| 1 Radiation·Plasma Electronics |
|
Plasma Electronics Award |
| September 7 13:15`13:45 |
| 7p-ZQ-@/ I |
| |
1 |
Plasma Electronics Award |
@ |
| |
|
2 - 10 13:45`17:25 (Symposium: Simulation of
Plasmas and their Applied Process - Present Situation and Future Breakthrough
) |
| 1.1 Radiation·Accelerator·Nuclear
Reactor |
| September 4 13:00`18:00 |
| 4p-ZC-@/ I |
| |
1 |
Performance Evaluation of BGO Scintillator Stacked
Gamma-ray Detector for Landmine Detection Based on Neutron Induced Prompt
Gamma-ray Analysis |
Nagoya Univ 1@*Mihoya Shinji 1,Watanabe Kenichi
1,Kawarabayashi Jun 1,Iguchi Tetsuo 1 |
| |
2 |
Directional Gamma Ray Detector with Triple Scintillators
II |
National Inst. of Radiological Sciences1,ALOKA2@*Shirakawa
Yoshiyuki1,Yamano Toshiya2,Kobayashi Yusuke2 |
| |
3 |
Development of position-sensitive detector |
NIRS 1, Osaka Univ RCNP 2, Hiroshima Univ 3, Tokushima
Univ 4@Hidehito Nakamura 1, Ejiri Hiroyasu 2,1, Uchihori Yukio 1, Kitamura
Hisashi 1, Shima Tatsushi 2, Hazama Ryuta 3, Fushimi Kenichi 4 |
| |
4 |
Improved Time-of-Flight Resolution by Depth-of-Interaction
Information |
National Institute of Radiological Sciences@*Kengo
Shibuya, Fumihiko Nishikido, Taiga Yamaya, Naoko Inadama, Eiji Yoshida,
Chih Fung Lam, Hideo Murayama |
| |
5 |
The simulation of time resolution of the gamma
ray measurement system |
The Univ. of Tokyo 1@*Yamawaki Masato 1,Katsumura
Yousuke 2 |
| |
6 |
A DOI-Dependent Extended Energy Window Method for
high sensitivity PET scanner |
National Inst. of Radiological Sciences 1, Shimadzu
Corporation 2, Kitasato Univ.@3@@Eiji Yoshida 1, Keishi Kitamura 2, Fumihiko
Nishikido 1, Kengo Shibuya 1, Tomouki Hasegawa 3, Taiga Yamaya 1, Hideo
Murayama 1 |
| |
7 |
Automatic and optimized calibration for depth-of-interaction
detector |
National Inst. of Radiological Sciences 1, Shimadzu
Corporation 2@Eiji Yoshida 1, Yuichi Kimura 1, Keishi Kitamura 2, Fumihiko
Nishikido 1, Kengo Shibuya 1, Taiga Yamaya 1, Hideo Murayama 1 |
| |
8 |
Xenon Pinhole Camera Measuring Spatial Distribution
of Low Energy X-rays and Gammma-rays |
Adv. Res. Inst. for Sci. and Eng., Waseda Univ.
1@Mimura Mitsuteru 1, Hasebe Nobuyuki 1, Kobayashi Shingo 1, Miyajima Mitsuhiro
1, Miyachi Takashi 1 |
| |
9 |
Development of gamma camera with functional mechanical
collimator |
Nagoya Univ. 1@*Sugiyama Junichi 1, Uritani Akira
1, Watanabe Kenichi 1 |
| |
|
Break 15:15`15:30 |
|
| |
10 |
Novel Xenon Time-Projection-Chamber for MeV Gamma-ray
Imaging |
Adv. Res. Inst. for Sci. and Eng., Waseda Univ.
1, Saitama Pref. Univ. 2@*Mimura Mitsuteru 1, Hasebe Nobuyuki 1, Kusano
Hiroki 1, Kobayashi Shota 1, Kobayashi Shingo 1, Doke Tadayoshi 1, Miyajima
Mitsuhiro 1, Miyachi Takashi 1, Shibamura Eido 2 |
| |
11 |
Development of high energy particle detectors onboard
the solar explorer, HELIOS |
Waseda Univ. 1, Moscow State Univ. 2, Inst. Experimental
Phys. 3@Hasebe Nobuyuki1, Kodaira Satoshi 1, Kobayashi Shingo 1, Sakurai
Kunitomo 1, Hareyama Makoto 1, Masuyama Naoki 1, Panasyuk M.I. 2, Kudela
K.3 and INTER-SONG group |
| |
12 |
Gamma-ray Spectrometer on Lunar Mission KAGUYA(SELENE) |
Research Institute for Science and Technology,
Waseda Univ. 1, Saitama Prefectural Univ. 2, Nippon MedicalSchool 3, ISAS
JAXA 4, Sumitomo Heavy Industries Ltd. 5, Meisei Electric Company 6, Clear
Pulse@*Osamu Okudaira 1, Naoyuki Yamashita 1, Shingo Kobayashi 1, Nobuyuki
Hasebe 1, Takashi Miyachi 1, Eido Shibamura 2, Masanori Kobayashi 3, Makoto
Hareyama 1, Yuzuru Karouji 1, Satoshi Kodaira 1, Kanako Hayatsu 1, Kazuya
Iwabuchi 1, Shinpei Nemoto 1, Takeshi Takashima 4, Katsuhiro Narasaki 5,
Keisuke Tsurumi 5, Takeshi Hiroishi 5, Shigeki Takai 5, Hiroshi Kaneko 6,
Michio Nakazawa 6, Kunishiro Mori 7 |
| |
13 |
Background Estimation of Gamma-Ray Spectrometer
on board Lunar Orbiter SELENE (Kaguya) |
Research Institute for Science and Technology,
Waseda Univ. 1, Saitama Prefectural Univ. 2, Nippon MedicalSchool 3@*Osamu
Okudaira 1, Naoyuki Yamashita 1, Shingo Kobayashi 1, Nobuyuki Hasebe 1,
Takashi Miyachi 1, Eido Shibamura 2, Masanori Kobayashi 3, Makoto Hareyama
1, Yuzuru Karouji 1, Satoshi Kodaira 1, Kanako Hayatsu 1, Kazuya Iwabuchi
1, Shinpei Nemoto 1 |
| |
14 |
Neutron energy spectrum within the lunar subsurface
by GCR alpha particles |
Shuya Ota 1, Naoyuki Yamashita 1, Makoto Hareyama
1, Nobuyuki Hasebe 1@Shuya Ota 1, Naoyuki Yamashita 1, Makoto Hareyama 1,
Nobuyuki Hasebe 1 |
| |
15 |
Possible detection of water in the lunar polar
regions by gamma-ray spectroscopy |
RISE,Waseda Univ. 1@Kazuya Iwabuchi 1,Shingo Kobayashi
1,Naoyuki Yamashita 1,Osamu Okudaira 1,Takashi Miyachi 1,Nobuyuki Hasebe
1 |
| |
16 |
Development of a space dosimeter using the Micro
Pixel Chamber V |
Waseda Univ. 1, Kyoto Univ. 2, KEK 3, JAXA 4, NIRS
5, Keio Univ. 6@Tsutomu Nagayoshi 1, Yasunobu Fujita 1, Tadayoshi Doke 1,4,
Jun Kikuchi 1, Kazuhiro Terasawa 1,4,6, Koji Takeuchi 1, Kentaro Miuchi
2, Toru Tanimori 2, Shin-ichi Sasaki 3, Hiroko Tawara 3, Tatsuto Komiyama
4, Haruhisa Matsumoto 4, Yukio Uchihori 5, Takashi Kitamura 5 |
| |
17 |
Development of a space dosimeter using the Micro
Pixel Chamber IV |
Waseda Univ. 1, Kyoto Univ. 2, KEK 3, JAXA 4, NIRS
5, Keio Univ. 6@Yasunobu Fujita 1, Tsutomu Nagayoshi 1, Tadayoshi Doke 1,4,
Jun Kikuchi 1, Kazuhiro Terasawa 1,4,6, Koji Takeuchi 1, Kentaro Miuchi
2, Toru Tanimori 2, Shin-ichi Sasaki 3, Hiroko Tawara 3, Tatsuto Komiyama
4, Haruhisa Matsumoto 4, Yukio Uchihori 5, Takashi Kitamura 5 |
| |
18 |
Radiation absorbed dose in surface materials for
spacecraft |
JAXA@*Shimazaki Kazunori 1, Imaizumi Mitsuru 1,
Kibe Koichi 1 |
| |
19 |
Dose Equivalent on the Lunar Surface |
RISE, Waseda Univ.@Kanako Hayatsu 1, *Singo Kobayashi
1, Naoyuki Yamashita 1, Osamu Okudaira 1, Takashi Miyachi 1, Mitsuhiro Miyajima
1, Kunitomo Sakurai 1, Nobuyuki Hasebe 1 |
| 1.1 Radiation·Accelerator·Nuclear
Reactor |
| September 5 9:00`12:00 |
| 5a-ZD-@/ I |
| |
1 |
Laser-Peening Processing to Fine Grain Rolling
Steels by Ultrashort Light Pulses |
Kanazawa Univ. 1, Hamamatsu Photonics 2@Masayuki
Kurashima 1,Ryouta Tsukahara 1,Toshio Kurobori 1,Masahide Gotoh 1,Yukio
Hirose 1,Toshiaki Sakai 2,Shin-ichiro Aoshima 2 |
| |
2 |
Irradiation effect of ultrashot light pulses and
its application for optoelectronic devices in bulk LiF |
Kanazawa Univ. 1,Hamamatsu Photonics 2,Osaka Pref.Univ.
