Symposium |
New developments in advanced
technology for image information processing and display |
August 29 (Tue.) 13:00〜17:35 |
29p-ZM- / 0 |
|
1 |
Advanced visual interface photonics |
Osaka City Univ. 1 Miyazaki Daisuke 1 |
|
2 |
High Fidelity Generation and Interactive Visualization
of 3D Video |
Kyoto Univ. 1 Matsuyama Takashi 1 |
|
3 |
Interactive Holographic Television |
Nihon Univ. 1 *Hiroshi Yoshikawa 1 |
|
4 |
Reproduction of 3-dimensional image and field -
Various problems should be solved |
CASI Osaka Univ. 1, Graduate School of Eng. Sci.
Osaka University 2 *Tetsuro Kobayashi 1, Shintaro Hisatake 2 |
|
|
Break 15:20〜15:35 |
|
|
5 |
Anisotropic Optical Reflectance Reproduction Technology
and Applications. |
digital fashion ltd. Sakaguchi Yoshiyuki |
|
6 |
Information accessibility based on characteristics
of human vision |
Ritsumeikan University Hiroyuki Shinoda |
|
7 |
Securing displayed images on liquid-crystal display
by use of visual cryptography |
Univ. of Tokushima *Yamamoto Hirotsugu 1 |
|
8 |
Secure Image Information Processing by Use of Digital
Holography |
Wakayama Univ. 1 Nomura Takanori 1 |
Recent progress in surface
analysis technique |
August 29 (Tue.) 13:00〜17:20 |
29p-ZV- / 0 |
|
1 |
Introduction |
Fac.Eng., Kobe Univ. 1, Fac.Eng., Kyoto Univ. 2 Urano
Toshio 1, Kimura Kenji 2 |
|
2 |
Ultrahigh-resolution photoemission spectroscopy:
fine electronic structure and quasiparticles. |
Tohoku Univ. 1 *Takafumi Sato 1, Takashi Takahashi
1 |
|
3 |
Two-Photon Photoemission Microspectroscopy |
Osaka Univ. 1, CREST 2 *Munakata Toshiaki 1,2 |
|
4 |
Probing nanoscale dynamics using laser-combined
scanning tunneling microscopy |
Inst. of Appl. Phys., Univ. of Tsukuba Hidemi Shigekawa |
|
|
Break 15:05〜15:20 |
|
|
5 |
Atomic level characterization of carbon nanostructures |
AIST 1, JST 2 Suenaga Kazu |
|
6 |
Spin polarization spectroscopy using metastable
atom beam; observation of top-surface-magnetism and its imaging |
Nat. Inst. Materials Sci. 1, PRESTO-JST 2 *Yamauchi
Yasushi 1, Kurahashi Mitsunori 1, Suzuki Taku 1,2, |
|
7 |
Hydrogen microscope with a nuclear reaction- probing
3D distribution and quantum state in solids |
Inst. Ind. Sci., Univ. Tokyo *Fukutani Katsuyuki
1 |
X線・中性子による quick 反射率法の展望−表面や埋もれたナノ構造の変化を追う(II)
|
August 29 (Tue.) 9:30〜17:30 |
29a-ZL- / 0 |
|
1 |
Introductory Talk: New opportunities in quick reflectometry
with X-rays and neutrons |
Nat'l Inst. for Mater. Sci. 1 *Sakurai Kenji 1 |
|
2 |
Real time observation of thermal oxidation of ultrathin
silicon-on-insulator wafers |
NTT Basic Research Labs. 1 Omi Hiroo 1, Kawamura
Tomoaki 1 |
|
|
Break 10:30〜10:50 |
|
|
3 |
X-ray study of temporal evolution of semiconductor
nanostructures during growth |
JAEA 1 *Takahasi Masamitu 1, Kaizu Toshiyuki 1 |
|
4 |
In-situ measurement of crystallization process
of polyimide thin films by GIXD |
Analysis and Simulation Center, Asahi-KASEI Corporation
1, Marketing Center,FPC/FPD Materials, Asahi-KASEI Corporation 2 Matsuno
Shin-ya 1, Kikuma Jun 1, Asano Gouji 2, Nayuki Takeshi 1 |
|
|
Lunch 12:10〜13:30 |
|
29p-ZL- / 0 |
|
1 |
XR for liquid-gas interfaces |
Ritsumeikan Univ. Yohko F. Yano |
|
2 |
Development of liquid interface spectrometer at
SPring-8 |
JASRI 1,Kyushu Univ. 2,Fukuoka Women's Univ. 3,Utsunomiya
Univ. 4 *Uruga Tomoya 1,Tanida Hajime 1,Takiue Takanori 2,Ikeda Norihiro
3,Iimura Kenichi 4,Hirosawa Ichiro 1 |
|
|
Break 14:50〜15:10 |
|
|
3 |
Potential use of plastically deformed semiconducting
wafers as optical elements for quick reflectivity measurements |
Kyoto Univ. 1, Tohoku Univ. 2 *OKUDA Hiroshi 1,
Nakajima Kazuo 2, Fujiwara Kozo 2, Ochiai Shojiro 1, Usami Noritaka 2 |
|
4 |
Buried hetero-interface of H, D monolayer |
JAEA 1, Eiko 2, KEK 3 *Asaoka Hidehito 1, Takeda
Masayasu 1, Soyama Kazuhiko 1, Shamoto Shin-ichi 1, Yamazaki Tatuya 1,2,
Torikai Naoya 3 |
|
5 |
A new neutron reflectometer SUIREN at JRR-3 |
JAEA 1 *Yamazaki Dai 1, Soyama Kazuhiko 1, Toru
Ebisawa 1, Maruyama Ryuji 1, Takeda Masayasu 1
|
|
6 |
Summary and Discussion |
|
Recent Progress of Carbon
Nanotube Research |
August 29 (Tue.) 9:50〜16:30 |
29a-A- / 0 |
|
1 |
Recent Advances of Carbon Nanotube Research |
ISIR Kazuhiko Matsumoto |
|
2 |
Recent Progress of Carbon Nanotube CVD Growth |
Tokyo Univ. Shigeo Maruyama |
|
3 |
Doping Control of Carbon Nanotubes by Plasma Processing |
Department of Electronic Engineering, Tohoku Univ.
1 *R. Hatakeyama 1, T. Kaneko 1, W. Oohara 1 |
|
4 |
Aligned growth and characterization of single-walled
carbon nanotubes on crystalline surfaces |
Kyushu Univ. 1 *Hiroki Ago 1 |
|
5 |
HRTEM characterization of carbon nanotubes |
AIST 1, JST 2 Suenaga Kazu |
|
|
Lunch 12:00〜13:00 |
|
29p-A- / 0 |
|
1 |
In Situ Measurements for Tracking Carbon Nanotube
Growth |
Tokyo Univ. of Science 1, NTT Labs. 2, CREST/JST
3 *Homma Yoshikazu 1,3, Takagi Daisuke 1 and Kobayashi Yoshihiro 2,3 |
|
2 |
Electrical properties of carbon nanotubes studied
by AFM |
Kyoto Univ. 1 Yamada Hirofumi 1 |
|
3 |
Characterization of Transport Propertties in Carbon
Nanotube FETs Using Micro-PL Spectroscopy |
Graduate School of Eng., Nagoya Univ.1, Inst. Adv.
