Sub-nanometer scale flattening using a non-uniform optical field
Takashi YATSUI1, Maiku YAMAGUCHI1, Katsuyuki NOBUSADA2
We have studied light-matter interactions at the nanoscale and found that what is essential is the non-uniformity of the electric/magnetic field, in which the physics does not follow the dipole approximation. Here, we review recent progress regarding unique phenomena at the nano-scale using this non-uniformity. First, we review recent theoretical works focusing on optical near ﬁelds based on the non-uniform optical ﬁelds. Second, among the unique phenomena of the optical near-field, we review the recent development of near-field etching to realize an ultra-flat surface for various materials and the structure. Finally, we discuss the future outlook for these technologies.
- 1 School of Engineering, University of Tokyo
- 2 Department of Theoretical and Computational Molecular Science, Institute for Molecular Science