1 Radiation·Plasma Electronics
Plasma Electronics Award
August 31 (Thu.) 13:30〜14:00
31p-ZW-　/ I
	1	Characteristics of meta-materials composed of microplasma arrays and their applications	Kyoto University　*Kunihide Tachibana
	2〜11 14:00〜18:05 (Symposium: Process diagnostics technologies for process monitoring)
1.1 Radiation·Accelerator·Nuclear Reactor
August 30 (Wed.) 9:00〜12:00
30a-R-　/ I
	1	A Development of a space-radiation dosimetry system Auto PADLES(I) -Study of automatic detection method for etch pits of CR-39-	AES 1,JAXA 2,KEK 3　*Kitajo Keiichi 1,Nagamatsu Aiko 2,Kumagai Hidenori 1,Tawara Hiroko 2,3
	2	Space radiation dosimetry by PADLES on an exposed area of the ISS Russian segment	JAXA 1, KEK Grad.Univ. 2, AES 3, KEK 4　Aiko Nagamatsu 1 2 , Hidenori Kumagai 3, Keiichi Kitajo 3, Hiroko Tawara 1 4
	3	Development of thickness measurement system with high accuracy for the identification of iron isotopes in CR-39 track detector	Waseda Univ. 1, NIRS 2, KEK 3, Nihon Univ. 4　Satoshi Kodaira 1, Nakahiro Yasuda 2, Nobuyuki Hasebe 1, Tadayoshi Doke 1, Shuya Ota 1, Hiroko Tawara 3, Koichi Ogura 4
	4	Investigation of CR-39-DAP copolymer with variable detection threshold for the observation of trans-iron nuclei in cosmic rays	Waseda Univ. 1, NIRS 2, Kinki Univ. 3, Nihon Univ. 4　Satoshi Kodaira 1, Masayuki Asaeda 1, Nobuyuki Hasebe 1, Tadayoshi Doke 1, Nakahiro Yasuda 2, Takao Tsuruta 3, Yoshinobu Kori 3, Koichi Ogura 4
	5	Development of particle tracking system using CR-39 track detector for the measurement of nuclear charge changing cross section	Waseda Univ. 1,NIRS 2　*Shuya Ota 1,Satoshi Kodaira 1,Nobuyuki Hasebe 1,Makoto Hareyama 1,Mieko Kurano 2, Dalu Shu 2,Nakahiro Yasuda 2
		Break 10:15〜10:30
	6	Heavy ion tracks in polycarbonate (bisphenole A) (2)	Kobe Univ.1　NIRS2　*Watanabe Souichirou 1, Yamauchi Tomoya 1, Oda Keiji 1, Yasuda Nakahiro 2
	7	Response of CR-39 track detector to low-energy heavy ion beams	Osaka Univ. 1　Ippei Ishikawa 1, Fuminobu Sato 1, Yushi Kato 1, Toshiyuki Iida 1
	8	Effect of atmospheric water on TD-1 sensitivity	AES 1,JAXA 2,KEK 3,NIRS 4　*Kumagai Hidenori 1,Nagamatsu Aiko 2,Kitajo Keiichi 1,Tawara Hiroko 2,3,Yasuda Nakahiro 4
△	9	Direct observation of low velocity atom using nanoparticle AgBr emulsion.	Nagoya Univ. 1, Fujifilm 2　*Natsume Mitsunori 1, Hoshino Kaoru 1, Naka Tatsuhiro 1, Nakano Toshiyuki 1, Nakamura Mitsuhiro 1, Narita Kouji 1, Niwa Kimio 1, Sato Osamu 1, Yoshioka Teppei 1, Kuwabara Ken'ichi 2
	10	Study on the sensitivity of BP-1 glass track-etch detector and its production method	Yokohama Nat'l Univ. 1,Waseda Univ. 2,KEK 3,NIRS 4　*Kamei Takuya 1,Uchida Yoshihiro 1,Ozaki Yuichi 1,Kodaira Satoshi 2, Tawara Hiroko 3,Doke Tadayoshi 2,Nakamura Shogo 1,Hasebe Nobuyuki 2, Yasuda Nakahiro 4
	11	Development of the fluorescent nuclear track detector	NIRS 1, Landauer, Inc. 2, Oklahoma State Univ. 3, Nagase Landauer 4　* Yasuda Nakahiro 1, Akselrod Mark 2, Benton Eric 3, Uchihori Yukio 1, Kitamura Hisashi 1, Kobayashi Ikuo 4
1.1 Radiation·Accelerator·Nuclear Reactor
August 31 (Thu.) 9:00〜17:45
31a-R-　/ I
	1	Timing Resolution of Light Sharing DOI Block Detector for Small Animal PET	National Institute of Radiological Sciences 1　*Fumihiko Nishikido 1, Kengo Shibuya 1, Tomoaki Tsuda 1, Taiga Yamaya 1, Eiji Yoshida 1, Naoko Inadama 1, Hideo Murayama 1
△	2	Development of multi-channel waveform sampling front-end ASIC for PET	School of Engineering, Univ of Tokyo 1　*Kenji Shimazoe 1, Yeom Jung Yeol 1, Hiroyuki Takahashi 1
	3	Development of 3-D dynamic multi-pinhole gamma camera using flat-panel detector with multi-pinhole collimator	Nagoya Univ. 1　*Takemoto Hisato, Watanabe Kenichi, Kwarabayashi Jun, Iguchi Tetsuo
	4	Applied study of laser Compton scattering gamma rays	LASTI 1,Univ.Hyogo 2,RCNP 3,Univ.Konan 4,ILT 5　Horikawa Ken 1,Aratani Tomohiro 1,*Miyamoto Syuji 1,Amano Syo 1,Mochizuki Takayasu 1,Aoki Kazuhiko 2,Shima Tatsushi 3,Utsunomiya Hiroaki 4,Akimune Hidetoshi 4,Li Dazhi 5
		Break 10:00〜10:15
	5	Analysis of γ-ray imaging for Spaghetti calorimeter	National Defense Academy 1,Osaka Univ. 2,RCNP Osaka Univ. 3,Kyoto Univ. 4,KEK 5, Saga Univ. 6,Yamagata Univ. 7　Matsumura Toru 1,Shinkawa Takao 1,Tojo Tsuyoshi 1,Yamanaka Taku 2,Kato Yuji 3, Sawada Takahiro 3,Hotta Tomoaki 3,Nakatsugawa Yohei 4,Watanabe Hiroaki 5,Suzuki Shiro 6,Ogata Risa 6,Shimogawa Tetsushi 6,Tajima Yasuhisa 7
△	6	Analytical Functions to Predict Cosmic-Ray Neutron Spectra in the Atmosphere	JAEA 1, RIST 2　*Sato Tatsuhiko 1, Niita Koji 2
	7	Development of carbon isotope analysis using the rapid-swept CW laser cavity-ring-down absorption spectroscopy II	Nagoya Univ. 1　*Takiguchi Yu 1, Tomita Hideki 1, Watanabe Kenichi 1, Kawarabayashi Jun 1, Iguchi Tetuo 1
	8	Study for Improvement of Resonance Ionization Mass Spectrometry Based on Isotope Selection with Doppler Shift of Laser Ablated Atoms	Nagoya Univ. 1 　*Higuchi Yuki 1, Watanabe Kenichi 1, Kawarabayashi Jun 1, Iguchi Testuo 1
	9	Effect of Ultrasonic Oscillation on Luminescence in X-Ray Irradiated KCl:Eu2+	Grad. School, Kanazawa Univ.　*Nakamura Shoichi 1, Ohgaku Tomiyasu 1
	10	Study on the detection method of secondary charged particles using the discrimination of the range	Research Reactor Inst. Kyoto Univ. 1, Japan Atomic Energy Agency 2　*Tanaka Hiroki 1, Yamagishi Hideshi 2, Nakamura Tatsuya 2, Soyama Kazuhiko 2, Aizawa Kazuya 2, Maruhashi Akira 1
	11	Angular Resolution of High-pressure Xenon Time Projection Chamber	Adv. Res. Inst. for Sci. and Engi. Waseda Univ. 1, Saitama Pref. Univ. 2, JAEA 3　*Mimura Mitsuteru 1, Kobayashi Shingo 1, Tezuka Chikara 1, Doke Tadayoshi 1, Hasebe Nobuyuki 1, Miyajima Mitsuhiro 1, Miyachi Takashi 1, Shibamura Eido 2, Ishizuka Akihiro 3
		Lunch 12:00〜13:00