Res., Nagoya Univ.2, PRESTO/JST3 *Takashi Mizutani1,2, Yutaka Ohno1,3 |
|
|
Break 14:30〜15:00 |
|
|
4 |
Carbon Nanotube Devices and its Bio-Sensor Applications |
ISIR Kazuhiko Matsumoto |
|
5 |
Quantum Nanodevices with Carbon Nanotubes |
RIKEN 1, CREST-JST 2, TIT 3 *Koji Ishibashi1,2,
Satoshi Moriyama1, Tomoko Fuse1,3, Masaki Suzuki1,3, Yukio Kawano1, Tomohiro
Yamaguchi1 |
|
6 |
Toward the development of nanoelectromechanical
devices consisting of carbon nanotubes |
Osaka Prefecture Univ. 1, Handai FRC 2 *Nakayama
Yoshikazu 1,2 |
Novel Development of Laser
Processing Toward Bioscience |
August 29 (Tue.) 13:00〜17:15 |
29p-L- / 0 |
|
1 |
Novel Development of Laser Processing Toward Bioscience |
Hokkaido Univ. Tsuboi Yasuyuki 1 |
|
2 |
Development of sensing device using nano-structured
surface |
AIST 1, Univ. of Hyogo 2, NTT-MI Labs. 3, Keio
Univ. 4, NTT Afty 5, JST-Crest 6 Niwa Osamu 1,6 , Kurita Ryoji 1, Sato Yukari
1, Mizutani Fumio 2, Iwasaki Yuzuru 3, Suzuki Koji 4, 6, Hirono Shigeru
5 |
|
3 |
Micro biochip fabrication using ultrashort wavelength
and pulsed laser and its applications |
RIKEN *Hanada Yasutaka 1, Sugioka Koji 1, Obata
Kotaro 1, Midorikawa Katsumi 1 |
|
4 |
Fabrication of Microfluidic Bead Array Chip by
Laser Induced Backside Wet Etching (LIBWE) |
AIST PRI *Tadatake Sato, Thomas Gumpenberger, Ryozo
Kurosaki, Aiko Narazaki, Yoshizo Kawaguchi, Hiroyuki Niino |
|
5 |
Laser Chemistry of Biomaterials |
Hokkaido Univ. Tsuboi Yasuyuki 1 |
|
|
Break 15:00〜15:15 |
|
|
6 |
Femtosecond laser nanosurgery |
AIST 1, Osaka Univ. 2 *Wataru Watanabe 1, Sachihiro
Matsunaga 2, Kiichi Fukui 2, and Kazuyoshi Itoh 2 |
|
7 |
Development of orange fiber laser for ophthalmology |
Nidek Ken-ichi Hayashi |
|
8 |
Targeted gene transfer by the use of laser-induced
stress wave |
Nat'l Defense Medical College 1, Keio Univ. 2 *Sato
Shunichi 1, Terakawa Mitsuhiro 2, Obara Minoru 2 |
|
9 |
New Protein Crystal Growth Technology by using
Femto-second Laser irradiation and Solution Stirring |
Graduate School of Eng. 1, Sanken2, Osaka University,
SOSHO Inc.3, CREST JST4 Mori Yusuke1 |
Symposium on Recent Progress
in Nanoimprint Technology |
August 29 (Tue.) 13:00〜16:45 |
29p-RC- / 0 |
|
1 |
Trend of Research and Development in Nanoimptint
Technology |
Univ. of Hyogo 1 Matsui Shinji 1 |
|
2 |
Thermal nanoimprint |
Osaka Pref. Univ. Hirai Yoshihiko1 |
|
3 |
UV-Nanoimprint |
AMRI-AIST *Hiroshima Hiroshi 1 |
|
4 |
Roller nanoimprint process |
National Institute of Advanced Industrial Science
and Technology (AIST) Hiroshi Goto |
|
|
Break 15:00〜15:15 |
|
|
5 |
Photocurable resin for UV-nanoimprint lithography |
Toyo Gosei Co. LTD., Nobuji Sakai |
|
6 |
Fluoropolymers for Nanoimprint Lithography |
Asahi Glass Co., Ltd. 1 *Kawaguchi Yasuhide 1,Asakawa
Akihiko 1,Sanada Yasuhiro 1 |
|
7 |
Thermoplastic Polymers for Thermal Nanoimprint
Lithography |
Soken Chemical & Engineering Co.,Ltd. 1 Mizawa
Takahide 1 |
Bionanotechnology in the
next generation |
August 29 (Tue.) 13:30〜16:50 |
29p-ZS- / 0 |
|
1 |
Introductory Talk |
AIST Naoki Matsuda 1 |
|
2 |
Design and Construction of Molecular Interfaces |
Kyushu Inst. Tech. *HARUYAMA Tetsuya |
|
3 |
Synthesis and Application of Luminescent Quantum
Dot |
Natl. Inst. Adv. Sci. Technol. On-Site Sens. Diag.
Res. Lab. 1 *Ohba Hideki 1, Zhelev Zhivko 1, Bakalova Rumiana 1 |
|
4 |
Nanoinjection technology toward post-genome science |
Tokyo Univ. Agricul. Technol. *Saito Mikako 1 |
|
|
Break 15:10〜15:20 |
|
|
5 |
Nanobiotechnology and Biosensor |
JAIST Tamiya Eiichi |
|
6 |
Thernoresponsive nano-biointerfaces for its biomedical
applications |
Dept. Mater. Sci. & Technol., Tokyo Univ. of Sci.
