| 14 Amorphous and Microcrystalline Materials |
| Review
Lectures and General Session:Investigation of novel properties of amorphous
and nanocrystalline materials |
| September 6 13:30`16:15 |
| 6p-ZV-@/ II |
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1 |
Frontiers and perspectives in amorphous and nanocrystalline
materials |
Kobe Univ. 1@*Uchino Takashi 1 |
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2 |
Unusual behaviors of free carriers in microcrystalline
Degenerate semiconductors |
Gifu Univ. 1. Faculty of Eng.@*Koichi Shimakawa
1 |
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3 |
Photoinduced phenomena in group VIb glasses: Possibility
of new applications |
Hokkaido Univ. 1@*Tanaka Keiji 1 |
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Break 15:15`15:30 |
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4 |
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Break 16:15`16:30 |
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5`14@16:30`19:00iundamental Properties and Evaluationsj |
| 14.1 Fundamental
Properties and Evaluations |
| September 4 10:00`11:30 |
| 4a-M-@/ II |
| |
1 |
Nano-scale characterization of a-Si:H film solar
cells by scanning near-field optical microscopy |
Gifu Univ.@1, Gunma Univ. 2@*Yamamoto Yoshiki 1,Gotoh
Tamihiro 2,Ichikawa Hiroyuki 1,Kawakami Tomohiro 1,Ogawa Syunnsuke 1,Yoshida
Norimitu 1,Nonomura Syuuichi 1 |
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2 |
ESR study on Κc-Si thin films deposited on various
textured substrates |
Osaka Univ. 1@*Kurihara Masanori 1, Sobajima Yasushi
1, Toyama Toshihiko 1, Okamoto Hiroaki 1 |
| £ |
3 |
Study on electron spin resonance of hydrogenated
microcrystalline silicon-germanium alloys (II) |
Advanced Industrial Science and Technology 1, Industrial
Technology Research Inst. 2, Tokyo Inst. of Technology 3@*Chia-Wen Chang
1,2,3, Takuya Matsui 1, Hiroyuki Fujiwara 1, Michio Kondo 1,3 |
| |
4 |
Optical Absorption Spectra of High-deposition-rate
Κc-Si Thin Films Evaluated by CPM |
Grad. School of Eng. Science, Osaka Univ.@Fukumori
Taiga 1, Kurihara Masanori 1, Sobajima Yasushi 1, Toyama Toshihiko 1, Okamoto
Hiroaki 1 |
| |
5 |
Absorption spectra of widegap a-Si:H films estimated
by resonant photothermal bending spectroscopy |
Gifu Univ 1@*Shimizu Yasuko 1,kawai Kazuma 1,Honda
Takasi 1,Yokoi Akitosi 1,Ogawa Syunsuke 1, Yoshida Norimizu 1,Nonomura Syuiti
1 |
| |
6 |
Carrier transport studies on high deposition rate
Κc-Si thin films (II) |
Grad. School of Eng. Science, Osaka Univ.@*Nishino
Mitsutoshi 1, Sobajima Yasushi 1, Toyama Toshihiko 1, Okamoto Hiroaki 1 |
| 14.1 Fundamental
Properties and Evaluations |
| September 5 9:30`12:00 |
| 5a-W-@/ II |
| |
1 |
Fabrication of holographic gratings with low-melting
organic-inorganic hybrid glass |
AIST 1, ICR Kyoto Univ. 2@*Kakiuchida Hiroshi 1,
