7 Beam Technologies
7.1 X-ray Technologies
August 30 (Wed.) 9:30〜17:20
30a-ZB-　/ II
	1	Application of X-ray absorption spectrometry for the study of EUV projection optics contamination	Univ. Hyogo 1, EUVA 2　*Masahito Niibe 1, Yukinobu Kakutani 1, Shigeru Terashima 2, Hiromitsu Takase 2, Yoshio Gomei 2, Yutaka Watanabe 2, Shuichi Matsunari 2, Takasi Aoki 2, Katsuhiko Murakami 2, Yasuaki Fukida 2
	2	Optical hollow fibers with inner metal coating for EUV transmission - material choice and preliminary experiments -	Tohoku Univ. 1　*Yoshida Takanori 1, Matsuura Yuji 1
	3	Design of two-aspherical-mirror aplanat tolerating practical alignment errors for soft X-ray imaging.	IMRAM, Tohoku Univ. 1　*Mitsunori Toyoda 1, Masaki Yamamoto 1, Mihiro Yanagihara 1
△	4	Multilayer laminar-type diffraction gratings achieving high diffraction efficiencies in the 1-8 keV energy region	JAEA 1, LBNL 2, Shimadzu 3, NTT-AT 4, Shimadzu Emit 5　*Ishino Masahiko 1, Koike Masato 1, Heimann Philip 2, Sasai Hiroyuki 3, Hatayama Masatoshi 4, Takenaka Hisataka 4, Sano Kazuo 5, Gullikson Eric 2
	5	Design of a high efficiency grazing incidence monochromator with multilayer laminar gratings for the 1-8 keV region	Japan Atomic Energy Agency 1, Shimadzu Corp. 2　*Masato Koike 1, Masahiko Ishino 1, Hiroyuki Sasai 2
	6	Soft gamma-ray response of multilayer reflector for astronomical observation	Nagoya Univ. 1　*Yasushi Ogasaka 1, Keisuke Tamura 1, Tomonaga Iwahara 1, Yasufumi Kanou 1, Takuya Miyazawa 1, Yoshihiro Fukaya 1, Masataka Naitou 1, Hideyo Kunieda 1, Koujun Yamashita 1
		Break 11:00〜11:15
	7	Study on the Excitation of X-ray Using Polarized LiNbO3 Single Crystal	Doshisha Univ 1,Doshisha Univ 2,Works Nakanishi3,Inst of Chemical Reseach Kyoto Univ 4,Asahi Rentgen Ind Co 5,Doshisha Univ 6　*Mizoguchi Tadahiro 1,Furubayashi Takuya 2,Nakanishi Yoshikazu 3,Ito Yoshiaki 4, Nakamura Toru 5,Yoshikado Shinzo 6
	8	Improvement of Highly Parallel X-Ray Microbeam Optics	Graduate School of Material Science, Univ. of Hyogo 1　*Maiko Abe 1, Sayuri Takahata 1, Kazuki Hayashi 1, Kazunori Fukuda 1, Yoshiyuki Tsusaka 1, Hidekazu Takano 1, Yasushi Kagoshima 1
	9	Development of X-ray high-speed camera for fast X-ray imaging	Univ. of Hyogo　*Yoshida Keisuke 1,Koyama Takahisa 1,Tsuji Takuya 1,Takano Hidekazu 1,Tsusaka Yoshiyuki 1,Kagoshima Yasushi 1
△	10	A novel multi-collimator using BP-1 glass and application to X-ray CCDs	RIKEN 1, Yokohama National Univ. 2, ISAS/JAXA 3, NIRS 4, KEK 5,　Junko S. Hiraga 1, Shogo Nakamura 2, Yuichi Ozaki 2, Koji Abe 1, Takeshi Takashima 3, Yukio Uchihori 4, Hisashi Kitamura 4, Hiroko Tawara 5, Toru Tamagawa 1,
	11	Determination of Exit-face Wavefunction using X-ray holography and Two-beam Interferometry	RIKEN1,JASRI2　*Yoshiki Kohmura1,Tatsuyuki Sakurai1,Tetsuya Ishikawa1,Akihisa Takeuchi2,Yoshio Suzuki2,Shunji Goto2
		Lunch 12:30〜13:30
30p-ZB-　/ II
	1
	2	LPP EUV Source Using Lithium Target	Univ. ou Hyogo Lasti 1, Grad. School of Eng. 2,　*Akihisa Nagano 1, Hideyasu Okino 1,Kataoka Kazuyuki 1, Masuda Kazuya 1, Sekioka Tsuguhisa 2, Inoue Takahiro 1, Amano Sho 1, Miyamoto Shuji 1, Mochizuki Takayasu 1
	3	Measurement of Particles Emitted from Laser Plasma EUV Source III	Univ. of Hyogo, Grad. School of Eng. 1, Univ. of Hyogo, LASTI 2, Univ. of Hyogo, Faculty of Eng. 3　*Sekioka Tsuguhisa 1, Amano Sho 2, Miyamoto Shuji 2, Inoue Takahiro 2, Shimoura Atsushi 2,　Nobuyuki Ohtani 1, Takashi Kondo 3, Atsushi Morimoto 3, Nagano Akihisa 2, Okino Hideyasu 2, Kataoka Kazuyuki 2, Mochizuki Takayasu 2
	4	High rep. rate laser-produced-plasma EUV source by using a rotating drum Xe cryogenic target	University of Hyogo LASTI 1, Grad.School of Eng. 2, 　Kataoka Kazuyuki 1, Nagano akihisa 1, Masuda Kazuya 1, Okino Hideyasu 1, Inoue Takahiro 1, Shimoura Atsushi 1, Amano Sho 1, Miyamoto Shuji 1, Sekioka Tsuguhisa 2, Mochizuki Takayasu 1,
	5	Studies on Xe Cryogenic Cavity Targets for EUV Light Source	University of Hyogo LASTI 1　*Okino Hideyasu 1,Inoue Takahiro 1,Amano Sho 1,Miyamoto Shuji 1,Motizuki Takayasu 1
	6	high power and short pulse CO2 laser for LPP-EUV light source	Hiratsuka R&D Center EUVA 1　*Hideo Hoshino 1,Tatsuya Ariga 1,Taisuke Miura 1,Akira Endo 1,Akira Sumitani 1
△	7	Development of Fast Ion Mitigation Technology for Xe/Sn based LPP EUV Light Source	Hiratsuka R&D Center EUVA 1　*Ueno Yoshifumi 1,Soumagne Georg 1,Komori Hiroshi 1,Suganuma Takashi 1,Endo Akira 1,Sumitani Akira 1,
		Break 15:20〜15:35
	8	Temperature and density measurement of laser produced EUV plasmas II	ILE Osaka Univ　1, ILT 2, JAEA 3 　*Aota Tatsuya 1, Fujioka Shinsuke 1, Ando Tsuyoshi 1, Yasuda Yuzuri 1, Nishimura Hiroaki 1, Nishihara Katsunobu 1, Sunahara Atsushi 2, Sasaki Akira 3,Miyanaga Noriaki 1, Izawa Yasukazu 1, Mima Kunioki 1
