcoEng. 4, Katagiri Eng. 5@Yoshihiro Tachibana 1, Shun Yamashita 1, Takayuki Ohta 1, Masafumi Ito 1, Seigo Takashima 2, Yasuhiro Higashijima 3, Hiroyuki Kano 4, Shoji Den 5, Masaru Hori 2 |
| | 9 | Observation of plasma potential well profile by laser-induced fluorescence method | Hiroshima Univ.@*Furukawa Shinya, Kuramoto Yosuke, Namba Shinichi, Takiyama Ken |
| ’ | 10 | Plasma diagnostics with Terahertz time-domain spectroscopy |
CAMT Osaka Univ. 1, Inst. of Laser Eng. Osaka Univ.
2@*Tomoko Kurose 1, Katsuhisa Kitano 1, Hideaki Kitahara 2, Masahiko Tani
2, Masanori Hangyo 2, Satoshi Hamaguchi 1 |
| ’ | 11 | Collective Thomson Scattering Diagnostics of Discharge Produced Plasmas for EUV light sources | Kyushu Univ. 1, Kumamoto Univ. 2@*Tomita Kentaro 1, Araki Syunji 1, Yamada Takao 1, Kagawa Taisuke 1, Uchino Kiichiro 1, Imamura Hideki 2, Katsuki Sunao 2, Akiyama Hidenori 2 |
| | | Lunch 12:00`13:00 | |
| 30p-C-@/ I |
| ’ | 1 | Rapid transport of nano-particles during pulsed RF discharges with amplitude modulation | Kyushu Univ. 1, AIST 2, ASM Japan 3@*Iwashita Shinya 1, Koga Kazunori 1, Nunomura Shota 2, Shiratani Masaharu 1, Morisada Yoshinori 3, Matsuki Nobuo 3, Ikeda Shingo 3 |
| | 2 | Size and composition of dust collected in LHD VI | Kyushu Univ. 1, NIFS 2@*Shiratani Masaharu 1, Iwashita Shinya 1, Kiridoshi Satoru 1, Koga Kazunori 1, Ashikawa Naoko 2, Nishimura Kiyohiko 2, Sagara Akio 2, Komori Akio 2, LHD Experimental Group 2 |
| ’ | 3 | Neutral Energy Distribution Impinging on the Cathode in Direct-Current Discharges | Osaka Univ. 1, Stanford Univ. 2@Ito Tsuyohito 1, Cappelli Mark 2 |
| | 4 | Estimation of both bias voltage and sheath voltage at sample stage for ICP by use of impedance analysis | Osaka Prefecture Univ. 1@*Hiroaki Kawata 1, Masaaki Yasuda, Yoshihiko Hirai |
| | 5 | Gas analysis using a quartz friction sensor near discharge glows | AIST RIIF 1,@Suzuki Atsushi 1,Kurokawa Akira 1,Nonaka Hidehiko 1 |
| | 6 | Triple Probe and Time Resolved Single Probe Measurements in 40 kHz AC Plasma Discharge | Nagano National College of Tech. 1, Ain Inc. 2@*Yasuhara Kouichi 1, Imaura Kazuyuki 1, Ono Kaoru 2, Ezumi Naomichi 1 |
| | 7 | Measurements of current-voltage characteristics of metals in capacitive coupled Ar rf plasmas II | Hirosima@Kokusai@Gakuin@Univ.@*Takashi Kubo 1 |
| 1.4 Plasma-Based Material Processing |
| March 29 9:00`17:00 |
| 29a-C-@/ I |
| | 1 | Inner Surface Modification of a Small-Diameter Tube by RF Impulse Discharge Using Small Coaxial Electrodes | Grad. School of Eng.,Tohoku Univ. 1@*Muraoka Takumasa 1,Iizuka Satoru 1 |
| £ | 2 | Etching of poly(dimethylsiloxane) for microfluidic systems using a scanning microplasma jet | The Univ. of Tokyo 1, CNBI, The Univ. of Tokyo 2@*Helen M. L. Tan 1, Satoshi Hirata 1, Takanori Ichiki 1,2 |
| | 3 | Photocatalytic effects on glass substrates cleaning by atmospheric pressure plasma | Seikei Univ.1,FuseTechnonet 2@Takashi Yoshikawa 1, Ryo Hosoya 1, Mitsunori Suzaki 2, Yoshinori Tsuda 2, *Yoji Saito 1 |