31p-R-　/ I
	1	Mass Stopping Power Ratios for Absolute Measurement of Air Kerma with Ionization Chambers	AIST 1, SSL 2, BUET 3　*Takata Nobuhisa 1, Kurosawa Tadahiro 1, Sugita Takeshi 2, Begum Afia 3
	2	Development of a space dosimeter using the Micro Pixel Chamber 1	Waseda Univ. 1, Kyoto Univ. 2, KEK 3, JAXA 4　*Nagayoshi Tsutomu 1, Doke Tadayoshi 1, Terasawa Kazuhiro 1 4, Fujita Yasunobu 1, Ishida Koji 1, Miuchi Kentaro 2, Sasaki Shin-chi 3, Tawara Hiroko 3, Saito Kiwamu 3, Matsumoto Haruhisa 4, Komiyama Tatsuto 4
	3	Development of space dosimeter using the Micro Pixel Chamber 2	Waseda Univ. 1, Kyoto Univ. 2, KEK 3, JAXA 4 　*Fujita Yasunobu 1, Nagayoshi Tsutomu 1, Doke Tadayoshi 1, Terasawa Kazuhiro 1, Ishida Koji 1, Miuchi Kentaro 2, Saito Kiwamu 3, Sasaki Shin-ichi 3, Tawara Hiroko 3, Komiyama Tatsuto 4
	4	Development of a timing detector for high-energy x-rays	KEK 1, NIRS 2, Tohoku-u 3, Kyushu-u 4, CREST/JST 5　*Kishimoto Shunji 1,5, Zhang Xiaowei 1,5, Shibuya Kengo 2,5, Koshimizu Masanori 3,5, Haruki Rie 4,5
	5	Resistivity Estimation Method for the Interface of Bonded Si – for High Performance Photon Detectors	Kyoto Univ. 1, Raytech 2　*Kanno Ikuo 1, Yamashita Makoto 1, Nomiya Seiichiro 2, Onabe Hideaki 2
	6	Basic study on radiation detector with single-electron transistor (II)	Nagoya Univ. 1　Teruhisa Matsui 1, Jun Kawarabayashi 1, Kenichi Watanabe 1, Tetsuo Iguchi 1
	7	Development of the Transition Edge Sensor with Ir/Au/Ir tri-layer	Tokyo Univ. 1, AIST 2　*Mori Fumiakira 1, Zen Nobuyuki 1, Danayanthi Thushara 1, Ohno Masataka 1, Takahashi Hiroyuki 1, Hukuda Daiji 2, Okubo Masataka 2
	8	InSb Crystal Growth of Low Carrier Concentration for Radiation Detector Development	JAEA 1, Graduate School of Engineering, Kyoto Univ. 2, Research Reactor Inst., Kyoto Univ. 3　Hishiki Shigeomi 1, Kogetsu Yoshitaka 2, Kanno Ikuo 2, Yamana Hajimu 3
	9	Improvement of performance of thallium bromide (TlBr) detectors by the zone refining method	Tohoku Institute of Technology　*Onodera Toshiyuki 1, Hitomi Keitaro 1, Shoji Tadayoshi 1
		Break 15:15〜15:30
	10	A quantitative analysis of deep acceptor level in CdTe single crystal	Ryukyu Univ. 1, Acrorad 2　*Toyama Hiroyuki 1, Owan Ikumi 1, Yamanoha Satoru 1, Higa Akira 1, Yamazato Masaaki 1, Ohno Ryoichi 2, Toguchi Minoru 1
△	11	Formation of Schottky contact on H2 plasma treated CdTe(111) surfaces (II)	Ryukyu Univ. 1, Acrorad 2　*Owan Ikumi 1, Toyama Hiroyuki 1, Yamanoha Satoru 1, Yamazato Masaaki 1, Higa Akira 1, Ohno Ryoichi 2, Toguchi Minoru 1
	12	Characterization of sensitive layer in CdTe detector for high-energy X-ray	Res. Inst. of Electronics, Shizuoka Univ.　Takuya Nakashima 1, Masashi Okazaki 1, Hisashi Morii 1, Toru Aoki
	13	X-ray pseudo-monochromatic detection and its quantitative measurement using energy discriminating CdTe radiation detector	HAMAMATSU PHOTONICS K.K. 1,Sizuoka Univ. 2,Aich University of Technology 3　*Shinjiro MATSUI 1,Yuji SHIRAYANAGI 1,Yasuhiro TOMITA 1,Toru AOKI 2,Yoshinori HATANAKA 3
	14	Photon counting type CdTe 2D X-ray Imager	RIE 1, Eng 2, Shizuoka Univ., Hamamatsu Photonics 3, Aichi Univ. of Tech. 4　*Toru Aoki 1, Hisashi Morii 1, Takuya Nakashima 1,Gosuke Ohashi 2, Yasuhiro Tomita 3, Yoshinori Hatanaka 4
	15	X-ray CT by Photon counting type CdTe line-scanner	RIE 1, Eng. 2, Shizuoka Univ., Hamamatsu Photonics 3　Hisashi Morii1, Yoshiyasu Makino 1,Yu Ishida 1, Gosuke Ohashi 2, Yasuhiro Tomita 3, *Toru Aoki 1
	16	Abatement of pile-up phenomenon by metal filter	RIE Shizuoka Univ. 1　*Makino Yoshiyasu 1,Morii Hisashi 1,Aoki Toru 1
	17	Extension of area of CdTe pixel radiation detectors for imaging applications	RIE.Shizuoka Univ 1,Aichi University of Technology 2　Furuhashi Daiji 1,Morii Hisashi 1,Aoki Toru 1,Hatanaka Yoshinori2
	18	Growth of Cd1-xZnxTe（x〜0.5）films for flat panel X-ray sensor	Ishinomaki Senshu Univ.1,Tohoku Inst. Tech.2　Takahashi Junichi 1,Izumiyama Atsushi 1, Hitomi Keitarou 2, Syouji Tadayoshi 2, * Mochizuki Katsumi
1.1 Radiation·Accelerator·Nuclear Reactor
September 1 (Fri.) 9:00〜15:00
1a-R-　/ I
	1	A simple ion beam profile monitor by use of fluorescent powder in tungsten meshes	Osaka Univ. 1　*Kada Wataru, Kishi Atsuya, Sato Fuminobu, Kato Yushi, Iida Toshiyuki
	2	Estimation of Photocathode Uniformity	KEK 1, Saitama Prefectural Univ. 2　*Kiwamu Saito 1, Sasaki Shinichi 1, Tawara Hiroko 1, Sanami Toshiya 1, Shibamura Eido 2
	3	Photon Yield in Inorganic Scintillators	Saitama　Pref.Univ. 1, KEK 2, Adv. Res. Inst. for Sci. and Eng. Waseda　Univ. 3　Shibamura Eido 1, Sasaki Shinichi 2, Tawara Hiroko 2, Saito Kiwamu 2, Miyajima Mituhiro 3
	4	Scintillation in Xenon doped with Hydrogen, Methane, and Carbon fluoride	Advanced Research Inst. for Science and Engineering, Waseda Univ. 1, Moscow Engineering Physics Institute (State Univ.) 2, Saitama Prefectural Univ. 3　Chikara Tezuka 1, Nobuyuki Hasebe 1, Tadayoshi Doke 1, Mitsuhiro Miyajima 1, Takashi Miyachi 1, Shingo Kobayashi 1, Mitsuteru Mimura 1, Kirill Pushkin 2, Eido Shibamura 3
	5	A measurement of emission spectrum of liquid xenon	Yokohama Nat'l Univ. 1, KEK 2, Tokyo Univ. ICRR 3　*NAKAMURA Shogo 1, OZAKI Yuichi 1, SAITO Kiwamu 2, SASAKI Shinichi 2, TAWARA Hiroko 2, NAGASE Tatsuhiro 1, NAKAHATA Masayuki 3, HAGIWARA Hiroki 1, HARUYAMA Tomiyoshi 2
		Break 10:15〜10:30
	6	Development of a novel Scintillator using Semiconductor Quantum Dot	Tohoku Univ. 1,NIRS 2,Univ. of Tokyo 3　*Shotaro Watanabe 1,Masanori Koshimizu 1,Keisuke Asai 1,Kengo Shibuya 2,Yusa Muroya 3
	7	Observation of scintillation light by an avalanche photo diode at the temperature of 150 mK	Kyushu Univ. 1　*Keisuke Maehata 1, Keisuke Fukmoto 1, Nobuyasu Takayama 1, Takashi Yasumune 1, Kenji Ishibashi 1