△	9	Density of high repetition tin target for extreme ultraviolet light source	Osaka Univ. ILE 1,ILT 2　* Ando Tsuyoshi 1, Fujioka Shinsuke 1, Nishimura Hiroaki 1, Shimada Yoshinori 2, Yamaura Michiteru 2, Hashimoto Kazuhisa 2, Norimatsu Takayoshi 1, Nishihara Katsunobu 1, Izawa Yasukazu 1, Mima Kunioki 1
	10	Two-dimensional Radiation Hydrodynamic Simulation on Extreme Ultra-Violet Emission from Laser-produced Plasmas	Inst. for Laser Technology 1, Inst. Laser Engineering Osaka Univ 2, Advanced Photon Research center JAEA 3, Okayama Univ. 4　*Atsushi Sunahara 1, Katsunobu Nishihara 2, Akira Sasaki 3, Takeshi Nishikawa 4, Tatsuya Aota 2, Michiteru Yamaura 1, Shinsuke Fujioka 2, Yoshinori Shimada 1, Hiroaki Nishimura 2, Noriaki Miyanaga 2, Yasukazu Izawa 2, Kunioki Mima 2
	11	Development of the detailed atomic model of EUV source plasmas	Japan Atomic Energy Agency, ILE Osaka Univ., ILT, Okayama Univ., Nara-women's Univ., Kitasato Univ. Tokyo Metropolitan Univ. 　*Akira Sasaki 1, Katsunobu Nishihara 2, Atsushi Sunahara 3, Takeshi Nishikawa 4, Takashi Kagawa 5, Fumihiro Koike 6, Hajime Tanuma 7
	12	Optimizations on minimum mass target	Inst. for Laser Technology 1, Inst. of Laser Eng. 2　*Furukawa Hiroyuki 1, Yamaura Michiteru 1, Shimada Yoshinori 1, Fujioka Shinsuke 2, Nishihara Katsunobu 2, Miyanaga Noriaki 2, Mima Kunioki 2, Yamanaka Chiyoe 1
	13	Studies on the development of droplet target for EUV light source(III)	Univ. of Hyogo1, ILE Osaka Univ2　Sugishita Hiroki 1, Nakashima Noriyuki 1, Kon Ryou 1, Tatsumi Shinichi 1, Fujiwara Etsuo 1, Azuma Kingo 1, Nishimura Hiroaki 2, Yatsuzuka Mitsuyasu 1
	14	EUV emission from a laser-produced plasma by use of a colloidal microjet target containing tin dioxide nanoparticles	Univ. of Miyazaki1, Utsunomiya Univ. 2　Yusuke Senba1, Sumihiro Suetake1, Yusuke Sato1, Shoji Ogura1, Takeshi Higashiguchi2, *Shoichi Kubodera1
7.2 Electron Microscopy and Diagnostics
August 30 (Wed.) 14:45〜15:45
30p-RC-　/ II
		1〜6 13:00〜14:30 (7.3 Lithography)
		Break 14:30〜14:45
	7	Specimen holder for the Conduction Measurements inside a Transmission Electron Microscope	Hokkaido Univ.　*Okubo Youhei, Hamada Kouich, Arita Masashi, Takahashi Yasuo
	8	Detection of trace harmful heavy elements in the plant using low accelerate electron beam	SII NanoTechnology Inc. 1, Tokyo University of Science 2　*Keiichi Tanaka 1,Yukari Baba 1,Akikazu Odawara 1,Atsushi Nagata 1,Satoshi Nakayama 1,Kazuhiro Kumagai 2,Akiko Hokura 2,Izumi Nakai 2
	9	Energetic Boersch Effect due to Coulomb Interactions in Mirror Electron Microscope	Meijo Univ.　*Yamada Yukihiro 1,Shimoyama Hiroshi 1
	10	Improvement of a phase image by in-line Fresnel electron holography	Meijo Univ.1,Nagoya Industrial Science Labs 2,Nagoya Univ.3　*Kuno Yuji 1,Ohye Toshimi1,Sugiyama Setsuko2,Takayoshi Tanji3
7.3 Lithography
August 30 (Wed.) 13:00〜14:30
30p-RC-　/ II
	1	Patterning without Depending on Matrix Array in Projection Exposure Using a Liquid Crystal Display Panel	Tokyo Denki Univ. 1　*Horiuchi Toshiyuki 1, Otani Ayaka 1
	2	Oil Immersion Projection Lithography onto Backside Surface of Cover Glass Plates	Tokyo Denki Univ.1　Mirumachi Naofumi 1, Horiuchi Toshiyuki 1
	3	Lithography on Inside Surfaces of Pipes Using a Micro-Pinhole and an Optical Fiber	Tokyo Denki Univ. 1,2　*Katayama Masahiro 1,Watanabe Yuusuke 1,Fujita Katsuyuki 2,Yasuda Takashi 2,Horiuchi Toshiyuki 1,2
	4	Fabrication of Cr-grating with 50-nm width using Nonadiabatic Near-Field Photolithography	The Univ. of Tokyo 1,SORST JST 2,Tokyo Inst. of Technology 3　Yonemitsu Hiroki 1,Kawazoe Tadashi 2,Kobayashi Kiyoshi 3,Ohtsu Motoichi 1,2
△	5	Three-dimensional structuring of silica glasses using femtosecond laser lithography	Osaka Univ. 1, AIST 2, ISIR 3　*Nishiyama Hiroaki 1, Mizoshiri Mizue 1, Nishii Junji 2, Kawahara Toshio 3, Kawai Tomoji 3, Hirata Yoshinori 1
	6	Three-dimensional resist coating using mist and patterning on a cube substrate	NTT Basic Research Labs. 1, NTT Advanced Technology 2　*Yamazaki Kenji 1, Inokuma Kazuhito 2, Namatsu Hideo 1,2
		Break 14:30〜14:45
		7〜10 14:45〜15:45 (7.2 Electron Microscopy and Diagnostics)
7.3 Lithography
August 31 (Thu.) 10:00〜18:00
31a-RC-　/ II
	1	Slip Free Driving for Ultra Precision Positioning Stage Utilizing Direct Drive type Actuator	Graduate School of Science and Technology Kumamoto Univ. 1 , Faculty of Engineering Kumamoto Univ. 2 , Tech-concierge Kumamoto Incorporated 3　(M)Tokumitsu Takuro 1, Endo Taishi 1,Kondo Hiroki 2, Kouji Kosaka 3,Akira Nakada1 , Kubota Hiroshi 1
	2	Analysis of a temperature rise of resist by electron beam irradiation(2)	Osaka Institute of Technology, Nanomaterials Microdevices Research Center 1　*Tanaka Hiroyuki 1,Kotera Masatoshi 1
	3	Measurement of resist shrinkage by Electron Beam exposure	Osaka Institute of Technology Nanomaterials Microdevices Research Center,1　*Tsuji　Shinya 1,Yagura Kei 1,Kotera Masatoshi 1
	4	Reduction of the Coulomb interaction among electrons in a high current electron beam by introduction of neutral gases (II)	Osaka Inst. Nanomaterials Microdevices Research Center 1　*Kusano Yuiko 1, Yagura Kei 1, Kotera Masatoshi 1
