| 7 Beam Technologies |
| 7.1 X-ray
Technologies |
| September 5 9:30`17:50 |
| 5a-V-@/ II |
| |
1 |
Development of two-concave-mirror aplanat tolerating
large misalignments for sofx X-ray imaging. |
IMRAM, Tohoku Univ. 1@*Toyoda Mitsunori 1, Yamamoto
Masaki 1, Yanagihara Mihiro 1 |
| |
2 |
Wavelength Matching of Multilayer Mirrors for a
Laboratory EUV Microscope |
CAMS IMRAM Tohoku Univ. 1@*Harada Tetsuo 1, Furudate
Minaji 1, Hatano Tadashi 1, Yamamoto Masaki 1 |
| |
3 |
Study on titanium oxide/nickel oxide multilayer
mirror for attosecond soft x rays |
Osaka City Univ. 1@Masuda Yusuke 1,Fujimoto Toshihiko
1,*Kumagai Hiroshi 1,Kobayashi Ataru 1 |
| |
4 |
Surface Milling of Soft-X-ray Multilayer Mirror
for Sub-nm Figure Error Correction using a $\phi$150 mm Ion Gun |
IMRAM, Tohoku Univ.@*Tosaka Aki, Sakai Yu, Tsuru
Toshihide, Yamamoto Masaki |
| |
5 |
Development of transmission X-ray multilayer mirror
microscope gTXM3h using LPP light source |
IMRAM, Tohoku Univ.@T. Ejima 1, Y. Nakamura 1,
M. Toyoda 1, T. Harada 1, M. Furudate 1, A. Arai 1, T. Tsuru 1, T. Hatano
1, M. Yanagihara 1, M. Yamamoto 1 |
| |
6 |
Application of X-ray absorption spectrometry for
the study of EUV projection optics contamination II |
Univ. Hyogo 1, EUVA 2, Canon 3@*Niibe Masahito
1, Koida Keigo 1, Kakutani Yukinobu 1,2, Matsunari Shuichi 2, Aoki Takashi
2, Terashima Shigeru 2, Takase Hiromitsu 2, Watanabe Yutaka 2, Murakami
Katsuhiko 2, Fukuda Yasuaki 2, Gomei Yoshio 3 |
| |
|
Break 11:00`11:15 |
|
| |
7 |
The Study on the Excitation of X-rays Using LiNbO3
Single Crystal |
Faculty of Engineering ,Doshisha Univ.1, Inst.of
Chemical Reseach Kyoto Univ.2@*Mizoguchi Tadahiro 1, Fukao Shinji 1, Nakanishi
Yoshikazu 1, Ito Yoshiaki 2, Yoshikado Shinzo 1 |
| |
8 |
Reflected X-rays excited from the end face of thin
film |
IMR, Tohoku Univ. 1, Fac. of Eng., Gunma Univ.
@Hayashi Kouichi 1, Yamamoto Tokujiro 1, Kitani Yusuke 2, Suzuki Kosuke
2, Ito Masahisa 2 |
| |
9 |
Polarization Phenomena & Structures of Electrodes
and Interfaces in Diode-type CdTe X-ray Detectors |
SPring-8/JASRI 1, SPring-8/NIMS 2, SPring-8/RIKEN
3, Present: Ricoh 4@*Okada Kyoko 1, Sakurai Yoshiharu 1, Yasufuku Hideyuki
2,4, Yoshikawa Hideki 2, Suematsu Hiroyoshi 3 |
| |
10 |
X-Ray Inspection Microscope capable of high Resolution
better than 0.1Κm |
Tohken Co.,Ltd. X-Ray R&D Dept.@*Saito Yasushi,
Kai Hiromi, Shirota Kouhei, Yada keiji |
| |
11 |
Low-Voltage Projection X-Ray Microscopy for Samples
Consisting of Light Elements |
TOHKEN CO., LTD. X-Ray R&D DEPT.@*Minami Katsunori
1, Oguchi Masao 1, Yada Keiji 1 |
| |
|
Lunch 12:30`13:30 |
|
| 5p-V-@/ II |
| |
1 |
Structure Analysis of Nano Particle Suspension
by Ultra-SAXS using Synchrotoron Radiation |
Univ. of Hyogo 1,HSTA 2@*Fujimura Eisaku 1,Li Lei
2,Kuwamoto Shigeo 2,Yokoyama Kazushi 2,Matsui Junji 1,2 |
| |
2 |
Development of observation method of grain boundary
in stainless steel by using white x-ray micro beam and image detector |
JASRI 1,INSS 2@*Kajiwara Kentaro 1,Sato Masugu
1,Hashimoto Tamotsu 1,Arioka Koji 2 |
| |
3 |
Structural studies of sarcoptic mites by Micro-CT
in SPring-8 |
Meiji University 1, JASRI2, Higashikawafs Dermatology
Office 3, R. Nakamura Skin Clinic 4,Y. Mori Clinic (Dermatology) 5@*Hideyuki
Yoshimura@1, Takuji Ohigashi@2, Masayuki Uesugi@2, Kentaro Uesugi 2, Kunio
Shinohara 2, Toshiaki Higashikawa 3, Ryuichi Nakamura 4, Yoshinori Mori
5 |
| |
4 |
Coherent X-ray imaging by use of a phase retrieval
with an array filter of rectangular apertures |
Shizuoka Univ.@Nakajima Nobuharu |
| |
5 |
Design and characterization of a monochromator
and a beam splitter using sapphire single-crystals |
Univ. of Hyogo 1@*Abe Maiko 1,Takahata Sayuri 1,Takeda
Shingo 1,Takano Hidekazu 1,Tsusaka Yoshiyuki 1,Kagoshima Yasushi 1,Matsui
Junji 1 |
| ’ |
6 |
Fast X-ray CT with a high-speed camera and applocation
for 4-dimensional observation |
Graduate School of Material Science, Univ.of Hyogo@Yoshida
Keisuke 1,Koyama Takahisa 1,Tsuji Takuya 1,Takano Hidekazu 1,Tsusaka Yoshiyuki
1,Kagoshima Yasushi 1 |
| |
7 |
Evaluation for Spatial Coherence of Synchrotron
Radiation by Hard X-ray Youngfs Interferometer |
Univ. of Hyogo 1@Takuya Tsuji 1, Keisuke Yoshida
1, Takahisa Koyama 1, Hidekazu Takano 1, Yoshiyuki Tsusaka 1, Yasushi Kagoshima
1 |
| |
8 |
JJAP Young Scientist Award
Hard X-Ray Nano-Interferometer and Its Application to High-Spatial-Resolution
Phase Tomography |
University of Hyogo@Takahisa Koyama |
| |
|
Break 15:35`15:50 |
|
| |
9 |
Young Scientist Award for the Presentation of an
Excellent Paper
PIC simulation for B-field shield of ion debris in LPP-EUV light source |
ILE Osaka Univ.@Nunami Masanori 1, Takata Akira
1, Nishihara Katsunobu 1 |
| ’ |
10 |
Diagnostics of debris from laser-produced tin plasma
using mass-limited target for EUV light source |
Grad. Sch. of I.S.E.E. Kyushu Univ. 1, Sch. of
Medicine. Kyushu Univ. 2@Daisuke Nakamura 1, Koji Tamaru 1, Tomoya Akiyama
1, Akihiko Takahashi 2, Tatsuo Okada 1 |
| |
11 |
Debris characteristics of a laser-produced EUV
plasma tin oxide colloidal target |
Univ. of Miyazaki 1@Sumihiro Suetake 1, Yusuke
Senba 1, Masanori Kaku 1, and Shoichi Kubodera 1 |
| |
12 |
Debris Evaluation of CO2 Laser Produced
Tin Plasma for EUV Light Source |
EUVA Hiratsuka Research & Development Center 1@*Ueno
Yoshifumi 1, Georg Soumagne 1, Endo Akira 1, Sumitani Akira 1 |
| |
13 |
Studies of the removal a tin thin film by hydrogen/argon
plasma(II) |
Univ.of Hyogo 1@*Nakashima Noriyuki 1,Azuma kingo
1,Fujiwara Etsuo 1 |
| ’ |
14 |
