研究紹介
磁束量子フロートランジスタとフロー特性
宮原 一紀，久保 衆伍，鈴木 実
応用物理, 第64巻,
第4号, pp.349-353 (1995)
高温超伝導薄膜を用いて磁束量子フロートランジスタを製作し，チャネル内をフローする磁束量子のフロー速度を測定した．YBaCuO薄膜で得られたフロー速度は5.4×105m/s程度であった．またこれらのブロー特性パラメーターとフロートランジスタの性能パラメーターとの関係を明らかにした．NdCeCuO薄膜で作製した磁束量子フロートランジスタについて相互レジスタンスを求め，最大で1.25Ωを得た．
Kazunori MIYAHARA, Shugo KUBO and Minoru SUZUKI
OYO BUTURI,
vol.64,
No.4, pp.349-353 (1995)
Vortex flow transistors were fabricated from high-Tc superconducting thin films. The
velocity of a vortex flowing along a channel was measured from the applied magnetic
field dependence of the I-V characteristics. The obtained flow velocity is
~5.4x105m/s
for YBaCuO devices. The transresistance and current gain of the devices were investigated
phenomenologically and experimentally in relation to the flux flow characteristics. It
was shown that the transresistance was proportional to the vortex flow velocity, the
channel width and the magnetic coupling coefficient between the channel and the control
current line. The control current dependence of the transresistance was measured for
NdCeCuO devices. It was found that the transresistance peak appeared at a high control
current level. The peak value of the transresistance was 1.25 ohm.
Keywords : high-temperature superconductor, superconducting three-terminal device, vortex, flux flow, flow velocity, YBaCuO, NdCeCuO