△	5	Measurements of VSB electron beams with a scattering aperture	CRL. Hitachi, Ltd., HISCO., Ltd., Hitachi-HITEC. Co.　○M. Sakakibara1, H. Ohta1, T. Kanosue2, Y. Sohda1, N. Ban3
		Break 11:15〜11:30
△	6	Fabrication of GaInAsP/InP arbitrary shaped low dimensional quantum structures	QNERC, Tokyo Tech 1, CREST, JST 2　*Yosuke Tamura 1, Dhanorm Plumwongrot 1, Nishimoto Yoshifumi 1, Takeo Maruyama 1,2, Shigehisa Arai 1,2
	7	Nanofabrication below 50-nm pattern with Mix and Match of EB/KrF lithography	Hitachi, Ltd., Central Research Laboratory　Yamamoto Jiro
	8	Full-chip lithography verification for multilayer structure in EB lithography	Fujitsu Ltd.　*Ogino Kozo 1, Hoshino Hiromi 1, Machida Yasuhide 1
△	9	Micro-machining of Resist on Silicon by Proton Beam Writing	Shibaura Inst. of Tech. 1, Takasaki Advanced Radiation Research Inst., JAEA 2　*Uchiya Naoyuki 1, Furuta Yusuke 1, Nishikawa Hiroyuki 1, Haga Junji 2, Sato Takahiro 2, Ishii Yasuyuki 2, Kamiya Tomihiro 2
	10	Resist-pattern guided self-assembly of symmetric diblock copolymer	NTT Basic Research Labs. 1, NTT-AT 2　*Yamaguchi Toru 1, Inokuma Kazuhito 2, Hayashi Junzo 1, Yamaguchi Hiroshi 1
	11	Chemically-amplified-resist modeling and verification by considering photoacid-dissociation equilibrium and quencher effect	NEC Electronics 1, UC Berkeley 2, LithoTechJapan 3, JSR4, JSR Micro 5　*Seiji Nagahara 1,2, Lei Yuan2, Wojtek Jacob Poppe 2, Andrew Neureuther 2, Yoshiyuki Kono 3, Atsushi Sekiguchi 3, Tsuyoshi Watanabe 4, Kazuo Taira 4, Koichi Fujiwara 5, Shiro Kusumoto 4, Takanori Nakano 4, Tsutomu Shimokawa 4, Takayuki Uchiyama 1
		Lunch 13:00〜14:00
31p-RC-　/ II
△	1	Development of the Multilayer Resist Technology for Half-Tone Mask -Negative-tone Resist/Negative-tone Resist-	Kochi National College of Technology 1　*Ichikawa Tomokazu 1,Yamamoto Yasuyuki 1,Horibe Hideo 1
	2	Development of the resist removal using ozone gas with water	Kochi National College of Technology 1,Osaka Institute of Technology 2　*Horibe Hideo 1,Ichikwa Tomokazu 1,Yamamoto Masashi 1,Matsuki Hideki 1, Takamatsu Shinya 1,Tanoue Syouta 1,Hata Takashi 1,Kamimura Tomosumi 2
	3	Resist removal using hydrogen atoms	Kochi National College of Technology 1,Tokyo Ohka Kogyo 2,JAIST 3　*Ichikawa Tomokazu 1,Takamatsu Sinya 1,Horibe Hideo 1,Takao Kazuhisa 2,Matsumura Hideki 3
	4	Mechanism for resist removal by using a laser irradiation	Osaka Institute of Technology.1, Kochi National College of Technology.2　Takaaki Seiwa 1,Keigo Katumi 1,Tomosumi Kamimura 1, Kunio Yoshida 1, Hideo Horibe 2
	5	Edge Roughness estimation on EUV Exposure Dose	Osaka Inst. Nanomaterials Microdevices Research Center 1　*Yagura Kei 1, Kotera Masatoshi 1
△	6	High Sensitivity and Low LER Resist for EUVL	University of Hyogo 1, Toyo Gosei Kogyo 2　*Yasuyuki Fukushima 1, Takeo Watanabe 1, Hideaki Shiotani 1, Ryuji Ohnishi 1, Hiroo Kinoshita 1, Masamichi Hayakawa 2, Satoshi Ogi 2, Yusuke Endo 2, Tomotaka Yamanaka 2, Shinichi Yusa 1
	7	Chemically-amplified negative-tone molecular resist using polarity-change reaction for EUV	Hitachi CRL 1, TOK 2, ASET 3, Hitachi ULSI 4　Kojima Kyoko 1, Fukuda Hiroshi 1, Shiono Daiju 2, Hada Hideo 2, Onodera Junichi 2, Oizumi Hiroaki 3, Nishiyama Iwao 3, Mori Shigeki 4
		Break 15:45〜16:00
	8	Fidelity of 45-nm-node rectangular patterns printed with EUV lithography	ASET EUV Process Technology Research Lab. 1　*Yuusuke Tanaka 1, Yukiko Kikuchi 1, Goo DooHoon 1, Iwao Nishiyama 1
	9	UV resist tuning for EUVL application	ASET 1　*Doohoon Goo 1,Yukiko Kikuchi 1,Yuusuke Tanaka 1,Iwao Nishiyama 1
	10	Phase Defect Observation Using an EUV Microscope	Univ of Hyogo 1, HOYA Corporation 2, CREST-JST 3　*Mizuta Yoshio 1,3, Yoshizumi Takahiro 1,3, Kishimoto Zyunki 1,3, Osugi Masahumi 1,3, Hamamoto Kazuhiro 2,3, Sakaya Noriyuki 2,3, Hosoya Morio 2,3, Syoki Tsutomu 2,3, Watanabe Takeo 1,3, Kinoshita Hiroo 1,3
	11	Inhibition of contamination by introduing ethanol for multilayer mirrors of EUVL projection optics	Univ. of Hyogo 1, Canon Inc. 2, EUVA 3　*Kakutani Yukinobu 1, Niibe Masahito 1, Gomei Yoshio 2, Takase Hiromitsu 3, Terashima Shigeru 3, Tanabe Masayuki 3, Watanabe Yutaka 3, Matsunari Shuichi 3, Aoki Takashi 3, Murakami Katsuhiko 3, Fukuda Yasuaki 3
	12	Oxygen-contamination Cleaning for EUVL by Atomic Hydrogen Generated by Hot Wire (III)	ASET EUV Lab. 1,Kyushu Inst. of Tech.　Nishiyama Iwao 1, Motai1 Kumi 1, Miyagaki Shinji 1, Oizumi Hiroaki 1, Ueno Tomoya 2, Izumi Akira 2, Namiki Akira 2
	13	Proposal of a novel Alt-PSM with a structure of tri-tone embedded Atten-PSM.	Renesas Technology.　Nakao Shuji 1, Maejima Shinroku 1, Hanawa Tetsuro 1, Hosono Kunihiro 1, Suko Kazuyuki 1
	14	Sub-100 nm device pattern formation by KrF single exposure using a mask with half-tone field.	Renesas Technology.　Nakao Shuji 1, Maejima Shinroku 1, Hanawa Tetsuro 1, Suko Kazuyuki 1