Abusolute measurement of out-of-band radiation
from laser-produced tin plasmas of EUV light source |
ILE Osaka Univ. 1, Graduate School of Engineering
Hiroshima Univ. 2, ILT 3@*Sakaguchi Hirokazu 1, Fujioka Shinsuke 1, Namba
Shinichi 2, Nishimura Hiroaki 1, Norimatsu Takayoshi 1, Sunahara Atsushi
3, Nishihara Katsunobu 1, Miyanaga Noriaki 1, Izawa Yasukazu 1, Mima Kunioki
1 |
| |
15 |
EUV conversion efficiency generated by sub- ns
pulse laser produced plasma |
ILE Osaka univ. 1, ILT 2@* T.Aota1, S.Fujioka1,
M.Shimomura1, H.Sakaguchi1, Y.Nakai1, H.Nishimura1, K.Nishihara1, A.Sunahara2,
N.Miyanaga1, Y.Izawa1, K.Mima1 |
| |
16 |
Characteristics of EUV radiation from CO2
laser-produced plasmas with punch-out target |
ILE Osaka Univ. 1,ILT 2@*Maeda Shinsuke 1,Shimada
Yoshinori 2,Yamaura Michiteru 2,Fujioka Shinsuke 1,Sunahara Atsushi 2,Kimura
Yasuko 1,Nagai Keiji 1,Norimatsu Takayoshi 1,Nishimura Hiroaki 1,Nishihara
Katsunobu 1,Miyanaga Noriaki 1,Izawa Yasukazu 1,Mima Kunioki 1 |
| 7.1 X-ray
Technologies |
| September 6 9:30`12:30 |
| 6a-V-@/ II |
| |
1 |
Development of Tin Droplet Target for LPP-EUV Light
Source |
EUVA Hiratsuka R&D Center 1@Nakano Masaki 1, Yabu
takayuki 1, Endo Akira 1, Sumitani Akira 1 |
| ’ |
2 |
Laser Induced Fluorescence images of pre-plasmas
generated from drop targets |
ILE Osaka Univ. 1@Shimomura Masashi 1, Nakai Yuki
1, Fujioka Shinsuke 1, Aota Tatsuya 1, Nishimura Hiroaki 1, Nishihara Katsunobu
1, Miyanaga Noriaki 1, Izawa Yasukazu 1, Mima Kunioki 1 |
| |
3 |
Developments of droplet target for EUV light source
(V) |
Univ. of Hyogo 1, ILE Osaka Univ. 2@*Fujiwara Etsuo
1, Shibanoki Takashi 1, Nishimura Hideaki 2 |
| |
4 |
Theoretical Study on Neutral Debris using Tin Targets |
Inst. Lasr. Technol. 1, Inst. Lasr. Eng. Osaka
Univ. 2@*Furukawa Hiroyuki 1, Nishihara Katsunobu 2 |
| |
5 |
Two-dimensional Radiation Hydrodynamic Simulation
on Extreme Ultra-Violet Emission from Laser-produced Plasmas III |
Inst. Laser Technology 1, JAEA 2, Inst. Laser Engineering
Osaka Univ. 3@*Atsushi Sunahara 1, Akira Sasaki 2, Hirofumi Ueda 3, Katsunobu
Nishihara 3, Tatsuya Aota 3, Shinsuke Fujioka 3, Michiteru Yamaura 1, Yoshinori
Shimada 1, Hiroaki Nishimura 3, Noriaki Miyanaga 3, Yasukazu Izawa 3, Kunioki
Mima 3 |
| |
6 |
Modeling of the radiation transport coefficient
for the EUV source plasmas |
JAEA 1, ILT 2, ILE Osaka Univ. 3, Okayama Univ.
4, Kitazato Univ 5, Tokyo Metropolitan Univ. 6@Sasaki Akira 1, Sunahara
Atsushi 2, Nishihara Katsunobu 3, Nishikawa Takeshi 4, Kokie Fumihiro 5,
Tanuma Hajime 6 |
| |
|
Break 11:00`11:15 |
|
| |
7 |
Improvement of EUV conversion efficiency with CO2
laser and double pulses 2 |
Osaka Univ. 1,ILE 2,ILT 3@*Ueda Hirofumi 1 2,Nishihara
Katsunobu 2,Sunahara Atsushi 3 |
| ’ |
8 |
Properties of EUV radiation from laser-irradiated
tin drop target |
ILE Osaka Univ. 1, ILT 2@Nakai Yuki 1, Fujioka
Shinsuke 1, Aota Tatsuya 1, Shimomura Masashi 1, Sakaguchi Hirokazu 1, Sunahara
Atsushi 2, Nishihara Katsunobu 1, Nishimura Hiroaki 1, Miyanaga Noriaki
1, Izawa Yasukazu 1, Mima Kunioki 1 |
| |
9 |
Development of technologies for delivering droplets
of suspension; evaporation of droplets |
AIST-ASRC@Sarjono 1, Hidehiko Yashiro 1, Toshihisa
Tomie 1 |
| |
10 |
Development of EUV light source with laser-produced
tin plasma by use of cylindrically holed target |
Osaka Univ. 1 @*Motohiro Nakano 1, Yuko Otani 1,
Yasuyuki Sanda 1, Haruyuki INOUE 1, Yasushi Oshikane 1, Toshihiko Kataoka
1 |
| |
11 |
Laser wavelength dependence of EUV source using
a forced recombination Li target |
Univ. of Hyogo LASTI 1, Grad. School of Eng. 2@Akihisa
Nagano 1, Tomoaki Inoue 1, Kazuya Masuda 1, Sho Amano 1, Tsuguhisa Sekioka
2, Shuji Miyamoto 1, and Takayasu Mochizuki 1 |
| 7.2 Electron
Microscopy and Diagnostics |
| September 4 9:30`16:00 |
| 4a-V-@/ II |
| |
1 |
Design of a Remote Control System for UHVEM with
a HDTV System |
Research Center for Ultra High Voltage Electron
Microscopy Osaka Univ. 1,Cybermedia Center Osaka Univ. 2,Hitachi High-Technologies
Co. 3,Center for Advanced Research of Energy Technology Hokkaido Univ. 4@*Yoshida
Kiyokazu 1,Shimojo Shinji 2,Mogaki Hiroaki 3,Furutu Tadao 3,Shibayama Tamaki
4 ,Nishi Ryuji 1,Mori Hirotaro 1 |
| ’ |
2 |
Development of low-energy electron diffraction
microscope |
Waseda Univ. 1, PRESTO JST 2, APCO 3, HOLON 4,
DENKA 5@Tsuyoshi Ishikawa 1, Tomohiro Urata 1, Boklae Cho 2, Keiko Ogai
3, Akira Yonezawa 4, Ryozo Nonogaki 5, Chuhei Oshima 1 |
| |
3 |
Reduction of Spatial Resolution by MCP in LEEM/PEEM |
Osaka Electro-Commun. Univ. 1@Shimizu Hiroshi 1,
*Yasue Tsuneo 1, Koshikawa Takanori 1 |
| |
4 |
Development of a portable air sampler for individual
particle analysis by TOF-SIMS |
Kogakuin Univer1@*Yamaguchi Jun1,Yokoe Masato2,
Sakamoto Tetsuo1 |
| |
5 |
Development of FIB-REMPI Method, Alignment of Laser
Axis |
Kogakuin Univ. 1@*Kawasaki Junji 1,Koizumi masaomi
1,Sakamoto Tetsuo 1 |
| |
6 |
Internal Energy Analysis of Atoms Sputtered with
Ga-FIB |
Kogakuin Univ. 1@*Koizumi Masaomi 1, Kawasaki Jyunji
1, Ito Toshiyuki 1, Sakamoto Tetsuo 1 |
| |
|
Break 11:00`11:15 |
|
| |
7 |
Development of environmental-cell TEM system for
atomic level in-situ observation of nano particle catalysts (V) |
Nagoya Univ. 1, Ecotopia Sci. Inst. Nagoya Univ.
2, Nihon Univ. 3@*Ueda Kouta 1, Kawasaki Tadahiro 1, Hasegawa Hitoshi 1,
Tanji Takayoshi 2, Ishikawa Akira 3 |
| ’ |
8 |
Development of environmental-cell TEM system for
atomic level in-situ observation of nano particle catalysts@(VI) |
Nagoya Univ. 1,Ecotopia Sci. Inst. Nagoya Univ.