| | 4 | Plasma Temperature and Particle Velocity Measurements during Atmospheric Pressure Microwave Plasma Spraying | Toyohashi Univ. of Technology@*Toshiaki Yasui 1, Daisuke Yamaguchi 1, Yasuhiro Kimura 1, Masahiro Fukumoto 1 |
| ’ | 5 | Sintering of Transparent Conductive ITO thin film using Gliding Arc | Toyohashi Univ. Technol.1, Sumitomo Osaka Cement Co., Ltd.2, Sintobrator Ltd.3, Daiken Chemical Co., Ltd.4, Gifu Nat. Coll. Technol.5@Ito Yukikazu 1, Shiki Hazime 1, Motoki Junpei 1, Takikawa Hirohumi 1, Ootsuka Takeshi 2, Usuki Eiji 3, Okawa Takashi 4, Yamanaka Shigenobu 4, Sakakibara Tateki 5 |
| | | Break 10:15`10:30 | |
| ’ | 6 | Plasma Surface Treatment of Oxide Ceramics for Hydrogen Production by Water Decomposition | Nagoya University 1,Plasma Nanotechnology Research Center 2@Yamaguchi Yuya 1,Ishijima Tatsuo 2,Sugai Hideo 1,2 |
| | 7 | Mass analysis measurement of a methane discharge plasma gas | Osaka Univ. 1, Sumitomo Metal Technology 2, Kansai Electric Power 3 @*Sugimoto Satoshi 1, Matsuda Yasushi 2, Mori Hideo 3 |
| | 8 | Influence of acceleration voltage in nitriding of Cr-Mo steel in electron beam excited nitrogen plasma | Meijo Univ.@*Yasuharu Yoshikawa 1, Yuki Katayama 1, Petros Abraha 1 |
| £’ | 9 | Effect of pulse-modulated surface-wave plasma treatment on surface modification of polyurethane | Shizuoka Univ.@*Kral Martin, Ogino Akihisa, Narushima Kazuo, Nagatsu Masaaki |
| ’ | 10 | Analysis of Chitosan Film Surface Chemically-Modified by Surface-wave Plasma | Shizuoka Univ.@*Ogino Akihisa, Kral Martin, Narushima Kazuo, Yamashita Mitsuji, Nagatsu Masaaki |
| £ | 11 | Plasma Environment Dependence of Characteristics of Coulomb Type Electrostatic Chuck | Nagoya Univ. 1, Toshiba Corp. 2@*Gyu Il Shim 1, Takeshi Yamauchi 2, Hideo Sugai 1 |
| | | Lunch 12:00`13:00 | |
| 29p-C-@/ I |
| £ | 1 | Study of Low-Temperature Sterilization Using Large-Volume Microwave Plasmas | Shizuoka Univ. 1, Hamamatsu Univ. Sch. of Med. 2@*Xu Lei 1, Ohno Yoshihito 1, Ogino Akihisa 1, Koide Yukio 2, Nagatsu Masaaki 1 |
| | 2 | Generation of plasma in ultra pure water assisted by Ar bubbles and its application to sterilization treatment | Dept.of Eng.Nagoya Univ. 1, West Bohemia Univ. 2, JST,CREST 3, Dept.of Med.Nagoya Univ. 4, EcoTopia Science Inst.Nagoya Univ. 5@*Tomoyuki Takeda 1, Pavel Baroch 2, Takahiro Ishizaki 1, Nagahiro Saito 1.3, Ohta Michio 4, Osamu Takai 3.5 |
| | 3 | Chemical Decomposition Effect of Microwave Plasma Excited in Liquid | Nagoya Univ. 1, Plasma Nanotechnology Reserach Center 2, Honda Electronic 3@Hotta Hirotaka 1, Tatsuo Ishijima 2, Masanori Sato 3, Hideo Sugai 1,2 |
| ’ | 4 | Si homoepitaxial growth by pulsed plasma CVD | CIR Tohoku Univ. 1, Sekisui Chemical Co.,Ltd. 2, AIST. 3, NIMS. 4@*Matsumoto Mitsutaka 1, Suemitsu Maki 1, Yara Takuya 2, Uehara Tsuyoshi 2, Nakajima Setsuo2, Toyoshima Yasutake 3, Chikyow Toyohiro 4, Nagata Takahiro 4, Nakajima Kiyomi 4 |
| ’ | 5 | Discharge power dependence of H atom density in anisotropic CVD plasmas | Kyushu Univ. 1@*Umetsu Jun 1,Koga Kazunori 1,Shiratani Masaharu 1 |
| | 6 | Production of high-density plasma with effects of hollow cathode and secondary electron emission and preparation of a-C:H thin films | Saga Univ. 1, AIST Kyushu 2@Ohtsu Yasunori 1, Nakamura Chisa 1, Misawa Tatsuya 1, Fujita Hiroharu 1, Akiyama Morito 2, Tabaru Tatsuo 2 |