	8	Scintillation properties of organic-inorganic perovskite compounds	Tohoku Univ. 1,NIRS 2,Univ. of Tokyo 3　*Takahashi Naoki 1,Koshimizu Masanori 1,Asai Keisuke 1,Shibuya Kengo 2,Muroya Yusa 3
	9	Development of a novel neutron scintillator by sol-gel method	Tohoku Univ. 1,NIRS 2,Univ. of Tokyo 3　*Kitajima Hiroyuki 1,Koshimizu Masanori 1,Asai Keisuke 1,Kengo Shibuya 2,Muroya Yusa 3
	10	Characterization of Gamma Camera Using BGO Scintillator Stacks	Nagoya Univ. 1　*Mihoya Shinji 1,Watanabe Kenichi 1,Kawarabayashi Jun 1,Iguchi Tetsuo 1
	11	Directional Gamma Ray Detector with Triple Scintillators	National Inst. of Radiological Sciences 1, ALOKA 2　*Shirakawa Yoshiyuki 1, Yamano Toshiya 2, Kobayashi Yusuke 2, Hara Masaki 2
		Lunch 12:00〜13:00
1p-R-　/ I
	1	Photostimulated Emission Characteristics of Alkali Halide after Heavy Ion Irradiation	Tohoku Univ. 1, Univ. of Tokyo 2　Yoshimi Takemoto 1, Masanori Koshimizu 1, Keisuke Asai 1, Takeo Iwai 2
	2	Optical study on CaF2 crystals doped with rare earth impurity oriented to imaging plate	Kanazawa Univ. 1,Osaka Sangyo Univ. 2　Obayashi Yoshihiro 1,Kurashima Masayuki 1,Nakamura Shoichi 1,*Kurobori Toshio 1,Fukuda Yasunori 2
	3	Micro-fabrication of a LiF single crystal by an femtosecond laser and its broad-band oscillation	Kanazawa Univ.,Hamamatsu hotonikusu　Takikawa Akio 1,*Kurobori Toshio 1,Sakai Toshiaki 2,Aoshima Shin-ichiro 2
	4	Laser-Peening Processing to Fine Grain Rolling Steels by femto-, nano-second Laser Pulses	Kanazawa Univ.　Tashiro Masayuki ,Kurashima Masayki ,Gotoh Masahide ,Kurobori Toshio , Hirose Yukio ,
	5	Elucidation of annealing treatment in the preparation process on TL phosphor CaSO4:Tm	Rikkyo(St.paul's) Univ 1. Juntendo Univ. 2　*Kiyomitsu Shinsho 1, Eiji Watanabe 2, Akio Urushiyama 1
	6	The characteristics of thermoluminescence in CaF2:Tb,Tm	Osaka Sagyo Univ.1　○ Fukuda Yasunori
	7	Thermoluminescence of semiconductor-doped glass exposed to radiation from monazite	Yamaguchi Univ. 1,Ube National College of Technology. 2　*Ushigusa Keita 1,Taketugu Shinohara 1,Miyoshi Tadaki 1,Kaneda Teruhisa 2
	8	Electron spin resonance and thermoluminescence of semiconductor-doped glass	Yamaguchi Univ. 1, Ube National College of Technology 2　*Miyoshi Tadaki 1, Migita Kouto1, Kaneda Teruhisa 2
1.2 Plasma Sources and Production Technologies
August 29 (Tue.) 9:45〜17:15
29a-Y-　/ I
△	1	Characteristics of Plasmas Production Using Module-Unit Type Squared Microwave Launcher	Shizuoka Univ. 1, Nissin Inc. 2　*Ninomiya Keigo 1, Ogino Akihisa 1, Nanko Shohei 2, Nagatsu Masaaki 1
▲△	2	Long plasma generation employing long wavelength in the evanescent region	Tokyo Univ. 1,ADTEC Plasma 2　*Shanmgavelayutham Gurusamy 1 2,Takayuki Fukasawa 1 2,Ryouhei Itatani 2,Hiroshi Kajiyama 1,Shinoda Tsutae 1
	3	Effect of Applied Magnetic Field on Compact Cylindrical Surface Wave Plasma	Grad. School of Sci. and Eng. Shizuoka Univ. 1, Grad. School of Electronic Sci. and Technol. Shizuoka Univ. 2, Research Inst. of Electronic Eng. Shizuoka Univ. 3　Sahara Tsuguhiro 1, Husarik Jan 2, Eto Akihiro 1, Kando Masashi 1, Momose Yoshimi 3
△	4	The Effect of a Multi-Hole Structured Dielectric Window on Surface Wave Plasma Production	Nagoya Univ. 1　*Nakao Sachiko 1, Stamate Eugen 1, Sugai Hideo 1
▲	5	Measurement of high energy electrons in the surface wave microwave plasma using the retarding field energy analyzer	Innovative Joint Research Center Shizuoka Univ. 1, Grad. School of Electronic Sci. and Technol. Shizuoka Univ. 2　Siry Milan 1, Husarik Jan 2, Kando Masashi 2
		Break 11:00〜11:15
▲	6	Optical Emission Diagnostics of Line-Shaped Microwave Helium Plasma	Tokai Univ. 1, ADTEC Co. LTD. 2,　E. Abdel Fattah, S. Fujii, H. Shindo
△	7	2D Numerical Analysis of Microwave Excited Plasma Source for Microthrusters	Kyoto Univ. 1　*Takahashi Takeshi 1, Takao Yoshinori 1, Ono Kouichi 1, Eriguchi Koji 1
	8	Theory of Surface Waves in ECR Plasmas	Univ. Tsukuba 1, Kobe Univ. 2, Kyushu Univ. 3　*Hojo Hitoshi 1, Yasaka Yasuyoshi 2, Mase Atsushi 3
▲	9	The effect of the quartz wall of the discharge chamber on the surface wave propagation	Graduate School of Electronic Sci. and Technol. Shizuoka Univ. 1, Innovative Joint Research Center Shizuoka Univ. 2　Husarik Jan 1, Siry Milan 2, Kando Masashi 1
	10	Ion beam extraction from an 11-13GHz ECR ion source with cylindrically comb-shaped magnetic-field configuration.	Osaka Univ. 1, Tateyama Machine Co. 2　*Asaji Toyohisa 1,2, Satani Takashi 1, Kato Yushi 1, Sato Fuminobu 1, Iida Toshiyuki 1
		Lunch 12:30〜13:30
29p-Y-　/ I
△	1	Correlations between Antenna Structures and Plasma Distributions in Inductively Coupled Plasmas Driven by Internal Antenna	JWRI Osaka Univ. 1,EMD Corp. 2　*Sera Takashi 1,Takenaka Kosuke 1,Setsuhara Yuichi 1,Ebe Akinori 2
	2	Frequency Dependence of Inductively Coupled Plasma with Multi-Mode Antenna	Tokai University1, ULVAC Inc.2　Kitamura Yuuichi1, Kusaba Kouta1, Jinbo Yousuke2, Asari Shin2, Kikuchi Masashi2, Shindo Haruo1
	3	Negative Ion Plasma Production by Employing High Permittivity Ceramic Discharge Tube	Tokai Univ. 12,KYOCERA Co. 3,NIHON KOSYUHA Co. 4　*Masafumi Suzuki 1,Kusaba Kota 24,Tanaka Seichi 3,Sinohara Kibatu 4,Sindo Haruo 12
	4	Two-dimensional fluid model simulation of inductively coupled plasma	Kyoto Univ. 1　Koki Kise 1, Kouichi Ono 1, Koji Eriguchi 1
	5	Miniature Inductively Coupled Plasma Source for Ion Thrusters of Micro Spacecraft	Kyoto Univ. 1　*Kato Takaya 1, Ono Kouichi 1, Eriguchi Koji 1
	6	Development of a JxB arc-jet propeller for the space-transport-ships	Dept. Physics, Shizuoka Univ. 1　*Tetsu Mieno 1
	7	Sheath 2D-Electric Field Calculation in Monte Carlo Method by the Forward Movement of Charged Particle Swarm	Hokkaido Inst. of Tech. 1　*Miyazaki Yohei 1,Kitamori Kazutaka 1
		Break 15:15〜15:30