Takahashi Masahide 2, Tokuda Yomei 2, Yoko Toshinobu 2 |
| |
2 |
Photoconductivity in organic Triphenyldiamine (TPD)
films (II) |
Gifu Univ. 1,Osaka Prefecture Univ. 2@*Sato Tomohiko
1,Yonezawa Kenichi 1,Matuyama Kenta 1,Shimakawa Koichi 1,Naito Hiroyoshi
2 |
| |
3 |
Simultaneous measurements of photodarkening and
photoinduced defect creation in a-As2Se3 films |
Gifu Univ. 1@*Mori Tomonari 1,Nakagawa Nozomu 1,Shimakawa
Koichi 1 |
| |
4 |
Photoinduced change at vacuum ultra-violet transmission
spectra of amorphous chalcogenide thin films |
Gifu Univ. 1@*Kitahara Eisuke 1, Hayashi Koji 1 |
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Break 10:30`10:45 |
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| ’ |
5 |
Relationship between photoinduced phenomena and
structures in GeO2-GeS2 glasses |
Hokkaido Univ. 1@*Terakado Nobuaki 1, Tanaka Keiji
1 |
| |
6 |
Coordination structure of chalcogen molecules in
nano-channels of zeolite |
Hokkaido Univ. 1, AIST 2@*Saitoh Akira 1, Okamoto
Satohiro 1, Tanaka Keiji 1, Kiyozumi Yoshimichi 2 |
| |
7 |
Structure and photoluminescence properties of silicon
suboxide prepared by the ultrasound-induced reduction of silicon alkoxides |
Kobe Univ. 1@*Iwasaka Takashi 1, Uchino Takashi
1 |
| |
8 |
Spin-dependent magnetoconductive properties of
magnetite (Fe3O4) thin film |
Konan Univ. 1,Konan Univ.QNL. 2,Osaka Univ. 3,NeRI-AIST.
4, NRI-AIST. 5@*Daisuke Shimizu 1,Hiromi Kobori 1,2,Atsushi Yamasaki 1,2,Akira
Sugimura 1,2,Toshifumi Taniguchi 3,Hirofumi Kawanaka 4,Atsushi Ando 4,Tetsuo
Shimizu 5 |
| |
9 |
Electrical and magnetoconductive properties of
magnetite (Fe3O4) nanoparticle sinter |
Konan Univ. 1, Konan Univ. QNL 2, Osaka Univ. 3@Toshinori
Asahi 1, Hiromi Kobori 1,2, Atsushi Yamasaki 1,2, Akira Sugimura 1,2, Toshifumi
Taniguchi 3 |
| 14.1 Fundamental
Properties and Evaluations |
| September 6 9:30`12:00 |
| 6a-X-@/ II |
| |
1 |
Correlation between melting tempurature and optical
nonlinearity of 30BaO-15TiO2-55GeO2 crystallized glass |
Tohoku Univ. 1,Nagaoka Univ. Tech. 2@*Suzuki Yoshiyuki
1,Masai Hirokazu 1,Takahashi Yoshihiro 1,Mori Hiroshi 1,Fuziwara Takumi
1,Komatu Takayuki 2 |
| |
2 |
Crystallization and optical properties of fresnoite-type
Ba2TiGe2O8 thin films |
Tohoku Univ. 1, Nagaoka Univ. Tech. 2@*Ogawa Ryoh
1, Masai Hirokazu 1, Takahashi Yoshihiro 1, Mori Hiroshi 1, Fujiwara Takumi
1, Komatsu Takayuki 2 |
| |
3 |
Structural study of BaO-TiO2-SiO2crystallized
glasses by 29Si magic angle spinning NMR and Raman spectroscopy |
Tohoku Univ. 1, Nagaoka Univ. Tech. 2@*Hirokazu
MASAI 1, Yoshihiro TAKAHASHI 1, Hiroshi MORI 1, Takumi FUJIWARA 1, Takayuki
KOMATSU 2 |
| ’ |
4 |
Improvement in the transparency of CaO-Bi2O3-B2O3-Al2O3-TiO2
glass and the crystallization behavior |
Tohoku Univ. 1, Nippon Electric Glass Co., Ltd.