3@Obayashi Yoshihiro 1,Suzuki Kenji 1,*Kurobori Toshio 1,Sakai Toshiaki
2,Aoshima Shin-ichiro 2,Oka Takashi 3,Kojima Takao 3,Okuda Syuichi 3 |
| |
3 |
Development of Sr Isotope ratio Analysis using
Resonance Ionization Mass Spectrometry for Origin Determination of Fossil
Bone |
Nagoya Univ. 1@*Seiji Sasada 1,Kenichi Watanabe
1,Yuki Higuchi 1,Hideki Tomita 1,Jun Kawarabayashi 1,Tetsuo IGUCHI1 |
| |
4 |
Study on formation of 24 keV monoenergetic neutron
field with an iron and aluminum filter |
Nagoya Univ. 1, AIST 2@Jun Yamazaki 1, Kenichi
Watanabe 1, Akira Uritani 1, Tetsuro Matsumoto 2, Hideki Harano 2 |
| |
5 |
Development of nuclear reaction microanalysis technique
of trace boron doped iron |
Kyoto Univ. 1, Muroran Inst. Tech. 2, JAEA Takasaki
3@*Shibata Hiromi 1, Kohno Yutaka 2, Sato Takahiro 3, Oikawa Masakazu 3,
Haga Junji 3, Takuro Sakai Takuro 3 |
| |
|
Break 10:15`10:30 |
|
| |
6 |
Improvement of Simple and Convenient Beam Profile
Monitor for Ion Beam Experiments |
Osaka Univ. 1@*Hatsumi Kobayashi 1, Wataru Kada
1, Atsuya Kishi 1, Fuminobu Sato 1, Yushi Kato 1, Toshiyuki Iida 1 |
| |
7 |
Investigation of latent image specks formation
of heavy-ion in the emulsion |
Nagoya Univ. 1, Chiba Univ. 2, Toho Univ. 3, High
Energy Accelerator Reserch Organization 4, National Inst. of Radiological
Sciences 5@*Hirotaka KUBOTA 1, Kimio NIWA 1, Toshiyuki TOSHITO 4, Ken'ichi
KUGE 2, Nakahiro YASUDA 5, Mitsunori NATSUME 1, Chika FUKUSHIMA 3, Mitsuhiro
KIMURA 3, Junya YOSHIDA 1 |
| |
8 |
Ultra High Speed Nuclear Emulsion Scanning System |
Nagoya Univ. 1@Morishima Kunihiro 1, Nakano Toshiyuki
1, Niwa Kimio 1, Kawai Toshihide 1, Ishikawa Shuzo 1 |
| |
9 |
Measurement method of nuclear charge changing cross
section using solid state detector and high speed imaging microscope |
RISE Waseda Univ 1, NIRS 2@Shuya Ota 1, Satoshi
Kodaira 1, Mieko Kurano 2, Masashi Sato 1, Makoto Hareyama 1, Nakahiro Yasuda
2, Nobuyuki Hasebe 1 |
| |
10 |
Study of the development of high performance BP-1
track detector |
Waseda University 1, Yokohama Nat'l Univ. 2, KEK
3, NIRS 4@*Kodaira Satoshi 1, Doke Tadayoshi 1, Hasebe Nobuyuki 1, Kamei
Takuya 2, Nakamura Shogo 2, Tawara Hiroko 3, Yasuda Nakahiro 4 |
| |
11 |
Improvement of mass resolution for iron isotopes
using CR-39 track detector |
Waseda Univ. 1, NIRS 2, KEK 3, Nihon Univ. 4@*Kodaira
Satoshi 1, Ota Shuya 1, Sato Masashi 1, Doke Tadayoshi 1, Hasebe Nobuyuki
1, Yasuda Nakahiro 2, Tawara Hiroko 3, Ogura Koichi 4 |
| 1.1 Radiation·Accelerator·Nuclear
Reactor |
| September 6 9:30`18:15 |
| 6a-ZC-@/ I |
| |
1 |
Study of Large Area CdTe X-ray and Α-ray Imaging
Detectors Grown by MOVPEiIIIj`High-speed growth of thick CdTe layers` |
Nagoya Inst. of Tech. 1@*Akinobu Watanabe 1,Hiroyuki
Ohashi 1,Motohiro Omura 1,Ikki Shingu 1,Ryuichi Tanaka 1,Koji Nakamura 1,Shinpei
Minoura 1,Masahiro Yokota 1,Hatasu Ichihashi 1,Yasuhiro Kai 1,Wataru Yamada
1,Yasunori Agata 1,Madan Niraula 1,Kazuhito Yasuda 1 |
| |
2 |
Study of Large Area CdTe X-ray and Α-ray Imaging
Detectors Grown by MOVPEiIVj`Characterization of CdTe/Si Diode Detectors` |
Nagoya Inst. of Tech.@*Hatasu Ichihashi 1,Hiroyuki
Ohashi 1,Motohiro Omura 1,Ikki Shingu 1,Ryuiti Tanaka 1,Kouji Nakamura 1,Shinpei
Minoura 1,Masahiro Yokota 1,Yasuhiro Kai 1,Wataru Yamada 1,Akinobu Watanabe
1,Yasunori Agata 1,Madan Niraula 1,Kazuhito Yasuda 1, |
| |
3 |
Basic Performance of a Prototype 3D PET Scanner
using CdTe-DOI Detectors |
Hitachi, Ltd.,Central Research Laboratory@*Yanagita
Norihito, Seino Tomoyuki, Ishitsu Takafumi, Ueno Yuuichirou, Amemiya Kensuke |
| |
4 |
Basic characteristics of stacked type CdTe radiation
detectors |
Hitachi, Ltd. 1@*Seino Tomoyuki 1, Kominami Shinya
1, Yanagita Norihito 1, Amemiya Kensuke 1 |
| |
5 |
Evaluation of Depletion Layer in In/CdTe/Pt Radiation
Detector |
Hitachi, Ltd., Central Research Laboratory 1@*Kominami
Shinya 1, Seino Tomoyuki 1, Amemiya Kensuke 1 |
| ’ |
6 |
Effect of sulfur treatment on formation of Al Schottky
electrode on CdTe(111)Te surface. |
Univ. of the Ryukyus 1, Acrorad 2@Yamanoha Satoru
1, Yamauchi Suguru 1, Yamazato Masaaki 1, Ohno Ryoichi 2, Higa Akira 1 |
| |
|
Break 11:00`11:15 |
|
| |
7 |
Development of a Radiation Detector Based on Silicon
Carbide |
Osaka Univ. 1@Ishikawa Ippei 1, Ihara Yohei 1,
Kada Wataru 1, Sato Fuminobu 1, Kato Yushi 1, Iida Toshiyuki 1 |
| |
8 |
Performance of a Si Avalanche Photodiode for gamma-ray
at Low Temperature |
Kyushu Univ. 1,Taiyou Nippon Sanso 2@*Yasumune
Takashi 1,Masuda Takurou 1,Maehata Keisuke 1,Ishibasi Kenji 1,Umeno Takahiro
2 |
| |
9 |
Measurement of W-values in Gases for Heavy Ions
–Tissue Equivalent Gas- |
KEK 1, NIRS 2@*Sasaki Shinichi 1, Sanami Toshiya
1, Tawara Hiroko 1, Saito Kiwamu 1, Iijima Kazuhiko 1, Murakami Takeshi
2 |
| |
10 |
Drift velocity for electrons in 4He
and 3He |
Research Inst. for Sci. and Eng., Waseda Univ.
1@Kusano Hiroki 1, *Hasebe Nobuyuki 1, Kobayashi Shingo 1, Mimura Mitsuteru
1, Miyajima Mitsuhiro 1 |
| |
11 |
Positive and Negative secondary ion measurements
from HOPG target bombarded by fast C, Al and Au cluster ions |
Kyoto Univ. 1, JAEA Takasak i2, ASRC JAEA 3@*Shibata
Hiromi 1, Tsuchida Hidetsugu 1, Itoh Akio 1, Saitoh Yuichi 2, Chiba Atsuya
2, Adachi Masahiro 2, Kamiya Tomihiro 2, Narumi Kazumasa 3 |
| |
|
Lunch 12:30`13:30 |
|
| 6p-ZC-@/ I |
| |
1 |
A simple method for measurement of radio-photoluminescence
from glass dosimeter (II) |
Osaka Univ. 1, Chiyoda Technol Corp.@2@Kishi Atsuya
1, Ihara Youhei 1, Kada Wataru 1,Sato Fuminobu 1,Kato Yushi 1 Iida Toshiyuki
1, Yamamoto Takayoshi 2 |
| |
2 |
Effect of solid phase reaction by annealing process
for grain size on TL phosphor CaSO4:Dy |
Rikkyo@Univ.1,Komazawa Univ.2@Kiyomitsu Shinsho1,Kazumasa
Harada2, Yusuke Yamamoto2, Akio Urushiyama1 |
| |
3 |
Deformation Luminescence in X-Ray Irradiated KCl |
Grad. School, Kanazawa Univ.@*Nakamura Shoichi
1, Ohgaku Tomiyasu 1 |
| |
4 |
Photon Yield in Some Inorganic Scintillators |
Saitama Pref. Univ. 1, KEK 2, Adv. Res. Ins. for
Sci. ans Eng. Waseda Univ. 3@*Shibamura Eido 1, Sasaki Shiniti 2, Tawara
Hiroko 2, Saito Kiwamu 2, Miyajima Mitsuhiro 3 |
| |
5 |
Maximum Scintillation Yields of NaI(Tl) and CsI(Tl)
Crystals Estimated from Scintillation Model for Liquid Rare Gases |
Keio Univ. 1, Waseda Univ. 2, Saitama Prefectural
Univ. 3, Rikkyo Univ. 4, JAXA 5@*Terasawa Kazuhiro 1,5, Doke Tadayoshi 2,
Shibamura Eido 3, Kubota Shinzo 4 |
| |
6 |
Cerium concentration dependence of luminescince
properties of Gd2Si2O7 |
Hokkaido Univ. 1, Hitachi Chemical 2@Saeki Syohei
1, *Haruna Jun 1, Kaneko Junichi 1, Higuchi Mikio 1, Kawamura Sohan 1, Ueda
Shunsuke 2, Kurashige Kazuhisa 2, Ishibashi Hiroyuki 2, Fujita Fumiyuki
1, Homma Akira 1, Furusaka Michihiro 1 |
| |
7 |
Development of Fast Scintillators Using Semiconductor
Quantum Dots Organized in Halide Crystals |
Tohoku Univ. 1, NIRS 2, Univ. of Tokyo 3@*Watanabe
Shotaro 1, Takahashi Naoki 1, Koshimizu Masanori 1, Shibuya Kengo 2, Muroya
Yusa 3, Asai Keisuke 1 |
| |
8 |
Relation between the scintillation characteristics
of Ce-doped Gd2Si2O7 single-crystals and
Ce-concentration |
Hokkaido Univ. 1, Hitachi Chemical 2@*Sohan Kawamura
1, Junichi H Kaneko 1, Mikio Higuchi 1, Shusuke Nishiyama 1, Fumiyuki Fujita
1, Akira Homma 1, Jun Haruna 1, Shohei Saeki 1, Shunsuke Ueda 2, Kazuhisa
Kurashige 2, Hiroyuki Ishibashi 2, Michihiro Furusaka 1 |
| |
9 |
Synthesis and evaluation organic-inorganic hybrid
scintillators by sol-gel method |
School of Eng. Tohoku Univ. 1@*Koshimizu Masanori
1, Kitajima Hiroyuki 1, Asai Keisuke 1 |
| |
|
Break 15:45`16:00 |
|
| |
10 |
Fast neutron detector using an alumina fluorescent
plate |
School of Engineering, The Univ. of Tokyo.@1@Y.Hosono,
T.Omata, T.Iwai and H.Takahashi@1 |
| |
11 |
Fast Neutron Detection by Storage Phosphors with
Low Gamma-ray Sensitivity |
JAEA 1@Sakasai Kaoru 1, Iwamoto Yosuke 1, Soyama
Kazuhiko 1 |
| |
12 |
Evaluation of Pr:LuAG scintillators for gamma-ray
detection by APD |
Institute of Multidisciplinary Research for Advanced
Materials, Tohoku University 1,Material reserch laboratoly, Furukawa, Co.