	15	Impact of resist blur in ArF lithography at high NA era (II)	Renesas Technology.　Nakao Shuji 1, Moniwa Akemi 1, Hagiwara Takuya 1, Maejima Shinroku 1, Minamide Ayumi 1, Ono Yoshiharu 1, Hanawa Tetsuro 1, Suko Kazuyuki 1
7.4 Nanoimprint
August 29 (Tue.) 10:00〜11:30
29a-RC-　/ II
	1	Fluorinated diamond-like carbon coating as an anti-sticking layer onto a nanoimprint mold	Univ. of Hyogo 1　*Yamada Noriko 1,Nakamatsu　Ken-ichiro 1,Kanda Kazuhiro 1,Haruyama Yuichi 1,Matsui shinji 1
	2	Development of polycrystalline SiC mold	NTT-AT Nanofabrication 1, NTT-AT 2　*Takahashi Mitsutoshi 1, Kouno Masaru 1, Ueda Ryou 1, Namatsu Hideo 2
	3	Fabrication of Anodic Porous Alumina with Fine Pitch Using Metal Molds	Tokyo Metropolitan Univ. 1, KAST 2　*Sho Hatakeyama1, Hiroaki Maegawa1, Kazuyuki Nishio1,2, Hideki Masuda1,2
	4	High quality mold made from SIMOX master for characterization of UV-nanoimprint	AMRI-AIST 1, Tokyo Univ, of Sci. 2　*Sugisawa Koji 1,2, Hiroshima Hiroshi 1, Miyamoto Iwao 2
	5	Strength Analysis of Si Mold for Nanoimprint Lithography with Molecular Dynamics (III)	Osaka Pref. Univ. 1　*Kazuhiro Tada 1, Masaaki Yasuda 1, Yoshihisa Kimoto 1, Hiroaki Kawata 1, Yoshihiko Hirai 1
	6	Quartz mold for Nano Imprint with a high index material	CANON INC., Canon Research Center　Terasaki Atsunori 1, Suehira Nobuhito 1, Seki Jun-ichi 1, Ono Haruhito 1
7.4 Nanoimprint
August 30 (Wed.) 10:15〜12:00
30a-RC-　/ II
	1	Fine patterning of SiO2 thin film using polysilane as a precursor II	RIKEN 1, Tokyo Inst. of Tech. 2　Okinaka Motoki 1, Tsukagoshi Kazuhito 1, Aoyagi Yoshinobu 2,1
△	2	Fabrication of Microlens Array by Nanoimprint Using Liquid Phase Hydrogen Silsesquioxane(HSQ)	Univ. of Hyogo 1, CREST JST 2, JSPS 3　Minari Chiaki 1,2, Nakamatsu Ken-ichiro 1,2,3, Kometani Reo 1,2,3, Kanda Kazuhiro 1,2, Haruyama Yu-ichi 1,2, Matsui Shinji 1,2
	3	O2 plasma irradiation effect on HSQ imprints replicated by room-temperature nanoimprinting	Univ. of Hyogo 1, JSPS 2　Nakamatsu Ken-ichiro 1,2, Kawamori Masanori 1, Haruyama Yuichi 1, Kanda Kazuhiro 1, Matsui Shinji 1
	4	Reproduction of the Morpho Blue by Nano Casting Method	Osaka Pref. Univ.1, Osaka Univ.2, Riken3　*Hirai　Yoshihiko1, Nakajima Masaki1, Miyamura Yusuki2, Sogo Kenji1, Ishikawa Yoko2, Saito Akira2,3
	5	Pattern size reduction of the nanoprint-fabricated structure on heat shrinkable film	NTT Basic Research Laboratories 1, Massachusetts Institute of Technology 2　*Atsushi Yokoo 1, Kazumi Wada 2, Lionel C. Kimerling 2
△	6	Nanoimprinting Process Using Anodic Porous Alumina for Anti-Refractive Structures on a Lens	KAST1, Tokyo Metropolitan Univ.2　*Takashi Yanagishita1, Kazuyuki Nishio1,2, Hideki Masuda1,2
	7	Nanoimprinting Using Roll Type Ordered Anodic Porous Alumina	KAST 1,Tokyo Metropolitan Univ.　2,Mitsubishi Rayon Co.3 　Yanagishita Takashi 1, Nishio Kazuyuki 1,2, Okamoto Eiko 3, Kojima Katsuhiro 3, Sakuma Satoshi 3, Uozu Yoshihiro 3, Mauda Hideki 1,2
7.5 Review Lectures and General Session:Progress in structural modifications of carbon materials by electronic excitations
August 31 (Thu.) 13:00〜16:45
31p-K-　/ II
	1	Femtosecond-Laser Induced Creation of A Novel Phase on Graphite Surface	Osaka Univ.　Kanasaki Jun'ichi
	2	Simulation of Structural Change of Electronically Excited Carbon Nanotubes	Fundamental and Environmental Research Labs., NEC　Yoshiyuki Miyamoto
△	3	Restructuring of Tetrahedral Amorphous Carbon Films induced by Core Electron Excitations	Tokyo Univ.1,RIKEN/SP-8 2,PF 3,ISSP 4 　*Liang Shijin 1,Harada Yoshihisa 2,Kitajima Yoshinori 3,Mera Yutaka 1,Shin Shik24, Maeda Koji 1
	4	Formation of carbon materials by atomic layer deposition technique with stmospheric plasma system	RIKEN 1, Hosei Univ. 2　*Tsuji Naoki 2, Saito Syota 2, Yamamoto Yasuhiro 2, Mise Takaya 1, Watanabe Kowashi 1, Meguro Takashi 1
	5	Effect of hyperthermal atomic oxygen exposures on hydrogenated diamond-like carbon films	Kobe Univ. 1, Nippon ITF 2, JAEA 3, ECL 4 　K. Yokota 1, H. Asada 1, M. Tagawa 1, H. Oohara 2, T. Nakahigashi 2, A. Yoshigoe 3, Y. Teraoka 3, J-M, Martin 4, M. Belin 4
	6	Formation of Diamond-like Carbon Film by Laser Detonation-Induced Hyperthermal Beam at Room Temperature	Kobe Univ.1　*M. Tagawa 1, H. Asada 1, Y. Matsuura 1, K. Yokota 1
		Break 15:00〜15:15
	7	Quantitative analysis of gallium in the annealed FIB-CVD DLC	Univ. of Hyogo 1,CREST JST 2,JSPS 3　*Saikubo Akihiko 1,2,Igaki Jun-ya 1,2,Kometani Reo 1,2,3,Kanda Kazuhiro 1,2,Matsui Shinji 1,2
	8	Annealing effect of the field emission from DLC emitter fabricated by FIB-CVD	University of Hyogo 1, JSPS 2, CREST JST 3, SII NanoTechnology Inc. 4　Kometani Reo 1,2,3, Kanda Kazuhiro 1,3, Haruyama Yuichi 1,3, Kaito Takashi 4 Matsui Shinji 1,3
△	9	Temperature dependence of deposition rate in FIB-CVD	Univ. of Hyogo 1,CREST JST 2,JSPS 3, SII Inc. 4　*Okada Makoto 1,2,Kometani Reo 1,2,3,Nakamatsu Kenichiro 1,2,3,Kaito Takashi 4,Kanda Kazuhiro 1,2,Haruyama Yuichi 1,2,Matsui Shinji 1,2