2@@*Hasegawa Hitoshi 1,Kawasaki Tadahiro 1,Ueda Kouta 1,Tanji Takayoshi
2 |
| |
9 |
Retrieval of phase image by in-line Fresnel electron
holography |
Meijo Univ. Fac. Sci. & Technol 1, Nagoya Indus.
Science Research Insti. 2,Nagoya Univ. 3@Ishikawa Masashi 1,Ohye Toshimi
1,Sugiyama Setsuko 2,Tanji Takayoshi 3 |
| |
10 |
A Molecular Dynamics Study of Electron Irradiation
Damages in Carbon Nano-Materials |
Osaka Pref. Univ. 1, Osaka Univ. 2@*Yasuda Masaaki
1, Majima Takashi 1, Kimoto Yoshihisa 1, Tada Kazuhiro 1, Akita Seiji 1,
Nakayama Yoshikazu 1 2, Hirai Yoshihiko 1 |
| |
11 |
Analysis of charging-up phenomenon of insulating
materials under electron beam irradiation(2) |
Osaka Inst. of Technol. 1, NMRC 2@*Maekawa Takeshi
1,2 , Kotera Masatoshi1,2 |
| |
|
Lunch 12:30`13:30 |
|
| 4p-V-@/ II |
| |
1 |
Young Scientist Award for the Presentation of an
Excellent Paper
Wave field restoration using active hollow cone illumination in transmission
electron microscopy |
Graduate School of Eng. Osaka Univ. 1,Osaka Electro-Communication
Univ. 2@*Yoshimori Hiromasa 1,Taya Masaki 1,2,Ikuta Takashi 2,Takai Yoshizo
1 |
| |
2 |
Application of annular pupils and multidetector
array in scanning transmission electron microscopy |
Osaka Univ. 1, Kinki Univ. 2, Osaka Electro-commu.
Univ. 3, APCO Ltd. 4, Osaka Sangyo Univ. 5@*Taya Masaki 1, 3, Matsutani
Takaomi 2, Ikuta Takashi 3, Saito Hidekazu 4, Ogai Keiko 4, Harada Yoshihito
4, Tanaka Takeo 5, Takai Yoshizo 1 |
| ’ |
3 |
Exit wave reconstruction for specimen required
to observe under low dose condition |
Grad. Schl. Of Eng. Osaka Univ.@Tsunenori Nomaguchi,Yoshihide
Kimura, Yoshizo Takai |
| |
4 |
Visualization and Mapping of Local Electric Field
at a sharp probe using STEM |
CREST JST 1, Univ. of Tsukuba 2, Univ. of Hyogo
3@Ikeda Yuta 1,2, Fujita Jun-ichi 1,2, Matsui Shinji 1,3 |
| |
5 |
HAADF-STEM observation of group III nitride semiconductor |
NIMS@*Okuno Hanako 1, Takeguchi Masaki 1, Mitsuishi
Kazutaka 1, Irokawa Yoshihiro 1, Sakuma Yoshiki 1, Furuya kazuo 1 |
| |
|
Break 14:45`15:00 |
|
| |
6 |
TEM observation of the Au-CeO2 interface |
UBIQEN- AIST 1,Tokyo Metropolitan Univ. 2@*Akita
Tomoki 1,Tanaka Koji 1, Kohyama Masanori 1, Haruta masatake 2 |
| ’ |
7 |
Chemical domains in Li1.2Mn0.4Fe0.4O2
positive electrode materials for Li-ion batteries studied by STEM-EELS |
AIST UBIQEN@*Jun Kikkawa 1, Tomoki Akita 1, Mitsuharu
Tabuchi 1, Masahiro Shikano 1, Kuniaki Tatsumi 1, Masanori Kohyama 1 |
| |
8 |
Characteristics of ferritin cores investigated
by XPS and KPFM using Argon Ion-Bombardment |
Kobe City College of Technology 1, Hyogo Pref.
Inst. of Tech. 2, Kyoto Univ. 3, NAIST 4, Matsushita ATR 5@*Yamamoto Shin-ichi
1, Yoshioka Hideki 2, Yamada Hirofumi 3, Kobayashi Kei 3, Uraoka Yukiharu
4, Fuyuki Takashi 4, Yamashita Ichiro 5 |
| |
9 |
Observation of various elements with the EUV photoelectron
system EUPS4 for analyzing 4 inch wafer surfaces |
ASRC-AIST@Kasai Takeshi, Iwazumi Hiromi, *Tomie
Toshihisa |
| 7.3 Lithography
|
| September 5 |
| 5a-C-@/ II |
| |
|
Short Presentation (5min.) 9:20`11:30
5a-C-1`23@Poster Session 13:00`15:00 |
| |
1 |
Pattern transferability of aligned lamellar domains
of diblock copolymers (2) |
NTT Basic Research Labs. 1, NTT-AT 2@*Yamaguchi
Toru 1, Inokuma Kazuhito 2, Hayashi Junzo 1, Yamaguchi Hiroshi 1 |
| |
2 |
Novel photoresist consisting of liquid-crystalline
polymer |
KRI 1@*Junko Konishi 1,Masahiro Mitsuyama 1,Saki
Tanaka 1,Shigeru Yamaki 1 |
| |
3 |
Comparison of Flow Models for Photoresist Behavior
in Thermal Flow Process |
Shibaura Inst. of Technology 1, Corporate Manufacturing
Engineering Center TOSHIBA Corp. 2, Semiconductor Company TOSHIBA Corp.
3@*Eto Hideo 1, 2, Miyazaki Maki 3, Kondoh Takehiro 3, Shiobara Eishi 3,
Ito Shinichi 3, Homma Tetsuya 1 |
| |
4 |
Analysis of resist shrinkage by Electron Beam Irradiation |
Osaka Inst.of technology Nanomaterials Microdevices
Research Center 1@*Tsuji Shinya 1, Kotera Masatoshi 1 |
| |
5 |
Ion-implanted resist removal by using ozone |
Kanazawa Inst.1, Osaka Inst.2, Osaka Univ. 3@*Horibe
Hideo1,3, Yamamoto Masashi1, Tomosumi Kamimura2, Tagawa Seiichi3 |
| ’ |
6 |
Study on acid base equilibrium in Chemically Amplified
Resists |
ISIR, Osaka Univ.@*Natsuda Kenichiro 1, Kozawa
Takahiro 1, Okamoto Kazumasa 1, Tagawa Seiichi 1 |
| ’ |
7 |
Polymer structure dependence of acid generation
in chemically amplified EUV resists |
ISIR,@Osaka Univ. 1, Intel Corporation2@Hiroki
Yamamoto 1, Takahiro Kozawa 1, Seiichi Tagawa 1, Heidi B. Cao 2, Hai Deng
2, Michael J. Leeson 2 |
| ’ |
8 |
EUV Absorption Coefficient of Chemically Amplified
Resist and Dependence of Acid Yield on Acid Generator Concentration |
Osaka Univ. 1, JSR. 2@*Hirose Ryo 1, Takahiro Kozawa
1, Seiichi Tagawa 1, Toshiyuki Kai 2, Tsutomu Shimokawa 2 |
| |
9 |
Dissolution characteristics and deprotection mechanism
of molecular resist for EUV lithography |
Selete1, Osaka Univ.2@*Minoru Toriumi1, Julius
J. Santillan1, Toshiro Itani1, Takahiro Kozawa2, Seiichi Tagawa2 |
| |
10 |
Image contrast of EUV lithography |
ISIR, Osaka Univ. 1, Selete 2@Kozawa Takahiro 1,
Tagawa Seiichi 1 , Santillan Julius 2, Toriumi Minoru 2, Itani Toshiro 2 |
| ’ |
11 |
Formation Process of Line Edge Roughness of Latent
Images in Chemically Amplified Resist Studied by Monte Carlo |
ISIR Osaka Univ. 1, Intel 2@*Akinori Saeki 1, Takahiro
Kozawa 1, Seiichi Tagawa 1, Heidi B. Cao 2, Hai Deng 2, Michael J. Leeson
2 |
| |
12 |
Sub-30nm Patterning with EUV Small Field Exposure
Tool |
Selete 1, EUVA 2, Canon 3@*Magoshi Shunko 1, Tawarayama
Kazuo 1, Tanaka Yuusuke 1, Shirai Seiichiro 1, Tanaka Hiroyuki 1, Abe Naomichi
2, Uzawa Shigeyuki 3 |
| |
|
Break 10:20`10:35 |
|
| |
13 |
EUV resist outgas mechanism analysis using the
multi-analysis outgas evaluation system |
MIRAI-Selete 1@JULIUS JOSEPH SANTILLAN 1, TOSHIRO
ITANI 1 |
| |
14 |
Sn Cleaning Process for EUV Optics by Catalytic
Hydrogen Radicals |
Grad. School of Engineering Science Osaka Univ.