Ltd. 2@Takayuki Yanagida 1, Mitsuhiro Sato 1, Kei Kamada 1A2, Akira Yoshikawa
1 |
| |
13 |
Investigation of reflector materials for 2 dimensional
radiation imaging by using Pr:Lu3Al5O12(LuAG)
scintillator |
Furukawa Co. Ltd. 1, IMRAM, Tohoku Univ. 2, Kobe
City College of Technology. 3,@Kei Kamada 1,2 , Kousuke Tsutsumi 1, Usuki
Yoshiyuki 1, Takeyuki Yanagida 2, Akira Yoshikawa 2, Seiichi Yamamoto 3 |
| |
14 |
Measurements of luminescence spectra of rare gas
scintillation |
KEK 1, Saitama Prefectural Univ. 2@Saito Kiwamu
1, Sasaki Shinichi 1, Tawara Hiroko 1, Sanami Toshiya 1, Hagiwara Masauki
1, Shibamura Eido 2 |
| |
15 |
Development of TIBIC System Combined with a Microbeam
of High Energy Heavy Ions II |
Japan Atomic Energy Agency 1@*Onoda Shinobu 1,
Hirao Toshio 1, Hishiki Shigeomi 1, Ohshima Takeshi 1 |
| |
16 |
X-ray micro beam profile measurement with radiophotoluminescent
glass plate |
Osaka Univ. 1, Chiyoda Technol corp. 2@*Aoi Yusuke
1, Kuchimaru Takahiro 1, Sato Fuminobu 1, Kato Yushi 1, Iida Toshiyuki 1,
Yamamoto Takayoshi 2 |
| |
17 |
Charging and Acceleration of Water Droplets for
Laser Produced Plasmas (LPP) Experiment |
Kyoto Univ. 1, EUVA 2@Moriyasu Kenta 1, *Shibata
Hiromi 1, Endo Akira 2 |
| |
18 |
Status and Future Plans of Research Center for
Accelerator and Beam Science, Kyushu University |
Kyushu Univ. 1@*Arima Hidehiko 1, Yonemura Yujiro
1, Ikeda Nobuo 1, Ishibashi Kenji 1 |
| 1.1 Radiation·Accelerator·Nuclear
Reactor |
| September 7 9:30`18:15 |
| 7a-ZC-@/ I |
| |
1 |
Measurement of Natural Activities in Asbestos |
Radiation Reseach Center, Osaka Prefecture University@*Taniguchi
Ryoichi 1,Kojima Takao 1,Okuda Shuichi 1 |
| |
2 |
Development of a Sensitive Tritium Monitor |
NIFS 1, Nagoya-Univ. 2, Niigata-Univ.@*Sakuma Yoichi
1, Ogata Yoshimune 2, Ohta Masatodhi 3, Uematsu Kazuyoshi 3, Akiyama Yoichi
3 |
| ’ |
3 |
Atomic number mapping by energy discriminated X-ray
CT image |
Res. Inst. of Electronics Shizuoka Univ. 1,IHI
2@*Takuya Nakashima 1,Yoshiaki Onishi 1,Akifumi Koike 1,Bunji Shinomiya
1,Hisashi Morii 1,Daisuke Ishida 2,Namio Kaneko 2,Youichiro Neo 1,Hidenori
Mimura 1,Toru Aoki 1 |
| |
4 |
Operation of a TES microcalorimeter with@helium-free
dilution refrigerator |
Kyushu Univ.1, JAEA 2, SII Nanotechnology Inst.3,
Taiyo Nippon Sanso Corp.4@*Nakamura Keisuke 1, Ueno katsunori 1, Maehata
Keisuke 1, Ishibashi Kenji 1, Takasaki Koji 2, Tanaka Keiichi 3, Umeno Takahiro
4 |
| |
5 |
Detection of LX-ray emitted from 241Am
by using TES microcalorimeter |
Kyushu Univ. 1, SII NanoTechnology Inc. 2, Taiyo
Nippon Sanso Corporation 3, JAEA 4@*Ueno Katsunori 1, Nakamura Keisuke 1,
Maehata Keisuke 1, Ishibashi Kenji 1, Tanaka Keiichi 2, Umeno Takahiro 3,
Takasaki Koji 4 |
| |
6 |
Correction of Characteristic X-ray on Spectral
Measurement of Mammographic X-ray Unit with Compton-Scattered Method |
Grad.Sch.Med.Osaka Univ. 1, Osaka Univ. 2, Hiroshima
Inter. Univ. 3@*Matsumoto Masao 1, Wakai Nobuhide 1, Sakamoto Masahiro 2,
Maeda Koji 3 |
| |
|
Break 11:00`11:15 |
|
| |
7 |
Development of a Fast Scintillation Detector for
High-energy X-rays |
KEK 1, NIRS 2, Tohoku Univ. 3, JASRI 4, CREST/JST
5 @*Shunji Kishimoto 1,5, Zhang Xiaowei 1,5, Kengo Shibuya 2,5, Fumihiko
Nishikido 2,5, Masanori Koshimizu 3,5, Naoki Takahashi 3, Keisuke Asai 3,
Yoshitaka Yoda 4,5, Rie Haruki 4 |
| |
8 |
Saturation characteristics of ionization chambers
for high-intensity pulsed X rays |
Japan Synchrotron Radiation Research Inst. 1@Nariyama
Nobuteru 1, Kudo Togo 1 |
| |
9 |
Development of BP-1 glass multi-collimators for
detailed diagnosis of X-ray CCD |
Yokohama Nat'l Univ. 1, Science Univ. of Tokyo
2, NIRS 3, ISAS/JAXA 4, KEK 5, RIKEN 6 @Tomoatsu Sato 1, Koji Abe 2, Yukio
Uchihori 3, Takuya Kamei 1, Hisashi Kitamura 3, Takeshi Takashima 4, Hiroko
Tawara 5, Shogo Nakamura 1, Junko S. Hiraga 6, Kenji Miyamoto 1 |
| |
10 |
Detailed diagnosis of X-ray CCD by using BP-1 glass
multi-collimators |
Yokohama Nat'l Univ. 1, Science Univ. of Tokyo
2, NIRS 3, ISAS/JAXA 4, KEK 5, RIKEN 6@*Kenji Miyamoto 1, Koji Abe 2, Yukio
Uchihori 3, Takuya Kamei 1, Hisashi Kitamura 3, Tomoatsu Sato 1, Takeshi
Takashima 4, Hiroko Tawara 5, Shogo Nakamura 1, Junko S. Hiraga 6, Kenji
Miyamoto 1 |
| |
11 |
Synchrotron beam test of a position-sensitive small-pixel
Ir-TES array |
Tokyo Univ. 1, PRESTO, Japan Science and Technology
Agency 2@Mori Fumiakira 1, Ohno Masashi 2, Minamikawa Yasuhiro 1, Zen Nobuyuki
1, Takahashi Hiroyuki 1 |
| |
|
Lunch 12:30`13:30 |
|
| 7p-ZC-@/ I |
| |
1 |
Imaging Performance of the jPET-D4: a Prototype
Brain PET Scanner |
NIRS@*Taiga Yamaya1, Eiji Yoshida1, Chih Fung Lam1,
Naoko Inadama1, Kengo Shibuya1, Fumihiko Nishikido1, Hiroshi Ito1, Hideo
Murayama1 |
| |
2 |
Proposal of a New Reflector Arrangement in a Low-Cost
PET Detector |
NIRS 1,Chiba Univ. 2,Waseda Univ. 3@Naoko Inadama
1, Hideo Murayama 1, Taiga Yamaya 1, Kengo Shibuya 1, Fumihiko Nishikido
1, Eiji Yoshida 1, Chih Fung Lam 1, Kei Takahashi 1,2, Atsushi Ohmura 1,3 |
| |
3 |
Beam Hardening Free CT Measurement Method (1) Feasibility
Study on Energy Subtraction CT by Simulation |
Kyoto Univ. 1, Raytech 2@*Kanno Ikuo 1, Uesaka
Akio 1, Nomiya Seiichiro 2, Onabe Hideaki 2 |
| |
4 |
Beam Hardening Free CT Measurement Method (2) Experiment
with CdZnTe Detector |
Kyoto Univ. 1, Raytech 2@*Uesaka Akio 1, Kanno
Ikuo 1, Nomiya Seiichiro 2, Onabe Hideaki 2 |
| |
5 |
Beam Hardening Free CT Measurement Method@(3)Feasibility
Study on Current Mode Detector |
Kyoto Univ. 1, JAEA 2, Raytech 3@Kanno Ikuo 1,
Uesaka Akio 1, Ohtaka Masahiko 2, *Hashimoto Makoto 2, Ara Kuniaki 2, Nomiya
Seiichiro 3, Onabe Hideaki 3 |
| |
6 |
Basic Study on Anodic Oxidation Technique with
Atomic Force Microscope to Fabricate Single-Electron Device for Radiation
Imaging Detector |
Nagoya Univ. 1@*Hirano Toshio 1, Jun Kawarabayashi
1, Tetsuo Iguchi 1 |
| |
7 |
ESR Property of Hydroxyapatite Doped with Rare
Earth Ion |
Fac. of Engineering, Niigata Univ.@*Ohta Masatoshi,Okamura
Hisakazu |
| |
8 |
Study on measurement of thermal neutron temperature
in a thermal neutron field with a graphite pile |
Nagoya Univ. 1,AIST 2,@*Sogabe Naoki 1,Watanabe
Kenichi 1,Uritani Akira 1,Matsumoto Tetsuro 2,Harano Hideki 2,Kudo Katsuhisa
2 |
| |
9 |
Observation of the High Effictive change of binding
state in a Thiospinel Compound by Ion Beams |
School of Engineering, Tohoku Univ. 1, School of
Engineering, Tokyo Univ. 2@*Hirotaka Tsukahara 1, Masanori Koshimizu 1,
Keisuke Asai 1, Takeo Iwai 2 |
| |
|
Break 15:45`16:00 |
|
| |
10 |
Optical absorption of semiconductor-doped glasses |
Yamaguchi Univ. 1, Ube National College of Technology
2@*Miyoshi Tadaki 1, Kaneda Teruhisa 2 |
| |
11 |
Modeling of dielectric barrier discharge (13) –Effect
of mono polar pulse voltage excitation – |
NDA 1, NIT 2, Hokkaido Univ 3@*Akashi Haruaki 1,
Oda Akinori 2, Sakai Yosuke 3 |
| |
12 |
Development of Global-Local Grouping Multi-Grid-Type
MSGC and front-end readout electronics |
The Univ. of Tokyo 1,Hokkaido Univ. 2,JASRI 3,Toshiba