1 *Akihiko Kikuchi 1 |
|
7 |
Glyco-Biointerface |
JAIST 1 Yoshiko Miura 1 |
Organic-based Photoltaic
Cells bearing Next Generation Energy |
August 30 (Wed.) 10:00〜17:00 |
30a-ZS- / 0 |
|
1 |
Dye Photovoltaic Cells as Cost-effective and Diffusible
Solar Cells |
Osaka Univ. 1, Center for Advanced Sceinece and
Innovation Yanagida Shozo 1, |
|
2 |
High efficiency of dye-sensitized solar cells |
Sharp Corporation, Solar systems development center ○Yasuo
Chiba, Naoki Koide, Liyuan Han |
|
3 |
Solidification of dye sensitized solar cells |
Kyushu Inst. of Tech. Hayase Shuzi |
|
4 |
Dye-Sensitized Solar Cells Employing Electrodeposited
Porous Crystalline Zinc Oxide Photoelectrode |
Gifu Univ. *Yoshida Tsukasa 1, Minoura Hideki 1 |
|
|
Lunch 11:50〜13:00 |
|
30p-ZS- / 0 |
|
1 |
Organic solid-state solar cells having p-i-n junction
and nanostructure design |
Osaka Univ. *Hiramoto Masahiro 1 |
|
2 |
Quasi-solid state dye-sensitized solar cells fabricated
with gel-type polymeric solid electrolytes |
Nippon Oil Corp. 1 *Nishikitani Yoshinori 1, Kubo
Takaya 1 |
|
3 |
Polymer-Based Bulk Heterojunction Photovoltaic
Cells |
Matsushita Electric Works, Ltd. Advanced Technologies
Development Laboratory *Jun Sakai, Kenji Kawano, Norihiro Ito, Taisuke Nishimori |
|
4 |
Highly efficient organic thin-films solar cells |
AIST RCPV 1 Saito Kazuhiro 1, Yamanari Toshihiro
1, Taima Tetsuya 1 |
|
|
Break 15:00〜15:15 |
|
|
5 |
Synthetic Approach to Organic Solar-Cell Materials
Tuned at Molecular Level |
ISIR Osaka Univ. 1, CREST/JST 2 *Yoshio Aso 1,2 |
|
6 |
"Energy-storable Dye-sensitized Solar Cell" Accumulates
Electricity by Photo-irradiation |
The Univ. of Tokyo, RCAST Segawa Hiroshi |
|
7 |
Application for Multi-Function Devices with Emission
and Photodetection Operations |
Univ. Toyama 1 Matsushita Yousuke 1, Shimada Hiroyuki
1, Yanagi Junya 1, *Naka Shigeki 1, Okada Hiroyuki 1, Onnagawa Hiroyoshi
1 |
|
8 |
Concluding Remarks |
AIST Research Center for Photovoltaics Kondo Michio |
多元系機能材料研究会企画「多元系蛍光体の設計、作製、および応用
−新しい展開は何か−」 |
August 30 (Wed.) 13:00〜17:00 |
30p-H- / 0 |
|
1 |
Introductory talk -Design, preparation and application
of multinary compound phosphors- |
Res. Inst. of Electron., Shizuoka Univ. *Nakanishi
Yoichiro |
|
2 |
|
|
|
3 |
Development of GaN related phosphors and their
VFD application |
Mie Univ.1 Noritake Itron corp.2 *H. Miyake1,
K. Nakao1, K. Hiramatsu1 , S. Kikuta2 |
|
4 |
Electronic structures of phosphors -A theoretical
approach- |
Kwansei Gakuin Univ. 1, NEC Lighting, Ltd. 2 Kazuyoshi
Ogasawara 1, Hisashi Yoshida 1,2, Shinta Watanabe 1, Hiroaki Toyoshima 2 |
|
|
Break 14:40〜14:55 |
|
|
5 |
Local structure of luminescent center in multinary
phosphor materials studied by XAFS analyses |
JASRI 1 Honma Tetsuo 1 |
|
6 |
Luminescent properties of rare-earth-activated
SrGa2S4 thin film phosphor formed by Laser annealing |
THE JAPAN STEEL WORKS, LTD. 1, Research Institute
of Electronics, Shizuoka University 2 *Toshiaki Seino 1, Yuko Arai 1,Takashi
Ebisawa 1, Yasumasa Kaneda 1, Takashi Harakawa 2, Hiroko Kiminami 2, Kazuhiko
Hara 2, Yoichiro Nakanishi 2 |
|
7 |
Synthesis of a red phosphor CaAlSiN3
doped with Eu2+, CASN, and its Application to White LEDs |
Mitsubishi Chemical 1 *Uheda Kyota 1 |
|
8 |
Development Trend of Nitride-based Phosphors and
Its Expansion to Eu-doped Sr-SiAlON Phosphor |
Toshiba Corp. R&D Center 1,Toshiba Research Consulting
Corp. 2,Yokohama National Univ. 3 *Yumi Fukuda 1,Masaaki Tamatani 2,Ryosuke
Hiramatsu 1,Hironori Asai 1,Jun-ichi Tatami 3,Katsutoshi Komeya 3,Toru Wakihara
3 |
|
9 |
Closing |
Shizuoka Univ. Kazuhiko Hara |
The present state and issues
of teaching-materials development for applied physics education |
August 30 (Wed.) 13:30〜16:30 |
30p-ZL- / 0 |
|
1 |
Introductory talk |
Hokkaido Pharmaceutical Unov. 1, Tokyou Univ. Tech.
2, Nagano Nat'l. Coll. Tech 3 Nakano Yoshiaki 1, Kezuka Hiroshi 2, Nakazawa
Tatsuo 3 |
|
2 |
Developments of Apparatuses for Demonstration of
Physical Phenomena by means of a Digital Balance
|
Kyoto Inst.Tech.1,Iwate Univ.2,Ritsumeikan Univ.3 Yoshio
Saito1, Noriyuki Yoshimoto2,Chihiro Kaito3 |
|
3 |
Experimental apparatus with a magnetic sensor
of a spring pendulum, a simple pendulum and a torsion pendulum
|
Maizuru National College of Technology 1,
Chubu.Univ.2 Maruyama Kaneyasu1,Okunura Koichi2,Okazaki Akihiko |
|
4 |
Development and demonstration of science experiment
materials and teaching programs by undergraduates |
Chitose Inst. of Science and Technology 1 *Hasegawa
Makoto 1, Ishida Koji 1 |
|
5 |
Instruction for promoting self-education and communication
ability |
Univ. Fukui 1 *Nobu Kuzuu |
|
|
Break 14:55〜15:10 |
|
|
6 |
A Way to Introduce Advanced Science and Technology
to High School Students |
Kyoto Sangyo Univ. 1 *Tsuboi Taiju 1 |
|
7 |
Discussion |
|
Symposium on a decade of
concentrated research of semiconducting silicides |
August 30 (Wed.) 13:00〜17:05 |
30p-RD- / 0 |
|
1 |
Introductory Talk - Topics in the last 10 years
of Silicide Semiconductor Research - |
Shizuoka Univ. 1 *Tatsuoka Hirokazu 1 |
|
2 |
A challenge to fabrication of \beta-FeSi2
substrates : Growth of bulk crystals |
Ibaraki N.C.T. *Hara Yoshiaki |
|
3 |
Heteroepitaxy of semiconducting silicides |
Univ. of Tsukuba Suemasu Takashi |
|
4 |
Low-temperature fabrication of beta-FeSi2
microdroplets by laser processing |
AIST 1 Narazaki Aiko 1, Sato Tadatake 1, Kawaguchi
Yoshizo 1, Niino Hiroyuki 1 |
|
|
14:50〜15:05 |
|
|
5 |
Emerging research for Fe-Si silicides |
Okayama University of Science Kenichi Takarabe |
|
6 |
Epitaxial Growth of Ferromagnetic Silicide on IV
Semiconductor |
Kyushu Univ. 1 *Sadoh Taizoh 1, Miyao Masanobu
1 |
|
7 |
Perspective of silicides towards high index-contrast
photonic crystals |
Kyoto Univ. 1 Maeda Yoshihito |
|
8 |
Discussion |
|
"Discussion of generic
technologies to obtain new bulk single crystals, such as high efficient
and low defects technologies succeeded from inorganic to organic crystals"
organized by JSPS 161 committee |
August 30 (Wed.) 13:00〜17:25 |
30p-ZT- / 0 |
|
1 |
Introductory talk: Fundamental techniques to get
new bulk single crystals |
NIMS 1,Osaka Univ. 2,Murata 3 *Kimura Hideo 1,Mori
Yusuke 2,Fujii Takashi 3 |
|
2 |
Advance in Si crystal growth technology and problems |
Shinshu Univ. *Taishi Toshinori 1, Hoshikawa Keigo
1 |
|
3 |
Defect reduction by control of interface shape
in growth technique for compound semiconductor bulk crystals |
Hitachi Cable, Ltd. *Shibata Masatomo 1 |
|
4 |
Fundamental techniques of oxides for multipurpose
applications: multi-elements and content control |