1@*H.Miura 1, Y.Yuba 1, Y.Akasaka 1, A.Sakai 1 |
| ’ |
15 |
Reduction of surface oxide layer of projection
optics mirrors by EUV irradiation in presence of ethanol |
LASTI, Univ. of Hyogo 1, EUVA 2, Canon Inc. 3@*Koida
Keigo 1, Niibe Masahito 1, Kakutani Yukinobu 1,2, Matsunari Shuichi 2, Aoki
Takashi 2, Takase Hiromitsu 2, Terashima Shigeru 2, Gomei Yoshio 3, Murakami
Katsuhiko 2, Fukuda Yasuaki 2 |
| |
16 |
Focus & Dose Measurement Control using advanced
CD-SEM (IIj |
Canon 1, Hitachi High-Tech. 2@*H. Ina@1, K. Sentoku@1,
K Watanabe@2, S. Yoneda@2 |
| ’ |
17 |
Optimization Method of ArF Resist Pattern Measurement
Conditions on CD-SEM Using Taguchi Method |
Central Research Lab., Hitachi, Ltd. 1,Hitachi
High-Technologies corporation 2@*Hitomi Keiichiro 1,Nakayama Yoshinori 1,Yamanashi
Hiromasa 1,Sohda Yasunari 1,Kawada Hiroki 2 |
| |
18 |
Verification of mask inspection optics for the
Die-to-Wafer-like mask inspection |
Tokyo Polytechnic University1, Topcon Corp. 2@A.
Takada1,2, M. Shibuya1 |
| |
19 |
Comparative Study of Optimization Technique in
Optical Proximity Correction |
Toho Univ. 1, Univ. of Tsukuba 2, AIST 3@Kenji
Shiraishi 1, Tetsuaki Matsunawa2, Hirokazu Nosato 3, Hidenori Sakanashi
3, Tetsuya Higuchi 3, Tatsumi Furuya 1 |
| |
20 |
Evaluation of long-range thin line pattern by stage-drawing
for SEM |
Graduate School of Science and Technology Kumamoto
Univ. 1, tech concierge kumamoto 2@*Nishi Yuya 1, Endo Taishi 1, Kubota
Hiroshi 1, Kosaka Koji 2 |
| |
21 |
Fabrication of high-aspect-ratio pillars by Proton
Beam Writing and Device Applications |
Shibaura Inst. of Tech. 1, Takasaki Advanced Radiation
Research Inst., JAEA 2, Tokyo Metropolitan Univ. 3@*Furuta Yusuke 1, Uchiya
Naoyuki 1, Nishikawa Hiroyuki 1, Haga Junji 2, Oikawa Masakazu 2, Satoh
Takahiro 2, Ishii Yasuyuki 2, Kamiya Tomihiro 2, Nakao Ryota 3, Uchida Satoshi
3 |
| ’ |
22 |
Silica-based micro-periodic structures on lenses
by femtosecond laser lithography |
Osaka Univ. 1,AIST 2@*Mizoshiri Mizue 1,Nishiyama
Hiroaki 1,Nishii Junji 2,Hirata Yosinori 1 |
| £ |
23 |
Si microfabrication using metastable atom beams
and self-assembled monolayers (II) |
Nat. Inst. Materials Sci. 1, PRESTO JST 2, Hefei
Nat. Lab. Phys. Sci. Microscale 3, Dept. Phys. USTC 4@Wang Zhongping 1,
Yamauchi Yasushi 1, Kurahashi Mitsunori 1, Suzuki Taku 1,2, Entani Shiro
1, Sun Xia 1,3,4 |
| 7.4 Nanoimprint
|
| September 4 10:00`11:45 |
| 4a-ZN-@/ II |
| |
1 |
Development of glass for low temperature imprinting |
Nippon Electric Glass 1@*Nagakane Tomohiro 1, Seto
Tadashi 1, Sakamoto Akihiko 1 |
| |
2 |
Thermal Imprinting of Low-softening Phosphate Glass |
Kyushu Univ. 1, Kyoto Univ. 2, Toppan Printing
Co. Ltd. 3, SCIVAX Co. 4@Takebe Hiromichi 1, Kuwabara Makoto 1, Komori Masaharu
2, Fukugami Norihito 3, Soma Munehisa 3, Kusuura Takahisa 4 |
| |
3 |
Nanoimprint patterning of high refractive index
glass |
RIKEN 1, Nippon Paint Co. 2, Tokyo Inst. of Tech.
3@Okinaka Motoki 1, Tsushima Hiroshi 2, Tachibana Toshiyuki 2, Ichinose
Yoshifumi 2, Tanaka Kenichiro 1, Tsukagoshi Kazuhito 1, Aoyagi Yoshinobu
3, 1 |
| ’ |
4 |
Molecular Dynamics Simulation of Glass Forming
Process with Nanoimprint Lithography |
Osaka Pref. Univ. 1@*Kimoto Yoshihisa 1, Tada Kazuhiro
1, Yasuda Masaaki 1, Kawata Hiroaki 1, Hirai Yoshihiko 1 |
| ’ |
5 |
Nanopatterning of glass surface using self-assembled
mold. |
Tokyo Inst. of Tech.@*Akita Yasuyuki, Hosaka Makoto,
Watanabe Takahiro, Hara Wakana, Matsuda Akifumi, Yoshimoto Mamoru |
| ’ |
6 |
Effect of UV Irradiation on Organic Spin-on-Glass
Patterns Replicated by Room-Temperature Nanoimprinting |
Univ. of Hyogo 1,JSPS 2,Tokyo Ohka Kogyo 3@Ken-ichiro
Nakamatsu 1,2,Yoshiyuki Takeuchi 3,Noriaki Taneichi 3,Shinji Matsui 1 |
| ’ |
7 |
Fabrication of Bakable Grating by Room Temperature
Nanoimprint Using Hydrogen Silsesquioxane |
University of Hyogo 1, JSPS 2@*Minari Chiaki 1,
Nakamatsu Ken-ichiro 1,2, Kometani Reo 1,2, Kanda Kazuhiro 1, Haruyama Yu-ichi
1, Matsui Shinji 1 |
| 7.4 Nanoimprint
|
| September 5 13:15`18:00 |
| 5p-W-@/ II |
| |
1 |
Hybrid EB-writing technique using a 100 kV-SB writer
and a 50 kV-VSB writer: assignment according to feature size |
Dai Nippon Printing, R&D Center 1, Electronic Device
Lab. 2@@Mikio Ishikawa 1, Masashi Sakai 2, Naoko Kuwahara 1, Hiroshi Fujita
1, Tadahiko Takikawa 2, *Hisatake Sano 1, Morihisa Hoga 1, Naoya Hayashi
2 |
| |
2 |
Alumina Nanohole Arrays with r-Ζ Hole Arrangement
by Nanoimprinting Processes |
KAST 1, Tokyo Metropolitan Univ. 2, Fujitsu Labs
Ltd. 3, Yamagata Fujitsu Ltd. 4@*Maegawa Hiroaki 2, Hatakeyama Sho 2, Kikuchi
Hideyuki 3,4, Nakao Hiroshi 3,4, Oshima Hirotaka 3,4, Ito Kenichi 3,4, Nishio
Kazuyuki 1,2, Masuda Hideki 1,2 |
| |
3 |
Preparation of Molds for Nanoimprinting by Anodization
of Al |
KAST 1, Tokyo Metropolitan Univ. 2@*Kumagai Naoko
2, Yanagishita Takashi 1, Nishio Kazuyuki 1,2, Masuda Hideki 1,2 |
| |
4 |
Decay resistance of the repaired hollow-defective
line on the UV-nanoimprint mold by FIB SiOx depositon |
Univ. of Hyogo 1, CREST JST 2, JSPS 3@*Okada Makoto
1,2, Nakamatsu Ken-ichiro 1,2,3, Kometani Reo 1,2,3, Kanda Kazuhiro 1,2,
Haruyama Yu-ichi 1,2, Matsui Shinji 1,2 |
| |
5 |
Fundamental Investigation on Replica Mold for Photo-Cure
Type Nanoimprint |
Material Research Laboratory, Hitachi Ltd. 1, Hitachi
Cable, Ltd. 2@Washiya Ryuta 1, Ando Takashi 1, Ohkubo Hiroyuki 2, Kitano
Nobuaki 2, Shiota Tsuneo 2, Miyauchi Akihiro 1 |
| |
6 |
Study of release property on photo-curing nanoimprint |
Tokyo Univ. of Science 1,TOYO GOSEI 2@Yatsushiro
Teruhiko 1,Ohtaguchi Makoto 2,Taniguchi Jun 1,Sakai Nobuji 2 |
| |
7 |
Study on anti-stiction layer for nanoimprint lithography |
Osaka. Pref. Univ. 1, Warsaw Univ. of Technol.2@J.Ishihara1,
A.Koszewski2, M.Kayama1, H.Kawata1, Z.Rymuza2, Y.Hirai1 |
| ’ |
8 |
Degradation Mechanism of Mold Release Layer in
Nanoimprint Proces |
Materials Research Laboratory, Hitachi Ltd. 1@Tada
Yasuhiko 1,Yoshida Hiroshi 1, Miyauchi Akihiro 1 |
| |
9 |
Study of time evolution of the resist deformation
on pressure and resist thickness |
Osaka Pref. Univ. 1, Mizuho Info. Res. Inst.2@T.