	8	Probe Characteristics of Shunting Arc Discharge Plasma with the Low Gas Pressure	Saga Univ. 1,Doshisha Univ. 2 　*Tatsuya Misawa 1,Katsuhiro Mori 1,Youei Matsumoto 1,Yasunori Ohtsu 1,Hiroharu Fujita 1,Ken Yukimura 2
△	9	Optimization of Power-Source Parameters and Electrode Shape in Gliding Arc	Toyohashi Univ. Technol. 1, Sumitomo Osaka Cement Co., Ltd. 2, Sintobrator Ltd. 3, Daiken Chemical Co., Ltd. 4, Kurita Seisakusho Co., Ltd. 5, Gifu Nat. Coll. Technol. 6 　*Motoki Junpei 1, Shiki Hajime 1, Ito Yukikazu 1, Takikawa Hirofumi 1, Ootsuka Takeshi 2, Usuki Eiji 3, Okawa Takashi 4, Yamanaka Shigenobu 4, Nishimura Yoshimi 5, Hishida Shigeji 5, Sakakibara Tateki 6
△	10	Analysis of Droplets Generated in Vacuum Arc Deposition for DLC Film Preparation	Toyohashi Univ. Technol. 1,Onward Ceramic Coating Co., LTD. 2 　*Tanoue Hideto 1, Hikosaka Hiroki 1, Takikawa Hirofumi 1, Hasegawa Hiroshi 2, Taki Makoto 2
△	11	High speed Radical process (I) -Development of the high speed radical source-	Nagoya Univ. 1,NU-EcoEngineering 2 ,Katagiri engineering 3　*Yasuhiro Hara 1,Seigo Takashima 1,Kouji Yamakawa 2,Shouji Den 2,Hiroyuki Kano 3,Masaru Hori 1,Hideo Sugai 1
	12	Deposition of a-C:H Films by ICP Sustained with Multiple Low-Inductance Antenna Units	Osaka Univ. 1,EMD Corp. 2　*Takenaka Kosuke 1,Setsuhara Yuichi 1,Ebe Akinori 2,Nishisaka Kazuaki 2
	13	Iron evaporator by induction heating for ECR multicharged ion source II	Osaka Univ. 1, Tateyama Machine Co.,Ltd 2　*Kubo Takashi 1, Asaji Toyohisa 1,2, Sato Fuminobu 1, Kato Yushi 1, Iida Toshiyuki 1
	14	Experimental evidence showing gas-phase production of metal atoms in magnetron sputtering plasmas	Nagoya Univ. 1,Suzuka National College of Technology 2　*Sasaki Koichi 1,Nafarizal Nayan 1,Gao Junsi 1,Shibagaki Kanji 2,Toyoda Hirotaka 1,Iwata Satoshi 1,Kato Takeshi 1,Tsunashima Shigeru 1,Sugai Hideo 1
1.2 Plasma Sources and Production Technologies
September 1 (Fri.) 9:00〜15:00
1a-S-　/ I
	1	Characterization of atmospheric pressure microplasma by Optical Emission Spectroscopy	Dept. of Mech. & cont. Engineering, Tokyo Inst. of Tech. 1, Dept. of Mech. & cont. Engineering, Tokyo Inst. of Tech. 2 　*Ogino Tomohisa 1, Sasaki Kenji 1, Asahi Daisuke 1, Nozaki Tomohiro 2, Okazaki Ken 2
	2	Measurements of Ar metastable atom density for microgap Ar discharge	Nagoya Univ. 1　*Shibata Tomoyuki 1,Aramaki Mitsutoshi 1,Kono Akihiro 1
△	3	Measurement of UV during Atmospheric-pressure Plasma Irradiations using On-wafer-monitoring Sensor	Tohoku Univ. 1, Sekisui Chemical 2　Ueno Akira 1, Yara Takuya 2, Samukawa Seiji 1
△	4	Production of Long-scale Microwave Discharge Plasma at Atmospheric Pressure	Nagoya Univ. 1　*Kouyama Yoshiaki 1, Ishijima Tatsuo 1, Sugai Hideo 1
	5	Decrease in Breakdown Power of the Antenna-excited Atmospheric Microwave Discharge	Grad. School of Sci and Eng. Shizuoka Univ. 1, Research Inst. of Electronic Eng. Shizuoka Univ. 2　Matsuda Itsuki 1, Eto Akihiro 1, Kando Masashi 1, Momose Yoshimi 2
△	6	Microwave Plasma Production in a Liquid-Gas Mixture Phase	Nagoya Univ. 1, Honda Electronics Co.,Ltd, 2　　*Hirotaka Hotta 1, Tatsuo Ishijima 1, Hideo Sugai 1, Masanori Sato 2
		Break 10:45〜11:00
△	7	Optimization of Water Addition in Moisture-Plasma Jet under Atmospheric Pressure for Surface Treatment	Toyohashi Univ. Technol.1, Kurita Seisakusho Co., Ltd.2, Daiken Chemical Co., LTD.3, Sintobrator Ltd.4, Sumitomo Osaka Cement Co., Ltd.5, Gifu Nat. Coll. Technol.6　Y. Ito1, H. Shiki1, J. Motoki1, H. Takikawa1, Y. Nishimura2, S. Hishida2, T. Okawa3, S. Yamanaka3, E. Usuki4, T. Ootsuka5, T. Sakakibara6
▲	8	Atmospheric glow discharge using the electrolyte anode and cathode	Saitama Univ. 1 ,Horiba Co. Ltd 2　*Qiang Chen 1, Kenji Saito 2,Yasusi Yamano 3,Asuka Terai 4,Kouji Haruta 5, Hajime Shirai 6
	9	Atmospheric glow discharge using the electrolyte anode and cathode(2)	Saitama Univ 1,Horiba Co.Ltd 2　Kenji Saito 1, Qiang Chen 2, Yasushi Yamanou 3, Asuka Terai 4, Kouji Haruta 5, Hajime Shirai 6
△	10	Electric Characteristics of Micro Plasma with Gas Phase-Liquid Phase Interface	Tohoku Univ. 1　*Baba Kazuhiko 1, Kaneko Toshiro 1, Hatakeyama Rikizo 1
	11	Generation and properties of atmospheric-pressure plasmas in contact with liquids	Center for Atomic and Molecular Technologies,Graduate School of Engineering, Osaka Univ. 　+Kitano Katsuhisa 1, Aoki Hironori 1, Hamaguchi Satoshi 1
		Lunch 12:00〜13:00
1p-S-　/ I
	1	Heat transfer analysis of the electrode for DC atomospheric discharge	Osaka Pref. Univ. 1　*Matsuura Hiroto 1, Sasada Yo 1, Matsumura Yasuhiro 1
	2	Application of Gnu-type Plasma Source for the Atmospheric Pressure Non-equilibrium Plasma	Osaka Pref. Univ.1,Sekisui Chemical Co.2　*Nakae Mari 1,Yoshimura Takeshi 1,Uehara Tuyoshi 2,Kunugi Shunsuke 2,Fujimura Norifumi 1
△	3	Application of atmospheric nanopulse plasma to thin film coating	NGK Insulator, LTD.1, Nagoya University2　*Takao Saito1,Yoshimasa Kondo1, Tatuya Terazawa1, Naoto Ohtake2
	4	Frequency dependency of RF impulse microdischarge and MgO film deposition in small glass tube	Grad. School of eng, Tohoku Univ. 1　*Muraoka Takumasa 1,Iizuka Satoru 1
	5	Homogeneity of Atomospheric Air Discharge with Electrodes in Microgap	Univ. of Yamanashi , Grafuate School 　*Shinsuke Yamasaki,Keisuke Yamamoto,Takeki Sakurai
△	6	Characteristics of Meter-sized Line-shaped Dielectric Barrier Discharge Plasma	Shizuoka Univ.　*Ono Yoshihito, Eto Hiroyuki, Ogino Akihisa, Nagatsu Masaaki
	7	Effect of gas flow in integrated coaxial micro dielectric barrier discharges at atmospheric pressure	Kyoto Univ. 1　*Yosuke Ito 1,Osamu Sakai 1,Kunihide Tachibana 1
△	8	Atmospheric pressure discharge with planar micro-hollow cathode array	Shizuoka Univ.　*Watanabe Jun, Ogino Akihisa, Nagatsu Masaaki