NIMS 1, *Kimura Hideo 1, |
|
5 |
Fruoride single crystals ; Growth of large crystals
by CZ method |
Tokuyama corp. 1,IMRAM,Tohoku Univ. 2 *Teruhiko
Nawata 1,Masada Isao 1, Mabuchi Toshirou 1,Fukuda Tsuguo 2 |
|
|
Break 15:05〜15:20 |
|
|
6 |
Semiconductor Materials for Power Electronics:
Improvement of Macroscopic and Microscopic Qualities |
AIST 1 *NISHIZAWA Shin-ichi 1, KATO Tomohisa 1,
ARAI Kazuo 1 |
|
7 |
Single Crystal for Organic Electronics: Challenge
of Crystal Growth & Handling |
Gakushuin Univ. Dept. Chemistry Kotani Masahiro |
|
8 |
Protein Crystal Growth: Challenges for obtaining
high quality large crystals and the utilization of microgravity |
JAXA *Yoshizaki Izumi 1, Long Rong 1, Satoshi Adachi
1, Shinichi Yoda 1 |
|
9 |
Process Control and Understanding of Crystal Growth:
from inorganic to organic |
Graduate School of Eng., Osaka University1, SOSHO
Inc.2, CREST JST3 Y. Mori1-3, Y. Takahashi1, S. Kawamura1, H. Adachi1-3,
M. Yoshimura1, Y. Kitaoka & T. Sasaki1,3 |
The Milestone of bottom
up epitaxial growth and the development toward nano-epitaxy |
August 30 (Wed.) 9:00〜18:00 |
30a-B- / 0 |
|
1 |
Introductory: The Milestone of bottom up epitaxial
growth and the development toward nano-epitaxy |
Kobe Univ. Takashi Kita |
|
2 |
Advances in quantum wires, quantum dots, and related
nanostructures |
Inst. of Industrial Science, Univ. of Tokyo *Sakaki
Hiroyuki |
|
3 |
Fabrication of Semiconductor Nano Structures by
Droplet Epitaxy |
National Inst. for Materials Science 1
*Koguchi Nobuyuki 1 |
|
|
Break 10:20〜10:35 |
|
|
4 |
Growth of semiconductor nano-whiskers |
ASET 1, Hitachi CRL 2, Renesas 3, Tokyo Univ. 4 *Hiruma
Kenji 1, Yazawa Masamitsu 2, Haraguchi Keiichi 3, Katsuyama Toshio 4 |
|
5 |
Structural analysis of InP nanowires using x-ray
scattering |
NTT Basic Research Labs. 1, Univ. Hyogo 2 *Kawamura
Toimoaki 1, Fujikawa Seiji 2, Bhunia Satyaban 1, Watanabe Yoshio 1 |
|
6 |
Atomic Ordering Formation in III-V Compound Epitaxial
Layers |
NEC Corp. Fundamental and Environmental Res. Labs.
1, NEC Corp. System Device Res. Labs. 2 *Akiko Gomyo 1, Shunsuke Ohkouchi
1, Tohru Suzuki 2 |
|
7 |
Growth and Characterization of Semiconductor Nanowires
by Selective-Area MOVPE |
RCIQE Hokkaido Univ., Graduate School of IST Hokkaido
Univ. Motohisa Junichi 1 2, Fukui Takashi 2 1 |
|
|
Lunch 12:00〜13:00 |
|
30p-B- / 0 |
|
1 |
MBE growth of self-assembled quantum wires and
their application to LDs and VCSELs |
Ehime Univ. 1, Osaka Univ. 2, Tokushima Univ. 3,
AIST 5, Nara Col. Tech. 4
Shimomura Satoshi 1, Higuchi Yu 2, Sasahata Yoshifumi 2, Ohmori Kazuyuki
2, Toritsuka Tetsuro 2, Uenishi Atsushi 2, Kitada Takahiro 3, Ogura Mutsuo
4, Hiyamizu Satoshi 5 |
|
2 |
Quantum wires and dots grown with an As2
source and their device applications |
AIST 1, CREST-JST 2, Shibaura Inst. Technol. 3 *Sugaya
Takeyoshi 1,2, Amano Takeru 1,2, Komori Kazuhiro 1,2, Ogura Mutsuo 1, Yonei
Kenji 3 |
|
3 |
Fabrication of high density quantum dots using
strain compensation (1)
- InAs/InGaAlAs multi-stacked structure grown on InP(311)B substrates -
|
National Institute of Information and Communications
Technology 1,Doshisha Univ. 2 *Akahane Kouichi 1,Yamamoto Naokatsu 1,Gozu
Shin-ichiro 1,Ueta Akio 1,Ohtani Naoki 2,Tsuchiya Masahiro 1 |
|
4 |
Fabrication of high density quantum dots using
strain compensation ~InAs /GaNAs quantum dots~ |
Univ. of Tsukuba, Inst. of Appl. Phys. 1 *Okada
Yoshitaka 1, Shigekawa Hidemi 1, Oshima Ryuji 1 |
|
5 |
Controlled Growth of InAs QDs on InP Substrate
by Double-Capping Method and Its Growth Mechanism |
NIMS 1, Fujitsu Labs. 2, Nagoya Univ. 3 Sakuma
Yoshiki 1, Takeguchi Masaki 1, Takemoto Kazuya 2, Hirose Shin-ichi 2, Usuki
Tatsuya 2, Akanuma Yasuhiko 3, Yamakawa Ichiro 3, Nakamura Arao 3 |
|
6 |
Controlling Shape of InAsSb Quantum Structures
on Vicinal InP Substrates Grown by MOVPE |
Fujitsu 1, Fujitsu Labs 2 *Kawaguchi Kenichi 1,2,
Ekawa Mitsuru 1,2, Akiyama Tomoyuki 1,2, Kuwatsuka Haruhiko 1,2, Sugawara
Mitsuru 1,2 |
|
7 |
Formation and Optical Characteristics of InAs Quantum
Dots with Dilute N/Sb |
P&I Lab., Tokyo Tech Miyamoto Tomoyuki, Matsuura
Tetsuya, Suzuki Ryoichiro |
|
|
Break 15:20〜15:35 |
|
|
8 |
Self-formation control of high-density and high-uniformity
InAs quantum dots |
Univ. Electro-Comm. *Koichi Yamaguchi |
|
9 |
MBE growth of InAs dots on patterned GaAs substrates
using anodic porous alumina mask |
Tokyo Univ. of Agri. & Tech. *Morishita Yoshitaka
1, Maeda Kensaku 1, Umezawa Yusuke 1 |
|
10 |
Effects of AlAs Coating for Stacked InAs/GaAs QDs |
Nippon Inst. of Tech. 1 Kanji Iizuka 1, Hiroshi
Yokota 1, Hiroshi Okamoto 1 |
|
11 |
Site-Control of InAs Quantum Dot Formation using
the Nano-Jet Probe Method |
NEC Corp.1, Kumamoto Univ.2, Univ. of Tsukuba3
*Shunsuke Ohkouchi1, Yusui Nakamura2 , Kiyoshi Asakawa3 |
|
12 |
in situ STM observation of InAs quantum dots during
MBE growth |
Univ. Tokyo 1 Tsukamoto Shiro 1, Arakawa Yasuhiko
1 |
|
13 |
Temporal evolution of strain and composition of
InAs quantum dots during MBE growth |
JAEA 1 *Takahasi Masamitu 1 |
|
14 |
First principles calculations and kinetic Monte
Carlo simulations for the mechanism of quantum dot formation |
Tottori Univ. 1 Ishii Akira 1 |
|
15 |
Summary: The Milestone of bottom up epitaxial
growth and the development toward nano-epitaxy |
Kobe Univ. Takashi Kita |
光とカオス −応用最前線− |
August 30 (Wed.) 13:00〜17:30 |
30p-ZA- / 0 |
|
1 |
Introductory Talk: Chaos and Optical Engineering |
Shizuoka Univ., Faculty Eng. Ohtsubo Junji |
|
2 |
Several Issues on Development of Chaotic Communications
Systems |
ChaosWare 1 Umeno Ken 1 |
▲ |
3 |
Dynamical Sensing and Communication Devices |
NTT-CS 1 * Peter Davis 1 |
|
4 |
Cryptography using correlated randomness |
NTT Communication Science Labs. 1 Kazuyuki Yoshimura
1, Jun Muramatsu 1 |
|
5 |
Implementation of correlated randomness cipher
with chaotic lasers |
Takushoku Univ. 1 *Uchida Atsushi 1, Yoshimori
Shigeru 1 |
|
|
Break 15:45〜16:00 |
|
|
6 |
Optical Chaotic Communication With Asynchronous
Chaotic Laser Diode Transmitter/Receiver Array |
Waseda Univ. 1, HRC 2 *Satoshi Ebisawa 1, Haruka
Miyazaki 1, Shinichi Komatsu 1,2 |
|
7 |
Lateral Modes and Chaotic Instabilities in Broad-Area
Laser Diodes |
Sony Corp.,CTDG 1 Yoshiro Takiguchi 1, Tsunenori
Asatsuma 1, Sebastien Frederico 1, Akio Furukawa 1, Shoji Hirata 1 |
|
8 |
Laser oscillation of wave chaos |
Department of Physics, Faculty of Science, Ritsumeikan
University Kensuke S.Ikeda |
|
9 |
Lasing characteristics of 2D microstadium laser
diodes |
Okayama Pref. Univ. 1, ATR Wave Engineering Labs.