△	10	Evaluation of wire rod of nanosprings fabricated by focused-ion-beam chemical vapor deposition (FIB-CVD)	Univ. of Hyogo 1, CREST JST 2, NEC fundamental research labs. 3, SII NanoTechnology 4　Nakamatsu Ken-ichiro 1,2, Ichihashi Toshinari 3, Kaito Takashi 4, Kanda Kazuhiro 1, Haruyama Yuichi 1, Matsui Shinji 1,2
	11	Annealing Effect of Electronic Properties for Wires Fabricated by FIB and EB-CVD	Univ. of Hyogo 1, CREST JST 2, JSPS 3, SII NanoTechnology Inc. 4　*Ozasa Akinori 1,2, Nakamatsu Ken-ichiro 1,2,3, Kometani Reo 1,2,3, Kanda Kazuhiro 1,2, Haruyama Yu-ichi 1,2, Kaito Takashi 4, Matsui Shinji 1,2
	12	Characteristics of SiOx based material deposited by FIB-CVD	Univ. of Hyogo 1, CREST JST 2, JSPS Research Fellowships for Young Schientists 3, SII Nanotechnology Inc. 4　*Igaki Jun-ya 1,2, Nakamatsu Ken-ichiro 1,2,3, Kometani Reo 1,2,3, Kanda Kazuhiro 1,2, Haruyama Yuichi 1,2, Kaito Takashi 4, Matsui Shinji 1,2
7.5 Beam Excitation Surface Reaction
August 31 (Thu.) 9:00〜11:45
31a-K-　/ II
	1	Beam line for synchrotron radiation etching using XeF2 as reaction gas	The Graduate Univ. for Advanced Studies 1,Inst. for Molecular Science 2,Japan atomic energy agency 3,Tsukuba Univ. 4　*Nakai Naohito 1,Chiang TsungYi 2,Uno Hidetaka 2,Tero Ryuugo 1, 2,Suzui Mitsukazu 2,Teraoka Yuden 3,Yoshigoe Akitaka 3,Makimura Tetsuya 4,Murakami Kouichi 4,Urisu Tsuneo 1,2
	2	Atomic movement in a-Si film by X-ray excitation using undulator source	Dept. Mat. Sci. & Chem.,Univ. Hyogo 1, Yamaguchi Univ. 2, LASTI,Univ. Hyogo 3　*Takada Hiroyuki 1,Watanabe Hiroshi 1,Heya Akira 1,Kawamoto Naoya 2,Kanda Kazuhiro 3,Niibe Masato 3,Matsuo Naoto 1,Mochizuki Takayasu 3
	3	Role of Steps in Cu2O Formation on Cu(410) using a Hyperthermal O2 Molecular Beam	Osaka Univ. 1, Univ. Genova 2, JAEA 3　*Michio OKada 1, Luca Vattuone 2, Kousuke Moritani 3, Andrea Gerbi 2, Letizia Savio 2, Akitaka Yoshigoe 3, Yuden Teraoka 3, Mario Rocca 2, Toshio Kasai 1
	4	Initial oxidation process of Si(100) surface with O3 molecular beam	The Univ. of Tokyo 1, Nagoya Univ. 2　*Ikuya Kinefuchi 1, Hiroki Yamaguchi 2, Yukinori Sakiyama 1, Shu Takagi 1, Yoichiro Matsumoto 1
△	5	Observation of initial oxidation process on Si(110)-16x2 by real-time photoemission spectroscopy I	CIR, Tohoku Univ. 1, Kyushu Institute of technology. 2, Japan Atomic Energy Agency. 3　*Togashi Hideaki 1, Kato Atsushi 1, Yamamoto Yoshihisa 1, Konno Atsushi 1, Narita Yuzuru 2, Suemitsu Maki 1, Teraoka Yuuden 3, Yoshigoe Akitaka 3, Takahashi Yuuya 1, Asaoka Hidehito 3
	6	Observation of initial oxidation process on Si(110)-16x2 by real-time photoemission spectroscopy II	CIR, Tohoku Univ. 1, Kyushu Inst. of Technology 2, JAEA 3　*Kato Atsushi 1, Togashi Hideaki 1, Yamamoto Yoshihisa 1,　Konno Atsushi 1, Narita Yuzuru 2, Suemitsu Maki 1, Teraoka Yuden 3, Yoshigoe Akitaka 3 Takahashi Yuuya 1, Asaoka Hideto 3
		Break 10:30〜10:45
	7	The irradiation of circular DNA with low-energy electrons	Univ. of Hyogo　*Mochiji Kozo 1, Hashimoto Hideyuki 1, Ninomiya Naoki 1, Tanaka Yuuta 1
	8	Effect of gas cluster ion beam irradiation on DNA	Graduate School of Engineering, University of Hyogo 1　*Takeshima Keigo 1,Houzumi Shingo 1,Moritani Kousuke 1,Tanaka Yuta 1,Mochiji kouzo 1
△	9	Incident Cluster Size Dependence on SIMS Analysis of Bio-molecular Samples	Kyoto Univ. QSEC 1, Kyoto Univ 2　*Ninomiya Satoshi 1, Nakata Yoshihiko 2, Ichiki Kazuya 2, Seki Toshio 1, Aoki Takaaki 1, Matsuo Jiro 2
	10	Study of Cluster Size Effect on Collisional Process of Reactive Cluster Ions	Dept. of Electric Sci. & Eng Kyoto Univ. 1, Quantum Sci. & Eng. Ctr. Kyoto Univ 2　*Takaaki Aoki 1, Jiro Matsuo 2
7.6 Ion Beam Technology
August 29 (Tue.) 9:00〜17:30
29a-K-　/ II
	1	AFM Evaluation of the Si Surfaces sputtered by the Metal Cluster Complex (Ir4(CO)n+）Ion-Beam.	AIST 1,Toshiba 2　*Kondou Kouji 1, Fujiwara Yukio 1, Teranishi Yoshikazu1, Nonaka Hidehiko 1, Fujimoto Toshiyuki 1 Kurokawa Akira 1, Ichimura Shingo 1, Tomita Mitsuhiro 2
	2	Static SIMS analysis of organic thin films of PMMA using the metal cluster complex of Ir4(CO)12	AIST 1,Toshiba 2　*Fujiwara Yukio 1, Kondou Kouji 1, Nonaka Hidehiko 1, Saito Naoki 1, Itoh Hiroshi 1, Fujimoto Toshiyuki 1, Kurokawa Akira 1, Ichimura Shingo 1, Tomita Mitsuhiro 2
	3	Surface Modification of Si Substrates Irradiated by Water Cluster Ion Beams	Ion Beam Eng. Exp. Lab., Kyoto Univ. 1　*Okada Takeshi 1, Nakayama Kazuya 1, Kawashita Masakazu 1, Takaoka Gikan 1
	4	Dependence of Ethanol Cluster Ion Beam Sputtering on Incident Angle	Ion Beam Eng. Exp. Lab., Kyoto Univ.　*Okada Takeshi 1, Nakayama Kazuya 1, Kawashita Masakazu 1, Takaoka Gikan 1
	5	Surface Modification of PET Substrates by Cluster Ion Beam Irradiation	Ion Beam Eng. Exp. Lab., Kyoto Univ.　*Araki Rei 1, Kawashita Masakazu 1, Takaoka Gikan 1