Electron Tubes and Devices, Co., Ltd. 4@*Takada Yuka 1,Takahashi Hiroyuki
1,Fujita Kaoru 1,Niko Hisako 1,Furusaka Michihiro 2,Toyokawa Hidenori 3,Ishitoya
Kenji 4,Hikida Noriyuki 4 |
| |
13 |
Basic study on single-electron transistor for cryogenic
radiation detector |
Nagoya Univ.@*Teruhisa Matsui 1, Jun Kawarabayashi
1, Kenichi Watanabe 1, Tetsuo Iguchi 1 |
| ’ |
14 |
Evaluation of Optical Cements for the DOI PET Detector:
refractive index dependence |
Waseda Univ. 1,NIRS 2,Chiba Univ. 3@*Atsushi Ohmura
1,2,Hideo Murayama 2,Naoko Inadama 2,Taiga Yamaya 2,Eiji Yoshida 2,Fumihiko
Nishikido 2,Kengo Shibuya 2,Kei Takahashi 2,3,Shoji Torii 1 |
| |
15 |
Development of high efficiency proton recoil counter
telescope for neutron measurement |
JAEA@*Tanimura Yoshihiko 1, Saegusa Jun 1, Yoshizawa
Michio 1 |
| |
16 |
Performance Evaluation of Four-layer DOI-PET Detector
with Avalanche Photodiode |
NIRS 1, Waseda Univ. 2, Shimazu Co. 3@*Fumihiko
Nishikido 1, Eiji Yoshida 1, Naoko Inadama 1, Kengo Shibuya 1, Taiga Yamaya
1, Chih Fung Lam 1, Atsushi Omura 2, Ichiro Oda 3, Hideo Murayama 1 |
| |
17 |
Corrections for charge of secondary electrons,
i.e., photoelectrons, Compton electrons and Auger electrons, during absolute
measurement of air kerma and exposure by free air ionization chambers |
AIST 1, BUET 2@Takata Nobuhisa 1, Begum Afia 2 |
| |
18 |
Influence of Structure of Large Area Scintillation
Detector on Detection Limit |
Toshiba Corp.@Hirotaka Sakai 1,Shunichiro Makino
1,Shuji Yamamoto 1,Mikio Izumi 1,Masashi Aoki 1,Yoshihisa Yamaguchi 1 |
| 1.2 Plasma
Sources and Production Technologies |
| September 4 9:45`17:45 |
| 4a-ZB-@/ I |
| |
1 |
A microwave-excited plasma source using a corrugated
internal dielectric microwave applicator |
SHIBAURA MECHATRONICS CORPORATION 1, Tyuubu Univ.
2@*Kohei Shimatani 1, Ivan Ganachev 1,2 |
| ’ |
2 |
Production of Multi-Hollow Plasma by Microwave
Discharge |
Nagoya Univ. 1, Chubu Univ. 2@*Nakao Sachiko 1,
Sugai Hideo 1,2 |
| £ |
3 |
Surface wave plasma production in the discharge
chamber fully covered by quartz glass |
Innovative Joint Research Center Shizuoka Univ.
1, Grad. School of Electronic Sci. and Technol. Shizuoka Univ. 2@*Siry Milan
1, Husarik Jan 2, Kando Masashi 2 |
| |
4 |
Characteristics of Pulse Modulated Surface Wave
Oxygen Plasma |
Toyo Univ. 1@Osaka Takuro 1, Okamoto Yukio 1 |
| |
5 |
Profile measurement of plasma parameters on 11-13GHz
ECRIS with cylindrically comb-shaped magnetic-field configuration. |
Osaka Univ. 1, Tateyama Machine Co. 2@*Satani Takashi
1, Matsui Yuki 1, Watanabe Takeyoshi 1, Tanaka Kiyokatu 2, Asaji Toyohisa
2, Sato Fuminobu 1, Kato Yushi 1, Iida Toshiyuki 1 |
| |
|
Break 11:00`11:15 |
|
| |
6 |
Plasma Production Simulations with Differential
Equation Solver |
Univ. Tsukuba 1, Kobe Univ. 2, Kyushu Univ. 3@Hitoshi
Hojo 1, Yasuyoshi Yasaka 2, Hiromasa Takeno 2, Atsushi Mase 3 |
| ’ |
7 |
Numerical Analysis and Optical Diagnostics of Microwave-Excited
Plasma Source for Microthrusters (II) |
Kyoto Univ. 1@*Takeshi Takahashi 1, Yoshinori Takao
1, Koji Eriguchi 1, Kouichi Ono 1 |
| |
8 |
Generation of microgap plasma by 10-GHz microwave
excitation and its electron density measurement |
Nagoya Univ. 1@*Kobayashi Masayoshi 1,Harada Yuya
1,Aramaki Mitsutoshi 1, Kono Akihiro 1 |
| |
9 |
Property of plasma filament excited microwave pulse
discharge |
Grad. School of Eng. Shizuoka Univ. 1@Matsuda Itsuki
1,Kando Masashi 1 |
| |
10 |
Measurement of VUV spectra of 10GHz micro ECR plasma
|
Nagoya Univ.@*Kuroki Toshihiro 1, Aramaki Mitsutoshi
1, Kono Akihiro 1 |
| |
|
Lunch 12:30`13:30 |
|
| 4p-ZB-@/ I |
| |
1 |
Behavior of long-plume atmospheric plasma jet |
Toyota Tech. Inst. 1, Univ. of Toyama 2@*Kubota
Yuusuke 1, Ichiki Ryuta 1, Kuroyanagi Eri 1, Yamaguchi Naohiro 2, Hara Tamio
1 |
| ’ |
2 |
Atmospheric Pressure Micro-plasma Jet -Difference
of Characteristics by Ar and He- |
Ehime Univ. 1@*Matsuba Hisaki 1, Nagahama Taichi
1, Motomura Hideki 1, Jinno Masahumi 1 |
| ’ |
3 |
Diagnostics of Discharge Characteristics and Spectroscopic
Measurements of Excited Species in Low-temperature Plasma Jet at Atmospheric
Pressure using Covered Cable Electrodes |
Kyoto Univ 1@*Urabe Keiichiro 1, Ito Yosuke 1,
Kubo Makoto 1, Tachibana Kunihide 1 |
| |
4 |
Dynamical characteristics of low-frequency nonequilibrium
atmospheric micro plasma jets II |
Osaka Univ. 1@Katsuhisa Kitano 1, Satoshi Hamaguchi
1 |
| |
5 |
Development of Electron Emission Simulator Considering
Tunnel Effect for Plasma Display Panel |
Tohoku Univ. 1 NICHe Tohoku Univ. 2@*Tsuboi Hideyuki
1, Kikuchi Hiromi 1, Serisawa Kazumi 1, Sahnoun Riadh 1, Koyama Michihisa
1, Hatakeyama Nozommu 1, Endou Akira 1, Takaba Hiromitsu 1, Kubo Momoji
1, Del Carpio Carlos A. 1, Miyamoto Akira 1,2 |
| ’ |
6 |
The Efect of Dielectric Barrier Discharge on Multi-hole
Type Micro-hollow Cathode Uniform Discharge |
Shizuoka Univ.@*Watanabe Jun 1,Ogino Akihisa 2,Nagatsu
Masaaki 2 |
| |
7 |
Optical control of wall charges and breakdown in
a barrier discharge |
Yamanashi Univ. 1@Kubota Satoru 1 |
| |
8 |
Breakdown voltage of a plane parallel-type microbarrier
discharge in an atmospheric pressure |
Yamanashi Univ. 1,@*Yamamoto Keisuke 1,Kasai Hiroyuki
1,Sakurai Takeki 1 |
| |
|
Break 15:30`15:45 |
|
| |
9 |
Discharge mechanisms on the metal electrode covered
with EPTFE in ethanol solution |
IIC, Kyoto Univ. 1, GSE, Kyoto Univ. 2@*Shirafuji
Tatsuru 1, Kimura Masaru 2, Sakai Osamu 2, Tachibana Kunihide 2 |
| ’ |
10 |
Investigation on potential of ionic liquid in low
gas pressure plasmas with gas-liquid interface |
Tohoku Univ.1@*Baba Kazuhiko1, Kaneko Toshiro1,
Hatakeyama Rikizo1 |
| £ |
11 |
Atmospheric glow discharge using the electrolyte
solution (2) |
Saitama Univ. 1 ,JST. 2@Q. Chen, K. Saito, Y. Takemura1,
and H. Shirai |
| |
12 |
Decomposition processing of acetic acid solution
using atmospheric pressure discharge plasm |
OSAKA institute of technology 1@*Oketani Kazuhiro
1,Osako Tomonobu 1,Miichi Tomoaki 1 |
| ’ |
13 |
Observation of discharge in hydrogen bubbles generated
by electrolysis method |
Kyoto Univ. 1, IIC, Kyoto Univ. 2@*Masaru Kimura
1, Osamu Sakai 1, Tatsuru Shirafuji 2 and Kunihide Tachibana 1 |
| ’ |
14 |
Influence of UV Photon Irradiation in Atmospheric-pressure
Plasma Process |
Tohoku Univ. 1, Sekisui Chemical 2@*Sato Taiki
1, Ueno Akira 1, Yara Takuya 2, Miyamoto Eiji 2, Samukawa Seiji 1 |
| |
15 |
Characteristics of RF He/CF4/O2
and He/SF6/O2 discharges at atmospheric pressure |
Nagoya Inst. Technol. 1@Tanahashi Hiroki 1, *Kimura
Takashi 1 |
| ’ |
16 |
Generation of microdischarge plasma in low pressure
environments |
Osaka Univ. 1,Stanford Univ. 2@(M)Kazunobu Kobayashi
1,Tsuyohito Ito 1, Mark A. Cappelli 2, Satoshi Hamaguchi 1 |
| 1.2 Plasma
Sources and Production Technologies |
| September 5 9:45`12:30 |
| 5a-ZB-@/ I |
| |
1 |
Properties of Ar/O2 Mixture Plasmas
Sustained with Inductively Coupled RF Discharges Using Multiple Internal
Antenna Units |
Osaka Univ. 1, EMD Corp. 2, Sung Kyun Kwan Univ.