2 *Fukushima Takehiro 1,2, Harayama Takahisa 2 |
The Upcoming Application
for Cluster Ion Beam |
August 30 (Wed.) 13:00〜17:15 |
30p-K- / 0 |
|
1 |
Cluster ion beam processing -A review of physics,
technology and applications- |
University of Hyogo, Laboratory of Advanced Science
and Technology Isao Yamada |
|
2 |
High-Speed Processing with Gas Cluster Ion Beams |
Kyoto Univ. 1 *Toshio Seki 1, Jiro Matsuo 1 |
|
3 |
GCIB Process Development for Electric and Industrial
Appreciations |
Hakuto Co., Ltd. 1, Epion Corp. 2 * Kasuga Koji
1, J Weldon2, R MacCrimmon2, S Caliendo2, Y Shao2,
J Hautala2, B Zide2, M Gwinn2
|
|
4 |
No damage surface processing using gas cluster
ion beams |
LASTI, Univ. of Hyogo 1 *Noriaki Toyoda 1, Isao
Yamada 1 |
|
5 |
Prospect of Cluster Ion Beam Technology for Nano-Fabrication |
Kyoto Univ. *Matsuo Jiro 1 |
|
|
Break 15:10〜15:25 |
|
|
6 |
Cluster Doping Technology for Advanced CMOS |
Renesas technology Corp. Kuroi Takashi, Kawasaki
Yoji, Ishibashi Masato, Yamashita Tomohiro |
|
7 |
Decaborane Ion Implantation Equipment |
Nissin Ion Equipment Co.,Ltd. 1, FUJITSU LABORATORIES
LTD. 2, Matsuda Koji 1, Tanjyo Masayasu 1, Aoyama Takayuki 2, |
|
8 |
Simulation of Cluster Impacts for Novel Nano-processing
Technology |
Dept. of Electric Sci. & Eng Kyoto Univ. 1, Quantum
Sci. & Eng. Ctr. Kyoto Univ 2 *Takaaki Aoki 1, Jiro Matsuo 2 |
|
9 |
Decaborane Ion Implantation for PMOSFETs |
FUJITSU LABORATORIS LTD 1, NISSIN Ion Equipment
Co.,ltd. 2
*Takayuki Aoyama1, Masatoshi Fukuda1,
Sei Umisedo2, Nariaki Hamamoto2, Tsutomu Nagayama2, Masayasu Tanjyo2
|
Future Prospects of Advanced
Bio-Sensing |
August 30 (Wed.) 13:00〜17:00 |
30p-RB- / 0 |
|
1 |
Introductory Talk -- Significance of Bio-Sensing |
Yokohama National Univ. 1, CREST/JST 2 *Ogino Toshio
1,2 |
|
2 |
Folding and quality control of intracellular proteins
by molecular chaperones |
Kyoto Univ.,Inst.for Frontier Medical Sciences Kazuhiro
Nagata |
|
3 |
Gravimetric measurements of Biomolecular Reactions
by a quartz crystal microbalance |
Tokyo Institute of Technology Yoshio Okahata |
|
4 |
Molecular imaging of living yeast cells by linear
and non-linear Raman microspectroscopy |
The Univ. of Tokyo, Dept. of Chem. Hiro-o Hamaguchi |
|
|
Break 14:50〜15:05 |
|
|
5 |
Fabrication and Functionalization ofBio-intersurface |
Toray, New Frontiers Research Labs. Fumio Nakamura
1 |
|
6 |
Bio-measurements using thermal lens spectroscopy
and microchemical chip |
Nagoya Univ. *Tokeshi Manabu 1 |
|
7 |
Nanoscopic Force Measurement and Bio-Interface |
Tokyo Inst. Tech. 1, RIKEN FRS 2 *Hara Masahiko
1,2 |
|
8 |
Closing Talk - Future Prospects of Advanced Bio-Sensing |
RIEC, Tohoku University Michio Niwano |
Materials science and interface
physics of noble oxides covering SiO2 and High-k dielectrics |
August 30 (Wed.) 13:00〜17:50 |
30p-ZW- / 0 |
|
1 |
Introductory talk |
Waseda Univ1, Tsukuba Univ2, NIMS3 * Yamada Keisaku1,
Yamabe Kikuo2, Chikyow Toyohiro3 |
|
2 |
Effect of the SiO2/Si interface on enhanced Si
and O self-diffusion in SiO2 |
NTT Basic Research Laboratories 1, Keio Univ. 2 Uematsu
Masashi 1, Itoh Kohei 2 |
|
3 |
Accelerated Oxidation at High-k/Si Interfaces due
to Catalytic Effects of the Metal Oxide Dielectrics |
Osaka University, Graduate School of Engineering Watanabe
Heiji, Takayoshi Shimura and Kiyoshi Yasutake |
|
4 |
Interfacial reaction in HfO2/SiO2/Si(001)
observed by high-resolution RBS |
Kyoto Univ. 1, NTT-BRL 2, Selete 3, Waseda Univ.