	6	Photocatalytic properties of Cr doped TiO2 thin films	Ion Beam Eng. Exp. Lab., Kyoto Univ. 1　*Nose Tomomichi 1, Terada Takashi 1, Kawashita Masakazu 1, Takaoka Gikan 1
		Break 10:30〜10:45
	7	Cluster size effects on gas cluster ion beams irradiation at oblique angle incidence	Graduate School of Engineering, Univ. of Hyogo 1, LASTI Univ. of Hyogo 2　*Kazuhiro Nakamura 1, Yuki Maeshima 1, Noriaki Toyoda 2, Kouzou Mochiji 1, Toru Mitamura 1, Isao Yamada 2
	8	Vacuum degree dependences of energy loss and velocity of gas cluster ion	Graduate School of Engineering University of Hyogo 1,LASTI University of Hyogo 2　Maeshima Yuki 1,Nakamura Kazuhiro 1,Toyoda Noriaki 2,Mochiji Kouzo 1,Mitamura Toru 1,Yamada Isao 2
	9	Improvement of thickness uniformity on wafer by gas cluster ion beam with Location Specific Processing.	Osaka Science & Technology Center 1,LASTI, University of Hyogo 2　*Mashita takafumi 1,Toyoda Noriaki 2,Yamada Isao 2
	10	Incident cluster size dependence of secondary ion yields II	Kyoto Univ. 1, Kyoto Univ. Quantum Science and Engineering Center 2　*Ichiki Kazuya 1, Ninomiya Satoshi 2, Seki Toshio 2, Aoki Takaaki 2, Matsuo Jiro 2
	11	High-quality Metal Film Formation with Gas Cluster Ion Beams Assisted Deposition	Kyoto Univ. 1　*Toshio Seki 1, Takeshi Murase 1, Jiro Matsuo 1
		Lunch 12:00〜13:00
29p-K-　/ II
	1	Properties of SiCx Film Prepared by Plasma-Based Ion Implantation and Deposition	University of Hyogo 1　*Utsumi Takayuki 1, Okuno Jiro 1, Oka Yoshihiro1, Fujiwara Etsuo 1, Yatsuzuka Mitsuyasu 1
△	2	STEM observation of nano-interface between substrate and DLC film prepared by plasma-based ion implantation and deposition	Univ. of Hyogo 1, Tohoku Univ. 2　*Oka Yoshihiro 1, Nishijima Masahiko 2, Hiraga Kenji 2, Yatsuzuka Mitsuyasu 1
	3	Suppression of Pinhole Defects in DLC Film Prepared by Plasma-based Ion Implantation & Deposition Method	University of Hyogo　Wataru Nishino,E.Fujiwara, H.Uchida,and M.Yatsuzuka
	4	Ion implantation into the inner surface of PET bottle	Kanazawa Inst. of Technology　*Sakamoto Akinori 1,Inui Toshiaki 1,Ikenaga Noriaki 1,Sakudo Noriyuki 1
	5	Cell Attachment Properties of Ion Implanted Poly-L-lysine-coated Polystyrene	RIKEN AD&S Center 1, Gakushuin Girls' Junior & Senior High School 2　*Toida Hiroshi 1, Masubuchi Tetsuo 1,2, Watanabe Kowashi 1, Nakao Aiko 1, Yatagai Fumio 1, Ujiie Rena 1, Suzuki Yoshiaki 1
	6	Cell adhesion of chitosan film modified by ion beam	Tokyo Univ. of Science1,RIKEN2　*Katsumune Takahashi1,2, Katsumi Uchida1, Yoshiaki Suzuki2, Hirofumi Yajima1
	7	Fabrication of Microstructures and Cellular Sheet by Ion-Beam Irradiation	Tokyo Univ. of Science 1, RIKEN AD&SC 2　*Tanaka Toshiyuki 1,Uchida Katsumi 1,Yajima Hirofumi 1,Toida Hiroshi 2,Ujiie Rena 2,Suzuki Yoshiaki 2
	8	Estimation of protein adsorption on spin coated polystyrene implanted carbon negative ion	Kyoto Univ. 1　*Yamada Tetsuya 1, Tsuji Hiroshi 1, Sommani Pyanuch 1, Hattori Mitsutaka 1, Gotoh Yashuhito 1, Ishikawa Zyunzo 1
▲△	9	Selective Attachment Properties of Mesenchymal Stem Cells on C-implanted Silicone Rubber	Kyoto Univ.　*Sommani Piyanuch 1,Tsuji Hiroshi 1,Yamada Tetsuya 1,Hattori Mitsutaka 1,Sato Hiroko 1,Gotoh Yasuhito 1,Ishikawa Junzo 1
		Break 15:15〜15:30
	10	Raman spectroscopy of Nanoparticles formed by Negative Ion Implantation in SiO2 thin Films	Kyoto Univ. 1,Sharp Corp. 2　*Minotani Takashi 1,Tsuji Hiroshi 1,Arai Nobutoshi 1,2,Gotoh Naoyuki 1, Kojima Kenji 1,Okumine Tetuya 2,Adachi Kouichirou 2, Kotaki Hiroshi 2, Gotoh Yasuyuki 1,Ishikawa Jyunzou 1
	11	Measurement of Cathode Luminescence on SiO2 Films Implanted by Germanium Negative Ion	Kyoto Univ. 1,Sharp Corp. 2　*Nakatsuka Hiroyuki 1,Tsuji Hiroshi 1,Arai Nobutoshi 1,2,Minotani Takashi 1,Kojima Kenji 1,Adachi Koichiro 2,Kotaki Hiroshi 2,Gotoh Yasuhito 1,Ishikawa Junzo 1
	12	Improvement of Oxidation of Ge atoms at deep depth in SiO2 Film Implanted by Multi-Energy Negative Ion Implantation	Kyoto Univ. 1,Sharp Corp. 2　*Kojima Kenji 1,Tuji Hiroshi 1,Arai Nobutoshi 1,2,Nakatsuka Hiroyuki 1,Minotani takashi 1,Okumine Tetsuya 2,Adachi kouitirou 2,Kotaki Hiroshi 2,Gotoh Yasuhito 1,Ishikawa Junzou 1
▲△	13	Ion Implantation on Indentation-Deformed Crystalline and Amorphous SiO2	Tsukuba University 1, Nanotional Institute for Materials Science　Jin Pan　1,2, Y.Takeda　2, H.Wang　2, O.A. Plaksin　2, K. Kono　2, H.Amekura　2, N. Kishimoto　2
	14	RTA effects on the initial formation process of embedded Si nanocrystals in SiO2	Aichi Univ. of Education 1, kanazawa Univ. 2, Univ. of Sussex 3　*T.S.Iwayama 1, T.Hama 2, D.E.Hole 3
	15	Atomic Redistribution in Metal Nanoparticle Composites Induced by High-Fluence Heavy-Ion Implantation(II)	Quantum Beam Center, NIMS 1, SSC RF-IPPE 2　K. Kono 1, O. Pkaksin 2, Y. Takeda 1, H. Amekura 1, N. Kishimoto 1