Tanabe1, Y. Onishi2, M. Shibata1, H. Kawata1, Y. Hirai1 |
| |
|
Break 15:30`15:45 |
|
| |
10 |
Development of nanometer accurate surface replication
method for fabricating reflective optics |
Osaka Univ. 1,JST-PRESTO 2@*Shibatani Akihiko 1,Mimura
Hidekazu 1 2,Ishikura Hiroyuki 1,Sano Yasuhisa 1,Yamauchi Kazuto 1 |
| ’ |
11 |
Fabrication of ultra smooth mirror by UV-nanoimprint
(1) |
Tokyo Univ. of Sci. 1, AIST 2@*Ito Wakana 1,Kurashima
Yuichi 1,Miyamoto Iwao 1,Ishii Hiroyuki 2,Itatani Taro 2,Hiroshima Hiroshi
2 |
| |
12 |
Fabrication of ultra smooth mirror by UV-nanoimprint
(2) |
AIST 1, Tokyo Univ. of Sci. 2, Shibaura Inst. of
Tech. 3@Ishii Hiroyuki 1, Fujino Hidetoshi 1, Ito Wakana 2, Kurashima Yuichi
2, Miyamoto Iwao 2, Takasuka Yasuyuki 3, Yokoi Hideki 3, Itatani Taro 1,
Hiroshima Hiroshi 1 |
| |
13 |
Fabrication of Nanostructure by Photo-Nanoimprint
Lithography with Metal Nanoparticles |
Graduate School of Science and Technology, Kumamoto
Univ. 1, The Faculty of Engineering, Kumamoto Univ. 2@*Kuwahara Yutaka 1,
Yoshimori Keishiro 1, Kumamaru Kaoru 1, Morita Minoru 1, Endoh Hiroaki 1,
Iwanaga Tomoki 1, Nagami Tomohito 2, Sawada Tsuyoshi 1, Sasaki Mitsuru 1,
Goto Motonobu 1 |
| |
14 |
Fabrication of cantilevers by transfer process
without release force |
Osaka Pref. Univ. 1@*Kawata Hiroaki 1, Masaaki
Yasuda 1, Hirai Yoshihiko 1 |
| ’ |
15 |
Three-dimensional replication using two-photon
microstereolithography |
Yokohama National Univ 1. JST PRESTO 2@*Hasegawa
Takuya 1. Maruo shoji 1,2 |
| |
16 |
Micro-nano fabrication by thermal-UV hybrid nanoimprint
II |
Osaka. Pref. Univ.@Keisuke Okuda, Hiroaki Kawada,
Yoshihiko Hirai |
| |
17 |
Investigation on High Throughput Sheet Nanoimprint
Technology |
Materials Research Lab. , Hitachi Ltd.@*Hasegawa
Mitsuru 1, Ogino Masahiko 1, Oohashi Ken-ya 1, Miyauchi Akihiro 1 |
| |
18 |
Through-the-mold alignment for UV-nanoimprint |
Natl. Inst. of Adv. Industrial Sci. & Technol.@*Hiroshima
Hiroshi 1 |
| 7.5 Beam
Excitation Surface Reaction |
| September 7 10:30`15:15 |
| 7a-W-@/ II |
| |
1 |
Luminescence from a Bis(MSB) Thin Film Excited
by Interaction with a Slow Highly Charged Ion |
UEC 1, Kobe Univ. 2, Gakusyuin Univ. 3, JST/CREST
4@M. Tona 1,4, H. Watanabe 1,4, S. Jian 1, N. Nakamura 1, N. Yoshiyasu
1, M. Sakurai 2, M. Kotani 3, C. Yamada 1, S. Ohtani 1,4 |
| |
2 |
Coincidence detection of scattered atoms and secondary
particles from solid surfaces under irradiation of multiply charged ions |
Tokyo Univ. Agricult. and Tech.@*Motohashi Kenji |
| |
3 |
Surface modification of diamond-like carbon by
using hyperthermal fluorine beam |
Univ of Hyogo 1, Kobe Univ 2@*Yamada Noriko 1,
Kanda Kazuhiro 1, Yokota Kumiko 2, Tagawa Masahito 2, Haruyama Yuichi 1,
Matsui Shinji1 |
| |
4 |
Structural Analysis of Carbon Nano-Pillar Fabricated
by FIB-CVD |
NTT Basic Research Labs.1,Univ. of Tokyo2@Tamaru
Kojiro1,2,Nonaka Keiichiro 1,2,Nagase Masao1,Yamaguchi Hiroshi1, Warisawa
Shinfichi2,Ishihara Sunao2 |
| |
5 |
Electron Biprism Fabrication using Free-Space-Wiring
Technology by Focused-Ion-Beam Chemical Vapor Deposition |
Univ. of Hyogo 1,CREST JST 2,JSPS 3,JFCC 4@Ken-ichiro
Nakamatsu 1,2,3,Kazuo Yamamoto 4,Tsukasa Hirayama 4,Shinji Matsui 1,2 |
| |
6 |
In-situ observation of 3-D nano-structure growth
on FIB-CVD by scanning electron microscope |
University of Hyogo 1, CREST JST 2, JSPS 3, SII
NanoTechnology Inc. 4@*Kometani Reo 1,2,3, Kanda Kazuhiro 1,2, Haruyama
Yuichi 1,2, Kaito Takashi 4, Matsui Shinji 1,2 |
| |
7 |
Ion desorption from single-walled carbon nanotubes
induced by core-electron excitations - Photo-electron photo-ion coincidence
measurements |
Univ. of Tokyo 1, Grad. Univ. for Adv. St. 2, KEK-PFC
3@*Mera Yutaka 1, Arima Satoshi 1, Fujiwara Takayuki 1, Ishizaki Kiichirou
1, Kakiuchi Takuhiro 2, Mase Kazuhiko 3, Maeda Koji 1 |
| |
8 |
Effect of Vacuum-Ultraviolet Irradiation during
Solid Phase Epitaxy in amorphous Si |
HOYA CANDEO OPTRONICS Corp. 1, Inst. of Appl. Phys.,
Univ. of Tsukuba 2@*Mizuta Taiji 1, Gojuuki Mikihiko 1, Ohshima Hiroyoshi
1, Murakami Kouichi 2 |
| |
|
Lunch 12:30`13:30 |
|
| 7p-W-@/ II |
| ’ |
1 |
Real-time SR-XPS observation of the initial oxidation
of Si(110)-16~2 and autocatalytic-reaction model |
Tohoku Univ. 1,JAEA 2@*Yamamoto Yoshihisa 1,Togashi
Hideaki 1,Konno Atsushi 1,Kato Atsushi 1,Suemitsu Maki 1,Teraoka Yuden 2,Yoshigoe
Akitaka 2 |
| |
2 |
Photon-stimulated desorption of hetero cluster
ions |
Gakushuin Univ. 1@Ide Takahisa 1,Morita Mai 1,Miura
Takasi 1,Arakawa Ichiro 1 |
| |
3 |
Synthesis of Titanium Nitride Thin Film using Hyperthermal
Nitrogen Atom Beam and Titanium Arc Plasma |
Kobe Univ.@*Hiroshi Kinoshita,Shunsuke Yamamoto,Hideaki
Yamamoto,Nobuo Ohmae |
| |
4 |
Direct fluorination and metallization of polyimide
using hyperthermal fluorine beam (2) |
Kobe Univ. 1, Konan Univ. 2@Tagawa Masahito 1,
Maeda Ken-ichi 1, Yokota Kumiko 1, Akamatsu Kensuke 2, Nawafune Hidemi 2 |
| |
5 |
Fast chopper wheel system for eliminating EUV from
the laser detonation hyperthermal atomic beam source |