3@*Kosuke Takenaka 1, Yuichi Setsuhara 1, Akinori Ebe 2, Yong-Mo Kim 3,
Jeon G. Han 3 |
| |
2 |
Dependence of atomic oxygen density on gas mixture
ratio in inductively coupled plasma in Ar/O2 |
Keio Univ. 1@*Sato Toshikazu 1, Makabe Toshiaki
1 |
| |
3 |
Modeling of the frequency e ect on a VHF capacitively
coupled plasma |
Keio Univ. 1@*Hiroyuki Takahashi 1, Takashi Yagisawa
1, Toshiaki Makabe 1 |
| |
4 |
Frequency Dependence of Inductively Coupled Plasma
with Single-Loop Antenna(II) |
Tokai Univ. 1,ULVAC Inc. 2@*Kitamura Yuichi 1,Kusaba
Kouta 1,Miyanishi Hiroaki 1,Jinnbo Yousuke 2,Tsuboi Hideo 2,Asari Sinn 2,Kikuchi
Masasi 2 ,Shindo Haruo 1 |
| |
5 |
Characteristic of the Frequency in Surface Wave
Plasma by Employing High Permittivity Ceramic Discharge Tube |
Tokai Univ. 12,KYOCERA Co. 3,NIHON KOSHUHA Co.
4@*M. Suzuki 1,K. Kusaba 24,S. Tanaka 3,K. Sinohara 4,H. Shindo 12 |
| |
|
Break 11:00`11:15 |
|
| |
6 |
Self-bias formation of rf-plasma generated in a
small-bore tube with an inserted coaxial cathode |
Toshiba PIC@Kazuo Hayashi, Motofumi Tanaka, Hiroyuki
Yasui, Kiyoshi Hashimoto |
| |
7 |
Development of high-powered electron-beam-excited-plasma
(EBEP) source |
Toyota Technol. Inst. 1@*R. Ichiki 1, Y. Kubota
1, Y. Le 1, Y. Fukuda 1, Y. Mizukamo 1, J. Yamanaka 1, T. Hara 1 |
| ’ |
8 |
Radical beam process(III) -Characteristics of N2
beam or N radical beam- |
Nagoya Univ. 1, Katagiri Eng CO., LTD. 2, NU-Eco
Eng CO., LTD. 3@*Yasuhiro Hara1, Seigo Takashima1, Kouji Yamakawa2, Shouji
Den2, Hiroyuki Kano3, Hirotaka Toyoda1, Makoto Sekine1, Masaru Hori1 |
| |
9 |
Acceleration of a Cold Argon Arc Jet Plasma Flowing
along Open-Field-Line |
Tokyo Tech. Dept. Enegy Sci. 1, Tokyo Tech. Res.
Lab. Nucl. Reactors 2@Ichii Hiroki 1, Yoshida Kazuyuki 1, Nagahara You 1,
Matsuura Haruaki 2, Akatsuka Hiroshi 1 2 |
| |
10 |
Effect of multiphoton ionization in laser Thomuson
scattering measurement of low temperature plasmas |
Nagoya Univ.@keiichi Fukuyama 1,Mitutoshi Aramaki
1,Akihiro Kono 1 |
| 1.3 Diagnostics
of Reactive Plasmas |
| September 8 9:00`14:30 |
| 8a-ZD-@/ I |
| |
1 |
In-situ sampling of dust particles in LHD using
a polyhedral holder |
Kyushu Univ. 1,NIFSELHD Experimental Group 2@@*Iwashita
Shinya 1,Koga Kazunori 1,Shiratani Masaharu 1, Ashikawa Naoko 2, Nishimura
Kiyohiko 2, Sagara Akio 2 |
| ’ |
2 |
Transport of nano-particles after turning off pulse
rf discharges |
Kyushu Univ. 1,AIST 2,ASM Japan 3@*Iwashita Shinya
1,Morita Michihito 1,Koga Kazunori 1,Nunomura Shota 2,Shiratani Masaharu
1,Morisada Yoshinori 3,Matsuki Nobuo 3,Ikeda Shingo 3 |
| ’ |
3 |
Observation of Cu particulates in high-pressure
sputtering plasmas by laser light scattering |
Nagoya Univ. 1, Canon ANELVA Corp. 2, Nagoya Univ.
3@*N. Nafarizal 1, N. Takada 1, M. Ikeda 2, Y. Sago 2, K. Sasaki 3 |
| |
4 |
Measurement of nitrogen atom density using compact
optical emission spectroscopy system |
Toshiba corp. R & D Center 1, Nagoya Univ. 2 @Kurihara
Kazuaki 1, Sasaki Kouichi 2 |
| |
5 |
Measurements of plasma parameters in inductively
coupled Ar/O2/C4F8 plasma. |
Nagoya Inst. Technol. 1@Hanaki Katsuyuki 1, *Kimura
Takashi 1 |
| |
|
Break 10:15`10:30 |
|
| |
6 |
Young Scientist Award for the Presentation of an
Excellent Paper
Collective Thomson Scattering Diagnostics of Plasmas for EUV Light Sources |
Kyushu Univ. 1, Kumamoto Univ. 2@*Tomita Kentaro
1, Yamada Takao 1, Kagawa Taisuke 1, Uchino Kiichiro 1, Katsuki Sunao 2,
Akiyama Hidenori 2 |
| |
7 |
Measurement of N2 density at the A3Σu+
state by cavity-ringdown absorption spectroscopy |
Nagoya Univ. 1, Toshiba Corp. R&D Center 2@*Y.
Horikawa 1, K. Kurihara 2, and K. Sasaki 1 |
| |
8 |
Radial profile of Ar metastable atom density in
inductively coupled plasma in Ar/O2 |
Keio Univ. 1@*Hayashi Yuichiro 1, Hirao Satoshi
1, Makabe Toshiaki 1 |
| |
9 |
Evaluation of light source for atomic radical measurements
by vacuum ultraviolet laser absorption spectroscopy |
Nagoya Univ. 1@Seigo Takashima 1, Keigo Kakeda
1, Masaru Hori 1 |
| ’ |
10 |
Development of compact vacuum ultraviolet absorption
spectroscopy system for absolute fluorine density measurements |
Ngoya Univ. 1@*Hajime Sasaki 1, Seigo Takashima
1, Keigo Takeda 1, Masaru Hori 1 |
| |
11 |
Diagnostics of Plasmas Produced in a Miniature
Microwave Ion Engine Using Laser Thomson Scattering |
Kyushu Univ. 1@*Tomita Kentaro 1, Majima Amane
1, Yamada Takao 1, Uchino Kiichiro 1, Kondo Shinya 1, Tsuru Teppei 1, Yamamoto
Naoji 1, Nakashima Hideki 1 |
| |
|
Lunch 12:00`13:00 |
|
| 8p-ZD-@/ I |
| |
1 |
Diagnostics of Low Pressure Inductively Coupled
VHF Plasma Used for Nanostructured Carbon Deposition |
NIMS 1@*Katsuyuki Okada 1, Shojiro Komatsu 1, Seiichiro
Matsumoto 1 |
| |
2 |
Investigation on sheath effects on frequency shift
probe |
Chubu Univ. 1@* Ryo Harata 1, Keiji Nakamura 1,
Hideo Sugai 1 |
| £ |
3 |
Measurement of electron beam parameters in the
microwave surface discharge for polymer cross-linking |
GSEST Shizuoka Univ. 1, Innovative Joint Research
Center, Shizuoka Univ. 2@Jan Husarik 1, Milan Širý 2 ,Masashi
Kando 1 |
| ’ |
4 |
Electron Density and Dispersion Relation of Periodic
Microplasmas on a Microwave Transmission Line |
Kyoto Univ.@*Naito Teruki 1,Sakai Osamu 1, Tachibana
Kunihide 1 |
| |
5 |
Arcing reduction system with combination of spark
monitoring and RF-power control |
Tohoku Univ. 1, Harada Corp. 2@*Sato Michio 1,2,
Suzuki Kouichi 2, Samukawa Seiji 1 |
| |
6 |
Measurement for gas phase in plasmas using a quartz
sensor |
AIST, RIIF@Suzuki Atsushi, Kurokawa Akira, Nonaka
Hidehiko |
| 1.4 Plasma-Based
Material Processing |
| September 4 9:45`17:30 |
|
-@/ I |
| |
1 |
Sharp transition of plasma mode from CCP to ICP
with inside RF antenna for CVD |
JAEA 1, Yamanashi Univ. 2@*Yamauchi Toshihiko 1,
Nakagaki Keita 2, Kanno Yoshinori 2, Kobayashi Seiji 1, Takemoto Ryou 2 |
| £ |
2 |
Hydrogen atoms and polymerization processes in
hydrocarbon gases |
Nagoya Univ. 1, Ruhr-Univ., Germany 2@*Olivera
Stepanovic 1,Johannes Berndt 2, Joerg Winter 2 |
| ’ |
3 |
Production and transport mechanisms of radicals
in Cu film deposition by metal chloride reduction plasma CVD |
Nagoya Univ. 1,PhyzChemix 2@*Furuta Kei 1,Tomita
Yugo 2,Sakamoto Hitoshi 2,Sasaki Koichi 3 |
| ’ |
4 |
Electron density dependence of HΏ intensity
in anisotropic CVD plasmas |
Kyushu Univ.@*Umetsu Jun 1, Inoue Kazuhiko 1, Koga
Kazunori 1, Shiratani Masaharu 1 |
| ’ |
5 |
Development of new radical process (I) |
Nagoya Univ. 1, KATAGIRI ENGINEERING. CO., Ltd.