2@Hirokazu MASAI 1, Takumi FUJIWARA 1, Akihiko SAKAMOTO 2, Tadashi SETO
2 |
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Break 10:30`10:45 |
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5 |
Preparation and characterization of transparent
gain media containing Cr: Mg2SiO4 nano-crystals |
Toyota Tech. Inst. 1, Toyota Central R&D Labs.,
Inc. 2@*Yusuke Arai 1, Takenobu Suzuki 1, Ohishi Yasutake 1, Shu Saeki 2,
Takao Tani 2 |
| |
6 |
Fabrication of nanostructures at the surface of
B2O3-Bi2O3 glass by pulse laser
irradiation |
Tohoku Univ. 1,Nagaoka Univ. Tech. 2@*Yasunaga
Hirotoshi 1,Mizuno Shintaro 1,Masai Hirokazu 1,Takahashi Yoshihiro 1,Komatsu
Takayuki 2 |
| ’ |
7 |
Decrease of propagation loss in transparent nano-crystallized
glass fibers |
Tohoku univ. 1. Nagaoka univ. tech. 2.@*Naoki Iwafuchi
1, Yoshiki Yamazaki 1, Hirokazu Masai 1, Yoshihiro Takahashi 1, Hiroshi
Mori 1, Takayuki Komatsu 2, Takumi Fujiwara 1 |
| |
8 |
Evaluation of second-order optical nonlinearity
in crystallized glass fiber |
Tohoku Univ. 1,Nagaoka Univ. Tech. 2@*Yamazaki
Yoshiki 1,Iwafuchi Naoki 1,Masai Hirokazu 1,Takahashi Yoshihiro 1,Mori Hiroshi
1,Fujiwara Takumi 1,Komatsu Takayuki 2 |
| |
9 |
Crystal growth behavior in laser-induced fresnoite
crystallized patterns in glass |
Nagaoka Univ. of Tech. 1@*Honma Tsuyoshi 1, Komatsu
Takayuki 1 |
| 14.1 Fundamental
Properties and Evaluations |
| September 6 16:30`19:00 |
| 6p-ZV-@/ II |
| |
5 |
Fictive temperature effect on refractive index
of silica-germania glasses |
Toyota Technological Institute@Edson H. Sekiya
1, Kazuya Saito 1, Akira J. Ikushima 1 |
| |
6 |
Effect of GeO2 additive on fluorescence intensity
enhancement in bismuth-doped silica glass |
ILE Osaka Univ.@Fujimoto yasushi 1, Kuwada Yoshiyuki
1, Nakatsuka Masahiro 1 |
| £ |
7 |
Fabrication and optical characterization of Yb-doped
silica glass |
Toyota Technological Institute@*P. Barua 1, E.
H. Sekiya 1, K. Saito 1, A. J.Ikushima 1 |
| |
8 |
Structural disorder and energy states of Yb3+ |
Toyota Technological Institute 1@Kazuya Saito 1,
Edson H. Sekiya 1, Pranabesh Barua 1, Kamiya Natsuki 1, Yamamoto Rie 1,
Ikushima Akira 1 |
| |
9 |
Effect of Suppression of Devitrification by Chlorine-containing
Silica Glass (III) |
Fukui National Col. of Technol. 1, Fukui Univ.