1.3 Diagnostics of Reactive Plasmas
August 30 (Wed.) 9:30〜18:00
30a-Q-　/ I
	1	Effect of Oxygen Addition on Characteristics of RF He/CF4 Discharges at Atmospheric Pressure	Nagoya Inst. of Technol. 1　*Kimura Takashi 1,Hanai Takamasa 1
△	2	Optical Emission Spectroscopy Mesurement of Atmospheric Pressure Microwave Discharge Non-Equilibrium Plasmas	Tokyo Inst. of Tech 1, Hiroshima cmt. 2, ADTEC Plasma Technology 3, Tokyo Inst. of Tech 4　*Yuji Toshifumi 1,2 Kazunari Fujioka 3, Takuya Urayama 3, Raju Ramasamy 3, Shuitsu Fujii 3, Hiroshi Akatsuka 4,1
	3	OES Measurement of Microwave Ar Discharge of Atmospheric Pressure and Estimation of Electron Temperature by CR Model	Tokyo Tech. 1, Hiroshima Nat. Col. Maritime Tech. 2, ADTEC Plasma Tech. 3　Akatsuka Hiroshi 1, Yuji Toshifumi 1,2, Fujioka Kazunari 3, Ramasamy Raju 3, Fujii Shuitsu 3
	4	Rotational and vibrational temperature measurement of gas molecules in the atmospheric pressure plasma by the spatial resolution emission spectroscopy	Graduate School of Engineering,Osaka Univ. 1,Research Center for Ultra-Precision Science and technology,Graduate School of Engineering,Osaka Univ. 2　*Ueno Koji 1,Oshikane Yasushi 1,Sano Yasuhisa 1,Yamamura Kazuya 2
	5	Spectroscopic Analysis of Spatio-temporal Structure in Open Air Capacitive Plasma at 13.56 MHz for CVM Process	Osaka Univ. 1, Univ. of Bristol 2, Nagoya Inst. of Technol. 3, Univ. of Tokyo 4　*Oshikane Yasushi 1, Ueno Koji 1, Yamamura Kazuya 1, Kakiuchi Hiroaki 1, Western Colin 2, Oda Akinori 3, Kado Shinichiro 4, Yasutake Kiyoshi, Endo Katsuyoshi 1
△	6	Large Area Cleaning Process and Gas Phase Diagnostics by Using Non-equilibrium Atmospheric Pressure-Pulsed Plasma	Nagoya Univ. 1, Wakayama Univ. 2, SEKISUI CHEMICAL CO.,Ltd. 3　*Iwasaki Masahiro 1, Ito Masafumi 2, Yara Takuya 3, Uehara Tsuyoshi 3,Hori Masaru 1
		Break 11:00〜11:15
△	7	Development of a collective Thomson scattering system for EUV light source plasmas	Kyushu Univ. 1, Kumamoto Univ. 2　*Kentaro Tomita 1, Syunji Araki 1, Takao Yamada 1, Kiichiro Uchino 1, Hideki Imamura 2, Sunao Katsuki 2, Hidenori Akiyama 2
▲△	8	Determination of the Loss of Ba Atoms from the Electrodes of the Fluorescent Lamp Operated with DC Discharge	Kyusyu Univ. 1,MEI Lighting Company 2　Ahmed Samir 1,Go Yamashita 1,Yuichi Egashira 1,Yukihiko Yamagata 1,Kiichiro Uchino 1,Yoshio Manabe 2,Takashi Ueda 2
	9	Temporal and spatial distributions of Ti and Ti+ densities in pulsed rf sputtering plasmas	Nagoya Univ. 1, Chubu Univ. 2, Canon ANELVA Corp. 3　*N. Nafarizal 1, N. Takada 1, K. Nakamura 2, Y. Sago 3, K. Sasaki 1
▲	10	Comparison between Cu atom densities at the metastable and ground states in magnetron sputtering plasmas	Nagoya Univ. 1　*Gao Junsi 1, Nafarizal Nayan 1, Sasaki Koichi 1, Toyoda Hirotaka 1,Iwata Satoshi 1, Kato Takeshi 1, Tsunashima Shigeru 1, Hideo Sugai 1
△	11	Laser diagnostics of Si oxidation process using Ar/O2 surface wave plasma in production level operation	Nagoya Univ. 1, Tokyo Electron AT LTD. 2　Takeda Keigo 1,Takashima Seigo 1,Hori Masaru 1,Shiozawa Toshihiko 2,Kabe Yoshiro 2,Kitagawa Junichi 2,Nakanishi Toshio 2
		Lunch 12:30〜13:30
30p-Q-　/ I
	1	Evaluation of Atomic Hydrogen Density in Hydrocarbon Inductively Coupled plasmas by Optical Actinometry	Fac. of Eng. 1, School of Sci. & Technol. 2, Nagasaki Univ.　*Yoshinobu Matsuda 1, Masanori Shinohara 1, Hiroshi Fujiyama 2
	2	Time-resolved measurement of E-H transition in Ar-ICP by using ICCD camera(II)	Keio Univ. 1　*Satoshi Hirao 1, Yong Zhang 1, Toshiaki Makabe 1
	3	Diagnostics for a 2f-CCP by using space- and time-resolved optical emission CT[IV] -Temporal profile of low energy electron during a cycle of LF-bias voltage-	Keio Univ. 1　*Ishimaru Mikio 1, Ohmori Takeshi 1, Makabe Toshiaki 1
△	4	A method based on absorption spectroscopy for estimating electron temperature and electron density in a plasma	Nagoya Univ.　Asaoka Ryota 1,Sasaki Koichi 1
△	5	Investigation of Dielectric Effect on Resonance Frequency of Frequency Shift Probe	Nagoya Univ. 1, Chubu Univ. 2　*Kim Hoonhee 1, Keiji Nakamura 2, Hideo Sugai 1
	6	Electron Temperature of Plasma Polymerization System Measured by Surface Wave Probe Technique	MIRAI-ASET 1, Chubu Univ. 2, MIRAI-ASRC AIST 3, Nagoya Univ. 4, RCNS Hiroshima Univ. 5　Kinoshita Keizo 1, Nakamura Keiji 2, Hirano Osamu 2, Hyodo Yasuyoshi 1, Kiso Osamu 3, Kawahara Jun 1, Sugai Hideo 4, Kikkawa Takamaro 3,5
	7	Influence of reactive gases on surface wave probes for measurements of electron density and electron temperature	Chubu Univ. 1,Nagoya Univ. 2,Selete 3　*Hirano Osamu 1,Nakamura Keiji 1,Sugai Hideo 2,Kinoshita keizo 3
	8	Emissive Probe Measurements of Radio Frequency Plasmas	Tokai University1　Kusaba Kouta1,Shindo　Haruo1
		Break 15:30〜15:45
	9	Probe Diagnostics in SiH4-CH4 Glow Discharge Plasmas	Tokyo Denki Univ.　Suzuki Shunsuke 1,Motohashi Mituya 1,Homma Kazuaki 1
	10	Electron Energy Distribution Functions in a Low Pressure Inductively Coupled CH4/H2 Plasma	NIMS 1　*Katsuyuki Okada 1, Shojiro Komatsu 1, Seiichiro Matsumoto 1
	11	Measurement of hydrogen radicals with appearance mass spectrometry	Chubu Univ. 1　*Matsunami Hiroaki 1, Nakanura Keiji 1
△	12	Appearance mass spectrometry of N radical flux from a compact radical source for GaN growth	Nagoya Univ. 1　*Kanai Hidekazu 1,Ishijima Tatsuo 1,Toyoda Hirotaka 1,Sugai Hideo 1,Osaka Jiro 1
	13	Estimation of N radical density in a nitrogen radical source for GaN growth by optical emission spectroscopy –comparison with appearance mass spectrometry–	Nagoya Univ. 1,Universite Joseph Fourier de Grenoble 2　*Sasaki Koichi 1,Osaka Jiro 1,Kanai Hidekazu 1,Ishijima Tatsuo 1,Toyoda Hirotaka 1,Sugai Hideo 1,Nader Sadeghi 2
	14	Gas analysis in plasmas with partial pressure measurement	AIST, RIIF　*Suzuki Atsushi, Kurokawa Akira, Nonaka Hidehiko