2, MARUBUN. CO., Ltd. 3@*Kono Satoshi 1, Takeda Keigo 1, Yamakawa Koji 2,
Maeda Tomohiro 3, Hori Masaru 1 |
| |
|
Break 11:00`11:15 |
|
| |
6 |
Formation of SiC and SiO2 by using ring resonator
microwave plasma CVD |
Univ. of Electro-Communications 1@*S.Hori 1, H.
Isshiki 1,T. Kimura 1 |
| |
7 |
Fundamental properties of carbon films prepared
by pulsed plasma ablation of PTFE |
Nagoya Univ. 1, JAXA 2, Univ. Tokyo 3@Hiroyuki
Kousaka 1, Hiroyuki Koizumi 2, Eri Hamajima 1, Yoshihiro Arakawa 3, and
Noritsugu Umehara 1 |
| |
8 |
Deposition of SiNX Films on Polymer Substrates
Using Pulsed-Plasma CVD under Near-Atmospheric Pressure |
CIR Tohoku Univ. 1,Sekisui Chemical Co.,Ltd. 2,AIST
3@*Matsumoto Mitsutaka 1,Inayoshi Yohei 1,Suemitsu Maki 1,Miyamoto Eiji
2,Yara Takuya 2,Uehara Tuyoshi 2,Nakajima Setsuo 2,Toyoshima Yasutake 3 |
| |
9 |
Surface microstructure of ultra water-repellent
films prepared by parallel-plate plasma CVD |
Nagoya Univ. 1, EcoTopia Science Inst. 2@*Shimazu
Norifumi 1, Yun Yongsup 2, Namba Naoki 1, Inoue Yasushi 2, Takai Osamu 2 |
| |
10 |
Diamond Synthesis utilizing Microwave Plasma Assisted
Process under Atmosphere |
Ehime Univ. 1@*Yagi Hidetsugu 1, Jinno Masahumi
1, Motomura Hideki 1, Aoyama Yoshiyuki 1, Ono Kazuo 1 |
| |
|
Lunch 12:30`13:30 |
|
| 4p-ZA-@/ I |
| £ |
1 |
Development of plasma technologies for flexible
electronics devices (tentative) |
Sungkyunkwan Univ.@Han Jeon G. 1 |
| |
2 |
Fabrication of SiO2 films using the
low-temperature plasma jet at atmospheric pressure |
Kyoto Univ. 1@*Ito Yosuke 1, Takano Nobuhiko 1,
Tachibana Kunihide 1 |
| |
3 |
Etching of poly(dimethylsiloxane) for microfluidic
system using a scanning microplasma jet (II) |
The Univ. of Tokyo 1, CNBI, The Univ. of Tokyo
2@*Hirata Satoshi 1, Ichiki Takanori 1,2 |
| |
4 |
NLD-PEPVD system development for thru Si via etching. |
ULVAC, Inc. Inst. for Semiconductor Technologies
1.@*Yasuhiro Morikawa 1, Takahide Murayama 1, Kenichirou Kawasaki 1, Kouou
Suu 1 |
| £’ |
5 |
Effect of Hydrogen on Amino-group Introduction
on Polyethylene Surface by Surface-wave Plasma |
Shizuoka Univ. 1@*Kral Martin 1, Ogino Akihisa
1, Nagatsu Masaaki 1 |
| ’ |
6 |
Improvement of Surface Amination of Chitosan Film
using Pulse-modulated Surface-wave Plasma |
Shizuoka Univ. 1@*Ogino Akihisa 1,Kral Martin 2,Yamashita
Mitsuji 3,Masaaki Nagatsu 1 |
| ’ |
7 |
Study on sterilization technology used with plasma
source ion implantation |
Kanazawa Inst of Tech. 1@*Toshiaki Inui 1,Noriaki
Ikenaga 1,Noriyuki Skudo 1 |
| |
|
Break 15:30`15:45 |
|
| ’ |
8 |
Effect of Oxidizing Species in Large Area Cleaning
Process Using Nonequilibrium Atmospheric Pressure-Pulsed Plasma |
Nagoya Univ. 1, Wakayama Univ. 2, SEKISUI CHEMICAL
CO.,Ltd. 3@*Masahiro Iwasaki 1, Yuto Matsudaira 1, Masafumi Ito 2, Eiji
Miyamoto 3, Takuya Yara 3, Tsuyoshi Uehara 3 and Masaru Hori 1 |
| |
9 |
Modification of Polymer Surfaces Using Ar/O2
Mixture Plasmas Sustained with Multiple Internal Antenna Units |
Osaka Univ. 1, EMD Corp. 2, Sung Kyun Kwan Univ.
3@*Yuichi Setsuhara 1, Kosuke Takenaka 1, Akinori Ebe 2, Yong-Mo Kim 3,
Jeon G. Han 3 |
| |
10 |
Hydrophilic surface on PMMA by irradiating ion
beam extracted from cylindrically comb-shaped magnetic-field ECRIS. |
Osaka Univ. 1, Tateyama Machine Co. 2@*Takashi
Satani 1, Kunitoshi Kinpara 1, Toyohisa Asaji 2, Sato Fuminobu 1, Yushi
Kato 1, Toshiyuki Iida 1 |
| |
11 |
Surface Modification of Vertically-stacked Josephson
Junctions by Surface Wave-Excited Plasma |
Nagoya Univ. 1,Chubu Univ. 2,CREST JST 3@*Hayashi
Takanobu 1,Watanabe Mitsuhiro 1,3,Kimura Taishi 1,3,Inoue Masumi 1,3,Fujimaki
Akira 1,3,Toyoda Hirotaka 1,Sugai Hideo 2 |
| |
12 |
Characteristics of Schottky Reverse Leakage Current
for n-GaN Etched by Capacitively Coupled RF Argon Plasmas |
Tokushima Univ.@*Kawakami Retsuo 1, Inaoka Takeshi
1 |
| ’ |
13 |
Evaluation of Oxide Vacancy Amount of Oxide Ceramics
for Hydrogen Production by Plasma Treatment |
Nagoya Univ. 1,2 , Chubu Univ. 3, Meijo Univ. 4,
TYK 5 @*Y.Yamaguchi 1,T.Ishijima 2,H.Toyoda 1,H.Sugai 3,K.Morita 4,K.Katahira
5 |
| |
14 |
The silicon trench oxidation characteristic in
microwave oxygen plasma |
TOKAI Univ. 1,TOKAI Univ. 1,TOKAI Univ. 1,TOKAI
Univ. 1,nihonkousyuuha.2@Sindo Haruo 1,Mitomi toru 1,Nisioka kensuke 1,Tunai
tatuya 1,kusaba kota 2 |
| 1.5 Nano-Technologies
by Plasma Process |
| September 5 9:00`12:30 |
| 5a-ZE-@/ I |
| |
1 |
Synthesis of carbon nanomaterial by arc discharge
in water using electrodes of hetero materials |
Tokyo Univ. of Science 1@*Nishikawa Eiichi 1,Aikawa
Shinya 1,Shimizu Hiroshi 1,Kim Yong-il 1,Kioka Toshihide 1 |
| |
2 |
Experiments of Creating Carbon Nanomaterials in
liquid Helium II |
SASEBO Natinal College of Tech. 1, Kungliga Tekniska
Högskolan in Sweden 2@*Shigematsu Toshinobu 1, Nishimoto Takuro 1,
Suetake Shougo 1, Nakashima Kousuke 1, Ohshima Tamiko 1, Yaguu Yoshito 1,
Kawasaki Yoshihito 1,2, Suda Yoshiaki 1 |
| |
3 |
Enhancement of Solubilization of Carbon Nanotubes
Based on Microplasma Treatment in Water Using Gas Bubbling |
Kyushu Univ.@*Imasaka Kiminobu 1, *Kato Yuki 1,
*Suehiro Junya 1 |
| ’ |
4 |
Mechanism of Aligned Carbon Nanotubes Growth Using
CVD Method with Electric Field Biasing |
Shizuoka Univ.@*Matsuda Takafumi 1, Marcel Mesko
1, Ishikawa Tomokazu 2, Sato Jun 2, Ogino Akihisa 1, Nagatsu Masaaki 1 |
| £’ |
5 |
Surface-wave Plasma Assisted Sol-gel Synthesis
Method of Catalyst for Carbon Nanotube Growth |
Shizuoka Univ.@*Lu Di 1,Mesko Marcel 1, Ogino Akihisa
1, Nagatsu Masaaki 1 |
| £’ |
6 |
Activation process of carbon layer encapsulated
catalytic metal particles for free-standing vertically aligned carbon nanotubes
growth |
Shizuoka Univ.@*Mesko Marcel 1, Ou Qiongrong 2,
Matsuda Takafumi 1, Ogino Akihisa 1, Nagatsu Masaaki 1 |
| |
7 |
Gas-phase synthesis of carbon fine particle using
spherical microwave plasma |
Kyoto Institute of Technology 1@*Morotomi Mamoru
1,Hayashi Yasuaki 1, |
| |
|
Break 10:45`11:00 |
|
| |
8 |
A Change in Intensity of Photoluminescence from
a-Si:H Nanoball-films Fabricated using Hydrogen Plasma |
Waseda Univ. 1@*Onodera Makoto 1, Sakamoto Hajime
1, Kato Isamu 1 |
| ’ |
9 |
Synthesis of photoluminescent silicon nanoparticles
by atmospheric pressure microplasma |
Dept. of Mech. & cont. Engineering, Tokyo Inst.