| | 7 | Advanced ceramics synthesis produced by laser/CVD plasma (Plasma Behavior) | JAEA 1,Yamanashi Univ. 2,Ibaraki Univ. 3@*Yamauchi Toshihiko 1,Nakagaki Keita 2,Kanno Yoshinori 2,Kobayashi Seiji 1,Saigusa Mikio 3,Takemoto Ryou 2,Yamashita Naohito 3,Kawashima Tomohiro 3 |
| | 8 | Production of low temperature plasma under low pressure for complex compound synthesis by mass-selective momentum control | Ibaraki Univ.@*Naoyuki Sato, Kousuke Kinoshita, Takashi Ikehata, Satoshi Yamauchi, Jin Oonuki
|
| ’ | 9 | Measurements of Cu and CuCl densities in Cu film deposition by metal chloride reduction plasma CVD | Nagoya Univ. 1, MHI 2, PhyzChemix 3@Furuta Kei 1, Oyama Naoki 2, Tomita Yugo 3, Yahata Naoki 2, Sakamoto Hitoshi 3, Sasaki Koichi 1 |
| | | Break 15:15`15:30 | |
| | 10 | Effect of target element on the mode transition of reactive sputter deposition | Seikei Univ.@*IIMURA Yasuo, NAKANO Takeo, BABA Shigeru |
| | 11 | Why single-crystal target is advantageous over sintered one in sputter-deposition of LiNbO3 films | NTT MI Labs.@*Akazawa Housei 1, Shimada Masaru 1 |
| | 12 | Characteristic of Energy-Controlled Hollow Magnetron O2/Ar RF Plasma and ZnO Deposition | Grad. School Eng., Tohoku Univ. 1@*Ono Hideki 1, Iizuka Satoru 1 |
| | 13 | Effect of Inductively-Coupled Plasma Assist on Conductivity and Deposition Rate of Al-doped ZnO Thin Films | School of Sci. & Technol. 1, Fac. of Eng. 2, Nagasaki Univ., @Shiro Iwai 1, *Yoshinobu Matsuda 2, Masanori Shinohara 2, Hiroshi Fujiyama 1 |
| | 14 | Preparation of super-conductive YBaCuO thin films by RF magnetron plasmas and the plasma diagnostics | Nagoya Univ. 1@*Fukaya Kota 1, Sasaki Koichi 1, Gao Junsi 1, Kimura Taishi 1, Watanabe Mitsuhiro 1, Inoue Masumi 1, Fujimaki Akira 1, Toyoda Hirotaka 1, Iwata Satoshi 1, Sugai Hideo 1 |
| | 15 | Bias effects on space distribution of plasma density near metal wall | Chubu Univ. 1, Canon ANELVA 2@* Ryo Harata 1, Keiji Nakamura 1, Masayoshi Ikeda 2, Yasumi Sago 2 |
| 1.5 Nano-Technologies by Plasma Process |
| March 27 9:30`16:00 |
| 27a-G-@/ I |
| | 1 | Fabrication of multiply twinned molybdenum grains using an atmospheric pressure microplasma and the characterization of the microstructure | AIST 1@*Shimizu Yoshiki 1, Davide Mariotti 1, Sasaki Takeshi 1, Koshizaki Naoto 1 |
| £’ | 2 | Transient Sheath Effect on Plasma Immersion Ion Implantation | Nagoya Univ.@1, Plasma Nanotech. Research Center@2, NGK@3@ *Nicolas Holtzer@1, Hirotaka Toyoda@2, Hideo Sugai@1,2, Takao Saito@3 |
| | 3 | Systematic study of fluorinated CNTs in CF4 plasma by means of HR-TEM analysis | Osaka Univ.@*Shoda Kaoru 1, Takeda Seiji 1 |
| | 4 | Study on surface structure of fluorinated C70 fullerite in CF4 plasma by means of HR-TEM analysis | Osaka Univ. 1@*Shoda Kaoru 1, Takeda Seiji 1 |
| ’ | 5 | Field emission characteristics of vertically aligned CNT emitter fabricated on submicron-sized dot-arrayed catalysts | Shizuoka Univ.@*Matsuda Takafumi, Mesko Marcel, Ogino Akihisa, Nagatsu Masaaki |