2@Horii Naohiro 1,2, Inouye Akihiro 1, Kuzuu Nobu 2 |
| |
10 |
The modification of silica glass by high-energy
photon irradiation |
Dept. of E&E, Univ. of Miyazaki@Kameyama Akihiro |
| |
11 |
Pulsed ESR observation of hydrogen radicals created
in SiO2 glass by F2 laser-irradiation at 12K |
Tokyo Tech MSL 1,Tokyo Tech FCRC 2,Tokyo Metropolitan
Univ. 3@*D.Yamashita 1, S.Koide 1, S.Matsuishi 2, K.Kajihara 3, H. Hosono
1,2 |
| |
12 |
Fabrication of visible light-emitting materials
from the self-assembled crystalline structure of alkyltriethoxysilane |
Kobe Univ. 1,2@*Nihismura Akiko 1,Uchino Takashi
2 |
| |
13 |
Photoluminescence properties of SiCl4-treated
mesoporous silica |
Kobe Univ.1@Itou Mai 1,Uchino Takashi 1 |
| |
14 |
Effect of freeze-drying on the photoluminescence
properties of silica gels |
Kobe Univ. 1,2@*Harada Shigenori 1,Uchino Takashi
2 |
| 14.2 Process
Technologies |
| September 4 13:00`17:45 |
| 4p-M-@/ II |
| |
1 |
Physical Properties of Al Films Made by Metal Organic@Chemical
Vapor Deposition |
AIST@*=Takakazu Suzuki |
| |
2 |
Resistance characteristics to oxidation of metal-catalyzer
for Cat-CVD |
Kanagawa Inst. of Tech.@Tsugutomo Kudoh 1, Yoh-Ichiro
Ogita 1 |
| |
3 |
Low temperature decomposition as large molecule
of MO-gas using catalyzer with resistance to oxidation in Cat-CVD |
Kanagawa Inst Tech. 1@*Ogita Yoh-Ichiro 1,Kudoh
Tsugutomo 1 |
| |
4 |
Study on cleaning methods of slicided tungsten
catalyzer |
Jpn. Adv. Inst. Sci. & Tech. (JAIST)@1.@K. Honda
1. K. Ohdaira 1. H. Matsumura 1. |
| |
5 |
The formation of silicon nanocrystals by laser
irradiation in SiOx sputtering film |
Univ. of electro-communications 1,Univ. of electro-communications
2,Univ. of electro-communications 3,Univ. of electro-communications 4,Univ.
of electro-communications 5,@*Lee Jaesung 1,Chen Changyong 2,Nozaki Sinji
3,Uchida Kazuo 4,Ono Hirosi 5 |
| £ |
6 |
Photoluminescence of Si nanocrystals photosynthesized
from SiO nanopowder |
Univ. Electro-communcations@*Chen changyong 1,
Nozaki Shinji 2, Uchida Kzuo 3, Ono Hiroshi 4 |
| ’ |
7 |
Luminescence from defects related to Germanium
in silicon oxide thin film |
Meiji Univ. 1@N Kosaka 1,T Kushida 1,S Uekusa 1 |
| |
8 |
Thermal desorption mass spectroscopy of SiO2 films
deposited by inductively coupled plasma CVD. |
Sumitomo Electric industries, Ltd.@*Kazunori Fujimoto,Tetsuya
Hattori,Michio Murata,Tadashi Saitoh |
| |
9 |
Gas barrier properties of SiNx films
formed by unipolar pulse sputtering |
Aoyama Gakuin Univ.1 Nissan Co.2@*Hirohata kento
1,Sato Yasushi 1,Yamamoto Isao 2,Shigesato Yuzo 1 |
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Break 15:15`15:30 |
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| ’ |
10 |
In-situ impurity doping to Si nanodots in VHF plasma
process |
QNERC, Tokyo Tech 1, Southampton Univ. and Tokyo
Tech 2, SORST-JST 3@*Inaba Naoki 1, Usami Koichi 1, Yoshishige Tsuchiya
1 3, Hiroshi Mizuta 2 3, Shunri Oda 1 3 |
| |
11 |
Detection of oxidizing and reducing radicals in
the catalytic decomposition of O2/H2 mixtures |
Shizuoka Univ. 1@*Umemoto Hironobu 1, Moridera
