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| 1 Radiation·Plasma
Electronics |
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| Mar. 22 (Wed.) |
Mar. 23 (Thu.) |
Mar. 24 (Fri.) |
Mar. 25 (Sat.) |
Mar. 26 (Sun.) |
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| AM |
PM |
AM |
PM |
AM |
PM |
AM |
PM |
AM |
PM |
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| 1.1 Radiation·Accelerator·Nuclear Reactor | 7-M 9:30～12:30 | 7-M 13:30～18:30 | ||||||||
| 1.2 Plasma Sources and Production Technologies | 7-ZC 9:30～12:30 | 7-ZC 13:30～17:15 | 7-ZC 9:30～12:30 | 7-ZC 13:30～17:45 | ||||||
| 1.3 Diagnostics of Reactive Plasmas | 7-ZC 9:30～12:30 | 7-W 9:00～12:30 | ||||||||
| 1.4 Plasma-Based Material Processing | 7-M (poster with short presentation) 9:00～11:50 | |||||||||
| 1.5 Nano-Technologies by Plasma Process | 7-ZC 9:15～12:00 | 7-ZC 13:00～14:45 | ||||||||
| 1.6 General Topics of Plasma Discharges | 7-ZC 9:30～12:30 | 7-ZC 13:30～16:30 | ||||||||
1.7 Review Lectures and General Session: Plasma etch, Frontier and Breakthrough Strategy |
5-ZL 9:45～12:30 | 5-ZL 13:30～16:45 | ||||||||
| 1.7 Plasma Etching | 7-ZA 9:30～12:00 | 7-ZA 13:00～16:15 | ||||||||