| | | Break 10:45`11:00 | |
| ’ | 6 | Discharge Characteristics of Carbon Nanotube Electrode Synthesized on the Apex of Metallic Whisker | Shizuoka Univ.@*Ishikawa Tomokazu, Matsuda Takafumi, Mesko Marcel, Ogino Akihisa, Nagatsu Masaaki |
| | 7 | Numerical Analysis of Radio-Frequency Discharge Plasmas for Carbon Nanotube Growth using Fluid Model | Nagoya Inst. Technol. 1, Hokkaido Univ. 2@*Akinori Oda 1, Atsushi Okita 2, Yoshiyuki Suda 2 |
| £’ | 8 | Low Temperature Growth of Graphene Layers from Ni-C Nanoparticles Using Ion-energy Controlled Plasma CVD | Shizuoka Univ.@*Lu Di, Tanaka Takayuki, Ou Qiongrong, Ogino Akihisa, Mesko Marcel, Nagatsu Masaaki |
| £ | 9 | Fabrication of Narrow Vertically Aligned Carbon Nanotubes on Catalytic Nickel-Carbon Nanoparticles | Shizuoka Univ.@*Mesko Marcel, Ou Qiongrong, Matsuda Takafumi, Tanaka Takayuki, Ogino Akihisa, Nagatsu Masaaki |
| | | Lunch 12:00`13:00 | |
| 27p-G-@/ I |
| ’ | 1 | Synthesis of Nitrogen-Atom Encapsulated Fullerene Using Highly-Dissociated Nitrogen Plasma Implantation | Tohoku Univ.@*Abe Shigeyuki, Ishida Hiroyasu, Nishigaki Shohei, Kaneko Toshiro, Hatakeyama Rikizo |
| ’ | 2 | The radical effect on synthesis of nitrogen-atom encapsurated fullerene | Tohoku Univ. 1@*Takahiro Endo 1, Wataru Oohara 1, Rikizo Htakeyama 1 |
| | 3 | Formation of Gas-Atom Encapsulated Silicon Fullerenes using Silicon - Rare Gas Mixed Plasmas | Tohoku Univ. 1@*Kaneko Toshiro 1, Ejiri Kota 1, Yabuno Masahiro 1, Hatakeyama Rikizo 1 |
| ’ | 4 | Preparation of Platinum Nanoparticle by Plasma in Liquid | Graduate School of Engineering, Nagoya Univ. 1,EcoTopia Science Inst.,Nagoya Univ. 2,CREST,JST 3@*Taku Nishigai 1,Takahiro Ishizaki 1, Nagahiro Saito 1,3,Osamu Takai 2,3 |
| | 5 | Fabrication of tunable photoluminescent silicon nanocrystal using microplasma reactor | Tokyo Tech. 1@Nozaki Tomohiro 1, Sasaki Kenji, Ogino Tomohisa, Okazaki Ken |
| | 6 | Fabrication of Diamond Nano-whiskers Using Oxygen Plasma Etching | Kochi Univ. of Technol.@Takaki Hirokazu 1, Furukawa Masahide 1, Li Chaoyang 1, Hatta Akimitsu 1 |
| | | Break 14:30`14:45 | |
| | 7 | Influences of substrate inclination on structural properties of reactivesputtered tin-nitride films | Dept. Eng., Nagoya Univ. 1, Graduate School of Eng., Nagoya Univ. 2, EcoTopia Science Inst., Nagoya Univ. 3@*Kurebayashi Norihiko 1, Kuranaga Toshihide 2, Takaba Hidetaka 2, Inoue Yasushi 3, Takai Osamu 3 |
| £’ | 8 | Characteristics of ZnO Nano-phosphors Fabricated Using YAG Laser Ablation Method | Shizuoka Univ.@*Ou Qiongrong, Ogino Akihisa, Nagatsu Masaaki |
| | 9 | Effect of glancing angle deposition on gallium-doped InN films prepared by low pressure reactive ion plating | Graduate School of Eng., Nagoya Univ. 1, EcoTopia Science Inst., Nagoya Univ. 2@*Takaba Hidetaka 1, Kuranaga Toshihide 1, Saito Nagahiro 1, Inoue Yasushi 2, Takai Osamu 2 |
| | 10 | Influence to a-Si:H Nanoball Films by increase of ion bombardment energy | Waseda Univ. 1@Sanada Hiroshi 1,*Onodera Makoto 1,Miyakawa Keisuke 1,Sakamoto Hajime 1,Kato Isamu 1 |