Masashi 1 |
| |
12 |
Free Carrier Absorption in ZnO films II |
Faculty of Engineering Gifu Univ. 1, CIPS 2@*Kenta
Matsuyama 1, Yakazono Yoshihiro 1, Itoh Takashi 1,2, Shimakawa Koichi 1,2
|
| |
13 |
Preparation of TiO2 thin films by hot wire
CVD method for a protecting material of TCO for Si thin film solar cells |
Gifu Univ.1@*Koie Ryousuke 1,Iida Tamio 1,Masuda
Toshiro 1,Ueno Hiroyuki 1,Tanaka Yousuke 1,Kuze Hiroshi 1,Narita Tomoki
1,Ogawa Shunsuke 1,Yosida Norimitsu 1,Nonomura shuichi 1 |
| |
14 |
The preparation of titanium dioxide thin films
for the intermediate layer of tandem type silicon film solar cells |
Gifu Univ. 1@*Ikeda Yusuke 1,Ogawa Shunsuke 1,Kuze
Hiroshi 1,Iida Tamio 1,Narita Tomoki@1,Itoh Takashi 1,Yoshida Norimitsu
1,Nonomura Shuichi |
| |
15 |
The fabrication of thin film solar cells using
microcrystalline 3C-SiC as a doping layer. |
Gifu Univ. 1@*Ogawa Shunsuke 1,Ikeda Yuusuke 1,Iida
Tamio 1,Narita Tomoki 1,Itoh Takashi 1,Yoshida Norimitsu 1,Nonomura Shuichi
1 |
| |
16 |
Low temperature deposition of n-type nanocrystalline
SiC:H films by VHF PECVD |
Tokyo Tech. 1@*Shinagawa Tomohiro 1, Sawamura Makoto
1, Miyajima Shinsuke 1, Yamada Akira 1, Konagai Makoto 1 |
| |
17 |
nc-SiC:H/c-Si Heterojunction Solar Cells Fabrictaed
by VHF-PECVD |
Tokyo Tech 1, Tokyo Tech 2@*Miyajima Shinsuke 1,
Sawamura Makoto 1, Yamada Akira 2, Konagai Makoto 1 |
| |
18 |
Fabrication of polycrystalline silicon films by
reactive thermal CVD with Si2H6 and Cl2 |
Tokyo Inst. of Tech.@*Sasaki Naoto 1, Hanna Junich
1 |
| 14.3 Devices
|
| September 7 10:00`11:45 |
| 7a-ZV-@/ II |
| |
1 |
Carrier collection characteristics of microcrystalline
Si1-xGex p-i-n solar cells (II) |
AIST 1, Tokai Univ. 2@*Matsui Takuya 1, Takada
Tomoyuki 1,2, Chang Cia-Wen 1, Isomura Masao 2, Fujiwara Hiroyuki 1, Kondo
Michio 1 |
| |
2 |
Characterization of grain-boundary passivation
in microcrystalline silicon solar cells |
AIST 1@Smets Arno 1, *Matsui Takuya 1, Fujiwara
Hiroyuki 1, Kondo Michio 1 |
| £ |
3 |
Deposition of wide bandgap a-SiO:H films and their
application to solar cells |
Grad. Sch. of Sci. & Eng. Tokyo Tech. 1, QNERC
Tokyo Tech. 2@*Inthisang Sorapong 1, Sriprapha Kobsak 1, Yamada Akira 2,
Konagai Makoto 1 |
| £ |
4 |
Fabrication of high efficiency pc-Si:H/µc-Si:H
double junction solar cells and their temperature dependences |
Grad. Sch. of Sci. & Eng. Tokyo Tech. 1, QNERC
Tokyo Tech. 2@*Sriprapha Kobsak 1, Yunaz Ihsanul Afdi 1, Myong Seung Yeop
1, Yamada Akira 2, Konagai Makoto 1 |
| |
5 |
Fabrication of backcontact HIT solar cells using
hard masks by Cat-CVD method |
Jpn.Adv.Inst.Sci.&Tech.@K.Koyama 1, K.Ohdaira 1,
H.Matsumura 1 |
| ’ |
6 |
Development of flat type TCO substrate with optical
confinement for the Si thin film solar cell |
Grad. School of Eng. Science, Osaka. Univ@*Sobajima
Yasushi, Kato Shingo, Toyama Toshihiko, Okamoto Hiroaki |
| |
7 |
High rate growth Κc-Si films deposited at low temperatures |
Grad. School. of Eng. Sci., Osaka Univ.@*Higuchi
Takuya, Sobajima Yasushi, Toyama Toshihiko, Okamoto Hiroaki |