of Tech 1@Ogino Tomohisa 1,Nakamuta Takashi 1,Sasaki Kenji 1,Nozaki Tomohiro
1,Okazaki Ken 1 |
| |
10 |
Nano structure formation experiment by Reactive
ion etching |
Toukai University@*Tatsuya Tsunai ,Masaki Hasegawa
, Kota Kusaba ,Haruo Shindo |
| £’ |
11 |
Influence of Pulse Parameters on the Microstructure
of Film in Pulsed DC Magnetron Sputtering |
Sungkyunkwan Univ.@Moon Chang Sung 1,Han Jeon Geon
1 |
| |
12 |
Effect of Ga-doping on microvillus InN films prepared
by oblique evaporation assisted with active nitrogen source |
Graduate School of Eng., Nagoya Univ. 1, EcoTopia
Science Inst., Nagoya Univ. 2@*Takaba Hidetaka 1, Takeuchi hiroki 1, Inoue
Yasushi 2, Takai Osamu 2 |
| |
13 |
Electricity Generation Characteristics of DMFC
Stack Cell Using Catalytic-Metal-Particles Dispersed Arc-Soot |
Toyohashi Univ. Technol.1, ENAX, INC.2, Daiken
Chemical Co., Ltd.3, Tokai Carbon Co., Ltd.4, Futaba Corporation5@Y. Izumi1,
K. Shinohara1, M. Yamamoto1, S. Oke1, H. Takikawa1, T. Sakakibara2, S. Nakamura2,
S. Sugawara2, N. Aoyagi3, T. Okawa3, K. Yoshikawa4, K. Miura4, S. Itoh5,
and T. Yamaura5 |
| 1.6 General
Topics of Plasma Discharges |
| September 6 9:30`16:45 |
| 6a-ZD-@/ I |
| |
1 |
Investigation of Inductively Coupled Electrodeless
Discharge Lamp using Magnetic Core |
Kanagawa Univ. 1@*Sakuma Tomonori 1, Watanabe Yoshio
1 |
| |
2 |
Observation of plasma fluctuation of AC high voltage
type ion thruster |
Saga Univ. 1@*Matsumoto Kentaro 1, Hayashi Nobuya
1 |
| |
3 |
Protection of Barrier Discharge Electrode from
Degradation by Oxide Film Coating |
AIST 1, Kanazawa Univ. 2@*Hozumi Yasufumi 1, Seto
Takafumi 2, Hirasawa Makoto 1 |
| |
4 |
Micro-Plasma Processing in SEM |
Kochi Univ. Technol.@Hidenori Ohi, Takamichi Ishibashi,
Zou Qin, *Akimitsu Hatta |
| |
5 |
Thomson Scattering Diagnostics of PDP Micro-discharges |
Kyushu Univ.@Yasushi Sonoda 1, Akihiko Akune 1,
Kentaro Tomita 1, Safwat Hassaballa 1, Kiichiro Uchino 1 |
| |
6 |
Direct measurement of ultraviolet emission from
Ne/Xe gas discharge in plasma display panel |
Grad. School of Advanced Sci. of Matter, Hiroshima
Univ.@Giichiro Uchida, Hiroshi Kajiyama, Tsutae Shinoda |
| |
|
Break 11:00`11:15 |
|
| |
7 |
UV Emission from Microwave Plasma of Nitrogen and
Oxygen Gas Mixture |
Kochi Univ. Technol. 1, JST Sat. Kochi 2@Bimal
Kumar Pramanik 1, *Akimitsu Hatta 1, Kazumasa Kawamura 1, Tomoyo Terada
1, Yusuke Nakagawa 1, Jun-Seok Oh 2 |
| |
8 |
Development of multi micro hollow cathode light
source iIIj |
Wakayama Univ. 1, Nagoya Univ. 2, NU System Co.,
Ltd. 3, NU EcoEngineering Co., Ltd. 4, Katagiri Engineering Co., Ltd. 5@*Takayuki
Ohta 1, Yoshihiro Tachibana 1, Masafumi Ito 1, Seigo Takashima 2, Yasuhiro
Higashijima 3, Hiroyuki Kano 4, Shoji Den 5, Masaru Hori 2 |
| |
9 |
Lamp properties of antenna-excited microwave xenon
discharge Lamps |
Grad. School of Eng., Shizuoka Univ. 1@*Youhei
Ohishi 1 , Masashi Kando 1 |
| |
10 |
Investigation of Long-Life White Mercury Point
Light Sources I: Emission Spectra using Antenna Excited Microwave Discharges |
Shizuoka Univ. 1, Ushio Inc. 2@Mizojiri Takafumi
1,2Kando Masashi 1Morimoto Yukihiro 2 |
| |
11 |
Investigation of Long-Life White Mercury Point
Light Sources II: Antenna Temperature in Antenna Excited Microwave Discharge
Lamps |
Shizuoka Univ. 1, Ushio Inc. 2@Mizojiri Takafumi
1,2Ikeuchi Mitsuru 2Kando Masashi 1Morimoto Yukihiro 2 |
| |
|
Lunch 12:30`13:30 |
|
| 6p-ZD-@/ I |
| |
1 |
Diagnostics of the plasma-electrolyte solution
interface (2) |
Saitama Univ. 1, JST 2@*K. Saito 1, Q. Chen 1,
Y. Takemura 2, H. Shirai 1 |
| |
2 |
Ground Penetrating Radar Using Microwaves Radiated
by Laser Induced Plasma |
Osaka Univ. 1,Inst. Laser Tech. 2@Nakajima Hirotomo
1, Yamaura Michiteru 2, Shimada Yoshinori 2, Fujita Masayuki 2, Tanaka Kazuo
1 |
| |
3 |
Electromagnetic Wave Propagation in Plasma Photonic
Crystal with Photonic Band Gap |
Kyoto Univ. 1@Naito Teruki 1, *Sakai Osamu 1, Tachibana
Kunihide 1 |
| £ |
4 |
Dynamic Metamaterials Composed of Microplasmas
and Metal Components |
Kyoto Univ. 1@*Dae-Sung Lee 1,Hiroyasu Nakanishi
1,Osamu Sakai 1,Kunihide Tachibana 1 |
| |
5 |
Development of a sterilization system using microwave
oxygen plasma torch |
Saga Univ. 1, Ryukyu Univ. 2@*Ito Hiroyuki 1, Hayashi
Nobuya 1, Akira Yonesu 2 |
| £ |
6 |
Low-temperature Sterilization of Wrapped Medical
Instruments using Microwave Plasmas |
Shizuoka Univ. 1, JST Innov. Satellite Shizuoka
2, Hamamatsu Univ. Sch. of Med. 3, GMA Co. 4@*Singh K. Mrityunjai 1, Xu
Lei 2, Ogino Akihisa 1, Koide Yukio 3, Kurawaki Ichiro 4, Nagatsu Masaaki
1 |
| |
|
Break 15:00`15:15 |
|
| ’ |
7 |
Internal Sterilization of Tyvek Wrapped Materials
Using Flexible Sheet-like Dielectric Barrier Discharge |
Shizuoka Univ.@*Ono Yoshihito 1,Eto Hiroyuki 2,Ogino
Akihisa 2,Nagatsu Masaaki 2 |
| ’ |
8 |
Sterilization characteristics of tube surface using
oxygen plasma produced by AC HV discharge |
Saga Univ. 1@*Kitazaki Satoshi 1,Hayashi Nobuya
1 |
| ’ |
9 |
Treatment of protein particles using oxygen RF
plasma |
Sasebo NCT 1, Saga Univ. 2@*Yagyu Yoshihito 1,
Hayashi Nobuya 2, Kawasaki Hiroharu 1, Ohshsima Tamiko 1, Suda Yoshiaki
1 |
| |
10 |
Decomposition characteristics of acetone using
an atmospheric DC corona discharge -Effects of O2 concentration
of a background gas- |
Muroran Institute of Technology 1@Sakamoto Takahiro
1, *Satoh Kohki 1, Itoh Hidenori 1 |
| |
11 |
Treatment and recycling of carbon dioxide using
microwave discharge |
Saga Univ. 1@*Ryoki Kamada 1, Hiroyuki Itho 1,
Nobuya Hayashi 1 |
| |
12 |
Effects of background-gas composition on pulsed-discharge
purification of water containing non-degradable hazardous substances |
Muroran Institute of Technology 1@Miyazaki Yasushi
1, *Satoh Kohki 1,Itoh Hidenori 1 |
| 1.7 Plasma
Etching |
| September 5 |
| 5a-ZA-@/ I |
| |
|
Short
Presentation (5min.) 9:30`11:20
5a-ZA-1`17@Poster Session 15:30`17:30 |
| |
1 |
Young Scientist Award for the Presentation of an
Excellent Paper
Modeling of Si-MEMS Fabrication by Two Frequency Capacitively Coupled Plasma
in SF6/O2 (II) |
Keio Univ. 1@*Hamaoka Fukutaro 1, Yagisawa Takashi
1, Makabe Toshiaki 1 |
| |
2 |
Silicon-Slicing Technique Using Plasma Etching |
Toyo Advanced Technologies 1, AIST 2@*Yamaguchi
Mitsutaka 1,2, Abe Yoshinori 1, Kimura Tatsuo 1, Masuda Atsushi 2, Kondo
Michio 2 |
| |
3 |
Development of Uniformity Control Process in Si
Deep Etching by NLD plasma(II) |
ULVAC,Inc.Inst.for Semiconductor Technologies 1@*Murayama
Takahide 1,Kawasaki Kenichirou 1,Morikawa Yasuhiro 1,Suu Koukou 1 |
| |
4 |
By-products effect to FinFET gate etching |
Tokyo Electron@Masahiko Takahashi, *Tetsuya Nishizuka,
Toshihisa Nozawa |
| ’ |
5 |
Measurement of MgO Sputtering Yields by Noble Gas
Ions |
CAMT Osaka Univ 1, AIST 2, Matsushita Electric
Industrial Co. 3@*Kiyohiro Hine 1, Satoru Yoshimura 1, Kazumasa Ikuse 1,
Masato Kiuchi 1 2, Jun Hashimoto 3, Masaharu Terauchi 3, Taketoshi Nakao
3, Satoshi Hamaguchi 1 |
| |
6 |
The dynamic model of the reactive ion etching method
for TiO2 anatase |
Osaka Univ. 1@Kishi Hirofumi 1, Roman Tanglaw 1,
David Melanie 1, Tanaka Reiko 1, Nakanishi Hiroshi 1, *Kasai Hideaki 1 |
| ’ |
7 |
Comparative study of ECR and ICP plasma etching
of high-k dielectric HfO2 films with BCl3-containing
gas chemistries |
Graduate School of Engineering, Kyoto Univ.@*Hamada
Daisuke 1, Nakamura Keisuke 1, Ueda Yoshinori 1, Yoshida Masahiro 1, Eriguchi
Koji 1, Ono Kouichi 1 |
| |
|
Break 10:15`10:30 |
|
| |
8 |
Analysis of Plasma-Surface Interactions during
Etching of by In-situ Diagnostics of Reactants and Reaction Products (II) |
Grad. School of Eng., Kyoto Univ. 1@Yoshinori Ueda
1, Masahiro Yoshida 1, Koji Eriguchi 1, Kouichi Ono 1 |
| |
9 |
Analysis of Plasma-Surface Interactions during
Etching by In-situ Diagnostics of Reactants and Reaction Products (III) |
Kyoto Univ. 1@*Yoshida Masahiro 1, Ueda Yoshinori
1, Eriguchi Kouji 1, Ono Kouiti 1 |
| |
10 |
Model analysis of the profile evolution during
Si etching in HBr/O2 plasmas |
Grad. School of Eng., Kyoto Univ. 1@*Shouki Irie
1, Koji Eriguchi 1, Kouichi Ono 1 |
| |
11 |
Analysis of plasma cleaning toward stable etching
processes |
Hitachi CRL@*Junichi Tanaka, Kazuyuki Ikenaga,
Naoshi Itabashi |
| |
12 |
Pattern dependency in structural effect on gate
length variation in gate etching process |
Central Research Lab., Hitachi Ltd. 1, Renesas
Technology 2@*Kurihara Masaru 1, Izawa Masaru 1, Tanaka Jun'ichi 1, Kawai
Kenji 2, Yoshifuku Ryouichi 2, Maruyama Takahiro 2, Fujiwara Nobuo 2 |
| |
13 |
Effect of Substrate Bias in Silicon Etching by
the RF Surface Plasma |
Tokai Univ. 12,KYOCERA Co. 3,NIHON KOSHUHA Co.