| | 11 | Electrochromic properties of microvillus-like InN films prepared by evaporation assisted with active nitrogen source | Graduate School of Eng. Nagoya Univ.1, EcoTopia Science Inst. Nagoya Univ.2, Dept.of Eng. Nagoya Univ.3@Toshihide Kuranaga 1, Yasushi Inoue 2, Hidetaka Takaba 1, Norihiko Kurebayashi 3, Osamu Takai 2 |
| 1.6 General Topics of Plasma Discharges |
| March 29 |
| 29a-A-@/ I |
| |
|
Short Presentation (5min.) 9:00`11:40
29a-A-1`29@Poster Session15:30`17:30 |
| | 1 | Discharge characteristics of atmospheric microplasma using dielectrics with high secondary-emission-coefficient | Saga Univ. 1@*Ohtsu Yasunori 1, Yamasaki Naoto 1, Misawa Tatsuya 1, Fujita Hiroharu 1 |
| | 2 | Discharge Characteristics of Capacitively Coupled Microplasma in Glass Capillary | Tokyo Metropolitan Univ. 1@*Ichinose Ayako 1, Tochikubo Fumiyoshi 1, Uchida Satoshi 1, Watanabe Tsuneo 1 |
| | 3 | Measurement of Gas Discharge Parameter (56)-Measurement of Electron Swarm Parameters in Mixtures of Xe+CO2,Xe+N2 |
Tomakomai Coll. of Tech.1,Hokkaido Univ.2,Hokkaido
Ins. of Tech.3@*Hasegawa Hirokazu1,Sato Yuta1,Shibata Noto1,Date Hiroyuki2,Shimozuma
Mituo3 |
| | 4 | Time dependence of the emission spectrum from a small cell in Plasma Display Panel II | Grad. School of Advanced Sci. of Matter, Hiroshima Uni.@Giichiro Uchida 1, Hiroshi Kajiyama 1, Tsutae Shinoda 1 |
| | 5 | PDP like Coplanar Barrier Discharge Mechanism studied from a wall voltage measurement | Univ.of Yamanashi 1, NHK Sci.and Tech.Res. Labs 2,@*Hisashi Yoda 1,Keisuke Yamamoto 1,Takeki Sakurai 1,Ishii Keiji 2,Yukio Murakami 2, |
| | 6 | Absorption measurement of the excited atom near the wall surface in a barrier discharge using an optical waveguide | Univ.of Yamanashi 1@*Daisuke Hara 1,Shouji Kakio 1,Takeki Sakurai 1 |
| | 7 | Influence of Electrode Configuration on Discharge Formation for Microplasma Array | Tokyo Metropolitan Univ. 1@*Kubota Takashi 1,Uchida Satoshi 1,Tochikubo Fumiyoshi 1 |
| | 8 | Numerical analysis for atmospheric microplasma in Nitrogen | Tokyo Metropolitan Univ. 1,@*Takagi Yugo 1,Uchida Satoshi 1,Tochikubo Fumiyoshi 1 |
| | 9 | Modeling of dielectric barrier discharge (12) –Excimer Density Distribution with Gas Temperature Rise– | National Defense Academy 1, Nagoya Inst. of Tech. 2, Hokkaido Univ. 3@*Akashi Haruaki 1, Oda Akinori 2, Sakai Yosuke 3 |
| | 10 | Effect of oxygen addition on discharge characteristics of MgO films deposited by sputtering | Kanagawa Inst. of Tech.@*Misu Takayuki, Sugimoto Masanori, Goto Miki, Arai Toshihiko |
| | 11 | Uniform Discharge Generated in Atmospheric Nitrogen Excited by AC/Pulsed Voltage Sources | Tokyo Tech 1,NGK, Ltd. 2@*Yoshiki Kato 1,Koichi Yasuoka 1,Shozo Ishii 1,Yoshihiko Ishida 2,Hiroyuki Katsukawa 2 |
| ’ | 12 | Measurement of Gas Flow Induced by Plasma Actuator with Laser Doppler Velocimeter | Tokyo Tech 1@*Takeuchi Nozomi 1, Yasuoka Koichi 1, Ishii Shozo 1 |
| | 13 | CF4 Decomposition by Pulsed-Electron-Beam Generated Atmospheric-Pressure Low-Temperature Plasmas | AIST 1@*Okuda Isao 1,Takahashi Eiichi 1, Kato Susumu 1, Matsumoto Yuji 1 |