Kobe Univ. 1@*Yokota Kumiko 1, Abe Shingo 1, Yasuda
Hidehiro 1, Tagawa Masahito 1 |
| |
6 |
Electron conduction in Pt layers fabricated by
electron-beam induced deposition:(I)Dependence of beam dwell time |
Osaka Univ. 1, CQST 2 @*Nakayama Takahito 1, Takeuchi
Takahiro 1, Murakami Katsuhisa 1, Abo Satoshi 2, Wakaya Fujio 1,2, Takai
Mikio 1,2 |
| |
7 |
Scattering process of monatomic molecular beam
on vertically aligned single wall carbon nanotubes |
The Univ. of Tokyo 1@Nakazono Keisuke 1, Harada
Yushi 1, Kinefuchi Ikuya 1, Takagi Shu 1, Matsumoto Yoichiro 1 |
| 7.6 Ion
Beam Technology |
| September 4 9:30`17:30 |
| 4a-W-@/ II |
| |
1 |
An ion beam focusing method by using glass capillary |
AIST 1@Watanabe Kouji 1, Kondou Kouji 1, *Fujiwara
Yukio 1, Nonaka Hidehiko 1, Saito Naoki 1, Ichimura Shingo 1, |
| |
2 |
Experiment of space charge compensation of extremely
low energy ion beam |
JST, Kyoto Univ., Nissin Ion Equipment@*Mitsuaki
Takeuchi 1, Yasuhito Gotoh 2, Hiroshi Tsuji 2, Junzo Ishikawa 2, Sigeki
Sakai 3 |
| |
3 |
Development of analysis technique for nanostructure
using Time of Flight RBS |
CQSTEC Osaka Univ. 1,A&D 2@*Koresawa Kouhei 1,Abo
Satoshi 1,Murakami Katsuhisa 1,Wakaya Fujio 1,Kikuchi Takahiro 2,Sawaragi
Hiroshi 2,Takai Mikio 1 |
| |
4 |
Size dependence of ethanol cluster ion beam trajectory |
Kyoto Univ.@*Sugiyama Kazumichi 1, Okada Takeshi
1, Dan Nicolaescu 1, Kawashita Masakazu 1, Takaoka Gikan 1 |
| |
5 |
Sputtering of Si substrate by ethanol cluster ion
beam irradiation |
Kyoto Univ.@*Sugiyama Kazumichi 1, Okada Takeshi
1, Kawashita Masakazu 1, Takaoka Gikan 1 |
| |
|
Break 10:45`11:00 |
|
| |
6 |
Development of size selected gas cluster SIMS machine(I) |
University of Hyogo1,Toyama2, JST SENTAN3@*Kousuke
Moritani1,3, Michihiro Hashinokuchi1,3, Noriaki Toyoda1,3, Kozo Mochiji1,3,Jun
Nakagawa2,3, Takahiro Kashiwagi2,3 |
| |
7 |
Generation of Cl2 Gas Cluster Ion Beam |
Kyoto Univ.@*Toshio Seki, Takaaki Aoki, Jiro Matsuo |
| |
8 |
Optimization of Incident Cluster Ion Beam Conditions
for Secondary Ion Mass Spectrometry of Bio-molecular Samples |
Kyoto Univ. 1@*Ninomiya Satoshi 1, Ichiki Kazuya
1, Nakata Yoshihiko 1, Honda Yoshiro 1, Seki Toshio 1, Aoki Takaaki 1, Matsuo
Jiro 1 |
| |
9 |
MD study of sputtering process with high-energy
gas cluster ion impact |
Dept. Electronic Sci. & Eng., Kyoto Univ. 1,Dept.
Nucl. Eng., Kyoto Univ. 2,Quantum Sci. & Eng. Cntr., Kyoto Univ. 3@*Takaaki
Aoki 1, Toshio Seki 2, Satoshi Ninomiya 3, Jiro Matsuo 3 |
| |
10 |
Study of computer simulations for long time-scale
evolution of radiation damage |
Dept. Electronic Sci. & Eng., Kyoto Univ. 1,Dept.
Nuclear Eng., Kyoto Univ. 2,Quantum. Sci. & Eng. Cntr., Kyoto Univ. 3,@*Takaaki
Aoki 1, Toshio Seki 2, Jiro Matsuo 3, Ikuji Takagi 2 |
| |
11 |
Computer simulation of IBIEC based on vacancy-migration
model (2) |
Hosei Univ 1@Masuda Hirotaka 1,Nakagawa Ryo 1,Yamamoto
Yasuhiro 1 |
| |
|
Lunch 12:30`13:30 |
|
| 4p-W-@/ II |
| |
1 |
Metallic nanoparticles formation by PBII method |
RIKEN 1, Saitama Univ. 2@*Kobayashi Tomohiro 1,
Nieta Ryo 2, Ogikubo Kouji 2 |
| ’ |
2 |
Spatial Control of Metal Nano-particles by Masked
Ion Implantation Using Anodic Porous Alumina |
Univ. of Tsukuba 1,Quantum Beam Center NIMS 2@Nakamura
Masahide 1,Umeda Naoki 2,Kato Seiichi 2,Kishimoto Naoki 2 |
| |
3 |
High fluence implantation effects of B2-
ions on colorless polycrystalline diamond thick films |
Nat. Inst. for Mater. Sci. 1@*Amekura Hiroshi 1,
Takeda Yoshihiko 1, Kishimoto Naoki 1 |
| |
4 |
Measurement of Photo Luminescence on Ge-Ion-Implanted
SiO2 Films |
Kyoto Univ. 1,Sharp Corp. 2@*Arai Nobutoshi 1,2,Tsuji
Hiroshi 1,Kojima Kenji 1,Hattori Masashi 1,Adachi Kouichirou 2,Kotaki Hiroshi
2,Gotoh Yasuhito 1,Ishikawa Junzou 1 |
| |
5 |
Enhancement of Poly-D-lysine Adsorption on Silicone
Rubber by Carbon Negtive-Ion Implantation |
Kyoto Univ. @*Tsuji Hiroshi, Kojima Hiroyuki, Sommani
Piyanuch, Yamada Tetsuya, Sato Hiroko, Gotoh Yasuhito, Ishikawa Junzo |
| ’ |
6 |
Differentiation induction and patterning attachment
of MSC on C- implanted Silicon rubber |
Kyoto Univ. 1@*Yamada Tetsuya 1, Tsuji Hiroshi
1, Kojima Hiroyuki 1, Sommani Piyanuch 1, Gotoh Yasuhito 1, Ishikawa Zyunzo
1 |
| |
7 |
The mechanism of protrusion formation on PTFE surface
by ion beam irradiation |
Graduate School of Engineering, The Univ. of Tokyo
1, RIKEN 2@*Kitamura Akane 1, Kobayashi Tomohiro 2, Meguro Takashi 2, Okitsu
Kouhei 1, Fukawa Kazuhiro 1, Suzuki Akahiro 1, Terai Takayuki 1 |
| |
|
Break 15:15`15:30 |
|
| |
8 |
Fabrication and characterization of Zn nanorod
by ion irradiation |
Nagoya Inst. Technol. 1, ENEOS 2,RCAST Univ. Tokyo
3 @*Kutsuna Masaki 1, Yamaguchi Kouhei 1, Tanemura Masaki 1, Hayashi Yasuhiko
1, Minami Masaki 2, Kubo Takaya 3 |
| |
9 |
Low-temperature fabrication of Ge nanostructures
by ion irradiation |
Nagoya Inst.Technol 1@*Miyawaki Ako 1, Yamaguchi
Kohei 1, Sugita Yoshitaka 1, Hayashi Yasuhiko 1, Tanemura Masaki 1 |
| |
10 |
Annealing and Electron Irradiation Effect on the