▲	16	2D Spatial Control of Metal Nanoparticles by Multi laser-Lithography and Heavy-ion Irradiation	NIMS,quantum beam center,　*Haisong Wang, Y. Takeda, N.Umeda, K.Kono and N.Kishimoto
△	17	Precipitation Control of Cu Nanoparticles in SiO2 by Simultaneous Ion and Laser Irradiation	Tsukuba Univ. 1, NIMS 2　*Kenji Saito 1,2, Yoshihiko Takeda 2, Naoki Kishimoto 2
7.6 Ion Beam Technology
August 30 (Wed.) 9:00〜12:00
30a-K-　/ II
	1	Development of electron-spin-polarized 4He+ ion source (II)	NIMS 1, JST-PRESTO 2　*Suzuki Taku 1,2, Yamauchi Yasushi 1
	2	Development of energy deposition method for μm3 area in liquid using a taper glass capillary with a thin end-window	Atomic Physics Lab., RIKEN 1, Beam Application Team, RIKEN 2, Kochi Univ. of Tech. 3, Inst. of Phys., Univ. of Tokyo 4　*Iwai Yoshio 1, Ikeda Tokihiro 1, Kojima M. Takao 1, Kanai Yasuyuki 1, Kobayashi Tomohiro 2, Nebiki Takuya 3, Narusawa Tadashi 3, Yamazaki Yasunori 1,4
	3	Investigation of a small neutron-generator-II	Tokai.Univ 1,Tokyo.Metro.Univ 2,Otsuma Womens Univ3　 　*Taniuti Yasuyuki 1,Kobayashi Kazumasa 1,Kusano Toshiaki 1,Yamamoto Hiroaki 1,Utsumi Michiaki 1,Chiba Masami 2,Fujii Masatoshi 2,Shirakawa Toshiaki 3
	4	Study of nuclear reactions under fracture process of dielectric material II	Tokai Univ. 1,Tokyo Metro. Univ. 2,Ootsuma Womens Univ. 3,Rikkyou Univ. 4　Kobayashi Kazumasa 1,Taniuti Yasuyuki 1,Suzuki Masashi 1,Utsumi Michiaki 1,Chiba Masami 2,Fujii Masatoshi 2,Shirakawa Toshiaki 3,Hashimoto Tomoko 4,shiraishi Fumio 4
	5	Formation of minute structures on Ge surface by focused ion beam irradiation (II)	Grad. School of Eng. Sci., Osaka Univ. 1, CQST, Osaka Univ. 2　*Ogushi Keiji 1, Yanagisawa Junichi 1,2, Akasaka Yoichi 1
	6	Structural characterization of ion-implanted highly oriented pyrolytic graphite	Riken　*Watanabe Hiroshi 1, Takahashi Katsuo 1, Iwaki Masaya 1
		Break 10:30〜10:45
	7	Carbon Implantation into Si Substrates by Octane Ion Beam Irradiation	Ion Beam Eng. Exp. Lab., Kyoto Univ. 1　*Kawashima Yoshio 1,Nishida Yoichi 1,Kawashita Masakazu 1,Takaoka Gikan 1
	8	Energy spectra in cyclotron RBS system	Kobe Steel, Ltd., Electronics Research Laboratory　Ichihara Chikara 1, Kobayashi Akira 1
▲	9	PIXE analysis of heavy metals in shellfish of Uranouchi Bay	Kochi Univ. of Technol. 1　*Kabir M Hasnat 1, Narusawa Tadashi 1
	10	Development of analysis technique for nanoscale multilayers using TOF-RBS with multiple MCPs	CQSTEC Osaka univ. 1　Koresawa Kouhei 1,Nguyen Viet Nguyen 1,Abo Satoshi 1,Wakaya Fujio 1,Takai Mikio 1
	11	Effects of ion beam irradiation and annealing on carbon nanotube thin film.	Tokyo Univ. 1, RIKEN 2　*Hirao Hiroki 1, Kobayashi Tomohiro 2, Meguro Takashi 2, Suzuki Akihiro 1, Terai Takayuki 1
7.7 Micro-Field Emitter
August 31 (Thu.) 10:00〜18:15
31a-ZM-　/ II
△	1	Field emission from ZnO:Al whisker cold-emitter fabricated on carbon fiber	Nagaoka Univ. Tech. 1　*Ooki Satoshi 1, Ohshio Shigeo 1, Nishino Junichi 1, Saitoh Hidetoshi 1
	2	Growth and emission characteristics of iron-oxide whiskers	RIE Shizuoka Univ.1, Nippon Steel Corp.2, Kanazawa Inst. Tech.3　*M. Okada1,2,Y. Neo1, K. Kubomura3, H. Mimura1
	3	Improvement of the electron emission property of graphite nanofiber with catalysts containing SiO2	NHK Science and Technical Research Labs. 1　*Hagiwara Kei 1, Ushirozawa Mizumoto 1, Sakai Toshikatsu 1, Masahiko Seki 1
△	4	Effect of the GNF-FEA structure on the electron beam divergence	NHK Sci. & Tech. Res. Lab. 1, Res. Inst. of Elect., Shizuoka Univ. 2　*Sakai Toshikatsu 1,Ushirozawa Misumoto 1,Hagiwara Kei 1,Seki Masahiko 1,Mimura Hidenori 2,Neo Yoichiro 2
	5	Field Emission Characteristics of Carbon Nanotubes Synthesized in Alcohol Liquid	Toppan Printing Co.,Ltd. 1, Toyo univ. 2, Sensor Photonics Research Center 3, NIMS 4　Hidenori Gamo 1, Takeshi Shibasaki 2, Kiyoharu Nakagawa 3, Toshihiro Ando 4, Mikka N.-Gamo 2,3
△	6	Field Emission Properties of the "Marimo Carbon"	Toyo Univ.1,Toppan Printing Co.,LTD.2,Sensor Photonics Research Center3,NIMS4　*Mayuko Kikuchi1,Hidenori Gamo2,Kiyoharu Nakagawa3,Toshihiro Ando4, Mikka Nishitani-Gamo1,3
		Break 11:30〜11:45
	7	Carbon-coated LaB6 cathode	NuFlare Technology 1　Katsap Victor 1, Kendall Rodeny 1, Messik Scott 1, *Kenichi Saito 1
	8	X-ray generation using carbon-nanofiber-based flexible field emitters	Nagoya Inst.Technol 1,Nanyang Tech.Univ. 2,SIM-Tech. 3　*Kohei Yamaguchi 1,Masaki Tanemura 1,Junya Tanaka 1,S. P. Lau 2,L. Huang 2,T. T. Tan 3,H. S. Sim 3
△	9	The electron emission current of n-type diamond emitter devices	Sumitomo Electric Industries, LTD.　*Tatsumi Natsuo 1, Namba Akihiko 1, Keisuke Tanizaki 1, Nishibayashi Yoshiki 1, Imai Takahiro 1
	10	Temperature dependence of tip type diamond electron source	Sumitomo Electric Industries, LTD.　*Namba Akihiko 1, Tatsumi Natsuo 1, Yamamoto Yoshiyuki 1, Nishibayashi Yoshiki 1, Imai Takahiro 1
	11	Field Emission Properties of Hafnium Nitride Field Emission Array	Kyoto Univ.　Noriyuki Setojima 1, Taro Kanzawa 1, Yasuhito Gotoh 1, Hiroshi Tsuji 1, Junzo Ishikawa1