| ’ | 14 | Relation between antenna gap and luminous efficacy of the antenna-excited microwave discharge lamp | Grad. School of Eng., Shizuoka Univ. 1@*Ohishi Youhei 1, Matsuda Itsuki 1, Kando Masashi 1 |
| | 15 | Optical Emission Spectroscopy of Water Vapor Microwave Discharge Plasma | Kochi Univ. Technol. 1, JST Kochi 2@Kawamura Kazumasa 1, Yanai Keishi 1, Bimal Kumar Pramanik 1, Oh Jun-Seok 2, Hatta Akimitsu 1 |
| | | Break 10:15`10:30 | |
| | 16 | Application of pulse-modulated atmospheric microplasma to thin film coating | AIST 1@*Shimizu Yoshiki 1, Davide Mariotti 1, Takeshi Sasaki 1, Naoto Koshizaki 1 |
| £ | 17 | Analysis of atmospheric microplasma processing by optical emission spectroscopy | AIST 1@*Davide Mariotti 1, Shimizu Yoshiki 1, Sasaki Takeshi 1, Koshzaki Naoto 1 |
| ’ | 18 | Control of Electromagnetic Wave Propagation and Excitation of Surface Mode in Microplasma Arrays | Kyoto Univ. 1@*Naito Teruki 1,Sakai Osamu 1,Tachibana Kunihide 1 |
| | 19 | The Microwave Propagation via Laser Induced Plasma Channels | Osaka Univ. 1, Laser Eng. Inst. 2, Laser Tech. Inst. 3@*Nakajima Hirotomo 1, Hashimoto Kazuhisa 2, Yamaura Michiteru 3, Shimada Yoshinori 3, Fujita Masayuki 3, Tanaka A. Kazuo 1,2 |
| | 20 | Inelastic Processes in a Low Pressure Inductively Coupled CH4/H2 Plasma | NIMS 1@*Katsuyuki Okada 1, Shojiro Komatsu 1, Seiichiro Matsumoto 1 |
| | 21 | Properties of Ar/O2 Mixture Plasmas Driven by Multiple Internal Antenna Units | Osaka Univ. 1, EMD Corp. 2, Sung Kyun Kwan Univ. 3@*Takenaka Kosuke 1, Setsuhara Yuichi 1, Ebe Akinori 2, Kim Yong-Mo 3, Han Jeon G. 3 |
| ’ | 22 | Effect of Gas Species on Sterilization Process inside Thin Tube Using Line-shaped Dielectric Barrier Discharge | Shizuoka Univ.@*Eto Hiroyuki, Ono Yoshihito, Ogino Akihisa, Nagatsu Masaaki |
| ’ | 23 | Internal Sterilization of Perforated Packaging Using Sheet-like Dielectric Barrier Discharge | Shizuoka Univ.@*Ono Yoshihito, Eto Hiroyuki, Ogino Akihisa, Nagatsu Masaaki |
| £ | 24 | Anti-bacteria Property of Hydrogen-free Carbon Films Grown with Microwave Plasma at Low Temperature | Shizuoka Univ.@*Zhou Haiyang, Xu Lei, Ogino Akihisa, Nagatsu Masaaki |
| | 25 | Characteristics of Surface Sterilization Using Microwave Plasma Torch | Saga Univ. 1, Ryukyu Univ. 2@*Nobuya Hayashi 1, Tetsushi Tomari 1, Hiroyuki Ito 1, Zenya Toyama 2, Akira Yonesu 2 |
| ’ | 26 | Atmospheric pressure plasma sterilization with water micro-mist | Osaka Univ. 1@*Yoshiki Ogiyama 1, Keiji Iwamoto 1, Hiromasa Ohmi 1, Hiroaki Kakiuchi 1, Kiyoshi Yasutake 1 |
| £ | 27 | Atmospheric glow discharge using the electrolyte solution | Saitama Univ. 1@Qiang Chen 1,Kenji Saito 1,Yasushi Yamano 1,Hajime Shirai 1 |
| | 28 | Diagnostics of the plasma-electrolyte solution interface | Saitama Univ. 1@Kenji Saito 1,Qiang Chen 1,Yasushi Yamano 1,Hajime Shirai 1 |
| ’ | 29 | Development of Green mold sterilization employing nonequilibrium atmospheric pressure plasma | Wakayama Univ. 1,NU EcoEngineering Co.LTD. 2,NU system Co.LTD. 3,Nagoya Univ. 4@*Sachiko Iseki 1,Akiyoshi Aomatsu 1,Takayuki Ohta 1,Masafumi Ito 1,Hiroyuki Kano 2,Yasuhiro Higashijima 3,Masaru Hori 4 |
| 1.7 Plasma Etching |