Young's Modulus of Amorphous Carbon Pillar Grown by FIB-CVD |
CREST-JST 1, Tsukuba Univ. 2, NEC 3, SIINT 4, Hyogo
Univ. 5@*Ueki Ryuichi 1,2, Fujita Jun-ichi 1,2, Okada Satoshi 1,2, Ichihashi
toshinari 1,3, Kaito Takashi 4, Matsui Shinji 1,5 |
| |
11 |
Characterization of thin films formed by FIB-CVD
method using Si ions |
Osaka Univ. 1, CQST Osaka Univ. 2, CREST JST 3@*Yo
Takuma 1, Tanaka Hideaki 1, Koreyama Kakunen 1, Yanagisawa Junichi 123,
Sakai Akira 1 |
| |
12 |
Maskless Selective Growth of p-InGaAs using Low
Energy Mg-In-Ga Focused Ion Beam |
Toyohashi Univ. of Tech,1@Fukai Masayuki 1,*Suzuki
Tomohisa 1,Mutoh Yuki 1,Nobuhara Keiichi 1,Kangsa Pak 1 |
| ’ |
13 |
Strain relaxation of a SiGe layer on Si(001) studied
by three-dimensional medium-energy ion scattering |
Osaka Univ. 1,RIKEN 2, SUMCO TECHXIV Corp. 3@*Aiko
Kashihata 1,2,Yuji Kuwahara 1,Masato Imai 2,3,Yoshiji Miyamura 2,3,Takane
Kobayashi 2 |
| |
14 |
Luminescence of zinc oxide implanted with rare
gas |
NIMS@NIMS, *Isao Sakaguchi, Yutaka Adachi, Takeshi
Ogaki, Syuinichi Hishita, Hajime Haneda, Naoki Ohashi |
| |
15 |
Defect structure of iron disilicide (FeSi2)
thin films by high energy heavy ion irradiation |
The Wakasa-wan Energy Research Center 1Japan Atomic
Energy Agency 2@*Sasase Masato 1, Okayasu Satoru 2, Yamamoto Hiroyuki 2,
Yamaguchi Kenji 2, Shamoto Shin-ichi 2, Hojou Kiichi 2 |
| 7.7 Micro-Field
Emitter |
| September 6 9:30`18:00 |
| 6a-W-@/ II |
| |
1 |
At the initial stage, simulation for time-dependent
electron emission characteristics of carbon nanotube field emitter array |
Kyung Hee University@MoonJongHyun1,Ryu Je Hwang1,
ParkKyuChang1,SatoGenta2, andNakamotoMasayuki2 |
| |
2 |
Influence of anode material on field emission characteristics. |
Saitama Univ. 1, KEK 2@Futoshi Nakagawa 1, Yasushi
Yamano 1, Shinichi Kobayashi 1, Yoshio Saito 2 |
| |
3 |
Work function measurement of the modified Mo(100)
with a Zr oxide |
Muroran Inst of Tech. 1@Yusuke Nakano 1, Hiroyuki
Kawahara 1, Hideaki Nakane 1, Hiroshi Adachi 1 |
| |
4 |
Emission Property and Structure of Ultra Sharp
Tungsten Probe |
CREST JST.1, Univ. of Tsukuba.2, NEC.3, Univ. of
Hyogo.4@Ikeda Yuta 1,2, Nakazawa Shyotaro1,2, Higashi Kodai1,2, Ichihasi
Toshinari1,3, Matsui Shinji1,4, Fujita Jun-ichi1,2 |
| ’ |
5 |
Observation of Oscillation Phenomena in Field Emission
Characteristics of Carbon nanotubes |
Shizuoka Univ.@*Ishikawa Tomokazu 1,Matsuda Takafumi
2,Marcel Mesko 2,Ogino Akihisa 2,Nagatsu Masaaki 2 |
| |
6 |
Development of High Spatial Resolution X-ray Microscope
Equipped with Carbon Nanotube Field Emission Cathode |
Graduate School of Eng., Mie Univ.@*Ryosuke Yabushita,
Koichi Hata |
| |
|
Break 11:00`11:15 |
|
| |
7 |
Reliable and flexible carbon-nanofiber-based all-plastic
field emission devices |
Nagoya Inst.Tech. 1 , Nanyang Tech.Uni. 2 @*Yamaguchi
Kohei 1, Tanemura Masaki 1, Hayashi Yasuhiko 1,@H. S. Sim 2, S. P. Lau 2,
H. Y. Yang 2, L. K. Ang 2 |
| |
8 |
Vacuum annealing effect on field emission from
heavily P-doped diamond |
AIST Diamond RC 1@Yamada Takatoshi 1, Somu Kumaragurubaran
1, Nebel Christoph 1, Shikata Shin-ichi 1 |
| |
9 |
Growth conditions of ZnO:Al whiskers on carbon
fiber |
Nagaoka Univ. Tech.@*Tanizawa Keisuke 1,Ooki Satoshi
1,Ohshio Shigeo 1,Saitoh Hidetoshi 1 |
| |
10 |
Morphology and field emission characteristics of
zinc-oxide whiskers |
Asahi Kasei Co. 1, Nagaoka Univ. of Tech. 2@*Ueda
Yoshikazu 1, Saito Hidetoshi 2 |
| ’ |
11 |
X-ray generation device incorporating ZnO:Al whisker
cold-emitter |
Nagaoka Univ. Tech. 1, Ookawara manufacturing co.,ltd.
2@*Ooki Satoshi 1, Ohsio Shigeo 1, Ohkawara Yoshiaki 1,2, Saitoh Hidetoshi
1 |
| |
|
Lunch 12:30`13:30 |
|
| 6p-W-@/ II |
| |
1 |
Development of Active-matrix HEED and its application
to image sensing (3) |
Pioneer Co. 1,NHK Sci. & Tech. Res. Labs. 2,Tokyo
Univ. of A&T 3@*Nakada Tomonari 1,Sato Takanobu 1,Matsuba Yohei 1,Tanaka
Ryota 1,Sakemura Kazeto 1,Negishi Nobuyasu 1,Okuda Yoshiyuki 1,Watanabe
Atsushi 1,Yoshikawa Takamasa 1,Ogasawara Kiyohide 1,Nanba Masakazu 2,Okazaki
Saburo 2,Tanioka Kenkichi 2,Egami Norifumi 2,Koshida Nobuyoshi 3 |
| |
2 |
Research of X-ray image sensor driven by field
emitter array with CdTe device |
RIE, Shizuoka Univ. 1,AIST 2@*Hanawa Yuichiro 1,Sakata
Takuya 1,Han Gui 1,Morii Hisashi 1,Matsubara Katsumi 1,Yamashita Susumu
1,Neo Yoichiro 1,Aoki Toru 1,Mimura Hidenori 1,Nagao Masayoshi 2 |
| |
3 |
100kV Beam Acceleration Test with Carbon Nanotube
Cathode |
AIST 1, KEK 2@*Hozumi Yasufumi 1, Ohsawa Satoshi
2, Sugimura Takashi 2, Ikeda Mitsuo 2 |
| |
4 |
Transmission type super high brightness spin-polarized
electron source based on GaAs/GaAsP strain superlattice structure |
nagoya Univ. engineering 1,nagoya Univ. sciencce
2@*X.G. Jin 1, N. Yamamoto 2, A. Mano 2, Y. Nakagawa 2, R. Sakai 2, T. Kato
1, M. Tanioku 1, M. Yamamoto 2, T. Nakanishi 2, T. Ujihara 1, Y. Takeda
1 |
| |
5 |
Development and evaluation of spin-polarized electron
source using laser-transmissive photocathode |
Nagoya Univ. Science 1,Hitachi CRL 2,Nagoya Univ.