△	15	Spatially resolved in-situ measurements of size and density of SiOCH nano-particles generated in gas phase	Kyushu Univ. 1,AIST 2,ASM Japan 3 　*Iwashita Shinya 1,Koga Kazunori 1,Nunomura Shota 2, Shiratani Masaharu 1, Watanabe Yukio 1,Morisada Yoshinori 3,Matsuki Nobuo 3,Ikeda Shingo 3
	16	Size and composition of dust collected in LHD V	Kyushu Univ. 1, NIFS 2　*Kiridoshi Satoru 1, Iwashita Shinya 1, Koga Kazunori 1, Shiratani Masaharu 1, Ashikawa Naoko 2, Nishimura Kiyohiko 2, Sagara Akio 2, Komori Akio 2, LHD Experimental Group 2
	17	Carbon-atom temperature in the arc dischrage for carbon-cluster production	Fac. Sci. Shizuoka Univ. 1, Fac. Eng. Shizuoka Univ. 2　Daizou Katou 1, Hironobu Masto 2, *Tetsu Mieno 1
1.4 Plasma-Based Material Processing
August 29 (Tue.) 9:00〜16:30
29a-Q-　/ I
△	1	Disinfection treatment of E.coli and Staphylococcus aureus using plasma in water	Dept.of Eng.,Nagoya Univ. 1,EcoTopia Science Inst,Nagoya Unive 2　* Tomoyuki Takeda 1,P.Baroch 2,Nagahiro Saito 1,Yasushi Inoue 2,Osamu Takai 2
△	2	Spherization for Grinded Toner Particle using Atmospheric Meso-Plasma	Toyohashi Univ. Technol. 1, Daiken Chemical Co., Ltd. 2, Kurita Seisakusho Co., Ltd. 3, Gifu Nat. Coll. Technol. 4　Shiki Hajime 1, Motoki Junpei 1, Takikawa Hirofumi 1, Nishi Tsuyoshi 2, Ookawa Takashi 2, Yamanaka Shigenobu 2, Nishimura Yoshimi 3, Hishida Shigeji 3, Sakakibara Tateki 4
	3	Localized removal of an insulator film coated on a copper wire by an atmospheric-pressure microplasma jet	Tsuruoka Natl. Coll. of Tech.　*Yoshiki Hiroyuki 1, Hoshikawa Yosuke 1
△	4	Transparent Films Formation for Gas Barrier with Metal Ion Sources	Chubu Univ. 1,　*Nishido Yuki 1,Nakamura keiji 1
△	5	Modification of Nano-particles Using High Pressure Inductively-Coupled Plasma(II)	JWRI,Osaka Univ. 1　*Nakayama Hiroaki, Takenaka Kosuke, Setsuhara Yuichi, Abe Hiroya, Nogi Kiyoshi
		Break 10:15〜10:30
▲△	6	Immobilization of Amino Group on Polyurethane using N2 + H2 Surface-wave Excited Plasma	Shizuoka Univ.　*Kral Martin, Ogino Akihisa, Narushima Kazuo, Yamashita Mitsuji, Nagatsu Masaaki
	7	Analysis of PDMS surface hydrophilicized using scanning micro radical jet	The Univ. of Tokyo 1, CNBI, The Univ. of Tokyo 2　*Hirata Satoshi 1, Tan Helen 1, Ichiki Takanori 1,2
	8	Analysis of GaN Etching Damage due to Capacitively Coupled RF Argon Plasma Exposure	Tokushima Univ.　*Kawakami Retsuo, Inaoka Takeshi
△	9	Inner Wall Coating of Narrow Tubes by Scanning 2nd Harmonic ECR Micro Plasmas	Nagasaki Univ. 1,Toyo Advanced Technologies Co. Ltd. 2　*Yuki Nitta 1,Tastuyuki Nakatani 1,2,Keisi Okamoto 2,Masanori Shinohara 1 Hiroshi Fujiyama 1
	10	Fabrication of molybdenum oxide thin film using a scanning atmospheric-pressure microplasma deposition system	Nanoarchitectonics Rec Ctr, AIST. 1, Univ Tokyo. 2　*Shimizu Yoshiki 1, Davide Mariotti 1, Kirihara Kazuhiro 1, Chandra Bose. Arumugamu 1, Sasaki Takeshi 1, Terashima Kazuo 1, Koshizaki Naoto 1
	11	Development of Microplasma devices employing photolithography technology	University of Tokyo　Ken Ogata
		Lunch 12:00〜13:00
29p-Q-　/ I
△	1	Modeling of Two Frequency Capacitively Coupled Plasma in 6/O2 for MEMS processing (II)	Keio Univ. 1　*Fukutaro Hamaoka 1, Takashi Yagisawa 1, Toshiaki Makabe 1
△	2	Simulation of microwave plasma for synthesis of single crystal diamond	AIST1　*Hideaki Yamada1, Akiyoshi Chayahara1, Yoshiaki Mokuno1, Shin-ichi Shikata1
△	3	DLC Thin Films Coating to Metal Wire by Quadrupole Magnetron Plasmas	Nagasaki Univ. 1, TOYO ADVANCE TECH.,LTD 2, JAPAN FINE STEEL CO.,LTD 3　Shoji Koga 1,Tatsuyuki Nakatani 2,Keishi Okamoto 2,Yukinobu Tokunaga 3, Naohisa Iwamoto 3, Hiroshi Fujiyama 1
	4	Formation of Carbonized Films in Electron-Temperature Controlled Hollow-Type Magnetron RF Plasmas	Tohoku Univ. 1, Tohoku Inst.Tech. 2　*Emi Junichi 1, Abe Toshimi 2, Kato Kohgi 1, Iizuka Satoru 1
△	5	Low Temperature Formation of Silicon Nitride Films Using VHF SiH4/NH3 Plasma	Nagoya Univ. 1, YOUTEC 2　*Matsubara Takeaki 1, Li Minglong 1, Imaeda Hiroyuki 1, Takeda Keigo 1, Masumoto Yusuke 1, Mori Tatsuo 1, Tada Shigekazu 2, Hayakawa Haruhito 2, Hori Masaru 1
△	6	Deposition of Poly-Si Thin Films on polymer Substrates Using Pulsed-Plasma CVD under Near-Atmospheric Pressure	CIR Tohoku Univ. 1,Sekisui Chemical Co.,Ltd. 2,AIST. 3　*Matsumoto Mitsutaka 1,Suemitsu Maki 1,Yara Takuya 2,Nakajima Setsuo 2, Uehara Tsuyoshi 2,Toyoshima Yasutake 3
△	7	Measurement of Cu atom density in Cu film deposition by metal chloride reduction plasma CVD	Nagoya Univ. 1, MHI 2, PhyzChemix 3　*K. Furuta 1, N. Yahata 2, Y. Tomita 3, H. Sakamoto 2, K. Sasaki 1
		Break 14:45〜15:00
	8	Deposition of Al-doped ZnO Thin Films Using Inductively-Coupled Plasma Assisted Sputtering	Fac. of Eng. 1, School of Sci. & Technol. 2, Nagasaki Univ.　*Yoshinobu Matsuda 1, Shiro Iwai 2, Masanori Shinohara 1, Hiroshi Fujiyama 2
△	9	Control of Film Flatness by VHF-DC Magnetron Sputtering and Application to Magnetic Multilayer Film	Nagoya Univ.　Yusuke Takagi, Hirotaka Toyoda, Yusuke Suzuki, Takeshi Kato, Satoshi Iwata, Shigeru Tsunashima, Hideo, Sugai
	10	Plasma diagnostics of magnetized sputtering device (I)	Chubu Univ. 1　*Harata Ryo 1, Nakamura Keiji 1
	11	Effects of impurity gases in argon plasmas on the ionization of metallic atoms	Chubu Univ. 1　*Wakayama Akira 1, Nakamura Keji 1
	12	Dependence of deposition rate on Target-Substrate distance during sputter deposition processes	Seikei Univ.　Takeo Nakano, Shigeru Baba
▲△	13	Characterization of plasma immersion ion implantation with high-voltage high-current nanopulse	Nagoya Univ. 1, NGK 2　Nicolas Holtzer 1, Eugen Stamate 1, Hideo Sugai 1, Takao Saito 2
1.5 Nano-Technologies by Plasma Process
August 30 (Wed.)