| March 27 9:00`17:45 |
| 27a-H-@/ I |
| ’ | 1 | Effect of Substrate Bias in Silicon Etching Employing by High Permittivity Ceramic Discharge Tube | Tokai Univ. 12,Kyocera Co. 3,NIHON KOSHUHA Co. 4,@Kota Kusaba 14,Seiichi Tanaka 3,Masahumi Suzuki 2,Toshitugu Morishita 2,Tomonori Mori 2,Kibatu Shinohara 4,Haruo Shindo 12 |
| | 2 | High aspect ratio silicon trench Etching by using SF6 gas chemistry | Toshiba Corporation@*Musha yuta 1,Sakai Takayuki 1 |
| | 3 | Development of Uniformity Control Process in Si Deep Etching by NLD plasma | ULVAC,Inc.Inst.for Semiconductor Technologies 1@*Murayama Takahide 1,Yamaguchi Kousaku 1,Morikawa Yasuhiro 1,Suu Koukou 1 |
| ’ | 4 | Study of Silicon Dicing Process Using an Atmospheric-pressure Microplasma | Meijo Univ. 1, Nagoya Univ. 2, AIST 3@*Hirotoshi Inui 1, Takuya Ideno 2, Hiroyuki Fujiwara 3, Atsushi Masuda 3, Michio Kondo 3, Mineo Hiramatsu 1, Masaru Hori 2 |
| | 5 | Development of the dry etching method using solid source by Atmospheric Pressure plasma Enhanced Chemical Transport (I) | Osaka Univ.1@Kishimoto Kazuya 1 |
| | 6 | Analysis of Plasma-Surface Interactions during Etching by In-situ Diagnostics of Reactants and Reaction Products | Kyoto Univ. 1@Masahiro Yoshida 1, Yoshinori Ueda 1, Koji Eriguchi 1, Kouichi Ono 1 |
| | | Break 10:30`10:45 | |
| ’ | 7 | Modeling of Si-MEMS Fabrication by Two Frequency Capacitively Coupled Plasma in SF6/O2 (I) | Keio Univ. 1@*Fukutaro Hamaoka 1, Takashi Yagisawa 1, Toshiaki Makabe 1 |
| | 8 | Model analysis of ion reflection on feature surfaces and its effect on profile evolution during Si etching in bromine-containing plasmas | Grad. School of Eng., Kyoto Univ. 1, Hitachi Central Research Lab. 2@*Irie Shouki 1, Mori Masahito 2, Koji Eriguchi 1, Naoshi Itabashi 2, Ono Kouichi 1 |
| ’ | 9 | Etching characteristics of high-k gate dielectric using ECR plasmas (5) | Kyoto Univ. 1@*Hamada Daisuke 1, Nakamura Keisuke 1, Eriguchi Kouji 1, Ono kouichi 1 |
| | 10 | Transcription of Carbon Nanowall Pattern into SiO2 film | Meijo Univ. 1, Nagoya Univ. 2@*Noda Akio 1, Hiramatsu Mineo 1, Hori Masaru 2 |
| ’ | 11 | Measurements of Sputtering Yields by CF3 Ion Beam Injection Superposed with Light Irradiation | Osaka Univ. 1, AIST 2@*Ikuse Kazumasa 1, Yoshimura Satoru 1, Kiuchi Masato 1,2, Takizawa Toshifumi 1, Toyoshima Takahiro 1, Karahashi Kazuhiro 1, Hamaguchi Satoshi 1 |
| | | Lunch 12:00`13:00 | |
| 27p-H-@/ I |
| | 1 | The construction of CF plasma reaction model for optimization of etching shape | The Univ. of Tokyo@*Seki Atsushi 1, Shimogaki Yukihiro 1 |
| | 2 | Angular distribution of desorbed products from Si and SiO2 surfaces by CF3+ irradiation |
Center for Atomic and Molecular Technologies, Osaka
Univ.@*Karahashi Kazuhiro, Hamaguchi Satoshi |
| ’ | 3 | Analysis of the Behavior of Reactive Particles in Microstructures and the Etching Feature Profile | Kyoto Univ. 1@*Hiroshi Fukumoto 1, Koji Eriguchi 1, Koichi Ono 1 |
| | 4 | An investigation of profile control mechanisms for quartz glass etching in fluorocarbon plasmas | Toppan Printing Co., Ltd. 1@*Tada Makoto 1, Fukugami Norihito 1 |