Engineering 3,Osaka Electro-Communication Univ. 4,Osaka Prefecture Univ.5,
Daido Institute Of Technology 6,Daido Steel Co.Ltd 7@*Mano Atsushi 1,Yamamoto
Naoto 1,Okumi Shoji 1,Nakagawa Yasuhide 1,Yamamoto Masahiro 1,Utsu Akira
1,Konomi Taro 1,Nakanishi Tsutomu 1,Oshima Takashi 2,Jin XiuGuang 3,Ujihara
Toru 3,Takeda Yoshikazu 3,Yasue Tsuneo 4,Koshikawa Takanori 4,Horinaka Hiromichi
5,Saka Takashi 6,Kato Toshihiro 7 |
| ’ |
6 |
Fabrication of evaporation type micro getter built
into loval vacuum package and evaporation experiment |
Toyohashi Univ. of Tech. 1, JST-CREST 2@*Nishijo
Yoshinosuke 1, Hatakeyama Masanori 1, Sawada Kazuaki 1,2, Takao Hidekuni
1,2, Ishida Makoto 1,2 |
| ’ |
7 |
Operation of nanocrystalline silicon ballistic
electron emitter in solutions |
Graduate School of Eng., Tokyo Univ. of Agri. &
Technol. 1, Quantum14 Co. 2@*Toshiyuki Ohta 1, Bernard Gelloz 1,2, Nobuyoshi
Koshida 1,2 |
| |
8 |
Characteristics of Nanocrystalline Silicon Surface
Electron Emitter Fabricated by CVD Process |
Crestec Co. 1, Tokyo Univ. A&T 2@Kojima Akira 1,2,
Ohyi Hideyuki 1, Koshida Nobuyoshi 2 |
| |
9 |
Electron Emission characteristics of planar-type
cathodes based on nanocrystalline silicon thin films (III) |
Hachinohe Inst. Technol. 1, RIE Shizuoka Univ.
2@*Shimawaki Hidetaka 1, Yoichiro Neo 2, Hidenori Mimura 2 |
| |
|
Break 15:45`16:00 |
|
| |
10 |
Mesurement of electron emission from porous Si
film on glass substrate (IV) |
Oshima College of Maritime Technol.@*Katsuya HIGA |
| |
11 |
Ejection of Carbon Nanotube Solution Using Electrostatic
Inkjet Nozzle |
Kyushu Univ. 1,2@*Shigematsu Satoshi1, Ishida Yuji1,
Nakashima Naotoshi2, Asano Tanemasa1 |
| |
12 |
Sharpening of VTF (vertical thin film) emitter
tips |
AIST 1, Kyushu Inst. of Tech. 2, Kyushu Univ. 3@*Yoshida
Tomoya 1, Yasumuro Chiaki 1, Nagao Masayoshi 1, Kanemaru Seigo 1, Baba Akiyoshi
2, Asano Tanemasa 3 |
| |
13 |
Fabrication of double-gated FEAs by etch-back technique |
RIE Shizuoka Univ. 1,AIST 2,NHK Sci.&Tech.Res.Lab
3@*Soda Takashi 1,Yasumuro Chiaki 2,Nagao Masayoshi 2,Kanemaru Seigo 2,Sakai
Toshikatu 3,Saito Nobuo 3,Neo Youichiro 1,Mimura Hidenori 1 |
| |
14 |
Improvement of tolerance of silicon field emitter
arras in O$_{2}$ ambient by carbon negative ion implantation |
Kyoto Univ. 1, JST 2, AIST 3, Nissin Ion Equipment
4@*Oowada Atsushi 1, Takeuchi Mitsuaki 2, Sakai Yoshiki 1, Gotoh Yasuhito
1, Nagao Masayoshi 3, Tsuji Hiroshi 1, Ishikawa Jyunzou 1, Sakai Shigeki
4, Kimoto Tsunenobu 1 |
| |
15 |
Improvement of energy distribution measurement
of Si-FEAs with a hemispherical energy analyzer |
Kyouto Univ. Inkou 1, JST 2, Sansouken 3, Nissinionkiki
4 @*Sakai Yoshiki 1, Oowada Atushi 1, Takeuchi Mitsuaki 2, Gotou Yasuhito
1, Nagao Masayoshi 3, Tsuji Hiroshi 1, Ishikawa Junzou 1, Sakai Shigeki
4,Kimoto Tsunenobu 1 |
| |
16 |
Improvement of Properties of SiO$_2$ as Insulating
Layer of HfN Field Emitter Array |
Kyoto Univ. 1.@*Miyata Yuko 1, Kanzawa Taro 1,
Gotoh Yasuhito 1, Tsuji Hiroshi 1, Ishikawa Junzo 1 |
| |
17 |
Suppression of leakage current in Pt field emitter
fabricated by electron-beam-induced deposition |
CQST Osaka Univ.@Katsuhisa Murakami 1,Satoshi Abe
1,Sinji Nishihara 1, Naoki Matsubara 1, Satoshi Abo 1,Fujio Wakaya 1, Mikio
Takai 1 |
| 7.8 Beam
Application and New Technology |
| September 6 9:00`12:00 |
| 6a-B-@/ II |
| |
1 |
Filter circuits fabricated by laser processing
on PEN films |
Chiba Inst. of Tech. Graduate school of Eng 1,
Chiba Inst. of Tech. Fac. of Eng 2@*Inoue Shinya 1. Sugiura Osamu 2 |
| |
2 |
A wiring method over large step height using laser
processing and electroless plating |
Chiba Inst. of Tech. Graduate School of Eng. 1,
Chiba Inst. of Tech. Fac. of Eng. 2@Zhang Licai 1, Sugiura Osamu 2 |
| |
3 |
Electroless plating catalysis induced by laser
irradiation on Cu oxide film and its application to Cu wiring |
Chiba Inst. of Tech. Graduate School of Eng. 1,
Chiba Inst. of Tech. Fac of Eng. 2@Takanashi Hironori 1, Sugiura Osamu 2 |
| ’ |
4 |
Helical Pattern Delineation onto Fine Pipes and
Fabrication of Long-span Micro-coils |
Tokyo Denki Univ. 1@*Katayama Masahiro 1,Horiuchi
Toshiyuki 1 |
| |
5 |
Research on Light Intensity Distribution and Resolution
Limit for Projection Exposure Using a Gradient-Index Lens Array |
Tokyo Denki Univ. 1,@*Kobayashi Hiroshi 1, Horiuchi
Toshiyuki 1 |
| |
6 |
Fabrication of Micro-gears Using Optical Lithography
and@Electroplating |
Tokyo Denki Univ. 1@*Watanabe@Yuusuke 1, Horiuchi@Toshiyuki
1 |
| |
|
Break 10:30`10:45 |
|
| ’ |
7 |
Development of disk inspection technology applied
mirror-electron-microscopy |
CRL. Hitachi Ltd. 1@*Shimakura Tomokazu 1, Takahashi
Yoshio 1, Sugaya Masakazu 1, Ohnishi Tadashi 1, Hasegawa Masaki 1, Ohta
Hiroya 1 |
| |
8 |
Development of Fine Patterning of SiO2 Thin Films
Using Electron Beam Enhanced Sputtering |
NIMS@Onishi Keiko 1, Fujita Daisuke 1 |
| |
9 |
Electron-beam-induced nanoparticles formation in
thin metal film |
ELIONIX Co., Ltd. 1, Tokyo Univ. 2@@*Yasuhiko Kojima
1, Takahisa Kato 2 |
| |
10 |
Formation and control of SiC nanowires by high
energy ion beam irradiation and heating process. |
Tohoku Univ. 1, Osaka Univ. 2, JAEA 3 @Tsukuda
Satoshi 1, Seki Shu 2, Sugimoto Masaki 3, Tagawa Seiichi 2, Tanaka Suhun-Ichiro
1 |
| |
11 |
In vitro vascular endothelial cells and blood platelets
adhesion to chitosan film modified by ion beam irradiation |
Tokyo Univ. of Science 1, RIKEN 2@Katsumune Takahashi
1, Katsumi Uchida 1, Rena Ujiie 2, Hiroshi Toida 2, Yoshiaki Suzuki 2, Hirofumi
Yajima 1 |