30a-P-　/ I
		Short Presentation (5min.) 10:30〜11:55 30a-P-1〜15　Poster Session 15:30〜17:30
	1	Application and Diagnostics of Supercritical Fluid Non-equilibrium Plasma -Synthesis of Carbon Nanostructured Materials-	Univ. Tokyo 1, AIST 2　　*Tomai Takaaki 1, Kubo Hirotake 1, Shimizu Yoshiki 2, Sasaki Takeshi 2, Koshizaki Naoto 2, Terashima Kazuo 1
△	2	Growth rate control of carbon nanotube by CH4/H2 plasma-enhanced chemical vapor deposition	Hokkaido Univ. 1, Nagoya Inst. of Technol. 2, Univ. of Tsukuba 3　*Okita Atsushi 1, Suda Yoshiyuki 1, Ozeki Atsushi 1, Oda Akinori 2, Nakamura Junji 3, Sugawara Hirotake 1, Sakai Yosuke 1
△	3	Low Temperature Growth of Carbon Nanotubes with Ni-C Nanocapsules as Catalyst Using Surface-wave Plasma CVD	Shizuoka Univ.　*Tanaka Takayuki, Ogino Akihisa, Mesko Marcel, Nagatsu Masaaki
△	4	Growth of Carbon Nanotube on the Tip of Metalic Whisker Using Electric Field Biasing	Shizuoka Univ.　*Ishikawa Tomokazu, Matsuda Takahumi, Mesko Marcel, Ogino Akihisa, Nagatsu Masaaki
▲△	5	Effect of DC Discharge on Growth of Vertically Aligned CNTs using Thermal CVD Reactor	Shizuoka Univ.　*Mesko Marcel, Matsuda Takafumi, Tanaka Takayuki, Ogino Akihisa, Nagatsu Masaaki
△	6	Effect of electric field on growth of vertically aligned carbon nanotubes by thermal CVD method	Shizuoka Univ.　*Matsuda takafumi, Marcel Mesko, Ogino Akihsia, Nagatsu Masaaki
	7	Fabrication of Carbon Nanotubes on the tips of Silicon Micro Needles	Kochi University of Technology 1　Kanakusa Hiroaki 1,Nakazawa Kazuki 1, Yoshimura Hiroaki 1, Hatta Akimitu 1
	8	Syntheses of multi-wall carbon nanotubes and particles by arc in liquid alcohols and hydrocarbons	Univ. Hyogo 1, Chulalongkorn Univ. 2, NSTDA(Thailand) 3　*N.Sano 1,T.Charinpanitkul 2 ,T.Muthakarn 2 ,W Tanthapanichakoon 3
△	9	Structural control of single-wall carbon nanotube by arc-in-liquid method in microgravity	Univ. Hyogo 1, Kyoto Inst. Tech. 2 　Osamu Kawanami 1, Noriaki Sano 1, Taizou Miyamoto 1, Atsushi Mineshige 1, Toshiya Murakami 2, Hiroshi Harima 2
	10	A Novel Experiment of Carbon-nano-materials in liquid 4He	Sasebo Natl. College Tech.　Kenichirou Watanabe 1, Takurou Nishimoto 1, Ryuji Taketomi 1, Hiroharu Kawasaki 1, Toshinobu Shigematsu 1, Tamiko Ohshima 1, Yoshiaki Suda 1
▲△	11	Fabrication of Nano-sized Graphene Layer Encapsulated Ni Particles Using Pulsed Laser Ablation	Shizuoka Univ.　*Ou Qiongrong, Tanaka Takayuki, Ogino Akihisa, Nagatsu Masaaki
▲△	12	Microscale Discharge Using a Carbon Nanotube-based Field Emission Cathode	Kochi Univ. of Tech. 1　*Zou Qin 1, Hatta Akimitsu 1
△	13	Synthesis of Gold Nano Particles using Plasma Discharge in Liquid and Understanding of Mechanism.	Dept. of Eng., Nagoya Univ. 1, EcoTopia Science Inst. , Nagoya Univ. 2 , Dept. of Chem., Tokyo Univ. 3　Masatomo Oda 1, P. Baroch 2, Nagahiro Saito 1, Yasushi Inoue 2, Tetsu Yonezawa 3, Osamu Takai 2
△	14	Synthesis of nc-Si in microplasma reactor -Effect of quench gas injection on particle properties-	Tokyo Inst. of Tech.　*Sasaki Kenji 1, Ogino Tomohisa 1, Asahi Daisuke 1, Nozaki Tomohiro 1, Okazaki Ken 1
	15	Effect of glancing angle deposition for gallium-doped InN films prepared by reactive ion plating	Graduate School of Eng., Nagoya Univ. 1,EcoTopia Science Inst., Nagoya Univ. 2　*Takaba Hidetaka 1,Kuranaga Toshihide 1,Saito Nagahiro 1,Inoue Yasushi 2,Takai osamu 2
1.6 General Topics of Plasma Discharges
September 1 (Fri.) 9:00〜14:45
1a-Q-　/ I
▲	1	Anti-Bacteria Property of Amorphous Carbon Film Deposited Using Microwave Plasma CVD	Shizuoka Univ.　*Zhou Haiyang, Xu Lei, Ogino Akihisa, Nagatsu Masaaki
▲△	2	Low Temperature Sterilization of PE film-Wrapped Material using Microwave-wave Plasma	Shizuoka Univ.1, Hamamatsu Univ. Sch. of Med.2　*Lei Xu 1, Ohno Yoshihito 1, Ogino Akihisa 1, Koide Yukio 2, Nagatsu Masaaki 1
△	3	Sterilization of Thin Tube for Medical Use by Line-shaped Dielectric Barrier Discharge	Shizuoka Univ.　*Eto Hiroyuki, Ono Yoshihito, Ogino Akihisa, Nagatsu Masaaki
	4	Two dimensional spatio-temporal behavior of surface charge density profile in co-planer-type DBD	IIC, Kyoto Univ. 1, VBL, Kyoto Univ. 2, GSE, Kyoto Univ. 3 　*Tatsuru Shirafuji 1, Rei Abo 2, Sergey N. Abolmasov 3, Kunihide Tachibana 2
	5	Modeling of dielectric barrier discharge (11) –Gas Temperature Increase in Multi-Filament Discharge-	N.D.A. 1, Nagoya Inst. of Tech. 2, Hokkaido Univ. 3　*Haruaki Akashi 1, Akinori Oda 2, Yosuke Sakai 3
	6	Computer simulations of atomic processes in barrier discharge for excimer lamp or laser with quasi 2-dimensional Monte Carlo	Osaka Univ. ILE　*Yasuhiro Yamauchi,Vasilli Zhakhovskii,Kazuyuki Uno,Takahisa Jitsuno,Katunobu Nishihara
		Break 10:30〜10:45
△	7	Discharge characteristics of MgO thin films deposited by sputtering	Kanagawa Inst. of Tech.　*Takayuki Misu, Sugimoto Masanori, Goto Miki, Arai Toshihiko
	8	Influence of Penning Ionization on Glow-like Dielectric Barrier Discharge Formation in Medium Pressure Ar	Tokyo Metropolitan Univ.　*Matsushita Yuki 1, Tochikubo Fumiyoshi 1, Uchida Satoshi 1, Watanabe Tsuneo 1
	9	Studies on PDP Micro-discharges using laser Thomson scattering diagnostics	Kyushu Univ.　Yasushi Sonoda　1, Tsuyoshi Nagayoshi 1, Yu Yamasaki 1, Kentaro Tomita 1, Safwat Hassaballa 1, Kiichiro Uchino 1
	10	Time dependence of the emission spectrum from a small cell in Plasma Display Panel	Inst. of Industrial Science, Univ. of Tokyo　Uchida Giichiro, Kajiyama Hiroshi, Shinoda Tsutae
	11	Temperature Dependence of Discharge Lag Times in AC-PDPs with an MgO Thin Film Protection Layer	Pioneer Corp. 1　*Yoshioka Toshihiro 1, Furutani Takashi 1
		Lunch 12:00〜13:00
1p-Q-　/ I
	1	Cross Section Database for Electron and Ion Collisions with Molecules Aimed at Plasma Applications	NIFS 1, Kyushu Univ. 2, Miyazaki Univ. 3, Kyoto Univ. 4, Tokyo Inst. Tech. 5, Kinki Univ. 6, JAEA 7, UEC 8, TUAT 9, ICU 10　*Daiji Kato 1, Mineo Kimura 2, Akinori Igarashi 3, Makoto Imai 4, Masashi Kitajima 5, Toshio Kusakabe 6, Kengo Moribayashi 7, Toru Morishita 8, Kenji Motohashi 9, Lukas Pichl 10, Izumi Murakami 1, Takako Kato 1, Masatoshi Kato 1