| ’ | 5 | Behaviors of H2 and N2 radicals in 100MHz capacitively coupled H2/N2 gas plasmas | Nagoya Univ. 1, COM Denshi Kaihatsu Corp. 2,Katagiri Engineering Co.,Ltd 3@Yamamoyo Hiroshi 1, Takashima Seigo 1, Kawauchi Ryota 2, Takahashi Syunji 1,3, Den Shoji 3 and Masaru Hori1 |
| | 6 | Damages on Low-k films due to VUV light, UV light, radical and ion in dual frequency capacitively coupled plasma etching process(III) | Nagoya Univ. 1, Sony Corp. 2@*Seigo Takashima 1, Saburo Uchida 1, Masanaga Fukasawa 2, Keiji Ohshima 2, Kazunori Nagahata 2, Tetsuya Tatsumi 2, Masaru Hori 1 |
| | 7 | MD simulations of CN film formation during organic polymer etching III | Osaka Univ. 1, AIST 2@*Yamashiro Masashi 1, Yamada Hideaki 2, Hamaguchi Satoshi 1 |
| | 8 | SiOCH damage reduction during N-H plasma exposure | Sony Corp. 1, Nagoya Univ. 2@Fukasawa Masanaga 1, Tatsumi Tetsuya 1, Nagahata Kazunori 1, Uchida Saburo 2, Takashima Seigo 2, Hori Masaru 2, Kamide Yukihiro 1 |
| ’ | 9 | Molecular Dynamics Simulation of Hydrogen Ion Bombardment Damage on SiO2 | CAMT, Osaka Univ. 1, SONY Corp. 2@Toshifumi Takizawa 1, Shoji Kobayashi 2, Tetsuya Tatsumi 2, Satoshi Hamaguchi 1 |
| | | Break 15:15`15:30 | |
| | 10 | Reduction and Restoration of Plasma-induced Defects in SiO2 film | Tohoku Univ. 1, Tsukuba Univ. 2, AIST 3@*Ishikawa Yasushi 1, Ichihashi Yoshinari 1, Uedono Akira 2, Yamasaki Satoshi 3, Samukawa Seiji 1 |
| ’ | 11 | Etching Processes for Low-k Films Using the Neutral Beam (2) | Tohoku Univ. 1@*Jinnai Butsurin 1, Samukawa Seiji 1 |
| | 12 | Investigation of Plasma Radiation Damage to Magnetic Tunnel Junction Elements | Tohoku Univ. 1, NEC Corp. 2@*Mukai Tomonori 1,2, Jinnai Butsurin 1, Fukumoto Noriyuki 2, Ohshima Norikazu 2, Hada Hiromitsu 2, Samukawa Seiji 1 |
| | 13 | Plasma-damage prediction system with combination of on-wafer monitoring and neural network modeling (II) | Tohoku Univ. 1@*Ohtake Hiroto 1, Ishikawa Yasushi 1, Ichihashi Yoshinari 1, Samukawa Seiji 1 |
| | 14 | Development of atomic radical monitoring probe for spatial distribution measurements and application to ashing processes | Nagoya Univ. 1, Katagiri Eng. 2, NU-EcoEng. 3@*Seigo Takashima 1, Syunji Takahashi 1,2, Koji Yamakawa 2, Shoji Den 2, Hiroyuki Kano 3, Masaru Hori 1 |
| | 15 | Interactive analysis of plasma cleaning using ATR-FTIR and radical distribution monitor | CRL, Hitachi@Junichi Tanaka 1, Kazuyuki Ikenaga 1, Naoshi Itabashi 1 |
| | 16 | Reduction of Degradation of Electrostatic Chuck in Dielectric Etchers in Wafer-less Plasma Cleaning | CRL Hitachi Ltd. 1, Hitachi High-Technologies 2@*Maeda Kenji 1, Tamura Tomoyuki 2, Andou Youji 2, Kobayashi Hiroyuki 1, Kanekiyo Tadamitsu 2, Izawa Masaru 1 |
| | 17 | Chamber Potential Measurements Using Capacitance Probe | Fuji Electric Advanced Tech. 1, Musashi Inst. Tech. 2@Yajima Ayako 1, *Fujikake Shinji 1, Ichikawa Yukimi 1, Matsumura Shousaku 2 |
| | 18 | Real-time estimation & automatic adjustment technology of oxide etch-rate distribution using plasma emission intensity profile | Hitachi,Ltd.,Central Research Lab.@*Yokogawa Ken'etsu1, Maeda Kenji1, Izawa Masaru1 |