応用物理、第81巻、第2号 (2012)

表紙のことば 　写真は，次世代光電子増倍管「μPMT」の外観写真．シリコン基板を2枚のガラス基板で挟み込んだ，わずか三つの部品で構成されたシンプルな3層構造で，増倍部の金属電極の配置と同様なパターンをエッチングによりシリコン基板を削って形成している．これまでの光電子増倍管と同じ動作原理で真空管構造のため，同等の性能が期待できる． （本文p. 130参照)

The cover picture is an exterior appearance of “μPMT” which is expected to be a next-generation PMT. The μPMT which is composed of a silicon substrate sandwiched by two glass substrates, that is, simple triple-layered structure formed by only three parts.　The pattern which is equivalent to the design of an electron-multiplier section’s metallic electrodes is etched on the silicon substrate. The μPMT is hoped that the specification is equal to that of a traditional PMT because working principle of the μPMT is the same as that of a traditional PMT to take advantage of vacuum-tube features. (p.130)