	2	Millimeter-Wave Control Using Two-Dimensional Periodical Structure of Microplasmas (III)	Kyoto Univ. 1　*Sakai Osamu 1, Sakaguchi Takui 1, Tachibana Kunihide 1
	3	Numerical Analysis of Microwave Electric Field Distribution and Lamp Impedance on Antenna-excited Microwave Discharge Lamps	Grad. School of Sci. and Eng., Shizuoka Univ 1　*Kando Masashi 1,Takuji Fukaya 1
	4	Luminous Efficacy and Incident Microwave Power of Antenna-excited Metal-halide Discharge Lamps	Grad. School of Sci. and Eng., Shizuoka Univ. 1, Koito Manufacturing Co. 2, SPC Electronics Corp. 3, Research Inst. of Electronic Eng., Shizuoka Univ. 4　*Masashi Kando 1,Youhei Oishi 1,Masaya shido 2,Takuya Serita 2,Satoshi Asari 3,Tadaharu Hieda 3,Yoshimi Momose 4
	5	Generation of micro-arc light (III)	Nagoya Univ.1, NMIRI 2, NU-EcoEng. 3　*Haruhiko Ito 2, Hiroyuki Kano 3, Masaru Hori 1
	6	Observation of discharge in a bubble surrounded by water and dielectric wall	IIC, Kyoto Univ. 1, GSE, Kyoto Univ. 2　*Tatsuru Shirafuji 1, Masaru Kimura 2, Osamu Sakai 2, Kunihide Tachibana 2
	7	Characteristics of small size AC high voltage type ion thruster	Saga Univ.　　*Saitou Tomoaki 1, Kawabata Daisuke 1, Hayashi Nobuya 1
1.7 Plasma Etching
August 30 (Wed.) 9:15〜17:15
30a-S-　/ I
	1	Measurements of Chlorine Negative Ions in Pulse-time-modulated Plasma	Tohoku Univ. 1　Mukai Tomonori 1, Jinnai Butsurin 1, Samukawa Seiji 1
△	2	Etching characteristics of high-k gate dielectric using ECR plasmas (4)	Grad.School of Eng.,Kyoto Univ. 1　*Hamada Daisuke 1,Nakamura Keisuke 1,Osari Kazushi 1,Eriguchi Koji 1,Ono Kouichi 1
△	3	The evaluation of annealing effects of Plasma-induced E' centers in SiO2 film	Tohoku Univ. 1, Tsukuba Univ. 2, AIST 3　Ishikawa Yasushi 1, Uedono Akira 2, Yamasaki Satoshi 3, Samukawa Seiji 1
△	4	Control of Damage on Si substrate during Gate Etching Processes	STDG, SBU, Sony Corp.　*Tomokazu Ohchi 1, Atsushi Kawashima 1, Nobuhisa Yamagishi 1, Katsuhisa Kugimiya 1, Tetsuya Tatsumi 1, Shoji Kobayashi 1, Yukihiro Kamide 1
△	5	Characteristic of Silicon Etching Employing High Permittivity Ceramic Discharge Tube	Tokai Univ. 1 2, KYOCERA Co. 3,NIHON KOSYUHA Co. 4　*Kota Kusaba 1 4,Seiiti Tanaka 3,Masahumi Suzuki 2,KIbatu Shinohara 4,Haruo Shindo 1,2
	6	Fine Pattern Etching of Si by use of Side Wall Passivation from Solid Source	Osaka Prefecture Univ. 1　*Kawata Hiroaki 1, Ishihara Jyunya 1, Kayama Masayo 1, Yasuda Masaaki 1, Hirai Yoshihiko 1
		Break 10:45〜11:00
	7	Plasma-surface interactions during Si etching in chlorine- and bromine - containing plasmas	Kyoto Univ. 1　*Shouki Irie 1,Masahito Mori 1,Koji Eriguchi 1,Kouichi Ono 1
	8	Silicon Deep Etching Using Pulse Time Modulated F2 Gas Plasma	SHOWA DENKO K.K. 1, Tohoku Univ. 2　Hoshino Yasuyuki 1, Ozaki Takuya 2, Samukawa Seiji 2
△	9	Etching Processes for Low-k Films Using the Neutral Beam (1)	Tohoku Univ. 1　Jinnai Butsurin 1, Samukawa Seiji 1
△	10	Stabilization of Radical Density in Fluorocarbon Plasma -Influence of Oxygen Addition-	Chubu Univ. 1, SONY 2　Kumagai Kazuya 1, Oshima Keiji 2, Tatsumi Tetsuya 2, Nagahata Kazunori 2, Nakamura Keiji 1
		Lunch 12:00〜13:00
30p-S-　/ I
	1	Damages on Low-k films due to light, radical and ion(II)	Nagoya Univ. 1, Sony Corp. 2　*S. Takashima 1, S. Uchida 1, K. Ohshima 2, K. Nagahata 2, T. Tatsumi 2, M. Hori 1
	2	Reduction of UV irradiation damage in MIS-FET using CF3I gas plasma	Tohoku Univ. 1, Sanyo Electric 2　Ichihashi Yoshinari 1,2, Ishikawa Yasushi 1, Shimizu Ryu 2, Mizuhara Hideki 2, Okigawa Mitsuru 2, Samukawa Seiji 1
	3	Measurement of Total Loss Coefficient of CFx Radicals at Etching Surfaces	Fuji Electric Device Tech. 1　Urano Yuichi 1, Kazama Kenichi 1, Horasawa Takayasu 1, *Ichikawa Yukimi 1
	4	Analysis of the Ion Energy Flux to the Sidewall of Hole and Trench	Kyoto Univ. 1　*Hiroshi Fukumoto 1, Koji Eriguchi 1, Koichi Ono 1
	5	MD simulations of CN film formation during organic polymer etching II	Osaka Univ. 1, AIST 2　*Masashi Yamashiro 1, Hideaki Yamadaand 2, Satoshi Hamaguchi 1
	6	Low-k Film Etching Process Employing Alternative Fluorocarbon Gases(III)	Nagoya Univ. 1,Asahi Corp. 2　*Hayashi Takayuki 1,Sasaki Hajime 1,Okamoto Syuiti 2,Hori Masaru 1
	7	Correlation between Etching and Optical Characteristics of Carbon Films for Multi-layer Resists	Selete　*Soda Eiichi, Koba fumihiro, Kondo Seiichi, Kobayashi Nobuyoshi
	8	Low-k via etching by using microwave plsama	Tokyo Electron　*Tetsuya Nishizuka, Song Yun Kang, Toshihisa Nozawa
		Break 15:00〜15:15
	9	Spatial Distribution Control of Radical Composition for Gate Etch Process (2)	Central Research Lab., Hitachi Ltd. 1, Hitachi High-Technologies Corp. 2　*Miya Go 1, Itabashi Naoshi 1, Akiyama Hiroshi 2, Sato Kohei 2, Saito Go 2, Ishimura Hiroaki 2, Makino Akitaka 2
	10	Variation of gate electrode length induced by thickness in local area	Central Research Lab. Hitachi Ltd. 1, Renesas Technology 2　*Kurihara Masaru 1, Izawa Masaru 1, Tanaka Jun'ichi 1, Kawai Kenji 2, Fujiwara Nobuo 2
	11	Effect of poly-Si grains that formed in gate electrode on gate-LER formation	Hitachi, Ltd., Central Research Laboratory　Uchiyama Hiroyuki 1, Ebana Satoshi 1, Kurihara Masaru 1, Tanaka Jyunichi 1
	12	Estimation of Root Causes For An Electrical Failure of A Flash Memory Device Using A Multivariate Statistical Analysis of Etching Tool Parameters	Spansion Inc.　*Miwa Kazuhiro 1, Watanabe Kazuhiro 1, Takeishi Kumiko 1, Kobayashi Toru 1
	13	Particle Trap by Electric Force in Etching System	Hitachi Central Research Lab.　*H. Kobayashi, K. Maeda, K. Yokogawa, M. Izawa
	14	Real-time Monitoring of Plasma Anomalous-Discharge Using Electromagnetic Field Sensors	Tohoku Univ. 1, Fab Solutions 2　Sato Mitsuo 1,2, Suzuki Kouichi 2, Ohtake Hiroto 1, Samukawa Seiji 1
	15	Plasma-damage prediction system with combination of on-wafer sensors and neural network modeling (I)	Tohoku Univ. 1, Myongji Univ. 2　Ohtake Hiroto 1, Ishikawa Yasushi 1, Kim Hee-Youn 2, Hong Sang Jeen 2, Samukawa Seiji 1
	16	Innovation of Oxide Dry Etching Technology by Lam Research	Doshisha Univ. 1, Nagaoka Univ. 2　*Yunogami Takashi 1,2