4 Ming Zhao 1, *Kaoru Nakajima 1, Motofumi Suzuki 1, Kenji Kimura 1, Masashi
Uematsu 2, Kazuyoshi Torii 3, Satoshi Kamiyama 3, Yasuo Nara 3, Keisaku
Yamada 4 |
|
5 |
Lanthanum Oxide for Gate Insulator Application |
IGSSE, Tokyo Inst. of Technol. 1
FCRC, Tokyo Inst. of Technol. 2 Kuniyuki Kakushima 1, Parhat Ahmet 2, Kazuo
Tsutsui 1, Hiroshi Iwai 2 |
|
|
Break 15:05〜15:20 |
|
|
6 |
Physics of Metal/Insulator Interfaces -Structures
and Electronic Properties- |
Chiba Univ. 1 *Nakayama Takashi 1,2 |
|
7 |
Characterization of Chemical Structure at Metal
Gate/Dielectric Interfaces and Evaluation of Effective Work Function of
Metal Gate
|
Grad. School of AdSM, Hiroshima Univ. 1 Miyazaki
Seiichi 1 |
|
8 |
Interface Properties of Metal Electrodes and High-k
Dielectric Films Using a Combinatorial Technique |
NIMS 1, Univ. of Tsukuba 2, Osaka Univ. 3, Selete
4, Waseda Univ. 5, NIST 6 NIMS1, Univ. of Tsukuba2, Osaka Univ.3, Selete4,
NIST5, Waseda Univ.6
K. Ohmori Kenji 1, Ahmet Parhat 1, Shiraishi Kenji 2, Yoshitake Michiko
1, Yamabe Kikuo 2, Watanabe Heiji 3, Akasaka Yasushi 4, Nara Yasuo 4, K.-S.
Chang 6, M. L. Green 6, Yamada Keisaku 5, Chikyow Toyohiro 1 |
|
9 |
Mechanism for suppression of crystallization by
Si-N bond formation in HfSiON |
Tsukuba Univ. 1, NIMS 2, Hiroshima Univ. 3, Selete
4, TEL 5, Univ. of Tokyo 6 Shiraishi Kenji 1, *Umezawa Naoto 2, Miyazaki
Seiichi 3, Uedono Akira 1, Akasaka Yasushi 4,5, Inumiya Seiji 4, Momida
Hiroyoshi 6, Ohno Takahisa 2, Ohmori Kenji 2, Chikyow Toyohiro 2 |
|
10 |
Issues of High-k gate dielectrics clarified by
mobility evaluation of High-k transistor |
RDC Toshiba Corp. 1,Semiconductor Company Toshiba
Corp. 2 *Koyama Masato 1,Kamata Yoshiki 1,Koike Masahiro 1,Ino Tsunehiro
1,Tatsumura Kosuke 1,Nishiyama akira 1,Muraoka Kouichi 1,Ishihara Takamitsu
1,Iijima Ryosuke 1, Takayanagi Mariko 2 |
Emerging technologies and
recent development of practical applications in spinelectronics |
August 30 (Wed.) 13:00〜17:35 |
30p-ZK- / 0 |
|
1 |
Introduction |
Tokyo Inst. Tech. 1, Matsushita Electric 2 Junji
Yoshino 1, Hiroshi Sakakima 2 |
|
2 |
Spintronics including nuclear spins |
NTT Basic Research Labs 1, SORST-JST 2, Tohoku
Univ. 3 * Yoshiro Hirayama 1,2,3 |
|
3 |
Photoinduced magnetism in ferromagnetic semiconductors |
ISEL, Tokyo Inst. of Tech.1 *Tsuyoshi Kondo 1,Hiro
Munekata 1 |
|
4 |
Giant Electric Field-Induced Magnetization Change
in Multiferroic BaTiO3-LaMnO3 Ceramic Composites |
Nagoya Inst. of Tech. 1 Gomi Manabu 1 |
|
|
Break 14:50〜15:05 |
|
|
5 |
Simulation of Spin-Transfer-Driven Magnetization
Reversal |
Advanced Research Lab. Hitachi, Ltd. 1 *Onogi Toshiyuki
1, Ichimura Masahiko 1 |
|
6 |
Spin-Transfer Torque Writing Technology (STT-RAM)
For Future MRAM |
Grandis 1 *Nagai Hideyasu 1,Huai Yiming 1 |
|
7 |
Performance study of TMR heads with MgO barrier
|
Data Storage & Thin Film Technology Components
Business Group, TDK Corp. 1 *Takeo Kagami 1, Shunji Saruki 1,Satoshi Miura
1 and Tetsuya Kuwashima 1 |
|
8 |
Near Field Optics and Heat Assisted Magnetic Recording |
Nihon Univ. 1 Katsuji Nakagawa 1 |
Recent Development in Neutron
Detection Technique |
August 30 (Wed.) 13:30〜17:50 |
30p-R- / 0 |
|
1 |
Intoroductory Talk; Recent Development of Neutron
Detection Technique |
JAEA 1 *Sakasai Kaoru 1, |
|
2 |
Current Status of the Development of Neutron Detectors
for High Intense Pulsed Neutron Experiments |
JAEA Soyama Kazuhiko 1 |
|
3 |
DARWIN: Dose Monitoring System Applicable to Various
Radiations with Wide Energy Ranges |
JAEA 1 *Sato Tatsuhiko 1, Satoh Daiki 1, Endo Akira
1 |
|
4 |
Development of phoswich-typed high energy neutron
detector |
National Inst. of Radiological Sciences * Masashi
Takada 1 |
|
|
Break 15:35〜15:50 |
|
|
5 |
Application of Personal Neutron Dosimeter to Higher
Energy Region |
Kobe Univ. Keiji Oda |
|
6 |
Development of Fast Neutron Image Sensor Using
Organic Liquid Scintillator and Wavelength Shifting Fiber |
Fuji Electric Systems. Co., Ltd. 1
Nagoya Univ. 2
JAEA 3
Inui Daisuke 1, Watanabe Kenichi 2, Kawarabayashi Jun 2, Iguchi Tetsuo
2, Nishitani Takeo 3 |
|
7 |
Neutron spatial distribution measurement with 6Li-containing
TL sheet |
National Maritime Research Inst. 1, CSD 2, Nemoto
& Co.,Ltd 3 *Konnai Akiko 1, Odano Naoteru 1, Sawamura Hidenori 2, Ozasa
Naoto 3, Ishikawa Yuhzoh 3 |
Developments of Solar Cells
- Present and Future - |
August 31 (Thu.) 9:50〜17:25 |
31a-ZS- / 0 |
|
1 |
Present status and futur of solar cells |
Gifu Univ. Engi. ERES Shuichi Nonomura |
|
2 |
Thin Film Si Photpvoltaic Solar Cell in MHI |
MHI Nagasakj R&D Ctr. 1, MHI Advanced Technol.