		Lunch 13:00〜14:00
31p-ZM-　/ II
	1	Electron emission from ferroelectric ceramics	NGK Insulators, Ltd.　Sugiyama Tomohiko 1, *Ohwada Iwao 1, Nanataki Tsutomu 1
	2	Electrode structure of ferroelectric electron emitter	NGK Insulators, Ltd.　*Ohwada Iwao 1, Sugiyama Tomohiko 1, Tsutomu Nanataki 1
	3	Life characteristics of electron emission from ferroelectric ceramics	NGK Insulators, Ltd.　*Ohwada Iwao 1, Mori Yukimasa 1, Yamaguchi Hirofumi 1, Nanataki Tsutomu 1
	4	Low temperature sharpening process for silicon field emitters	AIST　*Nagao Masayoshi 1, Sakamura Yuichi 1, Yasumuro Chiaki 1, Kanemaru Seigo 1, Itoh Junji 1
	5	Long Time Operation of Si:C-FEA in H2 Gas Atmosphere	Kyoto Univ. 1, JST 2, AIST 3, Nissin Ion Equipment 4　*Oowada Atsushi 1, Kojima Toshihiko 1, Takeuchi Mitsuaki 2, Gotoh Yasushito 1, Nagao Masayoshi 3, Tsuji Hiroshi 1, Ishikawa Jyunzou 1,　Sakai Shigeki 4, Kimoto Tsunenobu 1
	6	Measurement of electron emission from porous Si film on glass substrate (II)	Oshima College of Maritime Technology　*HIGA katsuya
	7	Emission characteristics of planar-type cathodes based on nanocrystalline silicon thin films (II)	Hachinohe Inst. of Technol. 1, RIE Shizuoka Univ. 2　 　*Shimawaki Hidetaka 1, Masuda Yoichiro 1, Neo Yochiro 2, Mimura Hidenori 2
	8	Gas Discharge Ignition by Nanocrystalline Poly-Silicon Ballistic Emitter	Matsushita Electric Works, Ltd. 1, Graduate School of Eng., Tokyo Univ. of A & T 2　*Hatai Takashi 1, Ichihara Tsutomu 1, Aizawa Koichi 1, Komoda Takuya 1, Koshida Nobuyoshi 2
	9	Operation of nanocrystalline silicon ballistic electron emitter in atmospheric pressure and its stabilization by surface modification	Graduate School of Eng., Tokyo Univ. Agri. & Technol. 1, Quantum14 Co. 2　*Ohta Toshiyuki 1, Kojima Akira 1,2, Koshida Nobuyoshi 1,2
		Break 16:15〜16:30
	10	Field emission current and microscopic work function distributions in a monolayer graphite	Univ. of Tsukuba 1,AIST 2　*Takanobu Sato 1,Morihiko Saida 1,Satoshi Ogata 1,Kimio Horikawa 1,Kotaro Adachi1,Masayoshi Nagao 2,Shigehiko Yamamoto 2,Masahiro Sasaki 1
	11	Field Electron Emission From Single Atom Tip: Systematic Measurements of Field Electron Spectroscopy	Waseda Univ. 1, Academia Sinica 2　E.Rokuta 1, K.Nomura 1, T.Itagaki 1, T.Ishikawa 1, B-.L.Cho 1, H.S.Kuo 2, T.T.Tsong 2 and C.Oshima 1
△	12	Application of the single-atom emitter to scanning electron microscopy	LMST Waseda Univ. 1,JST Presto 2,DENKA 3,HOLON 4,APCO 5　Urata Tomohiro 1,Ishikawa Tuyoshi 1,Cho Bokurai 1,2,Rokuta Eizhi 1,Nonogaki Ryozo 3,Yonezawa Akira 4,Saito Hidekazu 5,Oshima Chuhei 1
△	13	Characterization of the faceting structure on the Pd electroplated W(111) surface	Waseda Univ. 1, Academia Sinica 2　Tagawa Keisuke 1, Rokuta Eiji 1, Ishikawa Tuyoshi 1, H.S.Kuo 2, T.T.Tsong 2 and Oshima Tiuhei1
	14	XPS and LEED analyses on Mo(100) surface with zirconium oxide	Muroran Inst. 1　*Kawakubo Takashi 1, Satoh Shinya 1, Nakane Hideaki 1, Adachi Hiroshi 1
	15	Development of high-brightness spin-polarized electron field emitter I -Calibration of Mott spin polarization analyzer-	Graduate school of Eng., Mie univ. 1　*Nagai Shigekazu 1,Hata koichi 1
	16	Statistical investigation on the design of field emitter array (2)	Kyushu Univ. 1　*Yoshida Tomoya 1,Asano Tanemasa 1
7.8 Beam Application and New Technology
August 30 (Wed.)
30a-ZL-　/ II
		Short Presentation (5min.) 10:00〜10:35 30a-ZL-1〜7　Poster Session 15:30〜17:30
	1	Beam Blur Analysis of Electron Beam Writer	NuFlare Technology, Inc.　*Hiramoto Makoto 1, Kamikubo Takashi 1, Ohtoshi Kenji 1,Sunaoshi Hitoshi 1, Tamamushi Shuichi 1
	2	Fabrication of nano-wiring pattern by EB lithography with SEM	Graduate School of Science and Technology Kumamoto University 1,Kumamoto　University 2　*Yuya Nishi 1, Kouta Nakano 2, Akira Nakada 1 and Hiroshi Kubota 1
	3	Formation of silicon nanocrystal-dots in SiOx matrices by laser irradiation	Inst.of Appl.Phys. Univ. of Tsukuba 1, S.R.P Nano Science 2, NIMS 3　Uchida Noriyuki 1,2, Okami Tsuyoshi 1, Fukata Naoki 2,3, Murakami Kouichi 1,2
	4	Plasma Photonics --- Electromagnetic Wave Device by Laser Produced Plasma	Utsunomiya Univ.　Noboru Yugami, Takeshi Higashiguchi
	5	Plasma Photonics Feasibility of Advance Electromagnetic-wave Sources by Controlling Complex Refractive Index	Osaka Univ.1, U-Electro-Communications2, Utsunomiya Univ.3　　Ryosuke Kodama1, Makoto Nakagawa1, Toshihiro Tanaka1, Kkiminori Kondo1, Hitoki Yoneda2, Noboru Yugami3
	6	Plasma Photonics: Optical device with using metal-nonmetal transition induced by laser	Institute for Laser Science, Univ. Electro-Communications 1, LBNL 2 　Hitoki Yoneda 1, Richard M. More 2
	7	Plasmaphotonics Estimation of ultrashort intense pulse generation with plasmas	Osaka Univ. 1, U-Electro-Communications 2, Utsunomiya Univ. 3　Kiminori Kondo 1, Hitoki Yoneda 2, Noboru Yugami 3, Ryosuke Kodama 4