4@Kota Kusaba 14,Seiichi Tanaka 3,Masafumi Suzuki 2,Kibatsu Shinohara 4,Haruo
Shindo 1,2 |
| ’ |
14 |
Control of Damage on Si substrate during Gate Etching
Processesi2j |
Sony Corp.SBU STDD 1@*Ohchi Tomokazu 1,Fukasawa
Masanaga 1,Tatsumi Tetsuya 1,Kobayashi Shoji 1,Kinoshita Takashi 1,Kamide
Yukihiro 1 |
| ’ |
15 |
Effect of Substrate Temperature and Chamber Wall
Condition on SiN etching |
Sony Semiconductor Kyushu 1,STDD SBU Sony Corp
2@*Nakamura Yugo 1,Tatsumi Tetsuya 2,Matsushita Atsushi 1,Nishida Mamoru
1 |
| |
16 |
Improvement of photoresist resistance to etching
damage by H2 plasma treatment |
Renesas Technology Corp. 1@*Yonekura Kazumasa 1,
Fujiwara Yuji 1, Tadokoro Masahiro 1, Yoshikawa Kazunori 1, Fujiwara Nobuo
1 |
| ’ |
17 |
Study for Bias Applying to Insulating Substrates
in Plasma Etching |
Central Research Lab., Hitachi Ltd@¦Makoto Satake,
Kenji Maeda, Masaru Izawa |
| 1.7 Plasma
Etching |
| September 6 |
| 6a-ZA-@/ I |
| |
|
Short Presentation (5min.) 9:30`11:30
6a-ZA-1`21@Poster Session 13:00`15:00 |
| |
1 |
Real-time adjustment technique of oxide etch-rate
distribution using plasma emission intensity distribution measurements. |
Hitachi, Ltd., Central Research Lab. 1@*Yokogawa
Ken'etsu 1, Maeda Kenji 1, Izawa Masaru 1 |
| |
2 |
Mechanism of Bottom Distortion in Fine Pattern
Dielectric Etching Process |
Central Research Lab., Hitachi Ltd.@Negishi Nobuyuki
1,Miyake Masatoshi 1,Izawa Masaru 1 |
| |
3 |
Incident angle and energy dependence of desorbed
products from SiO2 caused by CF3+ irradiation |
Center for Atomic and Molecular Technologies,@Graduate
School of Engineering, Osaka Univ.@*karahashi kazuhiro 1, hamaguchi satoshi
1 |
| |
4 |
Effects of Geometry and Surface Conditions of the
Mask on Plasma Etching |
Kyoto Univ. 1@*Fukumoto Hiroshi 1, Eriguchi Koji
1, Ono Koichi 1 |
| |
5 |
Etching characteristics of amorphous perfluoropolymer
in low-pressure ICP |
School of Eng. Univ. Tokyo 1, CNBI Univ. Tokyo
2@*Ono Takao 1, Mouri Shuhei 1, Akagi Takanori 1,2, Ichiki Takanori 1,2 |
| ’ |
6 |
Low-k Film Etching Process Employing an Alternative
Fluorocarbon Gas (IV) |
Nagoya@Univ. 1,Asahi Glass Corp. 2,@*Shibata Emi
1,Okamoto Hidekazu 2,Sekine Makoto 1,Hori Masaru 1 |
| |
7 |
Feature profile modeling for an organic low-k material
etching |
Keio Univ. 1@*Yagisawa Takashi 1, Makabe Toshiaki
1 |
| |
8 |
Observation of Charge-build-up Mechanism during
Plasma Etching by On-Wafer Monitoring Sensor. |
Miyagi Oki Electric Co.,Ltd 1,Tohoku Univ. 2@*Tomohiko
Tatsumi 1,Shinji Kawada 1,Mamoru Konishi 1,Jun Hashimoto 1,Ikuo Kurachi
1,Yasushi Ishikawa 2,Seiji Samukawa 2 |
| |
9 |
Evaluation of electrical conductivity of deposited
polymer in contact etching using On-Wafer Monitoring Sensor |
Miyagi Oki Electric Co.,Ltd. 1,Tohoku Univ. 2@Kawada
Shinji 1,Yatagai Youichi 1,Hashimoto Jun 1,Kurachi Ikuo 1,Ishikawa Yasushi
2,Samukawa Seiji 2 |
| |
|
Break 10:15`10:30 |
|
| |
10 |
UV spectrum prediction system with combination
of on-wafer monitoring and neural network |
Tohoku Univ. 1, Miyagi Oki Electric 2@*Ohtake Hiroto
1, Ishikawa Yasushi 1, Ichihashi Yoshinari 1, Hashimoto Jun 2, Kurachi Ikuo
2, Samukawa Seiji 1 |
| |
11 |
Prediction of UV irradiation damage using on-wafer
monitoring technique (6) |
Tohoku Univ. 1, Miyagi Oki Electric 2@*Ishikawa
Yasushi 1, Kawada Shinji 2, Hashimoto Jun 2, Kurachi Ikuo 2, Ohtake Hiroto
1, Samukawa Seiji 1 |
| |
12 |
Generation and Reduction of Plasma-Induced SiO2/Si
Interface states |
Tohoku Univ. 1, Sanyo Electric 2, AIST 3@*Ishikawa
Yasushi 1, Ichihashi Yoshinari 1,2, Yamasaki Satoshi 3, Samukawa Seiji 1 |
| |
13 |
Investigation of interface state generation mechanism
in dielectric film etching with C-F gas plasma |
Tohoku Univ. 1, Sanyo Electric 2@*Ichihashi Yoshinari
1,2, Ishikawa Yasushi 1, Shimizu Ryu 2, Mizuhara Hideki 2, Samukawa Seiji
1 |
| |
14 |
Discharging mechanism of a sub-micron SiO2 hole
based on surface charging during plasma etching (I) |
Keio Univ., Dept. of EEE 1@Tomihito Ohba 1,Makabe
Toshiaki 1 |
| ’ |
15 |
Numerical analysis of charging on microstructure
in plasma etching |
Dept. of Aeronautics and Astronautics, Kyoto Univ.
1@*Taro Suzumura 1, Koji Eriguchi 1, Kouichi Ono 1 |
| ’ |
16 |
Evaluating damage on SiOCH by H2 plasma
and clarification of its mechanism |
Nagoya Univ. 1, Katagiri Engineering Co.,Ltd 2,
COM Electronics Development Co.,Ltd 3@*Yamamoto Hiroshi 1, Takahashi Syunji
1,2, Keigo Takeda 1, Kawauchi Ryota 3, Den Shoji 2, Sekine Makoto 1, Hori
Masaru 1 |
| ’ |
17 |
Damages on Low-k films due to VUV light, UV light,
radical and ion in dual frequency capacitively coupled plasma etching process(IV) |
Nagoya Univ. 1, Sony Corp. 2@*Uchida Saburo 1,
Takashima Seigo 1, Saito Ryota 1, Fukasawa Masanaga 2, Ohshima Keiji 2,
Nagahata Kazunori 2, Tatsumi Tetsuya 2, Hori Masaru1 |
| |
18 |
Etching Processes for Low-k Films Using the Neutral
Beam (3) |
Tohoku Univ. 1@*Jinnai Butsurin 1, Samukawa Seiji
1 |
| ’ |
19 |
Surface Reaction Enhancement by UV Irradiation
during Si Etching with Chlorine Atom Beam |
Tohoku Univ. 1, Ushio Inc. 2@*Jinnai Butsurin 1,
Oda Fumihiko 2, Morimoto Yukihiro 2, Samukawa Seiji 1 |
| |
20 |
A Study of Interaction between Processing Plasmas
and Chamber Wall Surfaces. |
Nagoya Univ., Graduate School of Engineering 1,
Plasma Nano Engineering Center 2@*Miwa Kazuhiro 1, Takada Shyoji 1, Sasaki
Kouichi 2 |
| |
21 |
Diamond etching with capacitively coupled plasma
using MgO electrodes |
Kanagawa Inst. of Tech.@*Murakami Masahiko, Misu
Takayuki, Goto Miki, Arai Toshihiko |