R&D Ctr. 2, MHI Nagasaki Ship & Machinery Works 3 *Yoshiaki Takeuchi 1,
Keisuke Kawamura 1, Tatsuyuki Nishimiya 1, Kengoh Yamaguchi 1, Youji Nakano
1, Nobuki Yamashita 1, Saneyuki Goya 2, Yasuhiro Yamauchi 3, Hiromu Takatsuka
3 |
|
3 |
Development of Thin Film Si Solar Cells and Modules |
Kaneka corp. Akihiko Nakajima, Kenji Yamamoto |
|
4 |
Present Status and Future Prospects of Flexible
Solar Cell using Plastic Film Substrate |
Fuji Electric Advanced Technology Co., Ltd Takehito
Wada |
|
5 |
Future prospects of thin-film silicon solar cells |
Nat'l. Inst. Adv. Industr. Sci. Tech. 1 *Masuda
Atsushi 1, Kondo Michio 1 |
|
|
Lunch 12:00〜13:00 |
|
31p-ZS- / 0 |
|
1 |
CIS-based Thin-film Solar Cells - From R&D to Production |
Showa Shell, CIS Project Team Katsumi Kushiya 1 |
|
2 |
Development of thin film chalcogenide photovoltaic
materials |
Ryukoku Univ. Takahiro Wada |
|
3 |
Development of dye-sensitized solar cells and their
modules |
TOYOTA CRDL 1, TOYOTA TI 2, AISIN SEIKI 3 *Motohiro
Tomoyoshi 1,2, Toyoda Tatsuo 3 |
|
4 |
Small-molecular-type organic solid-state solar
cells having p-i-n junction |
Osaka Univ. *Hiramoto Masahiro 1 |
|
|
Break 15:00〜15:15 |
|
|
5 |
Hierarchical Nanostructure for Organic Solar Cell |
Kyoto Univ. 1 Yoshikawa Susumu |
|
6 |
Current state of silicon solar cell and view in
the future |
SHARP Corp. Solar Systems Development Center Kaneiwa
minoru 1 |
|
7 |
The Recent Trends of Crystalline Silicon Photovoltaic
Industry |
RTS Corporation 1 Ohigashi Takashi 1, Ikki Osamu
1, Kaizuka Izumi 1, Kurihara Risa 1, Matsukawa Hiroshi 1 |
|
8 |
Solar Photovoltaic Systems toward Large Scale Deployment |
Tokyo Univ. Agri. & Techn. 1 Kosuke Kurokawa 1 |
|
9 |
Summary |
Tokyo Inst. Technology YAMADA Akira |
π共役高分子の超階層制御と革新機能の探索 |
August 31 (Thu.) 13:00〜17:20 |
31p-ZH- / 0 |
|
1 |
Introductory talk for advanced function in controlled
hierarchal structures of pi-conjugate polymers |
LSSE, Kyushu Inst. Tech. Keiichi Kaneto |
|
2 |
Control of Super-Hierarchical Structures and Innovative
Functions of Conducting Polymers |
Kyoto Univ. 1 *Akagi Kazuo 1 |
|
3 |
Spin-Correlated Function of p-Conjugated Polymers |
Dept of Applied Chem., Waseda Univ. Hiroyuki Nishide |
|
4 |
Photochromic Molecular Switching on Conjugated
Molecular Wires |
Nara Inst.Sci.Techn., NAIST Kawai Tsuyoshi, Nakashima
Takuya |
|
|
Break 15:05〜15:20 |
|
|
5 |
Organic field effect transistor using liquid as
gate dielectric |
LSSE Kyushu Inst. of Tech., Linkoping Univ. Takashima
Wataru 1, Mattias Andersson 2, Keiichi Kaneto 1, Olle Inganas 2 |
|
6 |
Exploration for Innovative Function of Fluorescent
Diphenylacetyene Polymers |
Kyungpook Univ.1, Nara Inst. of Sci. & Tech.2 *Kwak
Giseop1, Fujiki Michiya2 |
|
7 |
Electronic states of natural and metal doped DNA |
Tokyo Metropolitan Univ. Kenji Mizoguchi |
Short-wavelength light-emitting
devices with nitride-semiconductor |
August 31 (Thu.) 13:40〜18:00 |
31p-E- / 0 |
|
1 |
Introduction: GaN-based short wavelength light
emitting devices |
SANYO Electric Co., Ltd. Kunisato Tatsuya |
|
2 |
Development of solid state ultraviolet light emitter |
Dept. MSE and 21st Century COE “Nano-factory”,
Meijo Univ.1, Ibiden Co. Ltd.2, Showa Denko K.K.3 *H. Amano1, K. Balakrishnan1,
M. Iwaya1, S. Kamiyama1, I. Akasaki1, T. Noro2, T. Takagi2, A. Bandoh3 |
|
3 |
Luminescence characteristics of nonpolar (Al,In,Ga)N
quantum structures and light emitting diodes |
NICP-ERATO JST 1, Univ. Tsukuba 2, UCSB 3, Tokyo
Univ. Sci.4, Waseda Univ. 5 *Chichibu Shigefusa 1,2, Onuma Takeyoshi 1,2,
Koyama Takahiro 1,2, Chakraborty Arpan 1,3, Masui Hisashi 1,3, Haskell Benjamin
1,3, Fini Paul 1,3, Keller Stacia 3, Kusakabe Kazuhide 4, Ohkawa Kazuhiro
1,4, DenBaars Steven 1,3, Speck James 1,3, Mishra Umesh, Sota Takayuki 5
and Nakamura Shuji 1,3 |
|
4 |
Development of Ultraviolet (UV) Light-Emitting
Diodes (LEDs) using Quaternary InAlGaN |
RIKEN 1 Hirayama Hideki 1 |
|
5 |
Ultra-violet LEDs incorporating GaN quantum dots |
RIES, Hokkaido Univ. *Satoru Tanaka |
|
|
Break 15:45〜16:00 |
|
|
6 |
Short-wavelength single-photon generation using
nitride-based semiconductor quantum dots |
IIS 1, RCAST 2, Univ. of Tokyo *Satoshi. Kako 1,
Munetaka Arita 1, and Yasuhiko Arakawa 1,2 |
|
7 |
GaN nanocolumn based light emitting device |
Sophia Univ. 1, CREST JST 2 *Kishino Katsumi 1,2,
Kikuchi Akihiko 1,2 |
|
8 |
Blue-Violet Laser Diodes |
Nichia Corporation Nagahama Shinichi |
|
9 |
AlN deep-UV light-emitting diode with a wavelength
of 210 nm |
NTT BRL *Taniyasu Yoshitaka 1, Kasu Makoto 1, Makimoto
Toshiki 1 |
Optical Interconnection
(II) |
August 31 (Thu.) 13:00〜17:35 |
31p-ZT- / 0 |
|
1 |
Introductory Talk: Towards Innovation of Optical
Interconnection |
Kobe Univ. Wada Osamu |
|
2 |
Trends and Prospects of Optical Interconnection
Technologies |
System Platforms Res. Labs., NEC Corporation Ichiro
Ogura, Ichiro Hatakeyama, Junichi Sasaki, and Kazuhiko Kurata |
|
3 |
10-Gbit/s/channel Optical Transceiver for Optical
Interconnection |
Hitachi Ltd. Central Research Lab. 1 *Masato Shishikura
1, Takuma Ban 1, Reiko Mita 1, Yasunobu Matsuoka 1 |
|
4 |
Development of Optical Interconnection Technology
for Consumer Electronics |
SONY Material Labs. Optoelectronics Lab. 1 Arakida
Takahiro 1, Nakata Hidehiko 1, Naruse Terukazu 1, Okubo Miwa 1,
Koda Rintaro 1, Masui Yuji 1, Narui Hironobu 1 |
|
5 |
Characteristics of 4 channel VCSEL array operating
at 850 nm wavelength |
Fuji Xerox Co.,Ltd. Optical System Business Development
1 Takashi Kondo 1, Nobuaki Ueki 1, Jun Sakurai 1, Hideo Nakayama 1 |
|
|
Break 15:20〜15:35 |
|
|
6 |
Optical Interconnect for Computing Systems |
IBM Japan Tokyo Research Lab. 1 *Shigeru Nakagawa
1 |
|
7 |
On-chip Optical Interconnection |
The Univ. of Tokyo Kazumi Wada, Yasuhiko Ishikawa |
|
8 |
|
|
|
9 |
Silicon photonic wire waveguides for on-chip optical
interconnection. |
NTT MI labs. *Koji Yamada 1, Hiroshi Fukuda 1,
Tai Tsuchizawa 1, Toshifumi Watanabe 1, Sei-ichi Itabashi 1 |
Recent advances in photoelectronics
of fine particles and the related materials |
August 31 (Thu.) 13:00〜17:05 |
31p-B- / 0 |
|
1 |
Recent advances in photoelectronics using microspheres
and the related materials: Introductory talk |
Kobe Univ. 1 Uchino Takashi 1 |
|
2 |
Fabrication of Colloidal Photonic Crystals and
Its Application to Biosensor |
Hokkaido University Misawa Hiroaki |
|
3 |
Application of Inorganic Nano-Phosphors for Biomedical
Researches |
Tokyo Univ. of Sci. *SOGA Kohei |
|
4 |
Photoluminescence properties of Si nanocrystals
and the photosensitization effect |
Faculty of Engineering, Kobe Univ. *Minoru Fujii,
Shinji Hayashi |
|
|
Break 15:20〜15:35 |
|
|
5 |
Microdisk and Microring Cavities of π-Conjugated
Polymers |
Osaka Univ.1 *Fujii Akihiko1, Ozaki Masanori1 |
|
6 |
Electronic excitation effects in nanometer-sized
clusters |
Kobe Univ. 1 *Yasuda Hidehiro 1, Tanaka Akinori
1 |
The forefront of thermoelectric
generation systems -Can thermoelectrics save the Eearth?- |
August 31 (Thu.) 13:20〜17:50 |
31p-L- / 0 |
|
1 |
Forefront of Development for Thermoelectric Power
Generation Systems |
Shonan Inst. of Technology 1,Eng.Advancement Assoc.
of Japan *Kajikawa Takenobu 1, Onishi Tetuo 2 |
|
2 |
Development of Thermoelectric Conversion Module
and System for Consumer Use |
Yamaha Co. 1 Horio Yuma 1, Hayashi Takahiro 1,
Tachibana Takahisa 1, Kamimura Naoki 1 |
|
3 |
Development of Thermoelectric Conversion System
to recover exhaust heat below 150 degrees centigrade |
Toshiba Corp. Keiichi Sasaki 1, Takehisa hino 1,
Yuujiro Nakatani 1, Kengo Wakamatsu 1, Takahiko Shindo 1, Yoshiyasu Ito
1 |
|
|
Break 15:10〜15:25 |
|
|
4 |
Development of thermoelectricity conversion systems
using radiant heat for industrial furnaces |
Ishikawajima-Harima Heavy Industries Co.,Ltd Toshinori
Ota 1,Kouichi Fujita 1,Susumu Tokura 1,Kazuo Uematsu 1 |
|
5 |
Thermo-Electro Technology as Automotive Heat-Recovery,
Position & Prospect |
Sango Co. Ltd. R&D Dept. 1 *Hase Shuichi 1 |
|
6 |
Development of oxide thermoelectric system for
high temperature |
AIST 1, JST CREST 2 *Funahashi Ryoji 1,2, Urata
Saori 2, Mihara Toshiyuki 1,2 |
|
7 |
Summary |
Yamaguchi University Kengo Kishimoto |
Process diagnostics technologies
for process monitoring |
August 31 (Thu.) 14:00〜18:05 |
31p-ZW- / 0 |
|
1 13:30〜14:00 (Plasma Electronics Award) |
|
2 |
Process diagnostics technologies for process monitoring |
STDG, SBU, Sony corp. *Tatsumi Tetsuya 1 |
|
3 |
Monitoring of Electron Density for plasma equipment
for materials processing |
Chubu Univ. 1, Nagoya Univ. 2 *Nakamura Keiji 1,
Sugai Hideo 2 |
|
4 |
Monitoring of nano-particles in plasma CVD and
its application to structure- and property-control of films |
Kyushu Univ. 1 *Masaharu Shiratani 1 |
|
5 |
On-wafer Monitoring for High Performance Plasma
Processes |
Tohoku Univ. 1, STARC2 *Seiji Samukawa 1, Hiroto
Ohtake 1, Shingo Kadomura 2, Yoshinari Ichihashi, Akihito Nishitani 2 and
Jun Hashimoto 2 |
|
6 |
Optical plasma diagnostic techniques and in-situ
plasma monitoring |
Nagoya Univ. *Kono Akihiro |
|
|
Break 15:50〜16:05 |
|
|
7 |
Equipment & Plasma Monitoring Using rf Impedance
Measurements |
Mitsubishi Elecric Corp. 1, Renesas Technology
Corp. 2 *Taki Masakazu 1, Tuda Mutumi 1, Abe Yuji 1, Hanazaki Minoru 2,
Komemura Toshio 2 |
|
8 |
Improvement of Etching Process Uniformity using
Radical Distribution Monitoring and Control |
Hitachi CRL *Tanaka Junichi 1, Kanno Seiichiro
1, Miya Go 1 |
|
9 |
Defect control by in situ particle monitoring |
Tokyo Electron AT 1 *Tsuyoshi Moriya 1 |
|
10 |
Plasma Sensing for Advanced Process Control |
Hitachi-Hitec Kasado Proc. 1 Enami Hiromichi 1 |
|
11 |
Summary -Plasma nano-science established by monitoring
and aim for the center for nano-manufacturing-
|
Nasoya Univ. 1 *Masaru Hori 1 |
193nm Immersion Lithography
|
September 1 (Fri.) 9:30〜14:00 |
1a-RC- / 0 |
|
1 |
Current Status of ArF Immersion Lithography |
Renesas Technology Corp. *Hanawa Tetsuro, Takeo
Ishibashi, Toshifumi Suganaga, Yoshiharu Ono, Kazuyuki Suko |
|
2 |
Current Status and Future Prospect of Immersion
Exposure Tool |
Nikon Corp. 1 Hirotaka Kohno 1, Soichi Owa 1 |
|
3 |
Development Status and Extendibility of ArF immersion
Exposure Tools |
CANON INC. Optical Products Operations
CANON INC. Optical Technology Research Center
CANON INC. Optical Products Operations
CANON INC. Optical Products Operations Kobayashi Masamichi 1
Honda Tokuyuki 2
Nakano Hitoshi 3
Arakawa Mikio 4
|
|
4 |
Immersion Lithography process issues for volume
production |
Tokyo Electron Kyushu Ltd., Kitano Junichi, Kyoda
Hideharu |
|
|
Lunch 11:30〜12:30 |
|
1p-RC- / 0 |
|
1 |
Material Development Status for ArF Immersion Lithography |
Tokyo Ohka Kogyo, Advanced Material Development
Div.1 *Katsumi Ohmori 1, Takeshi Iwai 1, Tomoyuki Ando 1, Kazuhito Sasaki
1, Hisanobu Harada 1 |
|
2 |
ArF Immersion Lithography Materials Development |
Semiconductor Materials Research Lab. *Shimokawa
Tsutomu 1,Yamaguchi Yoshikazu 1,Kusumoto Shirou 1, Shima Motoyuki 1,Takahashi
Jun-ichi 1 |
|
3 |
High refractive index fluid for next generation
immersion lithography |
Mitsui Chemicals, Inc. 1 *Kagayama Akifumi 1, Nakano
Takashi 1, Fukuda Shin 1 |